JP2013079847A - Substrate inspection apparatus and substrate inspection method - Google Patents

Substrate inspection apparatus and substrate inspection method Download PDF

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JP2013079847A
JP2013079847A JP2011219297A JP2011219297A JP2013079847A JP 2013079847 A JP2013079847 A JP 2013079847A JP 2011219297 A JP2011219297 A JP 2011219297A JP 2011219297 A JP2011219297 A JP 2011219297A JP 2013079847 A JP2013079847 A JP 2013079847A
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substrate
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micro
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JP5928771B2 (en
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Tomokazu Kiuchi
智一 木内
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Olympus Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus which performs both macro inspection and micro inspection as a single apparatus, achieving footprint saving and reduction in cycle time.SOLUTION: A substrate inspection apparatus 1 of the present invention includes: a substrate mount unit 2 over which a substrate G to be inspected is mounted, and which has a flotation plate 6 for causing the substrate G to be floated by discharging gas from a discharge port 61; a micro inspection unit 3 which performs micro inspection on the substrate G; a substrate transfer unit 4 which transfers the substrate G floated over the substrate mount unit 2; a macro inspection holder 5 which is provided to go up and down with respect to the substrate mount unit 2, and which holds the substrate G floated over the substrate mount unit 2 while allowing the substrate G to be tilted to stand with respect to an upper surface of the substrate mount unit 2; and a macro illumination unit 15 which illuminates a surface of the substrate G held by the macro inspection holder 5. The macro inspection holder 5 rotates about a rotation axis which is parallel to a transfer direction in which the substrate G is transferred by the substrate transfer unit 4.

Description

本発明は、大型ガラス基板の検査装置および基板検査方法に関する。   The present invention relates to a large glass substrate inspection apparatus and a substrate inspection method.

近年、液晶ディスプレイ(LCD)やプラズマディスプレイ(PDP)等のフラットパネルディスプレイ(FPD)に使用するガラス基板(以下、基板という)の外観の検査として、基板全体を目視により観察するマクロ検査と、顕微鏡やCCD等を用いて微視的に検査するミクロ検査が行われている。基板の大型化に伴い、マクロ検査装置およびミクロ検査装置も大型化するため、省フットプリント可能な検査装置が種々開発されている。   In recent years, as a visual inspection of a glass substrate (hereinafter referred to as a substrate) used in a flat panel display (FPD) such as a liquid crystal display (LCD) or a plasma display (PDP), a macro inspection for visually observing the entire substrate, and a microscope In addition, micro-inspection is performed by microscopic inspection using a CCD or the like. Along with the increase in size of the substrate, the macro inspection apparatus and the micro inspection apparatus are also increased in size, and various inspection apparatuses capable of footprint saving have been developed.

例えば、下記特許文献1に記載の基板検査装置は、マクロ検査とミクロ検査とが行える兼用装置であって、基板の浮上ステージを有し、浮上搬送された基板をミクロ検査する検査ヘッドと、マクロ検査に適した角度に基板を回動することが可能なマクロ検査用ステージとを備える。   For example, the substrate inspection apparatus described in Patent Document 1 below is a dual-purpose apparatus that can perform macro inspection and micro inspection, and has a substrate floating stage, a micro inspection head that has been floated and conveyed, and a macro And a macro inspection stage capable of rotating the substrate at an angle suitable for inspection.

特開2007−278715号公報JP 2007-278715 A

上述した特許文献1に記載の技術において、搬入された基板を搬送部によりマクロ検査用ステージまで搬送し、マクロフレームで基板を持ち替えた後マクロ検査を行い、再度搬送部によりミクロ検査ステージまで基板を搬送後、ミクロ検査を行なう。この検査装置では、基板の搬送方向に対して垂直であり、かつ搬送面と平行な回動軸を中心として、この軸に基板の短手方向の一端をあわせた状態で基板を回動する。このため装置上部に基板の長手方向を立ち上げるための空間を要することとなる。   In the technique described in Patent Document 1 described above, the carried substrate is transported to the macro inspection stage by the transport unit, the macro inspection is performed after the substrate is changed by the macro frame, and the substrate is again moved to the micro inspection stage by the transport unit. After transport, micro inspection is performed. In this inspection apparatus, the substrate is rotated around a rotation axis that is perpendicular to the conveyance direction of the substrate and parallel to the conveyance surface, with one end in the short direction of the substrate aligned with this axis. For this reason, a space for raising the longitudinal direction of the substrate is required in the upper part of the apparatus.

また、基板を搬入する際の基板搬入領域が必要となるため、省フットプリントの効果は小さく、基板の持ち替えに要する時間が長くなるという問題を有する。   Further, since a substrate carry-in area is required when carrying the substrate, the effect of saving footprint is small, and there is a problem that the time required for changing the substrate becomes long.

本発明は、上記に鑑みてなされたものであって、マクロ検査とミクロ検査とを行う検査装置であって、省スペースかつ省フットプリントが図れるだけでなく、タクトタイムの短縮化が可能な基板検査装置を提供することを目的とする。   The present invention has been made in view of the above, and is an inspection apparatus that performs macro inspection and micro inspection, and not only can save space and footprint, but also can reduce tact time. An object is to provide an inspection device.

上述した課題を解決し、目的を達成するために、本発明に係る基板検査装置は、検査する基板を載置し、吐出口から気体を吐出させて該基板を浮上させる機構を有する基板載置部と、前記基板をミクロ検査するミクロ検査部と、前記基板載置部上に浮上した前記基板を搬送する基板搬送部と、前記基板載置部に対して出没可能に設けられ、前記基板載置部上に浮上した前記基板を前記基板載置部の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダと、前記マクロ検査用ホルダで保持された前記基板の表面を照明するマクロ照明部と、を備え、前記マクロ検査用ホルダは、前記基板搬送部による搬送方向と平行な回動軸を中心に回動することを特徴とする。   In order to solve the above-described problems and achieve the object, a substrate inspection apparatus according to the present invention has a mechanism for mounting a substrate to be inspected and discharging a gas from a discharge port to float the substrate. A substrate inspection unit for microinspecting the substrate, a substrate transport unit for transporting the substrate levitated on the substrate mounting unit, and a substrate mounting unit that can be moved in and out of the substrate mounting unit. A macro inspection holder that holds the substrate floating on the mounting portion in a state where it is tilted with respect to the upper surface of the substrate mounting portion, and illuminates the surface of the substrate held by the macro inspection holder. A macro illumination unit, wherein the macro inspection holder rotates about a rotation axis parallel to a transport direction by the substrate transport unit.

また、本発明の基板検査装置は、上記発明において、前記基板搬送部は、前記基板載置部の端部であって基板の搬送方向と平行な端部に設けられ、前記マクロ検査用ホルダの回動軸は、前記基板載置部の端部であって基板の搬送方向と平行な端部であり、かつ前記基板搬送部が設けられる端部とは異なる端部に設けられることを特徴とする。   In the substrate inspection apparatus of the present invention, in the above invention, the substrate transport section is provided at an end portion of the substrate placement section and parallel to the substrate transport direction, and the macro inspection holder The pivot shaft is provided at an end portion of the substrate mounting portion which is an end portion parallel to the substrate transport direction and is different from an end portion where the substrate transport portion is provided. To do.

また、本発明の基板検査装置は、上記発明において、前記基板載置部は、前記ミクロ検査部に対して上流側に設けられ、前記基板を搬入する基板搬入領域を有し、前記マクロ検査用ホルダは、前記基板搬入領域に設けられることを特徴とする。   Further, the substrate inspection apparatus of the present invention is the above-described invention, wherein the substrate mounting portion is provided on the upstream side of the micro inspection portion, has a substrate carry-in region for carrying the substrate, and is used for the macro inspection. The holder is provided in the substrate carry-in area.

また、本発明の基板検査装置は、上記発明において、前記基板載置部は、前記ミクロ検査部に対して下流側に設けられ、前記基板を搬出する基板搬出領域を有することを特徴とする。   The substrate inspection apparatus of the present invention is characterized in that, in the above invention, the substrate mounting portion is provided on the downstream side with respect to the micro inspection portion, and has a substrate unloading region for unloading the substrate.

また、本発明の基板検査装置は、上記発明において、前記基板載置部は、前記ミクロ検査部に対して上流側に設けられ、前記基板を搬入する基板搬入領域と、前記ミクロ検査部に対して下流側に設けられ、前記基板を搬出する基板搬出領域と、を有し、前記マクロ検査用ホルダは、前記基板搬出領域に設けられることを特徴とする。   The substrate inspection apparatus according to the present invention is the substrate inspection apparatus according to the above-described invention, wherein the substrate placement unit is provided on the upstream side of the micro inspection unit, and a substrate loading area for loading the substrate and the micro inspection unit And a substrate unloading area for unloading the substrate, and the macro inspection holder is provided in the substrate unloading area.

また、本発明の基板検査方法は、検査する基板を載置し、吐出口から気体を吐出させて該基板を浮上させる機構を有する基板載置部と、前記基板をミクロ検査するミクロ検査部と、前記基板載置部上に浮上した前記基板を搬送する基板搬送部と、前記基板載置部に対して出没可能に設けられ、前記基板載置部上に浮上した前記基板を前記基板載置部の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダと、前記マクロ検査用ホルダで保持された前記基板の表面を照明するマクロ照明部と、を備える基板検査装置における基板検査方法であって、基板搬入領域に基板を搬入する搬入ステップと、基板保持部により前記基板を保持する第1基板保持ステップと、前記基板を前記基板搬送部によりミクロ検査部に搬送する第1搬送ステップと、前記基板をミクロ検査するミクロ検査ステップと、ミクロ検査終了後、前記基板搬送部により前記基板をマクロ検査用ホルダまで搬送する第2搬送ステップと、前記基板保持部による前記基板の保持を解除する第1保持解除ステップと、前記基板をマクロ検査用ホルダで保持する第2基板保持ステップと、前記基板をマクロ検査するマクロ検査ステップと、前記マクロ検査用ホルダによる前記基板の保持を解除する第2保持解除ステップと、前記第2保持解除ステップ後直ちに前記基板を搬出する搬出ステップと、を含むことを特徴とする。   In addition, the substrate inspection method of the present invention includes a substrate placement portion having a mechanism for placing a substrate to be inspected, causing gas to be discharged from a discharge port, and floating the substrate, and a micro inspection portion for microinspecting the substrate. A substrate transport unit that transports the substrate that has floated on the substrate platform; and a substrate transport unit that is provided so as to be capable of projecting and retracting relative to the substrate platform, and the substrate platform that has floated on the substrate platform Board inspection in a board inspection apparatus comprising: a macro inspection holder that is held in an inclined state with respect to the upper surface of the section; and a macro illumination section that illuminates the surface of the substrate held by the macro inspection holder A method for carrying a substrate into a substrate carry-in region, a first substrate holding step for holding the substrate by a substrate holding unit, and a first transfer for transferring the substrate to a micro inspection unit by the substrate transfer unit. The A micro-inspection step for micro-inspecting the substrate, a second transport step for transporting the substrate to a macro-inspection holder after the micro-inspection is completed, and holding the substrate by the substrate holder A first holding release step for releasing the substrate, a second substrate holding step for holding the substrate with a macro inspection holder, a macro inspection step for macro inspecting the substrate, and releasing the holding of the substrate by the macro inspection holder. A second holding release step, and an unloading step of unloading the substrate immediately after the second holding release step.

また、本発明の基板検査方法は、検査する基板を載置し、吐出口から気体を吐出させて該基板を浮上させる機構を有する基板載置部と、前記基板をミクロ検査するミクロ検査部と、前記基板載置部上に浮上した前記基板を搬送する基板搬送部と、前記基板載置部に対して出没可能に設けられ、前記基板載置部上に浮上した前記基板を前記基板載置部の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダと、前記マクロ検査用ホルダで保持された前記基板の表面を照明するマクロ照明部と、を備える基板検査装置における基板検査方法であって、基板搬入領域に基板を搬入する搬入ステップと、前記搬入ステップ後直ちに前記基板をマクロ検査用ホルダで保持する第1基板保持ステップと、前記基板をマクロ検査するマクロ検査ステップと、前記マクロ検査用ホルダによる前記基板の保持を解除する第1保持解除ステップと、基板保持部により前記基板を保持する第2基板保持ステップと、前記基板搬送部により前記基板をミクロ検査部に搬送する第1搬送ステップと、前記基板をミクロ検査するミクロ検査ステップと、ミクロ検査終了後、前記基板搬送部により前記基板を基板搬出領域まで搬送する第2搬送ステップと、前記基板保持部による前記基板の保持を解除する第2保持解除ステップと、前記基板を搬出する搬出ステップと、を含むことを特徴とする。   In addition, the substrate inspection method of the present invention includes a substrate placement portion having a mechanism for placing a substrate to be inspected, causing gas to be discharged from a discharge port, and floating the substrate, and a micro inspection portion for microinspecting the substrate. A substrate transport unit that transports the substrate that has floated on the substrate platform; and a substrate transport unit that is provided so as to be capable of projecting and retracting relative to the substrate platform, and the substrate platform that has floated on the substrate platform Board inspection in a board inspection apparatus comprising: a macro inspection holder that is held in an inclined state with respect to the upper surface of the section; and a macro illumination section that illuminates the surface of the substrate held by the macro inspection holder A method for carrying a substrate into a substrate carry-in area, a first substrate holding step for holding the substrate with a macro inspection holder immediately after the loading step, and a macro inspection for macro-inspecting the substrate. A first holding release step for releasing the holding of the substrate by the macro inspection holder, a second substrate holding step for holding the substrate by the substrate holding unit, and the micro inspection unit by the substrate transport unit. A first transporting step for transporting the substrate to the substrate, a microinspection step for microinspecting the substrate, a second transporting step for transporting the substrate to the substrate unloading region by the substrate transporting unit after completion of the microinspection, and the substrate holding unit. It includes a second holding release step for releasing the holding of the substrate, and a carrying out step for carrying out the substrate.

本発明の基板検査装置は、検査する基板を載置し、該基板を浮上させる機構を有する基板載置部内にマクロ検査用ホルダを収容し、マクロ検査時に、マクロ検査用ホルダにより前記基板を保持し、前記基板の搬送方向に対し平行な回動軸で基板が持ち上がるように回動することにより、基板検査装置の省フットプリントを図ることができる。   The substrate inspection apparatus of the present invention places a substrate to be inspected, accommodates a macro inspection holder in a substrate mounting portion having a mechanism for floating the substrate, and holds the substrate by the macro inspection holder during macro inspection Then, by rotating the substrate so that the substrate is lifted by a rotation axis parallel to the substrate transport direction, the footprint of the substrate inspection apparatus can be reduced.

図1は、本発明の実施の形態に係る基板検査装置の要部の構成を示す上面図である。FIG. 1 is a top view showing a configuration of a main part of a substrate inspection apparatus according to an embodiment of the present invention. 図2は、本発明の実施の形態に係る基板検査装置の要部の構成を示す一部側面図である。FIG. 2 is a partial side view showing the configuration of the main part of the substrate inspection apparatus according to the embodiment of the present invention. 図3は、図2に示す基板検査装置のA−A断面図である。3 is a cross-sectional view taken along the line AA of the substrate inspection apparatus shown in FIG. 図4は、本発明の実施の形態に係る基板検査装置のマクロ検査時の側面図である。FIG. 4 is a side view during macro inspection of the substrate inspection apparatus according to the embodiment of the present invention. 図5は、本発明の実施の形態に係る基板検査装置のマクロ検査時の側面図である。FIG. 5 is a side view of the substrate inspection apparatus according to the embodiment of the present invention during macro inspection. 図6は、本発明の実施の形態に係る基板検査装置内にマクロ検査用ホルダが収容された状態を示す斜視図である。FIG. 6 is a perspective view showing a state in which the macro inspection holder is accommodated in the substrate inspection apparatus according to the embodiment of the present invention. 図7は、本発明の実施の形態に係る基板検査装置のマクロ検査用ホルダを回動して持ち上げた状態を示す斜視図である。FIG. 7 is a perspective view showing a state in which the macro inspection holder of the substrate inspection apparatus according to the embodiment of the present invention is rotated and lifted. 図8は、本発明の実施の形態に係る基板検査装置における基板検査工程のフローチャートである。FIG. 8 is a flowchart of a substrate inspection process in the substrate inspection apparatus according to the embodiment of the present invention. 図9は、図8のフローチャートの基板搬入工程のフローチャートである。FIG. 9 is a flowchart of the substrate carrying-in process in the flowchart of FIG. 図10は、図8のマクロ検査工程のフローチャートである。FIG. 10 is a flowchart of the macro inspection process of FIG. 図11は、本発明の実施の形態に係る基板検査装置における基板検査工程他の例のフローチャートである。FIG. 11 is a flowchart of another example of the substrate inspection process in the substrate inspection apparatus according to the embodiment of the present invention. 図12は、図11のフローチャートの基板搬入工程のフローチャートである。FIG. 12 is a flowchart of the substrate carrying-in process in the flowchart of FIG. 図13は、図11のマクロ検査工程のフローチャートである。FIG. 13 is a flowchart of the macro inspection process of FIG. 図14は、本発明の実施の形態の変形例に係る基板検査装置の要部の構成を示す上面図である。FIG. 14 is a top view showing a configuration of a main part of a substrate inspection apparatus according to a modification of the embodiment of the present invention.

以下、添付図面を参照して、本発明を実施するための形態(以下、「実施の形態」という)を説明する。なお、以下の説明で参照する図面は模式的なものであって、同じ物体を異なる図面で示す場合には、寸法や縮尺等が異なる場合もある。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention (hereinafter referred to as “embodiments”) will be described with reference to the accompanying drawings. Note that the drawings referred to in the following description are schematic, and when the same object is shown in different drawings, dimensions, scales, and the like may be different.

(実施の形態)
図1は、本発明の実施の形態に係る基板検査装置1の要部の構成を示す上面図である。図2は、本発明の実施の形態に係る基板検査装置1の要部の構成を示す一部側面図である。図3は、図2に示す基板検査装置1のA−A断面図である。図4は、本発明の実施の形態に係る基板検査装置1のマクロ検査時の側面図である。図5は、本発明の実施の形態に係る基板検査装置1のマクロ検査時の側面図である。図6は、本発明の実施の形態に係る基板検査装置1内にマクロ検査用ホルダ5が収容された状態を示す斜視図である。図7は、本発明の実施の形態に係る基板検査装置1のマクロ検査用ホルダ5を回動して持ち上げた状態を示す斜視図である。なお、図6および図7においては、エアを吐出する吐出口は省略している。図1〜図5に示す基板検査装置1は、LCDやPDP等のFPDに使用する矩形状の基板Gを浮上させながら搬送してミクロ検査およびマクロ検査を行う検査装置である。
(Embodiment)
FIG. 1 is a top view showing a configuration of a main part of a substrate inspection apparatus 1 according to an embodiment of the present invention. FIG. 2 is a partial side view showing the configuration of the main part of the substrate inspection apparatus 1 according to the embodiment of the present invention. 3 is a cross-sectional view taken along the line AA of the substrate inspection apparatus 1 shown in FIG. FIG. 4 is a side view of the substrate inspection apparatus 1 according to the embodiment of the present invention during macro inspection. FIG. 5 is a side view of the substrate inspection apparatus 1 according to the embodiment of the present invention during macro inspection. FIG. 6 is a perspective view showing a state in which the macro inspection holder 5 is accommodated in the substrate inspection apparatus 1 according to the embodiment of the present invention. FIG. 7 is a perspective view showing a state in which the macro inspection holder 5 of the board inspection apparatus 1 according to the embodiment of the present invention is rotated and lifted. 6 and 7, the discharge port for discharging air is omitted. A substrate inspection apparatus 1 shown in FIGS. 1 to 5 is an inspection apparatus that performs a micro inspection and a macro inspection by transporting a rectangular substrate G used for an FPD such as an LCD or a PDP while floating.

基板検査装置1は、基板Gを載置する基板載置部2と、基板Gをミクロ検査するミクロ検査機器3と、基板Gを搬送する基板搬送部4と、基板Gを基板載置部2の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダ5と、基板Gをマクロ照明するマクロ照明部15と、を備える。   The substrate inspection apparatus 1 includes a substrate placement unit 2 for placing a substrate G, a micro inspection device 3 for micro-inspecting the substrate G, a substrate transport unit 4 for transporting the substrate G, and a substrate placement unit 2 for transporting the substrate G. A macro-inspection holder 5 that is held in a state where it is tilted with respect to the upper surface, and a macro illumination unit 15 that macro-illuminates the substrate G.

基板載置部2は、図示しないリフター等の基板搬入ロボットにより搬入された検査用の基板Gを載置する基板搬入領域21と、ミクロ検査機器3により基板Gをミクロ検査する基板検査領域22と、からなる。本実施の形態では、基板搬入領域21は、搬入された基板Gを受け取る搬入領域であるとともに、マクロ検査用ホルダ5を収容するマクロ検査用ホルダ収容部であり、また検査が終了した基板Gをリフター等の基板搬出ロボットにより搬出する基板搬出領域でもある。   The substrate platform 2 includes a substrate carry-in area 21 on which an inspection substrate G carried by a substrate carry-in robot such as a lifter (not shown) is placed, and a substrate inspection area 22 in which the substrate G is micro-inspected by the micro-inspection device 3. It consists of In the present embodiment, the substrate carry-in region 21 is a carry-in region that receives the loaded substrate G, and is a macro inspection holder accommodating portion that accommodates the macro inspection holder 5. It is also a substrate unloading area for unloading by a substrate unloading robot such as a lifter.

基板載置部2の基板載置面pには、基板Gの下方から基板Gの下面に向けて気体を吐出することによって基板Gを浮上させる複数の浮上プレート6が設けられる。浮上プレート6は、基板Gの搬送方向Xに沿って細長い帯状をなして延びている。複数の浮上プレート6は、互いに平行であり、かつ互いの高さが等しい状態で基板載置部2に取り付けられている。浮上プレート6には、上面に開口を有し、気体を上方へ吐出する複数の吐出孔61が、全面にわたってほぼ均一に設けられている。吐出孔61から吐出される気体は、例えばクリーンドライエアであり、吐出孔61から吐出された気体により基板載置面pから基板Gを浮上させた状態で、基板搬送部4が基板Gを保持して基板載置部2上を搬送する。   The substrate placement surface p of the substrate platform 2 is provided with a plurality of floating plates 6 that float the substrate G by discharging gas from below the substrate G toward the lower surface of the substrate G. The levitation plate 6 extends in a strip shape along the transport direction X of the substrate G. The plurality of floating plates 6 are attached to the substrate platform 2 in parallel with each other and at the same height. The levitation plate 6 has openings on the upper surface, and a plurality of discharge holes 61 for discharging gas upward are provided substantially uniformly over the entire surface. The gas discharged from the discharge hole 61 is, for example, clean dry air, and the substrate transport unit 4 holds the substrate G in a state where the substrate G is levitated from the substrate placement surface p by the gas discharged from the discharge hole 61. Then, it is transported on the substrate platform 2.

基板搬入領域21の浮上プレート6には、複数のリフトピン7が昇降するための孔部71が設けられる。リフトピン7は、基板載置面pから昇降可能に設けられ、基板Gの搬入時および搬出時に上昇することにより、搬入出時の基板Gとの接触を低減して基板Gへの傷の発生を防止する。リフトピン7は、基板搬送部4による基板Gの搬送の際は、基板載置面pより下降される。   The floating plate 6 in the substrate carry-in area 21 is provided with a hole 71 for lifting and lowering the plurality of lift pins 7. The lift pins 7 are provided so as to be movable up and down from the substrate placement surface p, and are lifted when the substrate G is loaded and unloaded, thereby reducing contact with the substrate G during loading and unloading and causing damage to the substrate G. To prevent. The lift pins 7 are lowered from the substrate placement surface p when the substrate transport unit 4 transports the substrate G.

基板搬入領域21には、マクロ検査用ホルダ5が収容されている。マクロ検査用ホルダ5は、基板載置部2(基板搬入領域21)に対して出没可能に設けられ、基板載置部2に載置された基板Gを基板載置部2の載置面pに対して傾斜して起こした状態で保持する。基板搬入領域21上の浮上プレート6には、基板搬入領域21内でマクロ検査用ホルダ5が出没可能とする溝部が形成される。マクロ検査用ホルダ5は、基板支持部(縦)51と、基板支持部51に井桁状に嵌合されて基板を保持する基板支持部(横)52と、基板支持部(横)52上に設けられ、図示しない吸引部により吸引することにより基板Gを吸着する吸着部53と、マクロ検査用ホルダ5を回動する回動軸54と、基板支持部(縦)51と基板支持部(横)52とからなるホルダ本体部を、回動軸54を介して支持するホルダ支持部55と、マクロ検査用ホルダ5を回動する駆動部56と、駆動部56と連結されてホルダを立ち上げる連結部57とを備える。マクロ検査用ホルダ5の回動軸54は、基板載置部2の端部であって基板の搬送方向Xと平行な端部であり、かつ基板搬送部4が設けられる端部とは異なる端部に設けられる。マクロ検査用ホルダ5は、基板搬送部4による搬送方向Xと平行な回動軸54を中心に回動する。   The substrate carrying-in area 21 accommodates the macro inspection holder 5. The macro inspection holder 5 is provided so as to be able to appear and retract with respect to the substrate platform 2 (substrate carry-in region 21), and the substrate G placed on the substrate platform 2 is placed on the placement surface p of the substrate platform 2. Hold in a state where it is tilted with respect to. The floating plate 6 on the substrate carry-in area 21 is formed with a groove portion in which the macro inspection holder 5 can be moved in and out in the substrate carry-in area 21. The macro inspection holder 5 includes a substrate support portion (vertical) 51, a substrate support portion (horizontal) 52 that is fitted in a cross-beam shape to the substrate support portion 51 and holds the substrate, and a substrate support portion (horizontal) 52. An adsorbing portion 53 that adsorbs the substrate G by being sucked by a sucking portion (not shown), a rotating shaft 54 that rotates the macro inspection holder 5, a substrate supporting portion (vertical) 51, and a substrate supporting portion (horizontal). ) 52, the holder main body 55 that supports the holder main body 55 via the rotation shaft 54, the drive section 56 that rotates the macro inspection holder 5, and the drive section 56 that is connected to the holder. And a connecting portion 57. The rotation axis 54 of the macro inspection holder 5 is an end portion of the substrate platform 2 that is parallel to the substrate transport direction X and is different from the end portion on which the substrate transport portion 4 is provided. Provided in the section. The macro inspection holder 5 rotates around a rotation shaft 54 parallel to the conveyance direction X by the substrate conveyance unit 4.

駆動部56は、ボールねじ等により構成され、マクロ検査時にねじ軸を回転駆動することにより駆動部56のナットを上昇させ、ナットと連結された連結部57を介して、マクロ検査用ホルダ5を、目視によるマクロ検査に適した角度θまで回動軸54を軸として回動して基板Gを持ち上げる。角度θは、マクロ検査の種類や検査者20に応じて、図示しない入力部により変更することができる。   The drive unit 56 is configured by a ball screw or the like, and the nut of the drive unit 56 is raised by rotationally driving the screw shaft during macro inspection, and the macro inspection holder 5 is moved through the connection unit 57 connected to the nut. Then, the substrate G is lifted by rotating about the rotation shaft 54 to an angle θ suitable for visual macro inspection. The angle θ can be changed by an input unit (not shown) according to the type of macro inspection and the inspector 20.

ミクロ検査領域22には、基板載置部2を搬送方向Xと直交する方向Yに跨いで門型アーム8が設置され、門型アーム8に、顕微鏡、ラインセンサまたはCCDカメラ等のミクロ検査機器3が設けられる。ミクロ検査機器3は、門型アーム8上を基板Gの搬送方向と直行するY方向に移動可能な移動機構(図示せず)により移動可能である。   In the micro inspection region 22, a gate arm 8 is installed across the substrate platform 2 in a direction Y orthogonal to the transport direction X, and a micro inspection device such as a microscope, a line sensor, or a CCD camera is installed on the gate arm 8. 3 is provided. The micro-inspection device 3 can be moved by a moving mechanism (not shown) that can move on the portal arm 8 in the Y direction perpendicular to the transport direction of the substrate G.

基板搬送部4は、基板載置部2の端部であって、基板Gの搬送方向と平行(矢印X方向)な端部に設けられる。また、基板搬送部4が設置される基板載置部2の端部は、マクロ検査用ホルダ5の回動軸54が設置される端面と対向している。基板搬送部4は、基板Gの搬送方向Xに沿って直線的に延びるレール40と、レール40上を搬送方向に沿って駆動する駆動部41と、駆動部41の上面に、昇降部42を介して取り付けられて基板Gの端部を吸着する複数の基板保持部43とを有する。駆動部41は、リニアモータや、ベルト、ボールネジ、ラック・アンド・ピニオンなどにより構成されるが、等速性に優れるリニアモータを使用することが好ましい。   The substrate transport unit 4 is an end of the substrate platform 2 and is provided at an end parallel to the transport direction of the substrate G (arrow X direction). Further, the end portion of the substrate platform 2 where the substrate transport unit 4 is installed faces the end surface where the rotation shaft 54 of the macro inspection holder 5 is installed. The substrate transport unit 4 includes a rail 40 that extends linearly along the transport direction X of the substrate G, a drive unit 41 that drives the rail 40 along the transport direction, and an elevating unit 42 on the upper surface of the drive unit 41. And a plurality of substrate holding portions 43 that attract the end portions of the substrate G. The drive unit 41 includes a linear motor, a belt, a ball screw, a rack and pinion, and the like, but it is preferable to use a linear motor that is excellent in constant velocity.

マクロ照明部15は、マクロ検査用ホルダ5の上方に位置し、マクロ検査用の照明光を照明するマクロ照明光源9と、このマクロ照明光源9から出射される照明光を下方に向ける反射ミラー10と、この反射ミラー10により反射した照明光を収束させる収束レンズとしてのフレネルレンズ11と、このフレネルレンズ11により収束された照明光を透過させる透明な状態及び照明光を散乱させる不透明状態に切替える液晶散乱板12とを備える。マクロ照明光源9は、基板G全体をマクロ検査するために基板の搬送方向Xに移動可能な構成としてもよく、または基板G全体を照明できれば複数個備えていてもよい。   The macro illumination unit 15 is positioned above the macro inspection holder 5, and is a macro illumination light source 9 that illuminates illumination light for macro inspection, and a reflection mirror 10 that directs illumination light emitted from the macro illumination light source 9 downward. A Fresnel lens 11 as a converging lens that converges the illumination light reflected by the reflecting mirror 10, and a liquid crystal that switches between a transparent state that transmits the illumination light converged by the Fresnel lens 11 and an opaque state that scatters the illumination light. And a scattering plate 12. The macro illumination light source 9 may be configured to be movable in the substrate transport direction X in order to macro-inspect the entire substrate G, or a plurality of macro illumination sources 9 may be provided as long as the entire substrate G can be illuminated.

続いて、図8〜図10を参照して、本実施の形態に係る基板検査装置1の基板検査工程を説明する。図8は、本発明の実施の形態に係る基板検査装置1における基板検査工程のフローチャートである。図9は、図8のフローチャートの基板搬入工程のフローチャートである。図10は、図8のマクロ検査工程のフローチャートである。   Subsequently, a substrate inspection process of the substrate inspection apparatus 1 according to the present embodiment will be described with reference to FIGS. FIG. 8 is a flowchart of the substrate inspection process in the substrate inspection apparatus 1 according to the embodiment of the present invention. FIG. 9 is a flowchart of the substrate carrying-in process in the flowchart of FIG. FIG. 10 is a flowchart of the macro inspection process of FIG.

まず、リフターにより検査する基板Gを基板搬入領域21に搬入する(ステップS101)。   First, the substrate G to be inspected by the lifter is carried into the substrate carry-in area 21 (step S101).

基板Gの搬入は、図9の工程で行われる。まず、リフトピン7を上昇して(ステップS201)、リフターにより検査する基板Gを基板搬入領域21に搬入する(ステップS202)。続いて、吐出口61からエアを吐出させ(ステップS203)、リフトピン7を降下して(ステップS204)、吐出されたエアにより基板Gを基板載置部2上に浮上させる。浮上された基板Gを位置決め機構により位置決めをした後(ステップS205)、基板搬送部4の昇降部42を上昇させるとともに、吸引口44を吸引して、基板保持部43により基板Gを密着保持する(ステップS206)。   The board | substrate G is carried in in the process of FIG. First, the lift pins 7 are raised (step S201), and the substrate G to be inspected by the lifter is carried into the substrate carry-in area 21 (step S202). Subsequently, air is discharged from the discharge port 61 (step S203), the lift pin 7 is lowered (step S204), and the substrate G is floated on the substrate platform 2 by the discharged air. After the floating substrate G is positioned by the positioning mechanism (step S205), the elevating unit 42 of the substrate transport unit 4 is raised, the suction port 44 is sucked, and the substrate holding unit 43 holds the substrate G closely. (Step S206).

基板保持部43により基板Gを保持した後、駆動部41の駆動により基板搬送部4は基板Gをミクロ検査領域22に搬送する(ステップS102)。   After holding the substrate G by the substrate holding unit 43, the substrate transport unit 4 transports the substrate G to the micro inspection region 22 by driving of the drive unit 41 (step S102).

ミクロ検査領域22のミクロ検査機器3の下まで運ばれた基板Gについて、ミクロ検査機器3によりミクロ検査を行う(ステップS103)。ミクロ検査機器3を、門型アーム8に沿って移動させ、かつ基板搬送部4により基板Gを進行方法に移動させることにより、基板G全体をミクロ検査する。   Micro inspection is performed by the micro inspection device 3 on the substrate G transported to the bottom of the micro inspection device 3 in the micro inspection region 22 (step S103). The micro inspection apparatus 3 is moved along the gate-shaped arm 8 and the substrate G is moved in the advancing method by the substrate transfer unit 4 so that the entire substrate G is micro-inspected.

ミクロ検査終了後、基板搬送部4はミクロ検査が終了した基板Gをマクロ検査用ホルダ5上まで搬送する(ステップS104)。   After completion of the micro inspection, the substrate transport unit 4 transports the substrate G on which the micro inspection has been completed onto the macro inspection holder 5 (step S104).

基板搬送部4により基板Gがマクロ検査用ホルダ5上に搬送された後、マクロ照明部15により基板Gに照明してマクロ検査を行う(ステップS105)。   After the substrate G is transferred onto the macro inspection holder 5 by the substrate transfer unit 4, the macro illumination unit 15 illuminates the substrate G to perform the macro inspection (step S105).

マクロ検査は、図10の工程で行われる。まず、基板保持部43による基板Gの保持が解除される(ステップS301)。基板保持部43による基板Gの保持解除は、吸引口44の吸引を停止するとともに、昇降部42を下降させることにより行う。基板保持部43による保持が解除された基板Gは、吐出口61から吐出されているエアにより、基板載置面pから浮上する。   The macro inspection is performed in the process of FIG. First, the holding of the substrate G by the substrate holding unit 43 is released (step S301). Release of the holding of the substrate G by the substrate holding unit 43 is performed by stopping the suction of the suction port 44 and lowering the lifting unit 42. The substrate G released from being held by the substrate holding unit 43 is levitated from the substrate placement surface p by the air discharged from the discharge port 61.

続いて、駆動部56の駆動により、マクロ検査用ホルダ5を水平位置(基板載置面pから基板Gが浮上する位置)まで回動し(ステップS302)、吸着部53を吸着して基板Gを密着保持する(ステップS303)。   Subsequently, by driving the drive unit 56, the macro inspection holder 5 is rotated to a horizontal position (a position where the substrate G floats from the substrate placement surface p) (step S302), and the adsorption unit 53 is adsorbed to the substrate G. Is held in close contact (step S303).

その後、駆動部56の駆動により、マクロ検査用ホルダ5を検査位置まで回動して基板Gを持ち上げる(ステップS304)。   Thereafter, the driving unit 56 drives the macro inspection holder 5 to the inspection position to lift the substrate G (step S304).

検査位置まで持ち上げられた基板Gに、マクロ照明部15により照明光を照射して、検査者20は基板Gをマクロ検査する(ステップS305)。   The substrate G lifted up to the inspection position is irradiated with illumination light by the macro illumination unit 15, and the inspector 20 performs a macro inspection of the substrate G (step S305).

マクロ検査終了後、駆動部56の駆動により、マクロ検査用ホルダ5を水平位置(基板載置面pから基板Gが浮上する位置)まで回動する(ステップS306)。   After completion of the macro inspection, the macro inspection holder 5 is rotated to a horizontal position (position where the substrate G floats from the substrate placement surface p) by driving the drive unit 56 (step S306).

マクロ検査用ホルダ5を水平位置まで回動後、吸着部53の吸引を停止して、吸着部53による基板Gの保持を解除する(ステップS307)。吸着部53により保持が解除された基板Gは、吐出口61から吐出されているエアにより、基板載置面pから浮上する。   After rotating the macro inspection holder 5 to the horizontal position, the suction of the suction portion 53 is stopped, and the holding of the substrate G by the suction portion 53 is released (step S307). The substrate G released from being held by the suction unit 53 floats from the substrate placement surface p by the air discharged from the discharge port 61.

基板Gの保持を解除したマクロ検査用ホルダ5は、駆動部56の駆動により回動され、基板載置部2内に収容されて(ステップS308)、マクロ検査工程は終了する。   The macro inspection holder 5 from which the holding of the substrate G is released is rotated by the drive of the drive unit 56 and is accommodated in the substrate platform 2 (step S308), and the macro inspection process is completed.

浮上状態の基板Gを、リフトピン7を上昇させることによりリフトピン7で保持した後、リフター等により基板Gを搬出して基板検査工程を終了する(ステップS106)。   After the lifted substrate G is held by the lift pins 7 by lifting the lift pins 7, the substrate G is unloaded by a lifter or the like and the substrate inspection process is completed (step S106).

以上、本実施の形態にかかる基板検査装置1の基板検査工程について説明したが、基板検査装置1では、基板搬入後、マクロ検査を行い、その後ミクロ検査を行ってもよい。以下、図11〜図13を参照して、マクロ検査を先に行う基板検査工程について説明する。図11は、本発明の実施の形態に係る基板検査装置1における基板検査工程一例のフローチャートである。図12は、図11のフローチャートの基板搬入工程のフローチャートである。図13は、図11のマクロ検査工程のフローチャートである。   The substrate inspection process of the substrate inspection apparatus 1 according to the present embodiment has been described above. However, the substrate inspection apparatus 1 may perform a macro inspection after carrying in the substrate and then perform a micro inspection. Hereinafter, a substrate inspection process in which the macro inspection is performed first will be described with reference to FIGS. FIG. 11 is a flowchart of an example of a substrate inspection process in the substrate inspection apparatus 1 according to the embodiment of the present invention. FIG. 12 is a flowchart of the substrate carrying-in process in the flowchart of FIG. FIG. 13 is a flowchart of the macro inspection process of FIG.

まず、リフターにより検査する基板Gを基板搬入領域21に搬入する(ステップS401)。   First, the substrate G to be inspected by the lifter is carried into the substrate carry-in area 21 (step S401).

基板Gの搬入は、図12の工程で行われ、基板保持部43による基板Gの保持を除き、図9の基板搬入工程と同様の工程で行う。まず、リフトピン7を上昇して(ステップS501)、リフターにより検査する基板Gを基板搬入領域21に搬入し(ステップS502)、吐出口61からエアを吐出させて基板Gを浮上させる(ステップS503)。リフトピン7を降下して(ステップS504)、浮上された基板Gを位置決め機構により位置決めをして(ステップS505)、基板搬入工程を終了する。   The loading of the substrate G is performed in the process of FIG. 12 and is performed in the same process as the substrate loading process of FIG. 9 except for the holding of the substrate G by the substrate holding unit 43. First, the lift pins 7 are raised (step S501), the substrate G to be inspected by the lifter is carried into the substrate carry-in area 21 (step S502), air is discharged from the discharge port 61, and the substrate G is floated (step S503). . The lift pin 7 is lowered (step S504), the substrate G that has been levitated is positioned by the positioning mechanism (step S505), and the substrate carrying-in process is terminated.

基板Gの位置決め後、マクロ検査を行う(ステップS402)。   After positioning the substrate G, a macro inspection is performed (step S402).

マクロ検査は、図13の工程で行われ、基板保持部43による基板Gの保持解除を除き、図10のマクロ検査工程と同様の工程で行う。まず、駆動部56の駆動により、マクロ検査用ホルダ5を水平位置(基板載置面pから基板Gが浮上する位置)まで回動し(ステップS601)、基板載置面pから浮上している基板Gを、吸着部53を吸着することにより密着保持する(ステップS602)。   The macro inspection is performed in the process of FIG. 13, and is performed in the same process as the macro inspection process of FIG. 10 except for the release of the substrate G held by the substrate holder 43. First, by driving the drive unit 56, the macro inspection holder 5 is rotated to a horizontal position (a position where the substrate G floats from the substrate placement surface p) (step S601) and floats from the substrate placement surface p. The substrate G is held tightly by sucking the suction part 53 (step S602).

その後、駆動部56の駆動により、マクロ検査用ホルダ5を検査位置まで回動して基板Gを持ち上げ(ステップS603)、マクロ照明部15により基板Gに照明光を照射して、検査者20は基板Gをマクロ検査する(ステップS604)。   Thereafter, by driving the drive unit 56, the macro inspection holder 5 is rotated to the inspection position to lift the substrate G (step S603), the macro illumination unit 15 irradiates the substrate G with illumination light, and the inspector 20 The substrate G is macro-inspected (step S604).

マクロ検査終了後、駆動部56の駆動により、マクロ検査用ホルダ5を水平位置(基板載置面pから基板Gが浮上する位置)まで回動し(ステップS605)、吸着部53の吸引を停止して、吸着部53による基板Gの保持を解除する(ステップS606)。吸着部53により保持が解除された基板Gは、吐出口61から吐出されているエアにより、基板載置面pから浮上する。   After completion of the macro inspection, the drive unit 56 is driven to rotate the macro inspection holder 5 to a horizontal position (a position where the substrate G floats from the substrate mounting surface p) (step S605), and the suction of the suction unit 53 is stopped. Then, the holding of the substrate G by the suction unit 53 is released (step S606). The substrate G released from being held by the suction unit 53 floats from the substrate placement surface p by the air discharged from the discharge port 61.

基板Gの保持を解除したマクロ検査用ホルダ5は、駆動部56の駆動により回動され、基板載置部2内に収容されて(ステップS607)、マクロ検査工程は終了する。   The macro inspection holder 5 that has released the holding of the substrate G is rotated by the drive of the drive unit 56 and is accommodated in the substrate platform 2 (step S607), and the macro inspection process is completed.

マクロ検査終了後、基板搬送部4の昇降部42を上昇させるとともに、吸引口44を吸引して、基板保持部43により基板Gを密着保持し(ステップS403)、駆動部41の駆動により基板搬送部4は基板Gをミクロ検査領域22に搬送する(ステップS404)。   After completion of the macro inspection, the lifting unit 42 of the substrate transport unit 4 is raised, the suction port 44 is sucked, the substrate G is closely held by the substrate holding unit 43 (step S403), and the substrate is transported by driving of the drive unit 41. The unit 4 transports the substrate G to the micro inspection region 22 (step S404).

検査領域22のミクロ検査機器3の下まで運ばれた基板Gについて、ミクロ検査機器3によりミクロ検査を行い(ステップS405)、ミクロ検査終了後、基板搬送部4は基板Gを基板搬出領域でもある基板搬入領域21まで搬送する(ステップS406)。   The substrate G transported to the bottom of the micro inspection device 3 in the inspection region 22 is micro-inspected by the micro inspection device 3 (step S405). After the micro inspection is finished, the substrate transport unit 4 is also a substrate unloading region. The substrate is transferred to the substrate carry-in area 21 (step S406).

基板搬送部4により基板Gを基板搬入領域21に搬送した後、吸引口44の吸引を停止するとともに、昇降部42を下降させて、基板保持部43による基板Gの保持を解除し、保持が解除されて浮上状態の基板Gを、リフトピン7を上昇させることによりリフトピン7で保持した後、リフター等により基板Gを搬出して基板検査工程を終了する(ステップS407)。   After the substrate G is transported to the substrate carry-in area 21 by the substrate transport unit 4, the suction of the suction port 44 is stopped and the lifting / lowering unit 42 is lowered to release the holding of the substrate G by the substrate holding unit 43. After the lifted substrate G is lifted and held by the lift pins 7, the substrate G is unloaded by a lifter or the like and the substrate inspection process is completed (step S407).

本実施の形態に係る基板検査装置1は、マクロ検査用ホルダ5を基板載置部2に対して出没可能に設け、マクロ検査を行う際に、マクロ検査用ホルダ5を、基板搬送部4による基板Gの搬送方向Xと平行な回動軸55を中心に回動して、基板載置部2上の基板Gの短手方向を基板載置部2の基板載置面pに対して傾斜して起こした状態で検査するため、基板検査装置1上に基板G立ち上げのための余分な空間を必要とせず、省スペース化できる。   In the substrate inspection apparatus 1 according to the present embodiment, the macro inspection holder 5 is provided so as to be capable of appearing and retracting with respect to the substrate mounting portion 2, and when performing the macro inspection, the macro inspection holder 5 is provided by the substrate transport unit 4. The substrate G is rotated about a rotation axis 55 parallel to the transport direction X of the substrate G, and the lateral direction of the substrate G on the substrate platform 2 is inclined with respect to the substrate platform surface p of the substrate platform 2. Since the inspection is performed in the raised state, an extra space for starting up the substrate G is not required on the substrate inspection apparatus 1, and the space can be saved.

さらに、マクロ検査用ホルダ5が出没可能な領域を基板搬入領域21としているため、基板搬入領域をあらたに設ける必要がなく、省フットプリント化が可能である。さらにまた、マクロ検査用ホルダ5が出没可能な領域が基板搬出領域となるため、基板Gの持ち替えや搬送に要する時間を短縮でき、タクトタイムの低減が可能となる。   Furthermore, since the area in which the macro inspection holder 5 can appear and disappear is the substrate carry-in area 21, it is not necessary to newly provide the board carry-in area, and footprint saving is possible. Furthermore, since the area where the macro inspection holder 5 can appear and disappear is the substrate carry-out area, it is possible to shorten the time required for changing and transporting the substrate G, and to reduce the tact time.

また、本実施の形態にかかる基板検査装置1の変形例として、ミクロ検査を行うミクロ検査領域22の基板搬送方向の下流側に隣接して、基板搬出領域23が設けられる基板検査装置1Aが例示される。   Further, as a modified example of the substrate inspection apparatus 1 according to the present embodiment, a substrate inspection apparatus 1A in which a substrate carry-out region 23 is provided adjacent to the downstream side in the substrate transport direction of the micro inspection region 22 for performing micro inspection is illustrated. Is done.

基板搬出領域23は、基板検査装置1Aによりミクロ検査およびマクロ検査が終了した基板Gを、図示しないリフター等の基板搬出ロボットにより搬出するために基板を載置する。ミクロ検査領域22の基板搬出領域23側の一部は、基板搬出領域23として機能する。基板搬出領域23には、基板Gの搬出時に上昇して基板Gを保持するリフトピン7およびリフトピン7が昇降するための孔部71が設けられる。   The substrate carry-out area 23 places a substrate for carrying out the substrate G, which has been micro-inspected and macro-inspected by the substrate inspection apparatus 1A, by a substrate carry-out robot such as a lifter (not shown). A part of the micro inspection region 22 on the substrate unloading region 23 side functions as the substrate unloading region 23. The substrate carry-out area 23 is provided with lift pins 7 that lift when the substrate G is carried out and hold the substrate G, and holes 71 for the lift pins 7 to move up and down.

基板検査装置1Aでは、ミクロ検査後にマクロ検査をすることもできるが、マクロ検査後にミクロ検査を行うことにより、インラインの基板検査装置として使用することができる。また、マクロ検査後にミクロ検査を行うことにより、基板Gを基板搬入方向と逆方向に搬送することがなくなるため、複数の基板Gを基板検査装置1A内に搬入して、マクロ検査とミクロ検査とを同時に行うことができる。これにより、検査のタクトタイムを大幅に低減することも可能である。   In the substrate inspection apparatus 1A, the macro inspection can be performed after the micro inspection, but by performing the micro inspection after the macro inspection, the substrate inspection apparatus can be used as an inline substrate inspection apparatus. Further, since the micro inspection after the macro inspection does not transport the substrate G in the direction opposite to the substrate loading direction, a plurality of substrates G are loaded into the substrate inspection apparatus 1A, and the macro inspection and the micro inspection are performed. Can be performed simultaneously. Thereby, the tact time of the inspection can be significantly reduced.

また、基板検査装置1Aは、基板搬入領域21にマクロ検査用ホルダ5を出没可能に設けているが、ミクロ検査機器3を門型アーム8の左側に設置し、領域23を基板Gを搬入する基板搬入部とし、ミクロ検査機器3でミクロ検査を行った後、領域21まで基板Gを搬送し、マクロ検査用ホルダを回動させて基板を持ち上げてマクロ検査を行った後、領域21から基板Gを搬出させても同様の効果を得ることができる。   Further, in the substrate inspection apparatus 1A, the macro inspection holder 5 is provided in the substrate carry-in area 21 so as to be able to appear and retract, but the micro inspection apparatus 3 is installed on the left side of the gate arm 8 and the substrate G is loaded into the area 23. After performing the micro inspection with the micro inspection device 3 as the substrate carry-in portion, the substrate G is transported to the region 21, the macro inspection holder is rotated, the substrate is lifted and the macro inspection is performed. Even if G is carried out, the same effect can be obtained.

1、1A 基板検査装置
2 基板載置部
3 ミクロ検査機器
4 基板搬送部
5 マクロ検査用ホルダ
6 浮上プレート
7 リフトピン
8 門型アーム
9 マクロ照明光源
10 反射ミラー
11 フレネルネンズ
12 液晶散乱板
15 マクロ照明部
21 基板搬入領域
22 ミクロ検査領域
23 基板搬出領域
40 レール
41 駆動部
42 昇降部
43 基板保持部
44 吸引口
51 基板支持部(縦)
52 基板支持部(横)
53 吸着部
54 回動軸
55 ホルダ支持部
56 駆動部
57 駆動部
61 吐出口
71 孔部
DESCRIPTION OF SYMBOLS 1, 1A board | substrate inspection apparatus 2 Board | substrate mounting part 3 Micro inspection apparatus 4 Board | substrate conveyance part 5 Macro inspection holder 6 Levitation plate 7 Lift pin 8 Portal arm 9 Macro illumination light source 10 Reflection mirror 11 Fresnel nens 12 Liquid crystal scattering plate 15 Macro illumination part 21 Substrate carry-in area 22 Micro inspection area 23 Substrate carry-out area 40 Rail 41 Drive part 42 Lifting part 43 Substrate holding part 44 Suction port 51 Substrate support part (vertical)
52 Substrate support (horizontal)
53 Adsorption part 54 Rotating shaft 55 Holder support part 56 Drive part 57 Drive part 61 Discharge port 71 Hole part

Claims (7)

検査する基板を載置し、吐出口から気体を吐出させて該基板を浮上させる機構を有する基板載置部と、
前記基板をミクロ検査するミクロ検査部と、
前記基板載置部上に浮上した前記基板を搬送する基板搬送部と、
前記基板載置部に対して出没可能に設けられ、前記基板載置部上に浮上した前記基板を前記基板載置部の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダと、
前記マクロ検査用ホルダで保持された前記基板の表面を照明するマクロ照明部と、
を備え、前記マクロ検査用ホルダは、前記基板搬送部による搬送方向と平行な回動軸を中心に回動することを特徴とする基板検査装置。
A substrate mounting portion having a mechanism for mounting a substrate to be inspected and discharging gas from the discharge port to float the substrate;
A micro inspection part for micro inspection of the substrate;
A substrate transfer unit for transferring the substrate that has floated on the substrate mounting unit;
A macro inspection holder which is provided so as to be able to appear and retract with respect to the substrate platform, and holds the substrate floating on the substrate platform in a state where it is tilted with respect to the upper surface of the substrate platform; ,
A macro illumination unit that illuminates the surface of the substrate held by the macro inspection holder;
The substrate inspection apparatus is characterized in that the macro inspection holder rotates about a rotation axis parallel to a conveyance direction by the substrate conveyance unit.
前記基板搬送部は、前記基板載置部の端部であって基板の搬送方向と平行な端部に設けられ、
前記マクロ検査用ホルダの回動軸は、前記基板載置部の端部であって基板の搬送方向と平行な端部であり、かつ前記基板搬送部が設けられる端部とは異なる端部に設けられることを特徴とする請求項1に記載の基板検査装置。
The substrate transport section is provided at an end portion of the substrate placement section and parallel to the substrate transport direction,
The rotation axis of the macro inspection holder is an end portion of the substrate platform, which is an end portion parallel to the substrate transfer direction, and is different from an end portion where the substrate transfer portion is provided. The board inspection apparatus according to claim 1, wherein the board inspection apparatus is provided.
前記基板載置部は、
前記ミクロ検査部に対して上流側に設けられ、前記基板を搬入する基板搬入領域を有し、
前記マクロ検査用ホルダは、前記基板搬入領域に設けられることを特徴とする請求項1または2に記載の基板検査装置。
The substrate mounting part is
Provided on the upstream side with respect to the micro-inspection unit, and has a substrate loading area for loading the substrate,
The substrate inspection apparatus according to claim 1, wherein the macro inspection holder is provided in the substrate carry-in area.
前記基板載置部は、
前記ミクロ検査部に対して下流側に設けられ、前記基板を搬出する基板搬出領域を有することを特徴とする請求項3に記載の基板検査装置。
The substrate mounting part is
The substrate inspection apparatus according to claim 3, further comprising a substrate carry-out region that is provided on a downstream side with respect to the micro inspection unit and carries out the substrate.
前記基板載置部は、
前記ミクロ検査部に対して上流側に設けられ、前記基板を搬入する基板搬入領域と、
前記ミクロ検査部に対して下流側に設けられ、前記基板を搬出する基板搬出領域と、を有し、
前記マクロ検査用ホルダは、前記基板搬出領域に設けられることを特徴とする請求項1または2に記載の基板検査装置。
The substrate mounting part is
A substrate carry-in region provided on the upstream side with respect to the micro-inspection unit and carrying the substrate;
A substrate unloading area provided downstream from the micro-inspection unit and unloading the substrate;
The substrate inspection apparatus according to claim 1, wherein the macro inspection holder is provided in the substrate carry-out area.
検査する基板を載置し、吐出口から気体を吐出させて該基板を浮上させる機構を有する基板載置部と、前記基板をミクロ検査するミクロ検査部と、前記基板載置部上に浮上した前記基板を搬送する基板搬送部と、前記基板載置部に対して出没可能に設けられ、前記基板載置部上に浮上した前記基板を前記基板載置部の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダと、前記マクロ検査用ホルダで保持された前記基板の表面を照明するマクロ照明部と、を備える基板検査装置における基板検査方法であって、
基板搬入領域に基板を搬入する搬入ステップと、
基板保持部により前記基板を保持する第1基板保持ステップと、
前記基板を前記基板搬送部によりミクロ検査部に搬送する第1搬送ステップと、
前記基板をミクロ検査するミクロ検査ステップと、
ミクロ検査終了後、前記基板搬送部により前記基板をマクロ検査用ホルダまで搬送する第2搬送ステップと、
前記基板保持部による前記基板の保持を解除する第1保持解除ステップと、
前記基板をマクロ検査用ホルダで保持する第2基板保持ステップと、
前記基板をマクロ検査するマクロ検査ステップと、
前記マクロ検査用ホルダによる前記基板の保持を解除する第2保持解除ステップと、
前記第2保持解除ステップ後直ちに前記基板を搬出する搬出ステップと、
を含むことを特徴とする基板検査方法。
A substrate mounting portion having a mechanism for placing a substrate to be inspected and causing the substrate to float by discharging gas from a discharge port, a micro inspection portion for micro-inspecting the substrate, and the surface of the substrate placing portion A substrate transport unit that transports the substrate, and is provided so as to be capable of appearing and retracting with respect to the substrate platform, and the substrate floating on the substrate platform is tilted with respect to the upper surface of the substrate platform. A substrate inspection method in a substrate inspection apparatus, comprising: a macro inspection holder that is held in a state of being held; and a macro illumination unit that illuminates the surface of the substrate held by the macro inspection holder,
A loading step for loading the substrate into the substrate loading area;
A first substrate holding step of holding the substrate by a substrate holding unit;
A first transport step of transporting the substrate to the micro inspection unit by the substrate transport unit;
A micro inspection step for micro inspection of the substrate;
A second transfer step of transferring the substrate to a macro inspection holder by the substrate transfer unit after the micro-inspection is completed;
A first holding release step for releasing the holding of the substrate by the substrate holding unit;
A second substrate holding step for holding the substrate with a macro inspection holder;
A macro inspection step for macro inspecting the substrate;
A second holding release step for releasing the holding of the substrate by the macro inspection holder;
An unloading step of unloading the substrate immediately after the second holding release step;
A substrate inspection method comprising:
検査する基板を載置し、吐出口から気体を吐出させて該基板を浮上させる機構を有する基板載置部と、前記基板をミクロ検査するミクロ検査部と、前記基板載置部上に浮上した前記基板を搬送する基板搬送部と、前記基板載置部に対して出没可能に設けられ、前記基板載置部上に浮上した前記基板を前記基板載置部の上面に対して傾斜して起こした状態で保持するマクロ検査用ホルダと、前記マクロ検査用ホルダで保持された前記基板の表面を照明するマクロ照明部と、を備える基板検査装置における基板検査方法であって、
基板搬入領域に基板を搬入する搬入ステップと、
前記搬入ステップ後直ちに前記基板をマクロ検査用ホルダで保持する第1基板保持ステップと、
前記基板をマクロ検査するマクロ検査ステップと、
前記マクロ検査用ホルダによる前記基板の保持を解除する第1保持解除ステップと、
基板保持部により前記基板を保持する第2基板保持ステップと、
前記基板搬送部により前記基板をミクロ検査部に搬送する第1搬送ステップと、
前記基板をミクロ検査するミクロ検査ステップと、
ミクロ検査終了後、前記基板搬送部により前記基板を基板搬出領域まで搬送する第2搬送ステップと、
前記基板保持部による前記基板の保持を解除する第2保持解除ステップと、
前記基板を搬出する搬出ステップと、
を含むことを特徴とする基板検査方法。
A substrate mounting portion having a mechanism for placing a substrate to be inspected and causing the substrate to float by discharging gas from a discharge port, a micro inspection portion for micro-inspecting the substrate, and the surface of the substrate placing portion A substrate transport unit that transports the substrate, and is provided so as to be capable of appearing and retracting with respect to the substrate platform, and the substrate floating on the substrate platform is tilted with respect to the upper surface of the substrate platform. A substrate inspection method in a substrate inspection apparatus, comprising: a macro inspection holder that is held in a state of being held; and a macro illumination unit that illuminates the surface of the substrate held by the macro inspection holder,
A loading step for loading the substrate into the substrate loading area;
A first substrate holding step of holding the substrate with a macro inspection holder immediately after the carrying-in step;
A macro inspection step for macro inspecting the substrate;
A first holding release step for releasing the holding of the substrate by the macro inspection holder;
A second substrate holding step of holding the substrate by a substrate holding unit;
A first transport step of transporting the substrate to a micro inspection unit by the substrate transport unit;
A micro inspection step for micro inspection of the substrate;
A second transporting step of transporting the substrate to the substrate unloading region by the substrate transporting unit after the micro-inspection is completed;
A second holding release step for releasing the holding of the substrate by the substrate holding unit;
An unloading step of unloading the substrate;
A substrate inspection method comprising:
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