JP2013543254A5 - - Google Patents
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- Publication number
- JP2013543254A5 JP2013543254A5 JP2013529091A JP2013529091A JP2013543254A5 JP 2013543254 A5 JP2013543254 A5 JP 2013543254A5 JP 2013529091 A JP2013529091 A JP 2013529091A JP 2013529091 A JP2013529091 A JP 2013529091A JP 2013543254 A5 JP2013543254 A5 JP 2013543254A5
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- lithography system
- vacuum chamber
- bottom wall
- lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000001459 lithography Methods 0.000 claims 19
- 238000005259 measurement Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
Claims (14)
前記ベースプレートは、基礎上にリソグラフィシステムを配置するためにこのベースプレートに取着された少なくとも１つの支柱を有し、
前記少なくとも１つの支柱は、前記基礎に面する前記ベースプレートの側に配置され、
前記ベースプレートには、リソグラフィシステムの真空チャンバの下側に機器を装着するためのカットアウト又は開口が設けられているリソグラフィシステム。 A lithography system disposed on a top surface of a rigid or solid base plate,
The base plate has at least one column attached to the base plate for positioning the lithography system on a foundation;
The at least one strut is disposed on the side of the base plate facing the foundation;
A lithography system, wherein the base plate is provided with a cut-out or opening for mounting equipment under the vacuum chamber of the lithography system.
前記測定システムは、前記投影カラムの中心線、即ち光軸とほぼアライメントされて配置されている請求項２のリソグラフィシステム。 A projection column having a center line, i.e. an optical axis,
The lithographic system of claim 2 , wherein the measurement system is positioned substantially aligned with a centerline of the projection column, i.e., the optical axis.
前記機器は、リソグラフィシステムの前記ターゲット位置決め装置を駆動させるモータを有する請求項１のリソグラフィシステム。 The lithography system has a target positioning device,
The equipment, lithography system of claim 1 having a motor for driving the target positioning device of the lithography system.
リソグラフィシステムに面する前記機器の一側面は、前記真空チャンバの内部に配置されている請求項１ないし４のいずれか１のリソグラフィシステム。 The lithography system has a vacuum chamber,
One side of the device, any one of a lithography system of the claims 1 are disposed inside the vacuum chamber 4 facing the lithography system.
前記ベースプレートは、少なくとも、前記真空チャンバの前記底壁の一部である請求項１２のベースプレート。 The lithography system has a vacuum chamber having a bottom wall;
The base plate of claim 12 , wherein the base plate is at least part of the bottom wall of the vacuum chamber.
前記ベースプレートは、前記真空チャンバの前記底壁である請求項１２のベースプレート。 The lithography system has a vacuum chamber having a bottom wall;
The base plate of claim 12 , wherein the base plate is the bottom wall of the vacuum chamber.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38469010P | 2010-09-20 | 2010-09-20 | |
| NL2005374A NL2005374C2 (en) | 2010-09-20 | 2010-09-20 | Method for arranging a lithography system on a foundation, and lithography system arranged on said foundation. |
| US61/384,690 | 2010-09-20 | ||
| NL2005374 | 2010-09-20 | ||
| PCT/NL2011/050630 WO2012039606A1 (en) | 2010-09-20 | 2011-09-20 | Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013543254A JP2013543254A (en) | 2013-11-28 |
| JP2013543254A5 true JP2013543254A5 (en) | 2014-11-13 |
Family
ID=43920813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013529091A Withdrawn JP2013543254A (en) | 2010-09-20 | 2011-09-20 | Lithography system placed on a foundation and method for placing a lithography system on a foundation |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP2619629A1 (en) |
| JP (1) | JP2013543254A (en) |
| KR (1) | KR20130132769A (en) |
| NL (1) | NL2005374C2 (en) |
| TW (1) | TW201217915A (en) |
| WO (1) | WO2012039606A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6817621B2 (en) * | 2016-10-25 | 2021-01-20 | 株式会社マルテー大塚 | Road studs and how to repair road studs |
| US10048599B2 (en) | 2016-12-30 | 2018-08-14 | Mapper Lithography Ip B.V. | Adjustment assembly and substrate exposure system comprising such an adjustment assembly |
| JP7022134B2 (en) | 2016-12-30 | 2022-02-17 | エーエスエムエル ネザーランズ ビー．ブイ． | Board exposure system with adjustment assembly and adjustment assembly |
| TWI794964B (en) * | 2021-09-09 | 2023-03-01 | 協崑股份有限公司 | High precision base of extreme ultraviolet lithography (euv) and implementation thereof |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4805000A (en) * | 1986-01-17 | 1989-02-14 | Matsushita Electric Industrial Co., Ltd. | Exposure apparatus |
| KR100250152B1 (en) * | 1997-11-15 | 2000-03-15 | 유무성 | Exposing apparatus |
| EP1143492A4 (en) * | 1998-09-03 | 2004-06-02 | Nikon Corp | Exposure apparatus and exposure method, and device and method for producing the same |
| AU6365499A (en) * | 1998-10-28 | 2000-05-15 | Nikon Corporation | Stage device, exposure system, method of device manufacture, and device |
| JP2001148341A (en) * | 1999-11-19 | 2001-05-29 | Nikon Corp | Aligner |
| JP2004063653A (en) * | 2002-07-26 | 2004-02-26 | Nikon Corp | Vibration isolator, stage apparatus, and aligner |
| TWI307526B (en) * | 2002-08-06 | 2009-03-11 | Nikon Corp | Supporting device and the mamufacturing method thereof, stage device and exposure device |
| US20040149881A1 (en) * | 2003-01-31 | 2004-08-05 | Allen David S | Adjustable support structure for air conditioner and the like |
| US7460208B2 (en) * | 2005-02-18 | 2008-12-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2009164307A (en) * | 2007-12-28 | 2009-07-23 | Canon Inc | Supporting structure, exposing equipment, method of forming supporting structure, and method of manufacturing device |
| US8739383B2 (en) * | 2009-04-20 | 2014-06-03 | Nikon Corporation | Method and apparatus for aligning mirror blocks of a multi-element mirror assembly |
-
2010
- 2010-09-20 NL NL2005374A patent/NL2005374C2/en not_active IP Right Cessation
-
2011
- 2011-09-20 JP JP2013529091A patent/JP2013543254A/en not_active Withdrawn
- 2011-09-20 KR KR1020137006705A patent/KR20130132769A/en not_active Application Discontinuation
- 2011-09-20 TW TW100133722A patent/TW201217915A/en unknown
- 2011-09-20 WO PCT/NL2011/050630 patent/WO2012039606A1/en active Application Filing
- 2011-09-20 EP EP11761728.2A patent/EP2619629A1/en not_active Withdrawn
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