JP2013501378A5 - - Google Patents

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Publication number
JP2013501378A5
JP2013501378A5 JP2012523639A JP2012523639A JP2013501378A5 JP 2013501378 A5 JP2013501378 A5 JP 2013501378A5 JP 2012523639 A JP2012523639 A JP 2012523639A JP 2012523639 A JP2012523639 A JP 2012523639A JP 2013501378 A5 JP2013501378 A5 JP 2013501378A5
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Japan
Prior art keywords
layer
metal
metal oxide
directly
disposed
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JP2012523639A
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JP2013501378A (ja
JP5612685B2 (ja
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Priority claimed from PCT/US2010/043180 external-priority patent/WO2011017037A2/en
Publication of JP2013501378A publication Critical patent/JP2013501378A/ja
Publication of JP2013501378A5 publication Critical patent/JP2013501378A5/ja
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Claims (5)

  1. 支持体上に光学的に透明な薄い導電フィルムを形成するための方法であって、
    透明な支持体に隣接して金属酸化物の層を供給することと、
    前記金属酸化物層の上に直接、酸化亜鉛を含む多結晶シード層を形成させることと、
    前記多結晶シード層の上に直接、第一導電金属又は合金層を付着させることと、
    前記金属又は合金層の上に直接、バリア層を付着させることと、を含む、方法。
  2. 更に、
    前記バリア層に隣接して第二金属酸化物層を付着させることと、
    前記第二金属酸化物層の上に、酸化亜鉛を含む第二多結晶シード層を形成させることと、
    前記第二金属酸化物層の上に直接、第二導電金属又は合金層を付着させることと、
    前記第二導電金属又は合金層の上に直接、バリア層を付着させることと、を含む、請求項1に記載の方法。
  3. 透明な支持体と、
    前記支持体上の金属酸化物の層と、
    前記金属酸化物層の上に配置された、酸化亜鉛を含む多結晶シード層と、
    前記多結晶シード層の上に配置された導電金属又は合金層と、
    前記金属又は合金層の上に直接配置されたバリア層と、を含む、光学的に透明な導電フィルム。
  4. 請求項に記載のフィルムを備える電子デバイス。
  5. グレージング材料の層と光学的に透明なフィルムとを組み立てることと、前記グレージング材料と前記フィルムを共に接着して一体型物品にすることと、を含む、グレージング物品の製造方法であって、前記フィルムが、
    透明な支持体と、
    第一ポリマー材料上の金属酸化物の層と、
    前記金属酸化物層の上に配置された、酸化亜鉛を含む多結晶シード層と、
    前記多結晶シード層の上に配置された導電金属又は合金層と、
    前記導電金属又は合金層の上に配置されたバリア層と、
    を含む、方法。
JP2012523639A 2009-08-03 2010-07-26 光学的に透明な導電金属又は合金薄フィルムの形成プロセス及びこれから製造するフィルム Active JP5612685B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23082909P 2009-08-03 2009-08-03
US61/230,829 2009-08-03
PCT/US2010/043180 WO2011017037A2 (en) 2009-08-03 2010-07-26 Process for forming optically clear conductive metal or metal alloy thin films and films made therefrom

Publications (3)

Publication Number Publication Date
JP2013501378A JP2013501378A (ja) 2013-01-10
JP2013501378A5 true JP2013501378A5 (ja) 2013-09-12
JP5612685B2 JP5612685B2 (ja) 2014-10-22

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JP2012523639A Active JP5612685B2 (ja) 2009-08-03 2010-07-26 光学的に透明な導電金属又は合金薄フィルムの形成プロセス及びこれから製造するフィルム

Country Status (8)

Country Link
US (1) US9012044B2 (ja)
EP (1) EP2462791B1 (ja)
JP (1) JP5612685B2 (ja)
KR (2) KR102054782B1 (ja)
CN (1) CN102474999B (ja)
BR (1) BR112012002495A2 (ja)
SG (1) SG178225A1 (ja)
WO (1) WO2011017037A2 (ja)

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