JP2013224937A5 - - Google Patents
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- Publication number
- JP2013224937A5 JP2013224937A5 JP2013087058A JP2013087058A JP2013224937A5 JP 2013224937 A5 JP2013224937 A5 JP 2013224937A5 JP 2013087058 A JP2013087058 A JP 2013087058A JP 2013087058 A JP2013087058 A JP 2013087058A JP 2013224937 A5 JP2013224937 A5 JP 2013224937A5
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- substrate
- backing
- package
- mems
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 33
- 239000012530 fluid Substances 0.000 claims 12
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 11
- 238000002955 isolation Methods 0.000 claims 7
- 238000004806 packaging method and process Methods 0.000 claims 6
- 230000007613 environmental effect Effects 0.000 claims 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/451,790 | 2012-04-20 | ||
| US13/451,790 US9010190B2 (en) | 2012-04-20 | 2012-04-20 | Stress isolated MEMS structures and methods of manufacture |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013224937A JP2013224937A (ja) | 2013-10-31 |
| JP2013224937A5 true JP2013224937A5 (enExample) | 2016-06-09 |
| JP6258599B2 JP6258599B2 (ja) | 2018-01-10 |
Family
ID=48184065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013087058A Active JP6258599B2 (ja) | 2012-04-20 | 2013-04-18 | 応力隔離mems構造および製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9010190B2 (enExample) |
| EP (1) | EP2653443B1 (enExample) |
| JP (1) | JP6258599B2 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6150249B2 (ja) * | 2013-02-25 | 2017-06-21 | 京セラ株式会社 | 電子デバイスのガラス封止方法 |
| US8701496B1 (en) * | 2013-02-27 | 2014-04-22 | Honeywell International Inc. | Systems and methods for a pressure sensor having a two layer die structure |
| US20140260650A1 (en) * | 2013-03-15 | 2014-09-18 | Silicon Microstructures, Inc. | Silicon plate in plastic package |
| US10151647B2 (en) | 2013-06-19 | 2018-12-11 | Honeywell International Inc. | Integrated SOI pressure sensor having silicon stress isolation member |
| ITTO20130539A1 (it) * | 2013-06-28 | 2014-12-29 | Stmicroelectronics International N V | Dispositivo mems incorporante un percorso fluidico e relativo procedimento di fabbricazione |
| US9863903B2 (en) * | 2013-08-01 | 2018-01-09 | Honeywell International Inc. | Condensation sensor systems and methods |
| EP2871455B1 (en) * | 2013-11-06 | 2020-03-04 | Invensense, Inc. | Pressure sensor |
| EP2871456B1 (en) * | 2013-11-06 | 2018-10-10 | Invensense, Inc. | Pressure sensor and method for manufacturing a pressure sensor |
| US9431315B2 (en) * | 2013-12-26 | 2016-08-30 | Agency For Science, Technology And Research | Chemical sensor package for highly pressured environment |
| US20160052784A1 (en) * | 2014-08-25 | 2016-02-25 | Rosemount Aerospace Inc. | Mems devices and method of manufacturing |
| JP6398806B2 (ja) * | 2015-03-12 | 2018-10-03 | オムロン株式会社 | センサパッケージ |
| EP3614115B1 (en) | 2015-04-02 | 2024-09-11 | InvenSense, Inc. | Pressure sensor |
| US9963341B2 (en) | 2015-05-19 | 2018-05-08 | Rosemount Aerospace, Inc. | Pressure sensor package with stress isolation features |
| US10278281B1 (en) * | 2015-10-30 | 2019-04-30 | Garmin International, Inc. | MEMS stress isolation and stabilization system |
| US9878904B1 (en) * | 2016-10-25 | 2018-01-30 | Rosemount Aerospace Inc. | MEMS sensor with electronics integration |
| US10481025B2 (en) * | 2017-01-26 | 2019-11-19 | Rosemount Aerospace Inc. | Piezoresistive sensor with spring flexures for stress isolation |
| US10036676B1 (en) * | 2017-03-15 | 2018-07-31 | Honeywell International Inc. | Microelectromechanical systems (MEMS) force die with buried cavity vented to the edges |
| EP3444609A1 (en) | 2017-08-14 | 2019-02-20 | Sensirion AG | Measuring concentrations of a target gas |
| US11225409B2 (en) | 2018-09-17 | 2022-01-18 | Invensense, Inc. | Sensor with integrated heater |
| CN109738098A (zh) * | 2018-12-29 | 2019-05-10 | 菲比蓝科技(深圳)有限公司 | 压力传感器及其形成方法 |
| CN113785178B (zh) | 2019-05-17 | 2024-12-17 | 应美盛股份有限公司 | 气密性改进的压力传感器 |
| IT202000003862A1 (it) * | 2020-02-25 | 2021-08-25 | St Microelectronics Srl | Dispositivo a semiconduttore per il rilevamento ambientale includente una cavita' accoppiabile al mondo esterno e una struttura di filtraggio meccanico e corrispondente procedimento di fabbricazione |
| US11573145B2 (en) * | 2020-03-31 | 2023-02-07 | Rosemount Aerospace Inc. | Capacitive MEMS pressure sensor and method of manufacture |
| US11981560B2 (en) | 2020-06-09 | 2024-05-14 | Analog Devices, Inc. | Stress-isolated MEMS device comprising substrate having cavity and method of manufacture |
| US11656138B2 (en) * | 2020-06-19 | 2023-05-23 | Rosemount Inc. | Pressure sensor assembly |
| US11879800B2 (en) | 2021-03-29 | 2024-01-23 | Rosemount Aerospace Inc. | MEMS strain gauge pressure sensor with mechanical symmetries |
| US11692895B2 (en) * | 2021-03-30 | 2023-07-04 | Rosemount Aerospace Inc. | Differential pressure sensor |
| CN113049172B (zh) * | 2021-04-14 | 2025-04-04 | 明晶芯晟(成都)科技有限责任公司 | 一种多通道压力测量单元及压力测量装置 |
| CN113607328B (zh) * | 2021-09-08 | 2025-04-01 | 星科金朋半导体(江阴)有限公司 | 一种mems封装结构及其制造方法 |
| CN216453371U (zh) * | 2021-11-24 | 2022-05-10 | 瑞声声学科技(深圳)有限公司 | 电子烟 |
| CN114101831B (zh) * | 2021-12-20 | 2022-11-01 | 浙江亚通焊材有限公司 | 传感器基座及基座钎焊方法 |
| CN115479719B (zh) * | 2022-10-10 | 2025-08-12 | 无锡莱斯能特科技有限公司 | 一种绝对压力传感器封装结构 |
| US20240302237A1 (en) * | 2023-03-08 | 2024-09-12 | Rosemount Aerospace Inc. | High temperature piezo-resistive pressure sensor and packaging assembly therefor |
| CN119178548A (zh) * | 2024-09-21 | 2024-12-24 | 华东光电集成器件研究所 | 一种mems差压传感器芯片结构及制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2664979B1 (fr) * | 1990-07-20 | 1992-11-06 | Sextant Avionique | Micro-capteur de pression. |
| US5483834A (en) | 1993-09-20 | 1996-01-16 | Rosemount Inc. | Suspended diaphragm pressure sensor |
| JPH0933371A (ja) * | 1995-07-25 | 1997-02-07 | Yokogawa Electric Corp | 半導体圧力計 |
| EP0800070B1 (en) * | 1996-04-04 | 2001-08-22 | Ssi Technologies, Inc. | Pressure sensor package and method of making the same |
| JP2002082009A (ja) * | 2000-06-30 | 2002-03-22 | Denso Corp | 圧力センサ |
| DE102004011203B4 (de) * | 2004-03-04 | 2010-09-16 | Robert Bosch Gmbh | Verfahren zum Montieren von Halbleiterchips und entsprechende Halbleiterchipanordnung |
| US7475597B2 (en) * | 2006-02-27 | 2009-01-13 | Auxitrol S.A. | Stress isolated pressure sensing die |
| US8230745B2 (en) * | 2008-11-19 | 2012-07-31 | Honeywell International Inc. | Wet/wet differential pressure sensor based on microelectronic packaging process |
-
2012
- 2012-04-20 US US13/451,790 patent/US9010190B2/en active Active
-
2013
- 2013-04-18 JP JP2013087058A patent/JP6258599B2/ja active Active
- 2013-04-19 EP EP13164524.4A patent/EP2653443B1/en active Active
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