JP2013543254A5 - - Google Patents

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Publication number
JP2013543254A5
JP2013543254A5 JP2013529091A JP2013529091A JP2013543254A5 JP 2013543254 A5 JP2013543254 A5 JP 2013543254A5 JP 2013529091 A JP2013529091 A JP 2013529091A JP 2013529091 A JP2013529091 A JP 2013529091A JP 2013543254 A5 JP2013543254 A5 JP 2013543254A5
Authority
JP
Japan
Prior art keywords
base plate
lithography system
vacuum chamber
bottom wall
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2013529091A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013543254A (ja
Filing date
Publication date
Priority claimed from NL2005374A external-priority patent/NL2005374C2/en
Application filed filed Critical
Publication of JP2013543254A publication Critical patent/JP2013543254A/ja
Publication of JP2013543254A5 publication Critical patent/JP2013543254A5/ja
Withdrawn legal-status Critical Current

Links

JP2013529091A 2010-09-20 2011-09-20 基礎上に配置されるリソグラフィシステム、及び基礎上にリソグラフィシステムを配置する方法 Withdrawn JP2013543254A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US38469010P 2010-09-20 2010-09-20
NL2005374 2010-09-20
NL2005374A NL2005374C2 (en) 2010-09-20 2010-09-20 Method for arranging a lithography system on a foundation, and lithography system arranged on said foundation.
US61/384,690 2010-09-20
PCT/NL2011/050630 WO2012039606A1 (en) 2010-09-20 2011-09-20 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation

Publications (2)

Publication Number Publication Date
JP2013543254A JP2013543254A (ja) 2013-11-28
JP2013543254A5 true JP2013543254A5 (enExample) 2014-11-13

Family

ID=43920813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013529091A Withdrawn JP2013543254A (ja) 2010-09-20 2011-09-20 基礎上に配置されるリソグラフィシステム、及び基礎上にリソグラフィシステムを配置する方法

Country Status (6)

Country Link
EP (1) EP2619629A1 (enExample)
JP (1) JP2013543254A (enExample)
KR (1) KR20130132769A (enExample)
NL (1) NL2005374C2 (enExample)
TW (1) TW201217915A (enExample)
WO (1) WO2012039606A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6817621B2 (ja) * 2016-10-25 2021-01-20 株式会社マルテー大塚 道路鋲と、道路鋲の補修方法
US10048599B2 (en) 2016-12-30 2018-08-14 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly
EP3563197B1 (en) 2016-12-30 2024-01-31 ASML Netherlands B.V. Substrate exposure system
TWI794964B (zh) * 2021-09-09 2023-03-01 協崑股份有限公司 極紫外光設備（ｅｕｖ）之高精密度承載基座及其實施方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4805000A (en) * 1986-01-17 1989-02-14 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
KR100250152B1 (ko) * 1997-11-15 2000-03-15 유무성 노광장치
EP1143492A4 (en) * 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
US6999162B1 (en) * 1998-10-28 2006-02-14 Nikon Corporation Stage device, exposure system, method of device manufacture, and device
JP2001148341A (ja) * 1999-11-19 2001-05-29 Nikon Corp 露光装置
JP2004063653A (ja) * 2002-07-26 2004-02-26 Nikon Corp 防振装置、ステージ装置及び露光装置
TWI307526B (en) * 2002-08-06 2009-03-11 Nikon Corp Supporting device and the mamufacturing method thereof, stage device and exposure device
US20040149881A1 (en) * 2003-01-31 2004-08-05 Allen David S Adjustable support structure for air conditioner and the like
US7460208B2 (en) * 2005-02-18 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009164307A (ja) * 2007-12-28 2009-07-23 Canon Inc 支持構造、露光装置、支持構造の形成方法、及び、デバイス製造方法
US8739383B2 (en) * 2009-04-20 2014-06-03 Nikon Corporation Method and apparatus for aligning mirror blocks of a multi-element mirror assembly

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