JP2013535819A5 - - Google Patents

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JP2013535819A5
JP2013535819A5 JP2013520058A JP2013520058A JP2013535819A5 JP 2013535819 A5 JP2013535819 A5 JP 2013535819A5 JP 2013520058 A JP2013520058 A JP 2013520058A JP 2013520058 A JP2013520058 A JP 2013520058A JP 2013535819 A5 JP2013535819 A5 JP 2013535819A5
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model
overlay error
asymmetry
model structure
target
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JP2013520058A
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Japanese (ja)
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JP6008851B2 (ja
JP2013535819A (ja
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Priority claimed from PCT/EP2011/061822 external-priority patent/WO2012010458A1/en
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Publication of JP2013535819A5 publication Critical patent/JP2013535819A5/ja
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JP2013520058A 2010-07-19 2011-07-12 オーバレイ誤差を決定する方法及び装置 Active JP6008851B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36553810P 2010-07-19 2010-07-19
US61/365,538 2010-07-19
PCT/EP2011/061822 WO2012010458A1 (en) 2010-07-19 2011-07-12 Method and apparatus for determining an overlay error

Publications (3)

Publication Number Publication Date
JP2013535819A JP2013535819A (ja) 2013-09-12
JP2013535819A5 true JP2013535819A5 (OSRAM) 2014-08-28
JP6008851B2 JP6008851B2 (ja) 2016-10-19

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JP2013520058A Active JP6008851B2 (ja) 2010-07-19 2011-07-12 オーバレイ誤差を決定する方法及び装置

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US (2) US8908147B2 (OSRAM)
JP (1) JP6008851B2 (OSRAM)
KR (1) KR101793538B1 (OSRAM)
CN (1) CN103003754B (OSRAM)
IL (2) IL223965A (OSRAM)
NL (1) NL2007088A (OSRAM)
TW (1) TWI430333B (OSRAM)
WO (1) WO2012010458A1 (OSRAM)

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CN107771271B (zh) * 2015-04-21 2020-11-06 Asml荷兰有限公司 量测方法和设备、计算机程序及光刻系统
CN107636538B (zh) 2015-05-19 2021-02-19 科磊股份有限公司 用于叠加测量的形貌相位控制
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CN108369387B (zh) * 2015-12-17 2020-11-03 Asml荷兰有限公司 使用非对称亚分辨率特征改善测量的光刻过程的光学量测术
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