JP2013501375A5 - - Google Patents

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Publication number
JP2013501375A5
JP2013501375A5 JP2012523602A JP2012523602A JP2013501375A5 JP 2013501375 A5 JP2013501375 A5 JP 2013501375A5 JP 2012523602 A JP2012523602 A JP 2012523602A JP 2012523602 A JP2012523602 A JP 2012523602A JP 2013501375 A5 JP2013501375 A5 JP 2013501375A5
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JP
Japan
Prior art keywords
field
pattern
template
polymerizable material
substrate
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JP2012523602A
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English (en)
Japanese (ja)
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JP2013501375A (ja
JP5728478B2 (ja
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Priority claimed from US12/846,211 external-priority patent/US20110031650A1/en
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Publication of JP2013501375A publication Critical patent/JP2013501375A/ja
Publication of JP2013501375A5 publication Critical patent/JP2013501375A5/ja
Application granted granted Critical
Publication of JP5728478B2 publication Critical patent/JP5728478B2/ja
Active legal-status Critical Current
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JP2012523602A 2009-08-04 2010-07-30 隣接するフィールドのアラインメント方法 Active JP5728478B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23118209P 2009-08-04 2009-08-04
US61/231,182 2009-08-04
US12/846,211 2010-07-29
US12/846,211 US20110031650A1 (en) 2009-08-04 2010-07-29 Adjacent Field Alignment
PCT/US2010/002136 WO2011016849A2 (en) 2009-08-04 2010-07-30 Adjacent field alignment

Publications (3)

Publication Number Publication Date
JP2013501375A JP2013501375A (ja) 2013-01-10
JP2013501375A5 true JP2013501375A5 (cg-RX-API-DMAC7.html) 2013-08-15
JP5728478B2 JP5728478B2 (ja) 2015-06-03

Family

ID=43534207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012523602A Active JP5728478B2 (ja) 2009-08-04 2010-07-30 隣接するフィールドのアラインメント方法

Country Status (6)

Country Link
US (2) US20110031650A1 (cg-RX-API-DMAC7.html)
EP (1) EP2462487B8 (cg-RX-API-DMAC7.html)
JP (1) JP5728478B2 (cg-RX-API-DMAC7.html)
KR (1) KR101762213B1 (cg-RX-API-DMAC7.html)
TW (1) TWI556941B (cg-RX-API-DMAC7.html)
WO (1) WO2011016849A2 (cg-RX-API-DMAC7.html)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
JP5238742B2 (ja) * 2010-03-19 2013-07-17 株式会社東芝 加工方法および加工装置
JP5599356B2 (ja) * 2011-03-31 2014-10-01 富士フイルム株式会社 シミュレーション方法、プログラムおよびそれを記録した記録媒体、並びに、それらを利用した液滴配置パターンの作成方法、ナノインプリント方法、パターン化基板の製造方法およびインクジェット装置。
US10549313B2 (en) * 2016-10-31 2020-02-04 Canon Kabushiki Kaisha Edge field imprint lithography
KR102730502B1 (ko) * 2017-01-23 2024-11-14 에스케이하이닉스 주식회사 임프린트 패턴 형성 방법
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11429022B2 (en) * 2019-10-23 2022-08-30 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
US11474441B2 (en) * 2020-06-25 2022-10-18 Canon Kabushiki Kaisha Systems and methods for generating drop patterns
WO2022027925A1 (zh) * 2020-08-05 2022-02-10 上海鲲游光电科技有限公司 一体成型的树脂匀光元件和doe及其制造方法
WO2022159468A1 (en) * 2021-01-20 2022-07-28 Applied Materials, Inc. Anti-slippery stamp landing ring
JP2023083029A (ja) * 2021-12-03 2023-06-15 キヤノン株式会社 インプリント方法、パターン形成方法、インプリント装置、インプリント用モールドおよび物品の製造方法
US12136558B2 (en) 2022-06-30 2024-11-05 Canon Kabushiki Kaisha Generating edge adjusted drop patterns

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
JP2004505273A (ja) * 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US20070005409A1 (en) * 2005-06-30 2007-01-04 International Business Machines Corporation Method and structure for overriding calendar entries based on context and business value
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
US7579137B2 (en) * 2005-12-24 2009-08-25 International Business Machines Corporation Method for fabricating dual damascene structures
KR101232051B1 (ko) * 2006-06-29 2013-02-12 엘지디스플레이 주식회사 게이트 펄스 변조신호 발생회로
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP4922774B2 (ja) * 2007-01-26 2012-04-25 株式会社東芝 パターン形成方法及びパターン形成用モールド
US20090014917A1 (en) * 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
JP5274128B2 (ja) * 2007-08-03 2013-08-28 キヤノン株式会社 インプリント方法および基板の加工方法
JP5473266B2 (ja) * 2007-08-03 2014-04-16 キヤノン株式会社 インプリント方法および基板の加工方法、基板の加工方法による半導体デバイスの製造方法
JP4908369B2 (ja) * 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
US8119052B2 (en) * 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
JP2010076219A (ja) * 2008-09-25 2010-04-08 Canon Inc ナノインプリントによる基板の加工方法

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