JP2014009961A5 - - Google Patents

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Publication number
JP2014009961A5
JP2014009961A5 JP2012144604A JP2012144604A JP2014009961A5 JP 2014009961 A5 JP2014009961 A5 JP 2014009961A5 JP 2012144604 A JP2012144604 A JP 2012144604A JP 2012144604 A JP2012144604 A JP 2012144604A JP 2014009961 A5 JP2014009961 A5 JP 2014009961A5
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JP
Japan
Prior art keywords
gas
plasma
bonnet
icp
flow path
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Application number
JP2012144604A
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English (en)
Japanese (ja)
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JP2014009961A (ja
JP5965743B2 (ja
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Priority to JP2012144604A priority Critical patent/JP5965743B2/ja
Priority claimed from JP2012144604A external-priority patent/JP5965743B2/ja
Priority to KR1020130071401A priority patent/KR101948943B1/ko
Priority to CN201310261620.6A priority patent/CN103515184B/zh
Publication of JP2014009961A publication Critical patent/JP2014009961A/ja
Publication of JP2014009961A5 publication Critical patent/JP2014009961A5/ja
Application granted granted Critical
Publication of JP5965743B2 publication Critical patent/JP5965743B2/ja
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JP2012144604A 2012-06-27 2012-06-27 Ｉｃｐ装置及び分光分析装置並びに質量分析装置 Active JP5965743B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012144604A JP5965743B2 (ja) 2012-06-27 2012-06-27 Ｉｃｐ装置及び分光分析装置並びに質量分析装置
KR1020130071401A KR101948943B1 (ko) 2012-06-27 2013-06-21 Icp 장치 및 분광 분석 장치와 질량 분석 장치
CN201310261620.6A CN103515184B (zh) 2012-06-27 2013-06-27 感应耦合等离子体装置、分光分析装置以及质量分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012144604A JP5965743B2 (ja) 2012-06-27 2012-06-27 Ｉｃｐ装置及び分光分析装置並びに質量分析装置

Publications (3)

Publication Number Publication Date
JP2014009961A JP2014009961A (ja) 2014-01-20
JP2014009961A5 true JP2014009961A5 (https=) 2015-04-30
JP5965743B2 JP5965743B2 (ja) 2016-08-10

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ID=49897722

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JP2012144604A Active JP5965743B2 (ja) 2012-06-27 2012-06-27 Ｉｃｐ装置及び分光分析装置並びに質量分析装置

Country Status (3)

Country Link
JP (1) JP5965743B2 (https=)
KR (1) KR101948943B1 (https=)
CN (1) CN103515184B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101967145B1 (ko) * 2017-04-06 2019-04-09 울박, 인크 이온원 및 이온 주입 장치
CN108732234B (zh) * 2017-04-24 2020-09-29 上海新昇半导体科技有限公司 等离子体发生装置
KR102288662B1 (ko) 2017-05-12 2021-08-10 가부시키가이샤 사무코 스프레이 챔버, 시료 안개화 도입 장치, 분석 장치 및 시료 중의 성분 분석 방법
CN107464735A (zh) * 2017-06-28 2017-12-12 中国地质科学院水文地质环境地质研究所 一种新型氯/溴同位素质谱仪及其分析方法
CN108181374A (zh) * 2018-02-08 2018-06-19 聚光科技(杭州)股份有限公司 等离子体-质谱分析系统的工作方法
CN110519904B (zh) * 2019-08-16 2020-09-29 中国地质大学（武汉） 一种基于集磁器的icp等离子源形成装置及方法
CN110677972A (zh) * 2019-10-17 2020-01-10 中国人民解放军国防科技大学 用于SiC光学镜面加工的等离子体发生器及其应用方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS584062U (ja) * 1981-06-30 1983-01-11 日本ジヤ−レル・アツシユ株式会社 高周波誘導プラズマト−チ管
GB8602463D0 (en) * 1986-01-31 1986-03-05 Vg Instr Group Mass spectrometer
US4926021A (en) * 1988-09-09 1990-05-15 Amax Inc. Reactive gas sample introduction system for an inductively coupled plasma mass spectrometer
JPH0782918B2 (ja) * 1991-11-11 1995-09-06 株式会社三社電機製作所 インダクションプラズマトーチ
US5642190A (en) * 1995-09-01 1997-06-24 Thermo Jarrell Ash Corp. Dual-axis plasma imaging system for use in spectroscopic analysis
JPH11111491A (ja) * 1997-10-01 1999-04-23 Yokogawa Analytical Systems Inc プラズマ発生器
EP0930810A1 (fr) * 1997-12-29 1999-07-21 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Torche à plasma à injecteur réglable et installation d'analyse d'un gaz utilisant une telle torche
JP2003194723A (ja) * 2001-12-27 2003-07-09 Rikogaku Shinkokai プラズマトーチ
JP2004327243A (ja) * 2003-04-24 2004-11-18 Tdk Corp Ｉｃｐ質量分析装置及び質量分析方法
JP2010197080A (ja) * 2009-02-23 2010-09-09 Sii Nanotechnology Inc 誘導結合プラズマ分析装置
JP2010197207A (ja) * 2009-02-25 2010-09-09 Shimadzu Corp 発光分光分析方法及び発光分光分析装置
US8829386B2 (en) * 2010-05-05 2014-09-09 Perkinelmer Health Sciences, Inc. Inductive devices and low flow plasmas using them

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