JP2013518428A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 32
- 239000011344 liquid material Substances 0.000 claims abstract description 14
- 239000004020 conductor Substances 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims description 22
- 238000001459 lithography Methods 0.000 claims description 6
- 239000002243 precursor Substances 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000002612 dispersion medium Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 description 9
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
2a、2b、2c、2d、2e 分離した要素
3a、3b、3c、3d、3e 壁構造体
4 液体材料
4a、4b、4c、4d キャビティ
4e、4f、4g 領域
10a 半導体構造体
Claims (18)
- ・基板上に、内部端の第1の組を有する分離された要素を含むパターンで導電性材料の層を提供する段階、
・基板上に、それらの間に1つ以上のキャビティを形成するための、一連の壁構造体を提供する段階であって、前記壁構造体は内部端の前記第1の組と協働する内部端の第2の組を有し、内部端の第2の組は、所定の距離だけ第1内部端と第2内部端による形成されるキャビティの中心に関して内部端の第1の組の外側に配置される段階、
・前記キャビティ内に液体材料を堆積する段階、
を含む、半導体装置を製造する方法。 - 前記所定の距離が1から20マイクロメートルの範囲内である請求項1に記載の方法。
- 分離された要素が第1のピッチで配置され、壁構造体が第2のピッチで配置され、第1のピッチが第2のピッチと等しくない、請求項1に記載の方法。
- 水または溶媒に関する前記表面の濡れ性を変更するために、壁構造体の表面の表面特性を変更する段階をさらに含む、請求項1に記載の方法。
- 表面が、キャビティに対向する表面および/または壁構造体の上表面を含む、請求項4に記載の方法。
- 壁構造体が実質的に垂直な、角度を有する、または湾曲した壁を備える、請求項1に記載の方法。
- 液体材料が少なくとも溶媒、および半導体材料または半導体材料の前駆体を含む、請求項1に記載の方法。
- 液体材料が少なくとも分散媒体、および半導体材料の分散粒子、または半導体材料の前駆体を含む、請求項1に記載の方法。
- 半導体材料として有機半導体材料が選択される、請求項7に記載の方法。
- 半導体材料として無機半導体材料が選択される、請求項7に記載の方法。
- バック−リソグラフィーによって壁構造体がパターニングされ、分離された要素がマスクとして使用され、バック−リソグラフィーに使用される放射波長に対して基板が実質的に透明である、請求項1に記載の方法。
- 壁構造体を形成する層の余分な領域を除去するために、前面リソグラフィーの段階をさらに含む、請求項11に記載の方法。
- 内部端の第1の組を有する一組の分離された要素を含む導電性材料の層、および
内部端の第1の組と協働する内部端の第2の組を有し、内部端の第2の組は、所定の距離だけ第1内部端と第2内部端による形成されるキャビティに関して内部端の第1の組の外側に配置される壁構造体、
を含む基板を含む半導体装置。 - 前記所定の距離が1から20マイクロメートルの範囲内である請求項13に記載の半導体装置。
- 内部端の第1の組を有する一組の分離された要素を含む導電性材料の層、および
内部端の第1の組と協働する内部端の第2の組を有し、内部端の第2の組は、所定の距離で第1内部端と第2内部端による形成されるキャビティに関して内部端の第1の組の外側に配置される壁構造体、
を含む基板を含む半導体装置を含むディスプレイ。 - 基板が柔軟である請求項15に記載のディスプレイ。
- 折り畳み式である請求項16に記載のディスプレイ。
- 半導体装置を含むディスプレイを含む電子装置であって、
前記半導体装置が、
内部端の第1の組を有する一組の分離された要素を含む導電性材料の層、および
内部端の第1の組と協働する内部端の第2の組を有し、内部端の第2の組は、所定の距離で第1内部端と第2内部端による形成されるキャビティに関して内部端の第1の組の外側に配置される壁構造体、
を含む基板を含む、電子装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/694,969 | 2010-01-27 | ||
US12/694,969 US8603922B2 (en) | 2010-01-27 | 2010-01-27 | Semiconductor device, display, electronic apparatus and method of manufacturing a semiconductor device |
PCT/NL2011/050054 WO2011093706A1 (en) | 2010-01-27 | 2011-01-27 | Semiconductor device and method of manufacturing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2013518428A true JP2013518428A (ja) | 2013-05-20 |
Family
ID=43806798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012551107A Pending JP2013518428A (ja) | 2010-01-27 | 2011-01-27 | 半導体装置およびその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US8603922B2 (ja) |
EP (1) | EP2529426A1 (ja) |
JP (1) | JP2013518428A (ja) |
KR (1) | KR20120127621A (ja) |
CN (1) | CN102725876A (ja) |
WO (1) | WO2011093706A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI442088B (zh) | 2012-02-24 | 2014-06-21 | Ind Tech Res Inst | 電濕潤顯示元件 |
KR102244018B1 (ko) | 2014-11-20 | 2021-04-23 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
US9726634B1 (en) * | 2016-10-03 | 2017-08-08 | International Business Machines Corporation | Superhydrophobic electrode and biosensing device using the same |
Citations (7)
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WO2006051457A1 (en) * | 2004-11-09 | 2006-05-18 | Polymer Vision Limited | Self-aligned process to manufacture organic transistors |
US20070193978A1 (en) * | 2006-02-17 | 2007-08-23 | Samsung Electronics Co., Ltd. | Methods for forming banks and organic thin film transistors comprising such banks |
JP2008109100A (ja) * | 2006-09-26 | 2008-05-08 | Dainippon Printing Co Ltd | 有機半導体素子、有機半導体素子の製造方法、有機トランジスタアレイ、およびディスプレイ |
JP2009010332A (ja) * | 2007-05-25 | 2009-01-15 | Panasonic Corp | 有機トランジスタとその製造方法、およびそれを備える有機elディスプレイ |
US20090115318A1 (en) * | 2005-08-23 | 2009-05-07 | Cambridge Display Technology Limited | Organic electronic device structures and fabrication methods |
WO2009077740A1 (en) * | 2007-12-19 | 2009-06-25 | Cambridge Display Technology Limited | Organic thin film transistors, active matrix organic optical devices and methods of making the same |
JP2009295670A (ja) * | 2008-06-03 | 2009-12-17 | Hitachi Ltd | 薄膜トランジスタおよびそれを用いた装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US6953891B2 (en) * | 2003-09-16 | 2005-10-11 | Micron Technology, Inc. | Moisture-resistant electronic device package and methods of assembly |
GB2448174B (en) * | 2007-04-04 | 2009-12-09 | Cambridge Display Tech Ltd | Organic thin film transistors |
KR101424012B1 (ko) * | 2008-03-04 | 2014-08-04 | 삼성디스플레이 주식회사 | 표시장치와 그 제조방법 |
KR101557498B1 (ko) * | 2008-11-05 | 2015-10-07 | 삼성전자주식회사 | 양자점 발광소자 및 그 제조방법 |
-
2010
- 2010-01-27 US US12/694,969 patent/US8603922B2/en not_active Expired - Fee Related
-
2011
- 2011-01-27 KR KR1020127022301A patent/KR20120127621A/ko not_active Application Discontinuation
- 2011-01-27 JP JP2012551107A patent/JP2013518428A/ja active Pending
- 2011-01-27 WO PCT/NL2011/050054 patent/WO2011093706A1/en active Application Filing
- 2011-01-27 CN CN2011800075892A patent/CN102725876A/zh active Pending
- 2011-01-27 EP EP11703280A patent/EP2529426A1/en not_active Withdrawn
-
2013
- 2013-12-06 US US14/099,895 patent/US20140091339A1/en not_active Abandoned
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006051457A1 (en) * | 2004-11-09 | 2006-05-18 | Polymer Vision Limited | Self-aligned process to manufacture organic transistors |
US20090115318A1 (en) * | 2005-08-23 | 2009-05-07 | Cambridge Display Technology Limited | Organic electronic device structures and fabrication methods |
US20070193978A1 (en) * | 2006-02-17 | 2007-08-23 | Samsung Electronics Co., Ltd. | Methods for forming banks and organic thin film transistors comprising such banks |
JP2008109100A (ja) * | 2006-09-26 | 2008-05-08 | Dainippon Printing Co Ltd | 有機半導体素子、有機半導体素子の製造方法、有機トランジスタアレイ、およびディスプレイ |
JP2009010332A (ja) * | 2007-05-25 | 2009-01-15 | Panasonic Corp | 有機トランジスタとその製造方法、およびそれを備える有機elディスプレイ |
WO2009077740A1 (en) * | 2007-12-19 | 2009-06-25 | Cambridge Display Technology Limited | Organic thin film transistors, active matrix organic optical devices and methods of making the same |
JP2011510478A (ja) * | 2007-12-19 | 2011-03-31 | ケンブリッジ ディスプレイ テクノロジー リミテッド | 有機薄膜トランジスター、アクティブマトリックス有機光学デバイス、およびこれらの製造方法 |
JP2009295670A (ja) * | 2008-06-03 | 2009-12-17 | Hitachi Ltd | 薄膜トランジスタおよびそれを用いた装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2011093706A1 (en) | 2011-08-04 |
EP2529426A1 (en) | 2012-12-05 |
KR20120127621A (ko) | 2012-11-22 |
US20140091339A1 (en) | 2014-04-03 |
US20110180816A1 (en) | 2011-07-28 |
US8603922B2 (en) | 2013-12-10 |
CN102725876A (zh) | 2012-10-10 |
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