JP2013543653A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013543653A5 JP2013543653A5 JP2013529756A JP2013529756A JP2013543653A5 JP 2013543653 A5 JP2013543653 A5 JP 2013543653A5 JP 2013529756 A JP2013529756 A JP 2013529756A JP 2013529756 A JP2013529756 A JP 2013529756A JP 2013543653 A5 JP2013543653 A5 JP 2013543653A5
- Authority
- JP
- Japan
- Prior art keywords
- ultrasonic
- article
- megasonic energy
- fluid
- energy source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 claims description 44
- 235000012431 wafers Nutrition 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/889,975 | 2010-09-24 | ||
| US12/889,975 US9662686B2 (en) | 2010-09-24 | 2010-09-24 | Ultrasonic cleaning method and apparatus |
| PCT/IB2011/054195 WO2012038933A2 (en) | 2010-09-24 | 2011-09-23 | Improved ultrasonic cleaning method and apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013543653A JP2013543653A (ja) | 2013-12-05 |
| JP2013543653A5 true JP2013543653A5 (https=) | 2014-11-13 |
| JP5974009B2 JP5974009B2 (ja) | 2016-08-23 |
Family
ID=45869372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013529756A Active JP5974009B2 (ja) | 2010-09-24 | 2011-09-23 | 改良超音波洗浄方法および装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9662686B2 (https=) |
| JP (1) | JP5974009B2 (https=) |
| KR (1) | KR20130107287A (https=) |
| CN (1) | CN103118810B (https=) |
| SG (1) | SG188535A1 (https=) |
| TW (1) | TWI473668B (https=) |
| WO (1) | WO2012038933A2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10391526B2 (en) | 2013-12-12 | 2019-08-27 | Lam Research Corporation | Electrostatic chuck cleaning fixture |
| TWI698291B (zh) * | 2016-11-02 | 2020-07-11 | 大陸商盛美半導體設備（上海）股份有限公司 | 襯底清洗方法及清洗裝置 |
| JP6554128B2 (ja) | 2017-02-28 | 2019-07-31 | 株式会社Ｓｕｂａｒｕ | 繊維強化複合材料の製造方法 |
| US10995422B2 (en) * | 2017-05-26 | 2021-05-04 | Sumitomo Electric Industries, Ltd. | GaAs substrate and method for manufacturing the same |
| CN107570482A (zh) * | 2017-07-06 | 2018-01-12 | 天津大学 | 界面的非特异性吸附物的去除装置及方法 |
| JP6715226B2 (ja) | 2017-10-25 | 2020-07-01 | 株式会社Ｓｕｂａｒｕ | 複合材成形治具及び複合材成形方法 |
| CN110560425B (zh) * | 2019-09-20 | 2021-01-29 | 深圳先进技术研究院 | 超声清洗装置、清洗方法及其应用 |
| US12269070B2 (en) * | 2020-12-16 | 2025-04-08 | The Boeing Company | Flexible cavitation apparatus |
| CN116581067B (zh) * | 2023-07-12 | 2023-09-22 | 北京东方金荣超声电器有限公司 | 基于器件湿法处理的兆声波系统的控制方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5625249A (en) | 1994-07-20 | 1997-04-29 | Submicron Systems, Inc. | Megasonic cleaning system |
| JP3511441B2 (ja) | 1996-11-29 | 2004-03-29 | 忠弘 大見 | 洗浄やエッチング、現像、剥離等を含むウエット処理に用いる省液型の液体供給ノズル、ウエット処理装置及びウエット処理方法 |
| US6290778B1 (en) | 1998-08-12 | 2001-09-18 | Hudson Technologies, Inc. | Method and apparatus for sonic cleaning of heat exchangers |
| JP4608748B2 (ja) * | 1999-08-05 | 2011-01-12 | 東京エレクトロン株式会社 | 洗浄装置、洗浄システム及び洗浄方法 |
| US6729339B1 (en) * | 2002-06-28 | 2004-05-04 | Lam Research Corporation | Method and apparatus for cooling a resonator of a megasonic transducer |
| US7240679B2 (en) | 2002-09-30 | 2007-07-10 | Lam Research Corporation | System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold |
| WO2004112093A2 (en) | 2003-06-06 | 2004-12-23 | P.C.T. Systems, Inc. | Method and apparatus to process substrates with megasonic energy |
| CN1822905A (zh) | 2003-06-06 | 2006-08-23 | P.C.T.系统公司 | 用兆频声波能量处理基片的方法和设备 |
| CN1976765B (zh) | 2004-06-29 | 2011-11-09 | 株式会社鹿儿岛超音波综合研究所 | 超声波清洗的方法与装置 |
| US7392814B2 (en) | 2004-12-24 | 2008-07-01 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus and method |
| TWI259110B (en) | 2005-09-22 | 2006-08-01 | Delta Electronics Inc | Ultrasonic cleaning system and method |
| JP4652959B2 (ja) * | 2005-11-30 | 2011-03-16 | 芝浦メカトロニクス株式会社 | 基板の処理装置 |
| KR100710803B1 (ko) * | 2006-01-23 | 2007-04-23 | 삼성전자주식회사 | 기판 세정 장치 |
| JP2008021672A (ja) * | 2006-07-10 | 2008-01-31 | Sony Corp | ガス過飽和溶液を用いた超音波洗浄方法及び洗浄装置 |
| WO2008008921A2 (en) * | 2006-07-12 | 2008-01-17 | Akrion Technologies, Inc. | Tranducer assembly incorporating a transmitter having through holes, and method of cleaning |
| KR100931856B1 (ko) * | 2007-08-24 | 2009-12-15 | 세메스 주식회사 | 기판 세정 장치 및 기판 세정 방법 |
| JP2009178440A (ja) | 2008-01-31 | 2009-08-13 | Sammy Corp | 演出表示装置及び遊技機 |
-
2010
- 2010-09-24 US US12/889,975 patent/US9662686B2/en active Active
-
2011
- 2011-09-22 TW TW100134216A patent/TWI473668B/zh active
- 2011-09-23 SG SG2013018825A patent/SG188535A1/en unknown
- 2011-09-23 KR KR1020137007408A patent/KR20130107287A/ko not_active Ceased
- 2011-09-23 CN CN201180045874.3A patent/CN103118810B/zh active Active
- 2011-09-23 JP JP2013529756A patent/JP5974009B2/ja active Active
- 2011-09-23 WO PCT/IB2011/054195 patent/WO2012038933A2/en not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2013543653A5 (https=) | ||
| CN101959620B (zh) | 超声波清洗装置及超声波清洗方法 | |
| JP2011009699A5 (ja) | 基板処理装置、基板処理方法および半導体装置の製造方法 | |
| KR101226071B1 (ko) | 음향 에너지를 발생시키기 위한 장치, 및 그것을 만드는 방법 | |
| CN101563761B (zh) | 一种清洁处理元件的装置 | |
| KR101612633B1 (ko) | 기판 세정 방법 및 기판 세정 장치 | |
| JP5974009B2 (ja) | 改良超音波洗浄方法および装置 | |
| JP2012146939A5 (https=) | ||
| WO2012018448A3 (en) | Plasma processing chamber with dual axial gas injection and exhaust | |
| JP5851295B2 (ja) | 熱処理装置 | |
| WO2007085015A3 (en) | Acoustic energy system, method and apparatus for processing flat articles | |
| MX2009006925A (es) | Metodo y dispositivo de tratamiento de liquido. | |
| TW200623247A (en) | A substrate processing apparatus and method | |
| KR20090125471A (ko) | 상압 플라즈마 발생장치 및 이를 구비한 상압 플라즈마표면처리장치 | |
| CN100539004C (zh) | 用于对基片进行处理的方法和装置以及用于这种处理作业的喷嘴单元 | |
| KR100979568B1 (ko) | 초음파 정밀세정장치 | |
| PL374502A1 (pl) | Sposób i urządzenie do suszenia powierzchni płytek półprzewodnikowych z zastosowaniem wielu wlotów i wylotów utrzymywanych w bezpośrednim pobliżu powierzchni płytek | |
| CN101812661B (zh) | 一种压电式超声波盐浴加热渗氮装置 | |
| KR101242291B1 (ko) | 상압 플라즈마 세정장치 | |
| CN203955622U (zh) | 超声波清洗机 | |
| JP2016031916A (ja) | プラズマ表面処理方法、プラズマ表面処理装置およびプラズマ表面処理システム | |
| KR101224904B1 (ko) | 마스크 세정장치 | |
| JP5517227B2 (ja) | 超音波精密洗浄装置 | |
| JP2009260243A5 (ja) | 基板処理装置の基板載置台、基板処理装置及び半導体デバイスの製造方法 | |
| TW200741843A (en) | Acoustic energy system, method and apparatus for processing flat articles |