JP2013252528A - Laser beam-machining apparatus and laser beam-machining method - Google Patents

Laser beam-machining apparatus and laser beam-machining method Download PDF

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JP2013252528A
JP2013252528A JP2012128444A JP2012128444A JP2013252528A JP 2013252528 A JP2013252528 A JP 2013252528A JP 2012128444 A JP2012128444 A JP 2012128444A JP 2012128444 A JP2012128444 A JP 2012128444A JP 2013252528 A JP2013252528 A JP 2013252528A
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layer
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pulse irradiation
laser beam
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JP5920661B2 (en
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Takuya Kubo
拓矢 久保
Masakuni Takahashi
正訓 高橋
Satoru Higano
哲 日向野
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Mitsubishi Materials Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a laser beam-machining apparatus and a laser beam-machining method, which enable surface roughness in three-dimensional machining to be more reduced.SOLUTION: A machining area is set in such a way that a plurality of machining layers are stacked in a laser beam irradiation direction. Lattice points of an imaginary rectangular lattice having been set with respect to the machining layers are used as pulse irradiation points and the machining layers are irradiated with laser beam to be machined. The machining area includes at least one period of the plurality of machining layers in which four continuous layers from a first layer to a fourth layer in machining order form one period. In the second layer, pulse irradiation points P2 are formed by shifting lattice points to a gravity center G1 of a quadrangle Q1 formed of adjacent pulse irradiation points P1 of the first layer. In the third layer, pulse irradiation points P3 are formed by shifting lattice points to a gravity center G2 of a quadrangle Q2 formed of the adjacent pulse irradiation points P1, P2 of the first and second layers. In the fourth layer, pulse irradiation points P4 are formed by shifting lattice points to a gravity center G3 of a quadrangle Q3 formed of four adjacent pulse irradiation points P3 of the third layer.

Description

本発明は、面粗さを大幅に低減して3次元加工が可能なレーザ加工装置およびレーザ加工方法に関する。   The present invention relates to a laser processing apparatus and a laser processing method capable of three-dimensional processing with greatly reduced surface roughness.

従来、レーザを用いて材料を三次元形態加工する方法の一つとして、図7に示すように、加工対象物Wから加工除去する部位を、レーザ光Lの照射方向に垂直な方向に積層された複数の層(以下、加工レイヤーLYとも称する)に分け、加工対象物Wの表面に近い側の加工レイヤーLYから順番に加工除去する方法(以下、レイヤー加工法と称する)が知られている(特許文献1参照)。このレイヤー加工法は、比較的自由な形態が高精度に加工可能である反面、加工面にはレーザ光Lのパルスによる微細な加工痕(以下、パルス痕)に起因する凹凸が発生するため、加工面の面粗さは研削加工などと比較して大きくなる傾向がある。   Conventionally, as one method for processing a three-dimensional shape of a material using a laser, a part to be processed and removed from a workpiece W is laminated in a direction perpendicular to the irradiation direction of the laser beam L as shown in FIG. In addition, there is known a method (hereinafter referred to as a layer processing method) in which a plurality of layers (hereinafter also referred to as processing layers LY) are divided and processed in order from the processing layer LY on the side close to the surface of the processing target W. (See Patent Document 1). Although this layer processing method can process a relatively free form with high accuracy, unevenness due to fine processing marks (hereinafter referred to as pulse marks) due to a pulse of the laser beam L occurs on the processing surface. The surface roughness of the processed surface tends to be larger than grinding.

このため、加工面の面粗さを低減するため、加工レイヤーにパルス照射するレーザ光の照射位置(以下、パルス照射点)の分布(以下、パルス照射点分布とも称する)を規則的に制御することで、パルス痕に起因する凹凸を抑制する抑制する手段が行われている。例えば、特許文献2では、走査するレーザ光の走査線の間隔などを制御し、例えば正方格子状にパルス照射点を分布させている。   For this reason, in order to reduce the surface roughness of the processed surface, the distribution (hereinafter also referred to as pulse irradiation point distribution) of the laser beam irradiation position (hereinafter referred to as pulse irradiation point) for irradiating the processing layer with pulses is regularly controlled. Thus, a means for suppressing unevenness caused by the pulse mark is performed. For example, in Patent Document 2, the interval between scanning lines of laser light to be scanned is controlled, and pulse irradiation points are distributed in a square lattice shape, for example.

特開2012−16735号公報JP 2012-16735 A 特開2007−229756号公報JP 2007-229756 A

上記従来の技術には、以下の課題が残されている。
特許文献2に記載の加工方法では、レーザ加工面の面粗さを十分に低減されない場合がある。その理由は、層間のパルス照射点分布の重なりを考慮していないため、層内に発生した凹凸が層間で積み重なり、それが強調される場合があり、加工深さを増すごとに面粗さが増加することがあるためである。また、隣接するパルス照射点の間の距離を小さくするほど一つの層内のパルス痕による凹凸が目立たなくなり、一つの層内の面粗さは低下する傾向が得られるが、それは層の厚さを増すことになり、その結果、レーザ光軸に対して傾斜した面を加工形成する際に大きなステップ状の段差となるため、レーザ光軸に対して傾斜した面の面粗さは逆に高まってしまう問題があった。
The following problems remain in the conventional technology.
In the processing method described in Patent Document 2, the surface roughness of the laser processed surface may not be sufficiently reduced. The reason for this is that the overlapping of the pulse irradiation point distribution between layers is not taken into consideration, and the unevenness generated in the layer may be accumulated between the layers, which may be emphasized, and the surface roughness increases as the processing depth increases. This is because it may increase. In addition, as the distance between adjacent pulse irradiation points is reduced, unevenness due to pulse marks in one layer becomes less noticeable, and the surface roughness in one layer tends to decrease. As a result, when processing and forming a surface inclined with respect to the laser optical axis, a large stepped step is formed, so that the surface roughness of the surface inclined with respect to the laser optical axis is increased. There was a problem.

本発明は、前述の課題に鑑みてなされたもので、3次元加工において、より面粗さを低減することができるレーザ加工装置およびレーザ加工方法を提供することを目的とする。   The present invention has been made in view of the above-described problems, and an object thereof is to provide a laser processing apparatus and a laser processing method capable of further reducing surface roughness in three-dimensional processing.

本発明は、前記課題を解決するために以下の構成を採用した。すなわち、本発明のレーザ加工装置は、加工対象物にレーザ光を照射して形状形成を行う加工装置であって、前記加工対象物に前記レーザ光を一定の繰り返し周波数で照射すると共に走査するレーザ光照射機構と、前記加工対象物を保持して該加工対象物と前記レーザ光との相対的な位置関係を調整可能な位置調整機構と、これら機構を制御して、前記レーザ光の走査を行う際に、前記加工領域を前記レーザ光の照射方向に複数層の加工レイヤーを積み重ねたものとして設定し、各加工レイヤーに対して前記レーザ光を照射し、前記加工レイヤー毎に所定部分を除去して、三次元形状の加工面を形成する制御部とを備え、該制御部が、前記加工レイヤーに対して設定した仮想の四角格子の格子点をパルス照射点として前記レーザ光を照射して加工を行い、複数層の前記加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、前記第2層で、前記第1層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、前記第3層で、前記第1層及び前記第2層の隣接する前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、前記第4層で、前記第3層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とすることを特徴とする。なお、ここで四角格子とは、最近接の4つの格子点が正方形、長方形、菱形、平行四辺形のいずれか1種類の形状をとり、その同一の形状を平面上に隙間無く敷き詰めたものと定義する。また、例えば、最近接の3つの格子点が正三角形の場合は一般に正三角形格子として扱われる場合が多いが、ここでは鋭角が60°の平行四辺形と見なし、上記四角格子に含むこととする。   The present invention employs the following configuration in order to solve the above problems. That is, the laser processing apparatus of the present invention is a processing apparatus that irradiates a processing target with laser light to form a shape, and irradiates the processing target with the laser light at a constant repetition frequency and performs scanning. A light irradiation mechanism, a position adjusting mechanism that holds the object to be processed and can adjust a relative positional relationship between the object to be processed and the laser beam, and controls these mechanisms to scan the laser beam. When performing, the processing area is set as a stack of multiple processing layers in the direction of laser light irradiation, the laser light is irradiated to each processing layer, and a predetermined portion is removed for each processing layer And a control unit that forms a three-dimensional machining surface, and the control unit irradiates the laser beam with a lattice point of a virtual square lattice set for the machining layer as a pulse irradiation point. And includes at least one cycle of four layers from the first layer to the fourth layer in the processing order among the plurality of processing layers, and the second layer includes the first layer. The grid point of the square lattice is shifted to the center of gravity of a quadrangle constituted by the four pulse irradiation points adjacent to each other to form a pulse irradiation point, and the first layer and the second layer are adjacent to each other in the third layer. The grid point of the square lattice is shifted to the center of gravity of the quadrangle formed by the pulse irradiation points to form pulse irradiation points, and the fourth layer includes the four pulse irradiation points adjacent to the third layer. A pulse irradiation point is formed by shifting a lattice point of the square lattice to a square center of gravity. Here, the square lattice means that the four closest lattice points take any one of a square, a rectangle, a rhombus, and a parallelogram, and the same shape is spread on the plane without any gaps. Define. For example, when the three closest lattice points are equilateral triangles, they are generally treated as equilateral triangle lattices, but here they are regarded as parallelograms having an acute angle of 60 ° and are included in the square lattice. .

また、本発明のレーザ加工方法は、加工対象物にレーザ光を照射して形状形成を行う加工方法であって、前記加工対象物に前記レーザ光を一定の繰り返し周波数で照射すると共に走査するレーザ光照射工程と、前記加工対象物を保持して該加工対象物と前記レーザ光との相対的な位置関係を調整可能な位置調整工程とを有し、前記レーザ光の走査を行う際に、前記加工領域を前記レーザ光の照射方向に複数層の加工レイヤーを積み重ねたものとして設定し、各加工レイヤーに対して前記レーザ光を照射し、前記加工レイヤー毎に所定部分を除去して、三次元形状の加工面を形成し、前記加工レイヤーに対して設定した仮想の格子の格子点上に前記レーザ光を照射して加工を行い、複数層の前記加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、前記第2層で、前記第1層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、前記第3層で、前記第1層及び前記第2層の隣接する前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、前記第4層で、前記第3層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とすることを特徴とする。   The laser processing method of the present invention is a processing method for forming a shape by irradiating a processing target with laser light, and irradiating the processing target with the laser light at a constant repetition frequency and scanning the laser. A light irradiation step, and a position adjustment step of holding the processing object and adjusting a relative positional relationship between the processing object and the laser light, and when scanning the laser light, The processing region is set as a stack of a plurality of processing layers in the irradiation direction of the laser light, the laser light is irradiated to each processing layer, a predetermined portion is removed for each processing layer, and tertiary A processing surface having an original shape is formed, and processing is performed by irradiating the laser beam onto a lattice point of a virtual lattice set for the processing layer. 4th layer Of the four squares of the square lattice including at least one period, and the second layer has a quadrangular center of gravity formed by four pulse irradiation points adjacent to the first layer. The grid point is shifted to be a pulse irradiation point. In the third layer, the lattice point of the square lattice is shifted to the center of gravity of the rectangle formed by the pulse irradiation points adjacent to the first layer and the second layer. The irradiation point is a pulse irradiation point by shifting the lattice point of the square lattice to the center of gravity of a quadrangle composed of the four pulse irradiation points adjacent to the third layer in the fourth layer. To do.

これらのレーザ加工装置及びレーザ加工方法では、複数層の加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、第2層から第4層を上述したようにそれぞれ四角格子の格子点をずらしてパルス照射点とすることで、格子点がパルス照射点である四角格子をx−y面内でランダムにシフトさせて積層した場合に比べてパルス痕による凹凸を小さくすることができる。   In these laser processing apparatuses and laser processing methods, a plurality of processing layers include at least one period of layers in which four consecutive layers from the first layer to the fourth layer are included in the order of processing, from the second layer. As described above, when the lattice points of the square lattices are shifted to be pulse irradiation points as described above, the rectangular lattices whose lattice points are the pulse irradiation points are randomly shifted in the xy plane and stacked. As compared with the case, the unevenness caused by the pulse mark can be reduced.

また、本発明のレーザ加工装置は、前記制御部が、前記1周期を連続して繰り返す際、2回目以降の周期において、前記第1層で、前回周期までの隣接する前記パルス照射点で構成されるいずれかの四角形の重心に前記四角格子の格子点をずらしてパルス照射点とすることを特徴とする。
すなわち、このレーザ加工装置では、前記1周期を連続して繰り返す際、2回目以降の周期において、第1層で、前回周期までの隣接するパルス照射点で構成されるいずれかの四角形の重心に前記四角格子の格子点をずらしてパルス照射点とするので、さらに凹凸を低減することが可能になる。
In the laser processing apparatus of the present invention, when the control unit continuously repeats the one cycle, it is configured by the pulse irradiation points adjacent to the previous cycle in the first layer in the second and subsequent cycles. A pulse irradiation point is formed by shifting a lattice point of the square lattice to the center of gravity of any square.
That is, in this laser processing apparatus, when the one cycle is continuously repeated, in the second and subsequent cycles, the center of any quadrangle constituted by the adjacent pulse irradiation points up to the previous cycle in the first layer. Since the pulse points are shifted by shifting the lattice points of the square lattice, the unevenness can be further reduced.

また、本発明のレーザ加工装置は、前記制御部が、前記第4層が最後の前記加工レイヤーとなるように設定することが好ましい。
すなわち、このレーザ加工装置では、第4層が最後の加工レイヤーとなるように設定することで、非常に小さい面粗さとすることが可能になる。
In the laser processing apparatus of the present invention, it is preferable that the control unit sets the fourth layer to be the last processing layer.
That is, in this laser processing apparatus, by setting the fourth layer to be the last processing layer, it is possible to obtain a very small surface roughness.

本発明によれば、以下の効果を奏する。
すなわち、本発明に係るレーザ加工装置およびレーザ加工方法によれば、複数層の加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、第2層から第4層を上述したようにそれぞれ四角格子の格子点をずらしてパルス照射点とすることで、格子点がパルス照射点である四角格子をx−y面内でランダムにシフトさせて積層した場合に比べてパルス痕による凹凸を小さくし、レーザ加工面の面粗さを低減することができる。
したがって、本発明のレーザ加工装置およびレーザ加工方法は、例えば、表面粗さRz≦3μmが要求される複雑な立体形状を有する製品の形状加工などに好適である。
The present invention has the following effects.
That is, according to the laser processing apparatus and the laser processing method of the present invention, at least one cycle of layers in which four consecutive layers from the first layer to the fourth layer are processed in the processing order among a plurality of processing layers. In addition, by shifting the lattice points of the quadrangular lattices to pulse irradiation points as described above from the second layer to the fourth layer, the rectangular lattices whose lattice points are the pulse irradiation points are randomly formed in the xy plane. Compared with the case of shifting and stacking, the unevenness caused by the pulse marks can be reduced, and the surface roughness of the laser processed surface can be reduced.
Therefore, the laser processing apparatus and laser processing method of the present invention are suitable for, for example, shape processing of a product having a complicated three-dimensional shape that requires a surface roughness Rz ≦ 3 μm.

本発明に係るレーザ加工装置およびレーザ加工方法の一実施形態において、レーザ加工装置を示す概略的な全体構成図である。1 is a schematic overall configuration diagram showing a laser processing apparatus in an embodiment of a laser processing apparatus and a laser processing method according to the present invention. 本実施形態において、第1層(a)から第4層(d)までの正方形格子によるパルス照射点を工程順に示す説明図である。In this embodiment, it is explanatory drawing which shows the pulse irradiation point by the square grating | lattice from the 1st layer (a) to the 4th layer (d) in order of a process. 本実施形態において、第1層から第16層までの平行四辺形格子によるパルス照射点を工程順に示す説明図である。In this embodiment, it is explanatory drawing which shows the pulse irradiation point by the parallelogram lattice from the 1st layer to the 16th layer in order of a process. 本発明に係る実施例として、第1層(a)から第4層(d)まで本発明の方法でレーザ照射した際のシミュレーション結果を示すレーザ加工面の形状図である。As an example according to the present invention, it is a shape diagram of a laser processing surface showing a simulation result when laser irradiation is performed by the method of the present invention from the first layer (a) to the fourth layer (d). 本発明に係る比較例として、第1層(a)から第4層(d)までランダムシフトでレーザ照射した際のシミュレーション結果を示すレーザ加工面の形状図である。As a comparative example according to the present invention, it is a shape diagram of a laser processing surface showing a simulation result when laser irradiation is performed at random shift from the first layer (a) to the fourth layer (d). 本発明に係る実施例及び比較例において、層数に対する面粗さを示す実際のレーザ加工試験結果を示すグラフである。In the Example and comparative example which concern on this invention, it is a graph which shows the actual laser processing test result which shows the surface roughness with respect to the number of layers. レーザ加工によるレイヤー加工法を示す説明図である。It is explanatory drawing which shows the layer processing method by laser processing.

以下、本発明に係るレーザ加工装置およびレーザ加工方法の一実施形態を、図1から図3を参照しながら説明する。   Hereinafter, an embodiment of a laser processing apparatus and a laser processing method according to the present invention will be described with reference to FIGS. 1 to 3.

本実施形態のレーザ加工装置1は、図1に示すように、加工対象物Wにレーザ光Lを照射して形状形成を行う加工装置であって、加工対象物Wにレーザ光Lを一定の繰り返し周波数で照射すると共に走査するレーザ光照射機構2と、加工対象物Wを保持して該加工対象物Wとレーザ光Lとの相対的な位置関係を調整可能な位置調整機構3と、これら機構を制御して、レーザ光Lの走査を行う際に、加工領域をレーザ光Lの照射方向に複数層の加工レイヤーを積み重ねたものとして設定し、各加工レイヤーに対してレーザ光Lを照射し、加工レイヤー毎に所定部分を除去して、三次元形状の加工面を形成する制御部Cとを備えている。   As shown in FIG. 1, the laser processing apparatus 1 of the present embodiment is a processing apparatus that forms a shape by irradiating a workpiece W with a laser beam L, and the laser beam L is applied to the workpiece W at a certain level. A laser beam irradiation mechanism 2 that irradiates and scans at a repetition frequency; a position adjustment mechanism 3 that holds the workpiece W and can adjust the relative positional relationship between the workpiece W and the laser beam L; and When the laser beam L is scanned by controlling the mechanism, the processing region is set as a stack of a plurality of processing layers in the irradiation direction of the laser light L, and each processing layer is irradiated with the laser light L And a control unit C that removes a predetermined portion for each processing layer and forms a three-dimensional processing surface.

上記位置調整機構3は、水平面に平行なX方向に移動可能なX軸ステージ部4xと、該X軸ステージ部4x上に設けられX方向に対して垂直なかつ水平面に平行なY方向に移動方向なY軸ステージ部4yと、該Y軸ステージ部4y上に設けられ加工対象物Wを保持可能であると共に水平面に対して垂直方向に移動可能なZ軸ステージ部4zとで構成されている。   The position adjusting mechanism 3 includes an X-axis stage unit 4x that can move in the X direction parallel to the horizontal plane, and a moving direction in the Y direction that is provided on the X-axis stage unit 4x and is perpendicular to the X direction and parallel to the horizontal plane. The Y-axis stage unit 4y and the Z-axis stage unit 4z provided on the Y-axis stage unit 4y and capable of holding the workpiece W and movable in the direction perpendicular to the horizontal plane.

上記レーザ光照射機構2は、Qスイッチのトリガー信号によりパルス化されたレーザ光Lを発振するレーザ光源5と、該レーザ光源5からのレーザ光Lのビームを一定の径に広げるビームエキスパンダー6と、該ビームエキスパンダー6からのレーザ光Lを走査するガルバノスキャナ7と、該ガルバノスキャナ7からのレーザ光Lを集光して加工対象物Wに照射するf−θレンズ8と、保持された加工対象物Wの加工位置を確認するために撮像するCCDカメラ9とを備えている。なお、ビームエキスパンダー6前後の光路には、ミラーや波長板などの光学部材を配置しても構わない。   The laser beam irradiation mechanism 2 includes a laser light source 5 that oscillates a laser beam L pulsed by a trigger signal of a Q switch, and a beam expander 6 that expands the beam of the laser beam L from the laser light source 5 to a certain diameter. The galvano scanner 7 that scans the laser beam L from the beam expander 6, the f-θ lens 8 that collects the laser beam L from the galvano scanner 7 and irradiates the workpiece W, and the held processing A CCD camera 9 that captures an image to confirm the processing position of the object W is provided. An optical member such as a mirror or a wave plate may be disposed in the optical path around the beam expander 6.

このレーザ光照射機構2により出射されるレーザ光Lは、シングルモードでありビーム断面の光強度分布がガウシアン分布となっている。
上記レーザ光源5は、190〜550nmのいずれかの波長のレーザ光を照射できるものが使用可能であり、例えば本実施形態では、波長266nmのレーザ光を発振して出射できるものを用いている。
上記ガルバノスキャナ7は、Z軸ステージ部4zの直上に配置されている。また、上記CCDカメラ9は、ガルバノスキャナ7に隣接して設置されている。
The laser light L emitted by the laser light irradiation mechanism 2 is in a single mode, and the light intensity distribution in the beam cross section has a Gaussian distribution.
As the laser light source 5, a laser light source that can irradiate laser light having a wavelength of 190 to 550 nm can be used. For example, in this embodiment, a laser light source that can oscillate and emit laser light having a wavelength of 266 nm is used.
The galvano scanner 7 is disposed immediately above the Z-axis stage portion 4z. The CCD camera 9 is installed adjacent to the galvano scanner 7.

上記制御部Cは、図2に示すように、加工レイヤーに対して設定した仮想の四角格子の格子点をパルス照射点としてレーザ光Lを照射して加工を行い、複数層の加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、第2層で、第1層の隣接する4点のパルス照射点P1で構成される四角形Q1の重心G1に四角格子の格子点をずらしてパルス照射点P2とし、第3層で、第1層及び第2層の隣接するパルス照射点P1,P2で構成される四角形Q2の重心G2に前記四角格子の格子点をずらしてパルス照射点P3とし、第4層で、第3層の隣接する4点のパルス照射点P3で構成される四角形Q3の重心G3に前記四角格子の格子点をずらしてパルス照射点P4とする機能を有している。なお、上記格子点及びパルス照射点は、レーザ光Lの照射方向(z方向)に垂直な面(x−y平面)での平面視による座標点である。   As shown in FIG. 2, the control unit C performs processing by irradiating the laser beam L with the lattice points of the virtual square lattice set for the processing layer as pulse irradiation points, and among the plurality of processing layers. It includes at least one period of four consecutive layers from the first layer to the fourth layer in the processing order for one period, and is composed of four pulse irradiation points P1 adjacent to the first layer in the second layer. The grid point of the square lattice is shifted to the gravity center G1 of the quadrangle Q1 to form a pulse irradiation point P2, and the gravity center G2 of the quadrangle Q2 formed by the third layer and the adjacent pulse irradiation points P1 and P2 of the first layer and the second layer. The grid point of the square lattice is shifted to a pulse irradiation point P3, and the lattice point of the square lattice is centered on the center of gravity G3 of the quadrangle Q3 composed of the four pulse irradiation points P3 adjacent to the third layer in the fourth layer. Has the function of shifting to a pulse irradiation point P4 That. The lattice points and the pulse irradiation points are coordinate points in a plan view on a plane (xy plane) perpendicular to the irradiation direction (z direction) of the laser light L.

また、制御部Cは、前記1周期を連続して繰り返す際、2回目以降の周期において、第1層で、前回周期までの隣接するパルス照射点で構成されるいずれかの四角形の重心に前記四角格子の格子点をずらしてパルス照射点とする。
さらに、制御部Cは、第4層が加工層の最後の加工レイヤーとなるように設定することが好ましい。
In addition, when the control unit C continuously repeats the one cycle, in the second and subsequent cycles, the control unit C is arranged on the center of gravity of any square formed by the adjacent pulse irradiation points up to the previous cycle in the first layer. The lattice points of the square lattice are shifted to be pulse irradiation points.
Furthermore, the control unit C is preferably set so that the fourth layer becomes the last processed layer of the processed layers.

本実施形態では、レーザ光Lの走査を行う際に、走査プログラム上、複数の加工レイヤーを積み重ねて設定することで、各加工レイヤーに対してレーザ光Lを垂直に照射し、加工レイヤー毎に所定部分を除去して、三次元形状の加工面を形成していく。このため、レーザ光Lの走査制御において、まず加工対象物Wをレーザ光Lの照射方向に複数の加工レイヤーに分けて設定する。
そして、加工前の形状と設計上の加工後形状とから加工除去する部分を、加工レイヤー毎に設定し、加工レイヤー毎にレーザ光Lを走査して所定部分を除去することで、所定の加工面を形成していく。
In the present embodiment, when scanning with the laser beam L, a plurality of processing layers are stacked and set in the scanning program so that each processing layer is irradiated with the laser beam L vertically and is processed for each processing layer. A predetermined portion is removed to form a three-dimensional processed surface. For this reason, in the scanning control of the laser beam L, first, the workpiece W is set in a plurality of processing layers in the irradiation direction of the laser beam L.
Then, a portion to be processed and removed from the shape before processing and the shape after processing in design is set for each processing layer, and predetermined processing is performed by scanning the laser beam L for each processing layer and removing a predetermined portion. Form a surface.

このレーザ加工方法について、より具体的に説明すると、まず制御部Cは、図7に示すように、加工対象物Wの元の形状から目標の立体形状をレーザ光Lにより加工する場合、加工除去する立体形状部分をZ軸に垂直な面で等間隔に、複数の加工レイヤーLYに分割(層分割)する。
この際、層(加工レイヤーLY)の厚さはパルスあたりのエネルギーと層内のパルス照射点の空間密度とにより決定されるが、層の厚さが常に一定である方が制御し易く、また、層のステップに起因するレーザ光軸に対し傾斜した面の凹凸が均一となるため好ましい。そこで、層の厚さを一定とするために、レーザ光Lのエネルギー密度、レーザ光Lの繰り返し周波数、レーザ光Lの走査速度及び走査線の間隔は、加工中で常に一定に条件が設定される。そのため、全ての層のパルス照射点分布を同一形状および同一サイズの四角格子とすることが必要条件となる。
This laser processing method will be described in more detail. First, the control unit C removes the processing when the target three-dimensional shape is processed from the original shape of the processing object W by the laser light L as shown in FIG. The three-dimensional shape portion to be divided is divided (layer division) into a plurality of processing layers LY at equal intervals on a plane perpendicular to the Z axis.
At this time, the thickness of the layer (processed layer LY) is determined by the energy per pulse and the spatial density of the pulse irradiation point in the layer, but it is easier to control if the layer thickness is always constant, Since the unevenness of the surface inclined with respect to the laser optical axis due to the layer step becomes uniform, it is preferable. Therefore, in order to make the thickness of the layer constant, conditions for the energy density of the laser beam L, the repetition frequency of the laser beam L, the scanning speed of the laser beam L, and the interval between the scanning lines are always set constant during processing. The For this reason, it is a necessary condition that the pulse irradiation point distributions of all the layers have the same shape and the same size.

制御部Cは、パルス照射点の分布をレイヤー加工法の上記条件下で均一化して、その格子点がパルス照射点となる四角格子の形状を設定する。すなわち、四角格子のレーザ走査線内におけるパルス照射点間距離、隣接するレーザ走査線の間隔、パルス照射点のレーザ走査線間のずれ量(隣接するレーザ走査線間における最近接パルス照射点間のレーザ走査線方向の距離)、各レーザ走査線の走査開始点等を設定する。また、この際、図2の(a)に示すように、四角格子は、レーザ光の断面強度分布が理想的なガウシアンの場合は正方形格子とすることが好ましいが、レーザ光の断面強度分布に異方性が存在する場合、その形状の歪みに応じて長方形格子や平行四辺形格子とした方が面粗さが低減する。   The control unit C equalizes the distribution of the pulse irradiation points under the above-described conditions of the layer processing method, and sets the shape of a square lattice in which the lattice points become the pulse irradiation points. That is, the distance between pulse irradiation points in the laser scanning line of the square lattice, the interval between adjacent laser scanning lines, the amount of deviation between the laser scanning lines of the pulse irradiation points (between the adjacent pulse irradiation points between adjacent laser scanning lines) The distance in the laser scanning line direction), the scanning start point of each laser scanning line, and the like are set. At this time, as shown in FIG. 2A, the square lattice is preferably a square lattice in the case of ideal Gaussian laser beam cross-sectional intensity distribution. When anisotropy exists, the surface roughness is reduced by using a rectangular lattice or a parallelogram lattice according to the distortion of the shape.

そして、上記設定により加工レイヤーの加工を開始する。まず、加工レイヤーの第1層の加工では、図2の(a)に示すように、所定の四角格子の格子点を第1層のパルス照射点P1としてレーザ光Lの走査を行う。なお、図中の矢印は、レーザ光Lの走査方向を示している。
次に、第2層の加工では、図2の(a)(b)に示すように、第1層の隣接する4点のパルス照射点P1で構成される第1の四角形Q1の重心G1に四角格子の格子点をずらして第2層のパルス照射点P2とし、レーザ光Lの走査を行う。
Then, processing of the processing layer is started with the above settings. First, in the processing of the first layer of the processing layer, as shown in FIG. 2A, scanning with the laser beam L is performed with a lattice point of a predetermined square lattice as a pulse irradiation point P1 of the first layer. In addition, the arrow in a figure has shown the scanning direction of the laser beam L. FIG.
Next, in the processing of the second layer, as shown in FIGS. 2A and 2B, the center of gravity G1 of the first quadrangle Q1 formed by the four pulse irradiation points P1 adjacent to the first layer is set. The lattice point of the square lattice is shifted to the pulse irradiation point P2 of the second layer, and the laser beam L is scanned.

さらに、第3層の加工では、図2の(b)(c)に示すように、第1層及び第2層の隣接するパルス照射点P1,P2で構成される第2の四角形Q2の重心G2に前記四角格子の格子点をずらして第3層のパルス照射点P3とし、レーザ光Lの走査を行う。
そして、1周期の最後として、第4層の加工では、図2の(c)(d)に示すように、第3層の隣接する4つのパルス照射点P3で構成される第3の四角形Q3の重心G3に前記四角格子の格子点をずらして照射点P4とし、レーザ光Lの走査を行う。
Furthermore, in the processing of the third layer, as shown in FIGS. 2B and 2C, the center of gravity of the second quadrangle Q2 constituted by the adjacent pulse irradiation points P1 and P2 of the first layer and the second layer. The lattice point of the square lattice is shifted to G2 to obtain a pulse irradiation point P3 of the third layer, and the laser beam L is scanned.
Then, at the end of one cycle, in the processing of the fourth layer, as shown in FIGS. 2C and 2D, a third quadrangle Q3 composed of four adjacent pulse irradiation points P3 of the third layer. The lattice point of the square lattice is shifted to the center of gravity G3 to form an irradiation point P4, and the laser beam L is scanned.

このようにして加工レイヤーの1周期目について4層の加工が完了する。この後、前記1周期を連続して繰り返す際、すなわち層分割した層数が4層を超えている場合、同様にして前記1周期のレーザ加工を繰り返す。
例えば、四角格子を平行四辺形格子とした場合で、全層数を16層として4周期まで加工する際のパルス照射点について説明すると、2回目以降の周期では、図3に示すように、第1層で、前回周期までの隣接するパルス照射点で構成されるいずれかの四角形の重心に前記四角格子の格子点をずらしてパルス照射点とする。
In this way, the processing of the four layers is completed for the first cycle of the processing layer. Thereafter, when the one cycle is repeated continuously, that is, when the number of divided layers exceeds four layers, the laser processing of the one cycle is repeated in the same manner.
For example, in the case where the square lattice is a parallelogram lattice and the number of layers is 16 and processing is performed up to four cycles, the pulse irradiation points will be described. In the second and subsequent cycles, as shown in FIG. In one layer, the lattice point of the square lattice is shifted to the center of gravity of any quadrangle constituted by adjacent pulse irradiation points up to the previous cycle, and set as pulse irradiation points.

すなわち、図3の(a)に示すように、1周期目の4層のパルス照射点P1〜P4が平行四辺形格子の格子点に設定されている場合、2周期目の第1層では、1周期目の隣接するパルス照射点P1〜P4で構成される第4の四角形Q4の重心G4に、図3の(b)に示すように、前記平行四辺形格子の格子点をずらしてパルス照射点P5とし、レーザ光Lの走査を行う。そして、2周期目の第2層から第4層まで、すなわち最初から数えて第5層から第8層までの3層は、第5層のパルス照射点P5を基準にして1周期目と同様に第6層のパルス照射点P6、第7層のパルス照射点P7,第8層のパルス照射点P8を設定して、レーザ光Lの走査を順次行う。   That is, as shown in FIG. 3A, when the pulse irradiation points P1 to P4 of the four layers in the first period are set to the lattice points of the parallelogram lattice, in the first layer of the second period, As shown in FIG. 3B, pulse irradiation is performed by shifting the lattice points of the parallelogram lattice to the center of gravity G4 of the fourth quadrangle Q4 composed of adjacent pulse irradiation points P1 to P4 in the first period. Scanning with the laser beam L is performed at point P5. The second layer from the second layer to the fourth layer, that is, the third layer from the fifth layer to the eighth layer counting from the beginning, is the same as the first cycle with reference to the pulse irradiation point P5 of the fifth layer. A pulse irradiation point P6 for the sixth layer, a pulse irradiation point P7 for the seventh layer, and a pulse irradiation point P8 for the eighth layer are set, and the laser beam L is scanned sequentially.

さらに、図3の(b)に示すように、前回周期まで(1周期目及び2周期目)の隣接するパルス照射点P1〜P8で構成されるいずれかの第5の四角形Q5の重心G5に、図3の(c)に示すように、前記平行四辺形格子の格子点をずらして3周期目の第1層、すなわち最初から数えて第9層のパルス照射点P9とし、レーザ光Lの走査を行う。そして、3周期目の第2層から第4層まで、すなわち最初から数えて第10層から第12層までの3層は、第9層のパルス照射点P9を基準にして1周期目と同様に第10層のパルス照射点P10、第11層のパルス照射点P11,第12層のパルス照射点P12を設定して、レーザ光Lの走査を順次行う。   Further, as shown in FIG. 3B, the center of gravity G5 of any fifth quadrangle Q5 constituted by the adjacent pulse irradiation points P1 to P8 up to the previous cycle (first cycle and second cycle). As shown in FIG. 3C, the lattice points of the parallelogram lattice are shifted to the first layer of the third period, that is, the pulse irradiation point P9 of the ninth layer counted from the beginning, and the laser beam L Scan. The third layer from the second layer to the fourth layer, that is, the third layer from the tenth layer to the twelfth layer counted from the beginning, is the same as the first cycle with reference to the pulse irradiation point P9 of the ninth layer. The pulse irradiation point P10 of the tenth layer, the pulse irradiation point P11 of the eleventh layer, and the pulse irradiation point P12 of the twelfth layer are set, and the laser beam L is sequentially scanned.

次に、3周期目の隣接するパルス照射点P9〜P12で構成される第6の四角形Q6の重心G6に前記平行四辺形格子の格子点をずらして4周期目の第1層、すなわち最初から数えて第13層のパルス照射点P13とし、レーザ光Lの走査を行う。そして、4周期目の第2層から第4層まで、すなわち最初から数えて第14層から第16層までの3層は、第13層のパルス照射点P13を基準にして1周期目と同様に第14層のパルス照射点P14、第15層のパルス照射点P15,第16層のパルス照射点P16を設定して、レーザ光Lの走査を順次行う。   Next, the lattice point of the parallelogram lattice is shifted to the center of gravity G6 of the sixth quadrangle Q6 composed of the adjacent pulse irradiation points P9 to P12 in the third period, that is, the first layer in the fourth period, that is, from the beginning. The pulse irradiation point P13 of the thirteenth layer is counted and the laser beam L is scanned. The third layer from the second layer to the fourth layer in the fourth period, that is, the third layer from the fourteenth layer to the sixteenth layer from the beginning is the same as the first period with reference to the pulse irradiation point P13 of the thirteenth layer. The pulse irradiation point P14 of the 14th layer, the pulse irradiation point P15 of the 15th layer, and the pulse irradiation point P16 of the 16th layer are set to the laser beam L in order.

このように、前回周期までの互いに隣接するパルス照射点で囲まれたいずれかの四角形の重心に、次の周期の第1層におけるパルス照射点をずらして該周期の4層のパルス照射点を設定することで、隣接するパルス照射点の間の空間がパルス照射点で埋められて上記周期を繰り返す度に該空間が小さく狭められることで、加工痕による凹凸を徐々に小さくすることができる。   As described above, the four-layer pulse irradiation points in the first cycle are shifted to the center of gravity of any square surrounded by the pulse irradiation points adjacent to each other up to the previous cycle by shifting the pulse irradiation points in the first layer in the next cycle. By setting, the space between the adjacent pulse irradiation points is filled with the pulse irradiation points, and the space is narrowed small each time the above cycle is repeated, so that the unevenness due to the processing marks can be gradually reduced.

したがって、本実施形態のレーザ加工装置1及びレーザ加工方法では、複数層の加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、第2層から第4層を上述したようにそれぞれ四角格子の格子点をずらしてパルス照射点とすることで、格子点がパルス照射点である四角格子をx−y方向にランダムにシフトさせて積層した場合に比べてパルス痕による凹凸を小さくすることができる。   Therefore, in the laser processing apparatus 1 and the laser processing method of the present embodiment, at least one cycle includes a layer in which four consecutive layers from the first layer to the fourth layer are processed in the processing order among a plurality of processing layers. As described above, by shifting the grid points of the square lattice to the pulse irradiation points in the second layer to the fourth layer, the square lattices whose lattice points are the pulse irradiation points are randomly shifted in the xy direction. As compared with the case of stacking, unevenness due to pulse marks can be reduced.

また、前記1周期を連続して繰り返す際、2回目以降の周期において、第1層で、前回周期までの隣接するパルス照射点で構成されるいずれかの四角形の重心に前記四角格子の格子点をずらしてパルス照射点とするので、さらに凹凸を低減することが可能になる。特に、第4層が最後の加工レイヤーとなるように設定することで、非常に小さい面粗さとすることが可能になる。   In addition, when the one cycle is repeated continuously, in the second and subsequent cycles, the lattice point of the square lattice at the center of gravity of any quadrangle formed by the adjacent pulse irradiation points up to the previous cycle in the first layer As the pulse irradiation point is shifted, the unevenness can be further reduced. In particular, by setting the fourth layer to be the last processed layer, it is possible to achieve very small surface roughness.

次に、上記実施形態のレーザ加工装置を用いて加工対象物の表面をレーザ加工した際のシミュレーション結果について説明する。
本シミュレーションでは、上記四角形格子として一辺の大きさが2.5μmの正方形格子に設定し、図4の(a)〜(d)に示すように、1周期目の第1層(a)から第4層(d)までの加工レイヤーを加工した際における加工対象物の表面状態の凹凸を計算した。
Next, a simulation result when the surface of the workpiece is laser processed using the laser processing apparatus of the above embodiment will be described.
In this simulation, a square lattice having a side of 2.5 μm is set as the quadrangular lattice, and the first layer (a) in the first period is changed from the first layer (a) to the second period as shown in FIGS. The unevenness of the surface state of the processing object when processing up to four layers (d) was processed was calculated.

なお、このシミュレーションでは、1つのパルス照射点において、加工対象物の加工表面には下記ガウス関数で規定される断面形状で加工痕が発生すると仮定して計算している。
ガウス関数:z=−exp(−x−y
このシミュレーション結果からわかるように、層を重ねるごとに凹凸が打ち消され、平滑な加工面が得られている。なお、第4層の時点で、表面粗さRz(最大高さ)が0.029μmであった。
In this simulation, the calculation is performed on the assumption that at one pulse irradiation point, a machining trace is generated on the machining surface of the workpiece with a cross-sectional shape defined by the following Gaussian function.
Gaussian function: z = −exp (−x 2 −y 2 )
As can be seen from the simulation results, the unevenness is canceled each time the layers are stacked, and a smooth processed surface is obtained. At the time of the fourth layer, the surface roughness Rz (maximum height) was 0.029 μm.

なお、比較例として、上記実施例と同様に、四角形格子として一辺の大きさが2.5μmの正方形格子に設定し、層全体をx−y方向にランダムな量だけシフトさせて、図5の(a)〜(d)に示すように、1周期目の第1層(a)から第4層(d)までの加工レイヤーを加工した際における加工対象物の表面状態の凹凸を計算した。
このシミュレーション結果からわかるように、ランダムにずらしてレーザ加工した比較例では、層を重ねても凹凸が打ち消されることがなく、層を重ねるごとに凹凸が大きくなっている。なお、第4層の時点で、表面粗さRz(最大高さ)が1.878μmであった。
As a comparative example, similarly to the above-described embodiment, a square lattice having a side of 2.5 μm is set as a quadrangular lattice, and the entire layer is shifted by a random amount in the xy direction. As shown to (a)-(d), the unevenness | corrugation of the surface state of the process target object at the time of processing the process layer from the 1st layer (a) of the 1st period to the 4th layer (d) was calculated.
As can be seen from the simulation results, in the comparative example in which laser processing is performed at random shifts, the unevenness is not canceled even if the layers are stacked, and the unevenness increases as the layers are stacked. At the time of the fourth layer, the surface roughness Rz (maximum height) was 1.878 μm.

次に、アルミナ板(加工前の表面粗さRz:約0.2μm)を加工対象物とした場合に、本発明のレーザ加工を行った際の加工レイヤーの層数と面粗さとの関係(図中の「正方格子規則的積層」)について、図6に示す。
この際のレーザ条件は、波長266nm、繰り返し周波数100kHz、出力2Wとした。また、上記四角形格子としては、一辺の大きさが6μmの正方形格子に設定した。なお、グラフのプロットは、面粗さの実測値であり、点線及び実線は、それらのプロットを目視でフィッティングしたものである。
Next, when an alumina plate (surface roughness Rz before processing: about 0.2 μm) is a processing target, the relationship between the number of processing layers and surface roughness when laser processing of the present invention is performed ( FIG. 6 shows “tetragonal lattice regular lamination” in the figure.
The laser conditions at this time were a wavelength of 266 nm, a repetition frequency of 100 kHz, and an output of 2 W. Further, the square lattice was set to a square lattice having a side of 6 μm. The plot of the graph is an actual measurement value of the surface roughness, and the dotted line and the solid line are obtained by fitting these plots with the naked eye.

また、比較例として、上記実施例と同様に、四角形格子として一辺の大きさが6μmの正方形格子に設定し、層全体をx−y方向にランダムな量だけシフトさせて上記と同様の層数の加工を行った場合(図中の「正方格子ランダムシフト積層」)についても、図6に併せて示す。また、上記比較例と同様にランダムにシフトさせて加工し、途中の4層(第10層から第13層まで)だけを本発明の第1層から第4層までと同じレーザ加工を行った場合(図中の「正方格子ランダムシフト積層(実線部))についても、併せて図6に示す。   As a comparative example, as in the above example, a square lattice having a side size of 6 μm is set as a quadrangular lattice, and the entire layer is shifted by a random amount in the xy direction, and the number of layers is the same as above. 6 is also shown in FIG. 6 (“square lattice random shift lamination” in the figure). Further, similarly to the above comparative example, processing was performed by randomly shifting, and only the intermediate four layers (from the tenth layer to the thirteenth layer) were subjected to the same laser processing as the first layer to the fourth layer of the present invention. The case (“square lattice random shift stack (solid line part) in the drawing) is also shown in FIG.

これらの結果からわかるように、本発明のレーザ加工方法で全ての層を加工した場合は、第1層から層数を重ねるごとに表面粗さが小さくなっているのに対し、全ての層をランダムシフトで加工した比較例では、層数を重ねるごとに表面粗さが大きくなっている。また、全層数のうち一部のみ本発明のレーザ加工方法でレイヤー加工した例では、全ての層をランダムシフトで加工した比較例に対して、表面粗さが小さくなっており、一部でも規則化された本発明のレーザ加工方法で加工することにより、表面粗さを低下させる効果が得られている。   As can be seen from these results, when all layers are processed by the laser processing method of the present invention, the surface roughness decreases as the number of layers is increased from the first layer, whereas all layers are processed. In the comparative example processed by random shift, the surface roughness increases as the number of layers increases. In addition, in the example in which only a part of the total number of layers is processed by the laser processing method of the present invention, the surface roughness is smaller than in the comparative example in which all the layers are processed by random shift. By processing with the ordered laser processing method of the present invention, an effect of reducing the surface roughness is obtained.

なお、本発明の技術範囲は上記実施形態および上記実施例に限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。   The technical scope of the present invention is not limited to the above-described embodiments and examples, and various modifications can be made without departing from the spirit of the present invention.

1…レーザ加工装置、2…レーザ光照射機構、3…位置調整機構、C…制御部、G1〜G6…四角形の重心、L…レーザ光、P1〜P16…パルス照射点、W…加工対象物   DESCRIPTION OF SYMBOLS 1 ... Laser processing apparatus, 2 ... Laser beam irradiation mechanism, 3 ... Position adjustment mechanism, C ... Control part, G1-G6 ... Square gravity center, L ... Laser beam, P1-P16 ... Pulse irradiation point, W ... Work object

Claims (4)

加工対象物にパルスレーザ光を照射して形状形成を行う加工装置であって、
前記加工対象物に前記レーザ光を一定の繰り返し周波数で照射すると共に走査するパルスレーザ光照射機構と、
前記加工対象物を保持して該加工対象物と前記レーザ光との相対的な位置関係を調整可能な位置調整機構と、
これら機構を制御して、前記レーザ光の走査を行う際に、前記加工領域を前記レーザ光の照射方向に複数層の加工レイヤーを積み重ねたものとして設定し、各加工レイヤーに対して前記レーザ光を照射し、前記加工レイヤー毎に所定部分を除去して、三次元形状の加工面を形成する制御部とを備え、
該制御部が、前記加工レイヤーに対して設定した仮想の四角格子の格子点をパルス照射点として前記レーザ光を照射して加工を行い、
複数層の前記加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、
前記第2層で、前記第1層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、
前記第3層で、前記第1層及び前記第2層の隣接する前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、
前記第4層で、前記第3層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とすることを特徴とするレーザ加工装置。
A processing apparatus for forming a shape by irradiating a processing object with a pulsed laser beam,
A pulsed laser light irradiation mechanism for irradiating and scanning the processing object with the laser light at a constant repetition frequency; and
A position adjustment mechanism capable of holding the workpiece and adjusting a relative positional relationship between the workpiece and the laser beam;
When the laser beam is scanned by controlling these mechanisms, the processing region is set as a stack of a plurality of processing layers in the irradiation direction of the laser beam, and the laser beam is applied to each processing layer. A control unit that forms a three-dimensional machining surface by removing a predetermined portion for each machining layer,
The control unit performs processing by irradiating the laser beam with a pulse point of a virtual square lattice set for the processing layer,
Including at least one period of layers in which four consecutive layers from the first layer to the fourth layer are processed in the processing order among the plurality of processing layers,
In the second layer, the grid point of the square lattice is shifted to the center of gravity of the quadrangle formed by the four pulse irradiation points adjacent to the first layer, and the pulse irradiation point is obtained.
In the third layer, the lattice point of the square lattice is shifted to the center of gravity of the quadrangle formed by the pulse irradiation points adjacent to the first layer and the second layer, and the pulse irradiation points are obtained.
In the fourth layer, the laser processing apparatus is characterized in that a lattice point of the square lattice is shifted to a center of gravity of a quadrangle formed by the four pulse irradiation points adjacent to the third layer to form a pulse irradiation point. .
請求項1記載のレーザ加工装置において、
前記制御部が、前記1周期を連続して繰り返す際、2回目以降の周期において、前記第1層で、前回周期までの隣接する前記パルス照射点で構成されるいずれかの四角形の重心に前記四角格子の格子点をずらしてパルス照射点とすることを特徴とするレーザ加工装置。
The laser processing apparatus according to claim 1,
When the control unit continuously repeats the one cycle, in the second and subsequent cycles, in the first layer, the center of any square formed by the adjacent pulse irradiation points up to the previous cycle A laser processing apparatus characterized by shifting a lattice point of a square lattice to a pulse irradiation point.
請求項1又は2記載のレーザ加工装置において、
前記制御部が、前記第4層が最後の前記加工レイヤーとなるように設定することを特徴とするレーザ加工装置。
In the laser processing apparatus according to claim 1 or 2,
The laser processing apparatus, wherein the control unit sets the fourth layer to be the last processing layer.
加工対象物にパルスレーザ光を照射して形状形成を行う加工方法であって、
前記加工対象物に前記レーザ光を一定の繰り返し周波数で照射すると共に走査するレーザ光照射工程と、
前記加工対象物を保持して該加工対象物と前記レーザ光との相対的な位置関係を調整可能な位置調整工程とを有し、
前記レーザ光の走査を行う際に、前記加工領域を前記レーザ光の照射方向に複数層の加工レイヤーを積み重ねたものとして設定し、各加工レイヤーに対して前記レーザ光を照射し、前記加工レイヤー毎に所定部分を除去して、三次元形状の加工面を形成し、
前記加工レイヤーに対して設定した仮想の格子の格子点上に前記レーザ光を照射して加工を行い、
複数層の前記加工レイヤーのうち加工順に第1層から第4層までの連続する4層を1周期とした層を少なくとも1周期分含み、
前記第2層で、前記第1層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、
前記第3層で、前記第1層及び前記第2層の隣接する前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とし、
前記第4層で、前記第3層の隣接する4点の前記パルス照射点で構成される四角形の重心に前記四角格子の格子点をずらしてパルス照射点とすることを特徴とするレーザ加工方法。
A processing method for forming a shape by irradiating a processing object with pulsed laser light,
Irradiating the workpiece with the laser beam at a constant repetition frequency and scanning the laser beam; and
A position adjustment step of holding the workpiece and adjusting a relative positional relationship between the workpiece and the laser beam;
When scanning with the laser beam, the processing region is set as a stack of a plurality of processing layers in the irradiation direction of the laser beam, each processing layer is irradiated with the laser beam, and the processing layer Remove a predetermined part every time to form a three-dimensional machining surface,
Perform processing by irradiating the laser beam on the lattice points of the virtual lattice set for the processing layer,
Including at least one period of layers in which four consecutive layers from the first layer to the fourth layer are processed in the processing order among the plurality of processing layers,
In the second layer, the grid point of the square lattice is shifted to the center of gravity of the quadrangle formed by the four pulse irradiation points adjacent to the first layer, and the pulse irradiation point is obtained.
In the third layer, the lattice point of the square lattice is shifted to the center of gravity of the quadrangle formed by the pulse irradiation points adjacent to the first layer and the second layer, and the pulse irradiation points are obtained.
In the fourth layer, the laser processing method is characterized in that the grid point of the square lattice is shifted to the center of gravity of a quadrangle constituted by the four pulse irradiation points adjacent to the third layer to form a pulse irradiation point. .
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020075295A (en) * 2018-11-05 2020-05-21 京セラ株式会社 Cutting tool and manufacturing method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108436283B (en) * 2018-04-11 2020-10-16 大族激光科技产业集团股份有限公司 Laser marking machine and marking method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005125357A (en) * 2003-10-23 2005-05-19 Sumitomo Heavy Ind Ltd Laser beam machining method and laser beam machining apparatus
JP2007229756A (en) * 2006-02-28 2007-09-13 Sunx Ltd Laser beam machining apparatus
JP2010194560A (en) * 2009-02-23 2010-09-09 Nisshinbo Holdings Inc Laser machining method of solar battery panel
JP2011212726A (en) * 2010-03-31 2011-10-27 Fujifilm Corp Laser machining device and laser machining method
JP2013173150A (en) * 2012-02-23 2013-09-05 Mitsubishi Materials Corp Laser beam machining device and laser beam machining method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124913A (en) * 1992-06-26 1994-05-06 Semiconductor Energy Lab Co Ltd Laser treatment
JP3213882B2 (en) * 1997-03-21 2001-10-02 住友重機械工業株式会社 Laser processing apparatus and processing method
TWI221102B (en) * 2002-08-30 2004-09-21 Sumitomo Heavy Industries Laser material processing method and processing device
GB0315947D0 (en) * 2003-07-08 2003-08-13 Spectrum Technologies Plc Laser removal of layer or coating from a substrate
CN105583526B (en) * 2008-03-21 2018-08-17 Imra美国公司 Material processing method based on laser and system
JP5454080B2 (en) * 2008-10-23 2014-03-26 住友電気工業株式会社 Laser processing method and laser processing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005125357A (en) * 2003-10-23 2005-05-19 Sumitomo Heavy Ind Ltd Laser beam machining method and laser beam machining apparatus
JP2007229756A (en) * 2006-02-28 2007-09-13 Sunx Ltd Laser beam machining apparatus
JP2010194560A (en) * 2009-02-23 2010-09-09 Nisshinbo Holdings Inc Laser machining method of solar battery panel
JP2011212726A (en) * 2010-03-31 2011-10-27 Fujifilm Corp Laser machining device and laser machining method
JP2013173150A (en) * 2012-02-23 2013-09-05 Mitsubishi Materials Corp Laser beam machining device and laser beam machining method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020075295A (en) * 2018-11-05 2020-05-21 京セラ株式会社 Cutting tool and manufacturing method thereof
JP7023214B2 (en) 2018-11-05 2022-02-21 京セラ株式会社 How to manufacture cutting tools

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