JP2013183017A5 - - Google Patents

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Publication number
JP2013183017A5
JP2013183017A5 JP2012045783A JP2012045783A JP2013183017A5 JP 2013183017 A5 JP2013183017 A5 JP 2013183017A5 JP 2012045783 A JP2012045783 A JP 2012045783A JP 2012045783 A JP2012045783 A JP 2012045783A JP 2013183017 A5 JP2013183017 A5 JP 2013183017A5
Authority
JP
Japan
Prior art keywords
reference mark
charged particle
region
drawing apparatus
measurement unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012045783A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013183017A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012045783A priority Critical patent/JP2013183017A/ja
Priority claimed from JP2012045783A external-priority patent/JP2013183017A/ja
Priority to US13/771,243 priority patent/US20130230805A1/en
Publication of JP2013183017A publication Critical patent/JP2013183017A/ja
Publication of JP2013183017A5 publication Critical patent/JP2013183017A5/ja
Abandoned legal-status Critical Current

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JP2012045783A 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法 Abandoned JP2013183017A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012045783A JP2013183017A (ja) 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法
US13/771,243 US20130230805A1 (en) 2012-03-01 2013-02-20 Drawing apparatus, reference member, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012045783A JP2013183017A (ja) 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法

Publications (2)

Publication Number Publication Date
JP2013183017A JP2013183017A (ja) 2013-09-12
JP2013183017A5 true JP2013183017A5 (enExample) 2015-04-09

Family

ID=49043026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012045783A Abandoned JP2013183017A (ja) 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法

Country Status (2)

Country Link
US (1) US20130230805A1 (enExample)
JP (1) JP2013183017A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6426984B2 (ja) * 2014-11-18 2018-11-21 キヤノン株式会社 リソグラフィ装置および物品製造方法
US9892885B2 (en) * 2016-03-24 2018-02-13 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004349515A (ja) * 2003-05-23 2004-12-09 Hitachi High-Technologies Corp Ｓｅｍ式外観検査装置，レビュー装置、およびアライメント座標設定方法
US7332729B1 (en) * 2004-06-18 2008-02-19 Novelx, Inc. System and method for multiple electron, ion, and photon beam alignment
TWI368973B (en) * 2008-09-24 2012-07-21 Ind Tech Res Inst Package and substrate structure with alignment pattern and analysis method about its yield
JP5506560B2 (ja) * 2010-06-18 2014-05-28 キヤノン株式会社 描画装置及びデバイス製造方法

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