JP2013531808A5 - - Google Patents
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- Publication number
- JP2013531808A5 JP2013531808A5 JP2013511407A JP2013511407A JP2013531808A5 JP 2013531808 A5 JP2013531808 A5 JP 2013531808A5 JP 2013511407 A JP2013511407 A JP 2013511407A JP 2013511407 A JP2013511407 A JP 2013511407A JP 2013531808 A5 JP2013531808 A5 JP 2013531808A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photoimaged
- stencil
- pattern
- etching paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 229920001971 elastomer Polymers 0.000 claims 2
- 239000000806 elastomer Substances 0.000 claims 2
- 230000000087 stabilizing effect Effects 0.000 claims 2
- 230000035515 penetration Effects 0.000 claims 1
- 230000035699 permeability Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34705310P | 2010-05-21 | 2010-05-21 | |
| US61/347,053 | 2010-05-21 | ||
| PCT/US2011/037478 WO2011146912A2 (en) | 2010-05-21 | 2011-05-21 | Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013531808A JP2013531808A (ja) | 2013-08-08 |
| JP2013531808A5 true JP2013531808A5 (enExample) | 2014-07-10 |
Family
ID=44992372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013511407A Pending JP2013531808A (ja) | 2010-05-21 | 2011-05-21 | 基板のハイスループット、ミクロンスケールエッチングのためのステンシルならびにその製造方法および使用方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20120097329A1 (enExample) |
| EP (1) | EP2571629A4 (enExample) |
| JP (1) | JP2013531808A (enExample) |
| KR (1) | KR20130124167A (enExample) |
| CN (1) | CN103118805A (enExample) |
| SG (1) | SG185549A1 (enExample) |
| TW (1) | TW201220974A (enExample) |
| WO (1) | WO2011146912A2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009099417A1 (en) * | 2008-02-06 | 2009-08-13 | Nano Terra Inc. | Stencils with removable backings for forming micron-sized features on surfaces and methods of making and using the same |
| US20120248661A1 (en) * | 2011-04-04 | 2012-10-04 | Wasbbb, Inc. | Heavy plastic |
| KR101360281B1 (ko) * | 2012-01-12 | 2014-02-12 | 한국과학기술원 | 다중 진공 여과 방법을 이용한 단일벽 탄소나노튜브 포화 흡수체 제작법 |
| US9952147B2 (en) * | 2013-09-12 | 2018-04-24 | Sio2 Medical Products, Inc. | Rapid, non-destructive, selective infrared spectrometry analysis of organic coatings on molded articles |
| US9731437B2 (en) * | 2013-11-22 | 2017-08-15 | Johnson & Johnson Vision Care, Inc. | Method of manufacturing hydrogel ophthalmic devices with electronic elements |
| CN109835867B (zh) * | 2017-11-24 | 2023-07-14 | 中芯国际集成电路制造(上海)有限公司 | 刻蚀溶液和刻蚀方法 |
| KR20190087694A (ko) * | 2018-01-15 | 2019-07-25 | 삼성디스플레이 주식회사 | 표시 장치 및 그 표시 장치의 제조 방법 |
| KR102532774B1 (ko) * | 2018-08-20 | 2023-05-12 | 동우 화인켐 주식회사 | 절연막 식각액 조성물 및 이를 이용한 패턴 형성 방법 |
| US10971472B2 (en) * | 2019-07-09 | 2021-04-06 | Mikro Mesa Technology Co., Ltd. | Method of liquid assisted bonding |
| US20230271445A1 (en) * | 2022-02-25 | 2023-08-31 | Intel Corporation | Reusable composite stencil for spray processes |
| CN114573931B (zh) * | 2022-03-04 | 2023-05-09 | 中国工程物理研究院激光聚变研究中心 | 用于光学元件表面损伤坑修复的胶体的制备及应用 |
| US12371797B2 (en) * | 2023-03-24 | 2025-07-29 | Adrienne Reisinger | Etching a design on a metal surface covered with a pigmented layer |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4209582A (en) * | 1977-02-22 | 1980-06-24 | Arthur D. Little, Inc. | Method of preparing screen printing stencils using novel compounds and compositions |
| US4820746A (en) * | 1986-08-12 | 1989-04-11 | Avery International Corporation | Radiation-cured rubber-based pressure-sensitive adhesive |
| CA1332093C (en) * | 1986-12-08 | 1994-09-20 | Songvit Setthachayanon | Photoimagable solder mask coating |
| GB9721973D0 (en) * | 1997-10-17 | 1997-12-17 | Sericol Ltd | A screen printing stencil |
| JP3560042B2 (ja) * | 2001-03-22 | 2004-09-02 | インターナショナル・ビジネス・マシーンズ・コーポレーション | パターニング・マスクおよびパターニング方法 |
| US20030070569A1 (en) * | 2001-10-11 | 2003-04-17 | Colin Bulthaup | Micro-stencil |
| JP4324390B2 (ja) * | 2002-02-13 | 2009-09-02 | 大日本印刷株式会社 | 感光性樹脂組成物およびスクリーン印刷用版 |
| DE102006028640A1 (de) * | 2006-06-22 | 2008-01-03 | Flint Group Germany Gmbh | Fotopolymerisierbarer Schichtenverbund zur Herstellung von Flexodruckelementen |
| CN101755237B (zh) * | 2006-12-05 | 2014-04-09 | 纳诺泰拉公司 | 使表面形成图案的方法 |
| JP2008221697A (ja) * | 2007-03-14 | 2008-09-25 | Mitsubishi Electric Corp | シール印刷用スクリーン版、シール印刷方法及びこれらを用いて製造された液晶パネル |
| JP5102078B2 (ja) * | 2007-03-15 | 2012-12-19 | 株式会社リコー | 画像形成方法及びプロセスカートリッジ |
| US8080615B2 (en) * | 2007-06-19 | 2011-12-20 | Micron Technology, Inc. | Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide |
| KR101452705B1 (ko) * | 2008-01-10 | 2014-10-24 | 삼성전자주식회사 | 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드 |
| WO2009099417A1 (en) * | 2008-02-06 | 2009-08-13 | Nano Terra Inc. | Stencils with removable backings for forming micron-sized features on surfaces and methods of making and using the same |
| US8574710B2 (en) * | 2008-10-10 | 2013-11-05 | Nano Terra Inc. | Anti-reflective coatings comprising ordered layers of nanowires and methods of making and using the same |
| TW201128301A (en) * | 2009-08-21 | 2011-08-16 | Nano Terra Inc | Methods for patterning substrates using heterogeneous stamps and stencils and methods of making the stamps and stencils |
| JP2011090878A (ja) * | 2009-10-22 | 2011-05-06 | Fujifilm Corp | 透明導電体の製造方法 |
| EP2531566B1 (en) * | 2010-02-05 | 2018-09-12 | CAM Holding Corporation | Photosensitive ink compositions and transparent conductors and method of using the same |
| CN103069502A (zh) * | 2010-03-23 | 2013-04-24 | 凯博瑞奥斯技术公司 | 使用金属纳米线的透明导体的蚀刻构图 |
-
2011
- 2011-05-20 US US13/112,166 patent/US20120097329A1/en not_active Abandoned
- 2011-05-20 TW TW100117792A patent/TW201220974A/zh unknown
- 2011-05-21 CN CN201180035314XA patent/CN103118805A/zh active Pending
- 2011-05-21 SG SG2012083515A patent/SG185549A1/en unknown
- 2011-05-21 WO PCT/US2011/037478 patent/WO2011146912A2/en not_active Ceased
- 2011-05-21 EP EP11784370.6A patent/EP2571629A4/en not_active Withdrawn
- 2011-05-21 JP JP2013511407A patent/JP2013531808A/ja active Pending
- 2011-05-21 KR KR1020127033361A patent/KR20130124167A/ko not_active Withdrawn
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