JP2013113583A - 分光器 - Google Patents

分光器 Download PDF

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Publication number
JP2013113583A
JP2013113583A JP2011256775A JP2011256775A JP2013113583A JP 2013113583 A JP2013113583 A JP 2013113583A JP 2011256775 A JP2011256775 A JP 2011256775A JP 2011256775 A JP2011256775 A JP 2011256775A JP 2013113583 A JP2013113583 A JP 2013113583A
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JP
Japan
Prior art keywords
light
slit
wavelength
zero
etching
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Pending
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JP2011256775A
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English (en)
Japanese (ja)
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JP2013113583A5 (enExample
Inventor
Tomomitsu Kobayashi
智光 小林
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Shimadzu Corp
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Shimadzu Corp
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Priority to JP2011256775A priority Critical patent/JP2013113583A/ja
Publication of JP2013113583A publication Critical patent/JP2013113583A/ja
Publication of JP2013113583A5 publication Critical patent/JP2013113583A5/ja
Pending legal-status Critical Current

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  • Spectrometry And Color Measurement (AREA)
  • Drying Of Semiconductors (AREA)
JP2011256775A 2011-11-24 2011-11-24 分光器 Pending JP2013113583A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011256775A JP2013113583A (ja) 2011-11-24 2011-11-24 分光器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011256775A JP2013113583A (ja) 2011-11-24 2011-11-24 分光器

Publications (2)

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JP2013113583A true JP2013113583A (ja) 2013-06-10
JP2013113583A5 JP2013113583A5 (enExample) 2014-07-03

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JP2011256775A Pending JP2013113583A (ja) 2011-11-24 2011-11-24 分光器

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JP (1) JP2013113583A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105938013A (zh) * 2016-04-20 2016-09-14 杭州远方光电信息股份有限公司 一种光谱仪及其校正方法
CN112213272A (zh) * 2019-07-10 2021-01-12 中微半导体设备(上海)股份有限公司 一种光谱检测设备、终点检测系统和方法
CN118882818A (zh) * 2024-07-16 2024-11-01 广东中科谛听科技有限公司 一种用于光谱仪的光学强度监测与校正装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190731A (ja) * 1982-04-30 1983-11-07 Shimadzu Corp パツシエンルンゲ形分光器
JPH0562944A (ja) * 1991-09-05 1993-03-12 Olympus Optical Co Ltd プラズマエツチヤーのエンドポイント検出装置
JPH0562943A (ja) * 1991-09-02 1993-03-12 Olympus Optical Co Ltd プラズマエツチヤーのエンドポイント検出装置
JPH06109538A (ja) * 1992-09-30 1994-04-19 Shimadzu Corp 分光分析装置
JPH0815012A (ja) * 1994-06-27 1996-01-19 Ando Electric Co Ltd 光スペクトル測定装置
JPH08316218A (ja) * 1995-05-20 1996-11-29 Tokyo Electron Ltd プラズマエッチング装置
JP2003214951A (ja) * 2002-01-28 2003-07-30 Matsushita Electric Works Ltd 分光計測装置及び分光計測方法
JP2006201127A (ja) * 2005-01-24 2006-08-03 Maki Mfg Co Ltd 分光装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190731A (ja) * 1982-04-30 1983-11-07 Shimadzu Corp パツシエンルンゲ形分光器
JPH0562943A (ja) * 1991-09-02 1993-03-12 Olympus Optical Co Ltd プラズマエツチヤーのエンドポイント検出装置
JPH0562944A (ja) * 1991-09-05 1993-03-12 Olympus Optical Co Ltd プラズマエツチヤーのエンドポイント検出装置
JPH06109538A (ja) * 1992-09-30 1994-04-19 Shimadzu Corp 分光分析装置
JPH0815012A (ja) * 1994-06-27 1996-01-19 Ando Electric Co Ltd 光スペクトル測定装置
JPH08316218A (ja) * 1995-05-20 1996-11-29 Tokyo Electron Ltd プラズマエッチング装置
JP2003214951A (ja) * 2002-01-28 2003-07-30 Matsushita Electric Works Ltd 分光計測装置及び分光計測方法
JP2006201127A (ja) * 2005-01-24 2006-08-03 Maki Mfg Co Ltd 分光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105938013A (zh) * 2016-04-20 2016-09-14 杭州远方光电信息股份有限公司 一种光谱仪及其校正方法
CN112213272A (zh) * 2019-07-10 2021-01-12 中微半导体设备(上海)股份有限公司 一种光谱检测设备、终点检测系统和方法
CN112213272B (zh) * 2019-07-10 2024-01-12 中微半导体设备(上海)股份有限公司 一种光谱检测设备、终点检测系统和方法
CN118882818A (zh) * 2024-07-16 2024-11-01 广东中科谛听科技有限公司 一种用于光谱仪的光学强度监测与校正装置

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