JP2013113583A5 - - Google Patents

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Publication number
JP2013113583A5
JP2013113583A5 JP2011256775A JP2011256775A JP2013113583A5 JP 2013113583 A5 JP2013113583 A5 JP 2013113583A5 JP 2011256775 A JP2011256775 A JP 2011256775A JP 2011256775 A JP2011256775 A JP 2011256775A JP 2013113583 A5 JP2013113583 A5 JP 2013113583A5
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JP
Japan
Prior art keywords
light
slit
slit portion
spectroscopic
size
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JP2011256775A
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English (en)
Japanese (ja)
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JP2013113583A (ja
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Priority to JP2011256775A priority Critical patent/JP2013113583A/ja
Priority claimed from JP2011256775A external-priority patent/JP2013113583A/ja
Publication of JP2013113583A publication Critical patent/JP2013113583A/ja
Publication of JP2013113583A5 publication Critical patent/JP2013113583A5/ja
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JP2011256775A 2011-11-24 2011-11-24 分光器 Pending JP2013113583A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011256775A JP2013113583A (ja) 2011-11-24 2011-11-24 分光器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011256775A JP2013113583A (ja) 2011-11-24 2011-11-24 分光器

Publications (2)

Publication Number Publication Date
JP2013113583A JP2013113583A (ja) 2013-06-10
JP2013113583A5 true JP2013113583A5 (enExample) 2014-07-03

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ID=48709264

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JP2011256775A Pending JP2013113583A (ja) 2011-11-24 2011-11-24 分光器

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JP (1) JP2013113583A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105938013B (zh) * 2016-04-20 2019-12-17 杭州远方光电信息股份有限公司 一种光谱仪及其校正方法
CN112213272B (zh) * 2019-07-10 2024-01-12 中微半导体设备(上海)股份有限公司 一种光谱检测设备、终点检测系统和方法
CN118882818A (zh) * 2024-07-16 2024-11-01 广东中科谛听科技有限公司 一种用于光谱仪的光学强度监测与校正装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190731A (ja) * 1982-04-30 1983-11-07 Shimadzu Corp パツシエンルンゲ形分光器
JP3035388B2 (ja) * 1991-09-02 2000-04-24 オリンパス光学工業株式会社 プラズマエッチャーのエンドポイント検出装置
JP3043129B2 (ja) * 1991-09-05 2000-05-22 オリンパス光学工業株式会社 プラズマエッチャーのエンドポイント検出装置
JPH06109538A (ja) * 1992-09-30 1994-04-19 Shimadzu Corp 分光分析装置
JP3912801B2 (ja) * 1994-06-27 2007-05-09 横河電機株式会社 光スペクトル測定装置
JP3193265B2 (ja) * 1995-05-20 2001-07-30 東京エレクトロン株式会社 プラズマエッチング装置
JP2003214951A (ja) * 2002-01-28 2003-07-30 Matsushita Electric Works Ltd 分光計測装置及び分光計測方法
JP2006201127A (ja) * 2005-01-24 2006-08-03 Maki Mfg Co Ltd 分光装置

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