JP2015534267A5 - - Google Patents

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Publication number
JP2015534267A5
JP2015534267A5 JP2015531193A JP2015531193A JP2015534267A5 JP 2015534267 A5 JP2015534267 A5 JP 2015534267A5 JP 2015531193 A JP2015531193 A JP 2015531193A JP 2015531193 A JP2015531193 A JP 2015531193A JP 2015534267 A5 JP2015534267 A5 JP 2015534267A5
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Japan
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measurement
proportionality constant
measuring
quality
measured
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JP2015531193A
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Japanese (ja)
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JP6215330B2 (ja
JP2015534267A (ja
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Priority claimed from US13/834,915 external-priority patent/US9329033B2/en
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JP2015531193A 2012-09-05 2013-09-05 位置ずれ対象の不正確性を概算および補正するための方法 Active JP6215330B2 (ja)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US201261696963P 2012-09-05 2012-09-05
US201261697159P 2012-09-05 2012-09-05
US61/696,963 2012-09-05
US61/697,159 2012-09-05
US201361764441P 2013-02-13 2013-02-13
US61/764,441 2013-02-13
US201361766320P 2013-02-19 2013-02-19
US61/766,320 2013-02-19
US13/834,915 US9329033B2 (en) 2012-09-05 2013-03-15 Method for estimating and correcting misregistration target inaccuracy
US13/834,915 2013-03-15
PCT/US2013/058254 WO2014039674A1 (en) 2012-09-05 2013-09-05 Method for estimating and correcting misregistration target inaccuracy

Publications (3)

Publication Number Publication Date
JP2015534267A JP2015534267A (ja) 2015-11-26
JP2015534267A5 true JP2015534267A5 (OSRAM) 2016-10-20
JP6215330B2 JP6215330B2 (ja) 2017-10-18

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JP2015531193A Active JP6215330B2 (ja) 2012-09-05 2013-09-05 位置ずれ対象の不正確性を概算および補正するための方法

Country Status (6)

Country Link
US (1) US9329033B2 (OSRAM)
JP (1) JP6215330B2 (OSRAM)
KR (1) KR102000746B1 (OSRAM)
CN (1) CN104736962B (OSRAM)
TW (1) TWI591342B (OSRAM)
WO (1) WO2014039674A1 (OSRAM)

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US10551320B2 (en) * 2017-01-30 2020-02-04 Kla-Tencor Corporation Activation of wafer particle defects for spectroscopic composition analysis
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US20220244649A1 (en) * 2019-07-04 2022-08-04 Asml Netherlands B.V. Sub-field control of a lithographic process and associated apparatus
CN110796107A (zh) * 2019-11-04 2020-02-14 南京北旨智能科技有限公司 电力巡检图像缺陷识别方法和系统、电力巡检无人机
US11487929B2 (en) 2020-04-28 2022-11-01 Kla Corporation Target design process for overlay targets intended for multi-signal measurements
KR20230027089A (ko) 2020-06-25 2023-02-27 케이엘에이 코포레이션 반도체 디바이스의 오정합 및 비대칭을 개선하기 위한 웨이블릿 시스템 및 방법
US12100574B2 (en) 2020-07-01 2024-09-24 Kla Corporation Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures
KR20230038285A (ko) * 2020-07-20 2023-03-17 어플라이드 머티어리얼스, 인코포레이티드 광학 디바이스들 및 광학 디바이스 계측 방법
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