JP2008014706A - Visual inspection method and system - Google Patents

Visual inspection method and system Download PDF

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JP2008014706A
JP2008014706A JP2006184508A JP2006184508A JP2008014706A JP 2008014706 A JP2008014706 A JP 2008014706A JP 2006184508 A JP2006184508 A JP 2006184508A JP 2006184508 A JP2006184508 A JP 2006184508A JP 2008014706 A JP2008014706 A JP 2008014706A
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substrate
appearance inspection
substrate support
support unit
transfer
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Hiroyuki Okahira
裕幸 岡平
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Olympus Corp
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Olympus Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a visual inspection method capable of more efficiently performing the visual inspection of a substrate, and a visual inspection system. <P>SOLUTION: In the visual inspection method for performing the inspection of the substrate while irradiating the substrate, which is held on a substrate supporting part 4, with the light emitted from a light source, the substrate supporting part 4 is arranged under the feed surface of a substrate feed device 6 for feeding the substrate and, in a stage that the substrate is fed to the region above the substrate supporting part 4 is moved upward while the substrate is scooped up to be supported on the substrate supporting part 4. In a stage that the substrate supported on the substrate supporting part 4 is inspected, the substrate supporting part 4 is returned to the original position to return the substrate to the feed surface of the substrate feed device 6. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、フラットディスプレイパネル(FPD)用ガラス基板などの基板の外観検査方法および外観検査装置に関し、例えば、製造ライン内の基板搬送装置で搬送される基板を、直接、外観検査装置の基板支持部で受け取って検査を行う外観検査方法及び外観検査装置に関する。   The present invention relates to an appearance inspection method and an appearance inspection apparatus for a substrate such as a glass substrate for a flat display panel (FPD). For example, a substrate conveyed by a substrate conveyance apparatus in a production line is directly supported by the substrate of the appearance inspection apparatus. The present invention relates to an appearance inspection method and an appearance inspection apparatus that receive and inspect at a section.

従来、フラットディスプレイパネル(FPD)用のガラス基板(以下、基板という)は、基板に照明光を照射しその反射光や透過光を観察者が目視観察して、乱反射光を検知することによって基板表面に塗布されたレジストの膜むらやピンホールなどの欠陥や、塵埃付着の有無などが確認される。この種の外観検査は、基板に光を照射するための光源や基板を保持する基板支持部などを備えた、いわゆる外観検査装置と称される装置が用いられている。また、この外観検査装置で検査する基板は、例えば搬送ロボットによって外観検査装置に搬送され、基板支持部に載置しつつ保持させて検査される。   Conventionally, a glass substrate for flat display panel (FPD) (hereinafter referred to as a substrate) is formed by irradiating a substrate with illumination light and visually observing the reflected light or transmitted light by an observer to detect irregularly reflected light. Defects such as unevenness of resist applied on the surface and pinholes, and the presence or absence of dust adhesion are confirmed. In this type of visual inspection, a so-called visual inspection apparatus, which includes a light source for irradiating light onto a substrate, a substrate support section for holding the substrate, and the like is used. Further, the substrate to be inspected by the appearance inspection apparatus is transferred to the appearance inspection apparatus by, for example, a transfer robot, and is inspected by being held while being placed on the substrate support portion.

しかしながら、外観検査装置への基板の搬送に多大な時間を要し、基板の外観検査を行うために生産性が低下するという問題があった。このため、製造ラインの基板搬送装置の側近に外観検査装置を設け、製造ライン内で搬送される基板を、直接、搬送ロボットで受け取り、側近に配置した外観検査装置に搬送して検査を行うことで、搬送ロボットによる基板の搬送距離を短くし、検査に要する時間の短縮を図っている(例えば、特許文献1参照。)。   However, it takes a lot of time to transport the substrate to the appearance inspection apparatus, and there is a problem that productivity is lowered because the appearance inspection of the substrate is performed. For this reason, an appearance inspection device is provided in the vicinity of the substrate transfer device of the production line, and the substrate conveyed in the production line is directly received by the transfer robot and transferred to the appearance inspection device arranged in the vicinity for inspection. Therefore, the transport distance of the substrate by the transport robot is shortened to shorten the time required for the inspection (see, for example, Patent Document 1).

また、搬送ロボットにより外観検査装置の基板支持部に載置された基板は、検査によって検出された欠陥の位置を特定するため、検査前に基板を基準位置に合わせ原点座標の取得を行う必要がある。この基板の基準位置合わせは、載置された基板と、基板支持部との摩擦力を、例えば基板の下面側から圧力気体を吐出し基板を浮上させることにより低減させ、この状態で、基板の端部を例えば位置決めピンなどで押圧し、所定の基準位置に基板を移動させることにより行われている(例えば、特許文献2参照。)。
特開2004−79614号公報 特開2000−9661号公報
In addition, the substrate placed on the substrate support part of the appearance inspection apparatus by the transfer robot needs to acquire the origin coordinates by aligning the substrate with the reference position before the inspection in order to specify the position of the defect detected by the inspection. is there. The reference alignment of the substrate reduces the frictional force between the placed substrate and the substrate support part by, for example, discharging the pressure gas from the lower surface side of the substrate and floating the substrate, and in this state, For example, the end portion is pressed with a positioning pin or the like, and the substrate is moved to a predetermined reference position (see, for example, Patent Document 2).
JP 2004-79614 A JP 2000-9661 A

しかしながら、上述した製造ラインの基板搬送装置の側近に外観検査装置を配置して検査を行う場合においても、搬送ロボットを介して製造ラインと外観検査装置の間で基板の受け渡しを行なうことからやはり検査に時間が掛かり、検査に要する時間のさらなる短縮を図ることが望まれていた。   However, even when an inspection is performed by placing an appearance inspection device near the substrate transfer device on the production line described above, the inspection is still performed because the substrate is transferred between the production line and the appearance inspection device via the transfer robot. Therefore, it has been desired to further reduce the time required for the inspection.

また、上記の外観検査方法においては、基板搬送装置の側近に外観検査装置と搬送ロボットを備えるため、これらの大きな占有スペースが必要になるという問題があった。   Further, in the above-described appearance inspection method, since the appearance inspection apparatus and the transfer robot are provided in the vicinity of the substrate transfer apparatus, there is a problem that these large occupied spaces are required.

本発明は、上記事情を鑑み、基板の外観検査をより効率的に行うことが可能な外観検査方法及び外観検査装置を提供することを目的とする。   In view of the above circumstances, an object of the present invention is to provide an appearance inspection method and an appearance inspection apparatus that can more efficiently perform an appearance inspection of a substrate.

上記の目的を達するために、この発明は以下の手段を提供している。   In order to achieve the above object, the present invention provides the following means.

本発明の外観検査方法は、光源で発した光を基板支持部に保持した基板に照射させながら前記基板の検査を行う外観検査方法において、前記基板を搬送する基板搬送装置の搬送面よりも下方に前記基板支持部を配置しておき、該基板支持部の上方に前記基板が搬送されてきた段階で、前記基板支持部を上方に移動するとともに前記基板をすくい上げて該基板支持部に支持させ、前記基板支持部で支持した前記基板に対して検査を行った段階で、前記基板支持部を元の位置に戻すことで前記基板を前記基板搬送装置の前記搬送面上に戻すことを特徴とする。   An appearance inspection method according to the present invention is an appearance inspection method for inspecting a substrate while irradiating light emitted from a light source onto a substrate held on a substrate support, and is below a transport surface of a substrate transport device that transports the substrate. The substrate support portion is disposed on the substrate support portion, and when the substrate has been transported above the substrate support portion, the substrate support portion is moved upward and the substrate is picked up and supported by the substrate support portion. The substrate is returned to the transfer surface of the substrate transfer device by returning the substrate support to the original position when the substrate supported by the substrate support is inspected. To do.

この発明に係る外観検査方法においては、例えば製造ライン内の基板搬送装置で搬送される基板を、基板搬送装置から直接、基板支持部で受け取り検査することができるとともに、検査を終えた基板を基板支持部から直接、製造ライン内の基板搬送装置に戻すことができる。   In the appearance inspection method according to the present invention, for example, a substrate transported by a substrate transport device in a production line can be received and inspected directly from the substrate transport device by a substrate support unit, and the substrate that has been inspected is a substrate. It can be returned directly to the substrate transfer device in the production line from the support portion.

また、本発明の外観検査装置は、光源で発した光を基板支持部に保持した基板に照射させながら前記基板の検査を行うための外観検査装置であって、前記基板を搬送する基板搬送装置の搬送面よりも下方に前記基板支持部が配置され、該基板支持部は、上方に搬送されてきた前記基板を上方に移動しつつすくい上げて保持するように構成されていることを特徴とする。   The appearance inspection apparatus of the present invention is an appearance inspection apparatus for inspecting the substrate while irradiating light emitted from a light source onto the substrate held on the substrate support portion, and is a substrate conveyance device for conveying the substrate. The substrate support portion is disposed below the transfer surface of the substrate, and the substrate support portion is configured to scoop up and hold the substrate transferred upward while moving upward. .

この発明に係る外観検査装置においては、例えば製造ライン内の基板搬送装置で搬送される基板が基板支持部の上方に搬送されてきた段階で、基板支持部を上方に移動することによってこの基板支持部で基板をすくい上げて受け取ることができる。そして、基板支持部で保持した基板の検査を行った後に、再度基板支持部を基板搬送装置の搬送面よりも下方に戻すことによって、基板を基板搬送装置の搬送面上に戻すことができる。   In the visual inspection apparatus according to the present invention, for example, when the substrate transported by the substrate transport device in the production line has been transported above the substrate support, the substrate support is moved by moving the substrate support upward. The board can be picked up and received at the section. Then, after inspecting the substrate held by the substrate support unit, the substrate can be returned onto the transfer surface of the substrate transfer device by returning the substrate support portion below the transfer surface of the substrate transfer device again.

本発明の外観検査方法及び外観検査装置によれば、基板を基板搬送装置に対して直接基板支持部で受け渡しすることができるため、外観検査装置の基板支持部に基板を搬送するための搬送ロボットを用いる必要がなく、検査時間を短縮することができる。これにより、検査の効率化を図ることが可能になる。また、搬送ロボットおよび外観検査装置の占有スペースを省スペース化することも可能になる。   According to the appearance inspection method and the appearance inspection apparatus of the present invention, since the substrate can be directly transferred to the substrate transfer device by the substrate support portion, the transfer robot for transferring the substrate to the substrate support portion of the appearance inspection device. Therefore, the inspection time can be shortened. This makes it possible to improve the efficiency of inspection. In addition, the space occupied by the transfer robot and the appearance inspection apparatus can be saved.

以下、図1から図7を参照し、本発明の一実施形態に係る外観検査方法および外観検査装置について説明する。   Hereinafter, an appearance inspection method and an appearance inspection apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 to 7.

本発明の一実施形態は、図1および図3から図4に示すような、製造ライン内を搬送されるFPD用のガラス基板1(以下、基板という)を直接受け取って検査を行う外観検査装置2に関するものである。この外観検査装置2は、図1に示すように、光源3a、この光源3aから出射した光を偏向する矩形板状のミラー3b、及びミラー3bによって偏向した光を収束する例えばフレネルレンズなどの略円板状の収束レンズ3cを備えた投光部3と、収束レンズ3cにより収束した照明光が照射される矩形薄板状の基板1を保持するための基板支持部4と、基板支持部4を片持ち状態で例えばモータなどの回転駆動手段5に繋いで、回転駆動手段5の駆動とともに基板支持部4を軸線O1回りに回動させるための回転軸部5aとから構成されている。   An embodiment of the present invention is an appearance inspection apparatus that directly receives and inspects an FPD glass substrate 1 (hereinafter referred to as a substrate) conveyed in a production line as shown in FIGS. 1 and 3 to 4. 2. As shown in FIG. 1, the appearance inspection apparatus 2 has a light source 3a, a rectangular plate-like mirror 3b that deflects light emitted from the light source 3a, and an abbreviation such as a Fresnel lens that converges light deflected by the mirror 3b. A light projecting unit 3 having a disc-shaped converging lens 3c, a substrate supporting unit 4 for holding a rectangular thin plate-shaped substrate 1 irradiated with illumination light converged by the converging lens 3c, and a substrate supporting unit 4 In a cantilever state, it is connected to a rotation driving means 5 such as a motor, and is composed of a rotation shaft portion 5a for driving the rotation driving means 5 and rotating the substrate support portion 4 about the axis O1.

基板支持部4は、図3から図4に示すように、基板1の搬送方向Xに平行する軸線O1を備えた回転軸部5aと繋がる矩形枠部4aと、後述する基板搬送装置6によって搬送される基板1の搬送方向Xに沿った矩形枠部4aの両端辺部4b、4c同士を結ぶように基板搬送装置6の回転軸6aの軸線方向に延びた複数の支持部材4dとから構成されている。このとき、複数の支持部材4dは、隣り合う回転軸6aの間に配置されるように搬送方向Xに一定の間隔をあけて並設されている。また、基板支持部4には、図5から図6に示すように、矩形枠部4aの回転軸部5a側に基板1を支持するための当付けピン4fが設けられ、支持部材4dの上面側には、基板1と基板支持部4との摩擦力を低減させるための複数の回転ローラ4gからなる摩擦力低減手段4hが設置されている。   As shown in FIGS. 3 to 4, the substrate support unit 4 is transported by a rectangular frame portion 4 a connected to a rotation shaft portion 5 a having an axis O <b> 1 parallel to the transport direction X of the substrate 1 and a substrate transport device 6 described later. A plurality of support members 4 d extending in the axial direction of the rotation shaft 6 a of the substrate transport device 6 so as to connect both end portions 4 b and 4 c of the rectangular frame portion 4 a along the transport direction X of the substrate 1 to be formed. ing. At this time, the plurality of support members 4d are juxtaposed at a certain interval in the transport direction X so as to be disposed between adjacent rotating shafts 6a. Further, as shown in FIGS. 5 to 6, the substrate support portion 4 is provided with an abutting pin 4f for supporting the substrate 1 on the rotating shaft portion 5a side of the rectangular frame portion 4a, and an upper surface of the support member 4d. On the side, a frictional force reducing means 4h composed of a plurality of rotating rollers 4g for reducing the frictional force between the substrate 1 and the substrate support portion 4 is installed.

一方、製造ライン内に設けられて基板1を搬送する基板搬送装置6は、図1から図4に示すように、基板1の搬送方向Xに長手方向の軸線O2が一致する矩形盤状のベース部6bと、ベース部6bの上面6cの長手方向の両端部6d、6eから搬送方向Xに沿って垂直に突設した矩形板状の支持板部6f、6gと、支持板部6f、6gに回転可能に軸支されるとともに、軸線O3が搬送方向Xに直交する方向に配されるよう両支持板部6f、6gに複数等間隔で連架した円柱棒状の回転軸6aと、回転軸6aに環装されてその外周面6hが基板1の下面1aに摩擦接触する複数のリング状の回転体6iと、支持板部6gの側面6jに支持されて複数の回転軸6aに巻き回された無端状のベルト6kと、このベルト6kを回転駆動させる例えばモータなどの回転軸駆動手段6lとから構成されている。なお、本実施形態では、基板搬送装置6の複数の回転軸6aに具備した複数の回転体6iの外周面6hの上端が、それぞれ同一水平面上に位置されており、この同一水平面が基板1を搬送する搬送面を形成している。   On the other hand, as shown in FIGS. 1 to 4, the substrate transport apparatus 6 provided in the production line for transporting the substrate 1 is a rectangular disk-shaped base whose longitudinal axis O2 coincides with the transport direction X of the substrate 1. A rectangular plate-like support plate portions 6f and 6g projecting vertically along the conveying direction X from both ends 6d and 6e in the longitudinal direction of the upper surface 6c of the base portion 6b, and the support plate portions 6f and 6g. A cylindrical rod-shaped rotary shaft 6a that is rotatably supported and is connected to the support plate portions 6f, 6g at a plurality of equal intervals so that the axis O3 is arranged in a direction orthogonal to the transport direction X, and the rotary shaft 6a The outer peripheral surface 6h is wound around the plurality of ring-shaped rotating bodies 6i whose frictional contact with the lower surface 1a of the substrate 1 and the side surface 6j of the supporting plate 6g are wound around the plurality of rotating shafts 6a. Endless belt 6k, and this belt 6k is driven to rotate, for example Is composed of a rotary shaft drive means 6l such over data. In the present embodiment, the upper ends of the outer peripheral surfaces 6 h of the plurality of rotating bodies 6 i provided on the plurality of rotating shafts 6 a of the substrate transport device 6 are respectively positioned on the same horizontal plane, and the same horizontal plane is used to mount the substrate 1. A conveyance surface to be conveyed is formed.

ここで、図2に示すように、支持板部6f、6gには、回転軸6aと回転軸6aとの間に、上端部6mから下端部6Oに向けて矩形状に切り欠かれた切欠き部6nが形成されており、この切欠き部6nは、下端6pが回転軸6aの軸線O3よりも下方に位置するように形成されている。また、ベルト6kは、支持板部6gに軸支されて支持板部6gの外側方に突設した回転軸6aの端部に巻き回されるとともに、切欠き部6nの下方に配されるとともに支持板部6gの外側面6jに直交するように固着した円柱棒状の支持ピン6qに巻き回されて設けられている。さらに、基板搬送装置6には、図7に示すように、基板搬送装置6上を搬送されてきた基板1が、図示せぬ基板支持部4上で停止した際に、基板1の搬送方向X下流側の端部1bを押圧して、搬送方向Xに対して基板1の位置を調整するための位置決めピン6rが設けられている。この位置決めピン6rは、例えばアクチュエータなど適宜手段を利用して垂直に倒立することで基板1の下流側端部1bを押圧するように構成されている。   Here, as shown in FIG. 2, the support plate portions 6f and 6g have notches cut out in a rectangular shape between the rotating shaft 6a and the rotating shaft 6a from the upper end portion 6m toward the lower end portion 6O. A portion 6n is formed, and the notch 6n is formed such that the lower end 6p is located below the axis O3 of the rotation shaft 6a. Further, the belt 6k is wound around the end portion of the rotating shaft 6a that is pivotally supported by the support plate portion 6g and protrudes outward from the support plate portion 6g, and is disposed below the notch portion 6n. It is provided by being wound around a cylindrical rod-like support pin 6q fixed so as to be orthogonal to the outer side surface 6j of the support plate portion 6g. Further, as shown in FIG. 7, when the substrate 1 transported on the substrate transport device 6 stops on the substrate support unit 4 (not shown), the substrate transport device 6 transports the substrate 1 in the transport direction X. Positioning pins 6r for adjusting the position of the substrate 1 with respect to the transport direction X by pressing the downstream end 1b are provided. The positioning pin 6r is configured to press the downstream end 1b of the substrate 1 by inverting vertically using appropriate means such as an actuator.

ついで、上記の構成からなる外観検査装置2及び基板搬送装置6を用いて基板1の検査を行う方法について説明する。   Next, a method for inspecting the substrate 1 using the appearance inspection apparatus 2 and the substrate transport apparatus 6 having the above-described configuration will be described.

はじめに、図2および図5に示すように、基板搬送装置6の回転軸6aが回転軸駆動手段6lにより駆動すると、回転体6iの外周面6hに下面1aが当接する基板1が、基板搬送装置6上(搬送面上)を一方向Xに搬送される。この段階では、図1から図3に示す外観検査装置2の基板支持部4は、矩形枠部4aおよび支持部材4dが支持板部6f、6gの切欠き部6nに挿入され、支持部材4dの回転ローラ4gが基板搬送装置6の回転体6iの上方に位置する外周面6h(基板1の下面1a、基板搬送装置6の搬送面)よりも下方に位置するように、基板支持部4が配置されている。そして、基板1が基板支持部4の上方に搬送されてきた段階で、基板搬送装置6の回転軸駆動手段6lを一端停止する。この段階で、図7に示すように、基板搬送装置6に備えた位置決めピン6rを倒立させつつ、基板1の搬送方向X下流側の端部1bを押圧させて、基板1を搬送方向Xの所定の基準位置に移動させる。   First, as shown in FIGS. 2 and 5, when the rotating shaft 6a of the substrate transport device 6 is driven by the rotating shaft driving means 61, the substrate 1 whose lower surface 1a contacts the outer peripheral surface 6h of the rotating body 6i is changed to the substrate transport device. 6 (on the transport surface) is transported in one direction X. At this stage, in the substrate support portion 4 of the appearance inspection apparatus 2 shown in FIGS. 1 to 3, the rectangular frame portion 4a and the support member 4d are inserted into the notch portions 6n of the support plate portions 6f and 6g, and the support member 4d The substrate support 4 is arranged so that the rotating roller 4g is positioned below the outer peripheral surface 6h (the lower surface 1a of the substrate 1 and the conveying surface of the substrate conveying device 6) positioned above the rotating body 6i of the substrate conveying device 6. Has been. Then, at the stage where the substrate 1 has been transported above the substrate support portion 4, the rotary shaft driving means 6 l of the substrate transport device 6 is stopped once. At this stage, as shown in FIG. 7, while positioning the positioning pins 6 r provided in the substrate transport device 6, the end 1 b on the downstream side in the transport direction X of the substrate 1 is pressed to bring the substrate 1 in the transport direction X. Move to a predetermined reference position.

ついで、図1および図3から図6に示すように、外観検査装置2の回転駆動手段5を駆動し、基板支持部4を上方に向けて回転軸部5aの軸線O1回りに回動させる。これにより、基板支持部4の上面4eで基板1がすくい上げられ、上面4eに設けた摩擦力低減手段4hの回転ローラ4gに基板1が支持される。そして、図1および図5から図6に示すように、回転軸部5aの軸線O1回りのさらなる回転によって基板支持部4の上面4eが傾斜するとともに、摩擦力低減手段4hの回転ローラ4gで支持した基板1が、その自重と回転ローラ4gの回転により基板支持部4上を下方に移動し、基板支持部4の回転軸部5a側の当付けピン4fに当接して保持される。これにより、基板1の搬送方向Xに直交する方向Yの基準位置が合わされる。   Next, as shown in FIGS. 1 and 3 to 6, the rotation driving means 5 of the appearance inspection apparatus 2 is driven to rotate the substrate support portion 4 about the axis O <b> 1 of the rotation shaft portion 5 a toward the upper side. As a result, the substrate 1 is scooped up by the upper surface 4e of the substrate support portion 4, and the substrate 1 is supported by the rotating roller 4g of the frictional force reducing means 4h provided on the upper surface 4e. As shown in FIGS. 1 and 5 to 6, the upper surface 4e of the substrate support portion 4 is inclined by further rotation around the axis O1 of the rotation shaft portion 5a and is supported by the rotation roller 4g of the frictional force reducing means 4h. The substrate 1 thus moved moves downward on the substrate support portion 4 due to its own weight and rotation of the rotating roller 4g, and is held in contact with the contact pin 4f on the rotation shaft portion 5a side of the substrate support portion 4. Thereby, the reference position in the direction Y orthogonal to the transport direction X of the substrate 1 is matched.

ついで、図1に示すように、基板支持部4上で基準位置に配置した基板1に、投光部3から光を照射するとともに、基板支持部4を回転軸部5aの軸線O1回りに回動させつつ揺動させる。そして、観察者7は、揺動する基板1からの反射光を目視観察し、基板1の表面1cで例えば乱反射する反射光の有無を確認し、すなわち基板1の表面1cの欠陥の有無を確認する。   Next, as shown in FIG. 1, the substrate 1 arranged at the reference position on the substrate support 4 is irradiated with light from the light projecting unit 3, and the substrate support 4 is rotated around the axis O1 of the rotation shaft 5a. Swing while moving. Then, the observer 7 visually observes the reflected light from the swinging substrate 1 and confirms the presence or absence of reflected light that is irregularly reflected on the surface 1c of the substrate 1, that is, confirms the presence or absence of a defect on the surface 1c of the substrate 1. To do.

ついで、上記のような検査を終えた段階で、図4から図5に示すように、基板支持部4の回転ローラ4gが基板搬送装置6の回転軸6aに取り付けられた回転体6iの上方に位置する外周面6hよりも下方に位置されるように、基板支持部4を元の位置に戻し、回転体6iに再度基板1を支持させる。回転体6iによって基板1が支持された段階で、図1から図4に示すように、基板搬送装置6の回転軸駆動手段6lを駆動し、基板1を製造ラインに戻す。   Next, at the stage where the above inspection is completed, as shown in FIGS. 4 to 5, the rotating roller 4 g of the substrate support unit 4 is positioned above the rotating body 6 i attached to the rotating shaft 6 a of the substrate transport device 6. The substrate support portion 4 is returned to the original position so as to be positioned below the positioned outer peripheral surface 6h, and the substrate 1 is again supported by the rotating body 6i. At the stage where the substrate 1 is supported by the rotating body 6i, as shown in FIGS. 1 to 4, the rotating shaft driving means 6l of the substrate transport device 6 is driven to return the substrate 1 to the production line.

したがって、上記の構成からなる外観検査装置2およびこの外観検査装置2を用いた外観検査方法によれば、製造ラインにおいて基板1を搬送する基板搬送装置6と外観検査装置2の基板支持部4を重ねて配置することにより、基板搬送装置6で搬送されてきた基板1を基板支持部4に直接支持させることができる。これにより、従来製造ラインから搬送ロボットを用いて外観検査装置の基板支持部4に搬送していた基板1を、搬送ロボットを用いずに基板支持部4で保持することが可能になる。また、搬送ロボットを用いずに検査後の基板1を製造ラインに戻すことができる。そして、このように基板搬送装置6と外観検査装置2との間で基板1の受け渡しを行えることで、検査に要する時間を短縮することができる。また、外観検査装置の占有スペースを省スペース化することができる。   Therefore, according to the visual inspection apparatus 2 having the above-described configuration and the visual inspection method using the visual inspection apparatus 2, the substrate transport device 6 that transports the substrate 1 and the substrate support portion 4 of the visual inspection apparatus 2 on the production line. By superposing the substrates, the substrate 1 transported by the substrate transport device 6 can be directly supported by the substrate support unit 4. Thereby, it becomes possible to hold | maintain the board | substrate 1 conveyed to the board | substrate support part 4 of the external appearance inspection apparatus from the conventional manufacturing line using the conveyance robot by the board | substrate support part 4 without using a conveyance robot. Further, the inspected substrate 1 can be returned to the production line without using a transfer robot. And since the board | substrate 1 can be delivered between the board | substrate conveyance apparatus 6 and the external appearance inspection apparatus 2 in this way, the time which inspection requires can be shortened. Further, the space occupied by the appearance inspection apparatus can be saved.

また、上記の構成からなる外観検査装置2および基板搬送装置6によれば、基板支持部4上における基板1の基準位置合わせにおいて、搬送方向Xの基準位置合わせを基板搬送装置6の駆動と位置決めピン6rとにより行うことができ、搬送方向Xに直交する方向Yの基準位置合わせを基板支持部4の回動とともに行うことができるため、従来の外観検査装置に対して基板1の基準位置合わせを容易に行うことができ、この点からも検査に要する時間を短縮することが可能になる。   Further, according to the appearance inspection apparatus 2 and the substrate transport apparatus 6 having the above-described configuration, in the reference position alignment of the substrate 1 on the substrate support portion 4, the reference position alignment in the transport direction X is driven and positioned by the substrate transport apparatus 6. Since the reference position alignment in the direction Y orthogonal to the conveyance direction X can be performed together with the rotation of the substrate support portion 4, the reference position alignment of the substrate 1 can be performed with respect to the conventional visual inspection apparatus. From this point, the time required for the inspection can be shortened.

なお、本発明は上記の一実施形態に限定されるものではなく、その趣旨を逸脱しない範囲で適宜変更可能である。例えば、搬送方向Xの基板1の基準位置合わせが、基板搬送装置6を停止した後、位置決めピン6rを基板1の搬送方向X下流側の端部1bに押圧させて行うものとしたが、位置決めピン6rを搬送方向X上流側に設け、上流側の基板1端部1dを押圧することによって行われてもよい。また、基板支持部4上に基板1が搬送されてきた段階で、位置決めピン6rを用いずに基板搬送装置6の駆動によって基板1を搬送方向X前後に進退させることで、基板1の搬送方向Xの基準位置合わせを行うようにしてもよい。さらに、例えば図8に示すように、基板1の端部1b、1dを感知するセンサー8を基板搬送装置6に設け、このセンサー8を用いて図3に示した基板搬送装置6の回転軸駆動手段6lを制御し、基板支持部4上に搬送されてきた基板1が停止した時点で、センサー8と、センサー8に制御された回転軸駆動手段6lにより基板1の基準位置合わせを行うようにしてもよい。   In addition, this invention is not limited to said one Embodiment, It can change suitably in the range which does not deviate from the meaning. For example, the reference position alignment of the substrate 1 in the transport direction X is performed by pressing the positioning pin 6r against the end 1b on the downstream side in the transport direction X of the substrate 1 after stopping the substrate transport device 6. The pin 6r may be provided on the upstream side in the transport direction X, and the upstream side substrate 1 end 1d may be pressed. In addition, when the substrate 1 has been transported onto the substrate support portion 4, the substrate 1 is moved back and forth in the transport direction X by driving the substrate transport device 6 without using the positioning pins 6 r, thereby transporting the substrate 1 in the transport direction. X reference alignment may be performed. Further, for example, as shown in FIG. 8, a sensor 8 for detecting the end portions 1 b and 1 d of the substrate 1 is provided in the substrate transport device 6, and the rotational axis drive of the substrate transport device 6 shown in FIG. The means 6l is controlled, and when the substrate 1 conveyed onto the substrate support 4 stops, the sensor 8 and the rotation axis driving means 6l controlled by the sensor 8 are used to perform the reference position alignment of the substrate 1. May be.

さらに、基板支持部4に支持した基板1の位置合わせを行うための摩擦力低減手段4hは、例えば基板支持部4の矩形枠部4aや支持部材4dに貫通孔を設け、この貫通孔から圧力気体を吐出することで基板支持部4と基板1との摩擦抵抗をなくし、これにより基板支持部4上で基板1を滑らせて位置合わせを行う構成としてもよい。   Further, the frictional force reducing means 4h for aligning the substrate 1 supported by the substrate support part 4 is provided with a through hole in the rectangular frame part 4a and the support member 4d of the substrate support part 4, for example, and pressure is applied from the through hole. It is also possible to eliminate the frictional resistance between the substrate support portion 4 and the substrate 1 by discharging the gas and thereby perform alignment by sliding the substrate 1 on the substrate support portion 4.

また、基板支持部4は、矩形枠部4aの搬送方向Xに沿う回転軸部5a側と対向する一端辺部4bをなくして櫛状を呈するように形成されてもよい。   Moreover, the board | substrate support part 4 may be formed so that the one end side part 4b facing the rotating shaft part 5a side along the conveyance direction X of the rectangular frame part 4a may be eliminated, and a comb shape may be exhibited.

さらに、本発明の一実施形態では、投光部3から基板1の表面1cに光を照射し、その反射光を観察することによって基板1の検査を行うものとしたが、基板支持部4に支持した基板1の裏面から光を照射し、その透過光を観察することによって検査するように構成してもよい。   Further, in one embodiment of the present invention, the substrate 1 is inspected by irradiating the surface 1c of the substrate 1 from the light projecting unit 3 and observing the reflected light. You may comprise so that it may test | inspect by irradiating light from the back surface of the supported board | substrate 1 and observing the transmitted light.

本発明の一実施形態に係る外観検査装置と基板搬送装置を示した断面図である。It is sectional drawing which showed the external appearance inspection apparatus and board | substrate conveyance apparatus which concern on one Embodiment of this invention. 本発明の一実施形態に係る基板搬送装置を示した斜視図である。It is the perspective view which showed the board | substrate conveyance apparatus which concerns on one Embodiment of this invention. 本発明の一実施形態に係る基板搬送装置と基板支持部を示した斜視図である。It is the perspective view which showed the board | substrate conveyance apparatus and board | substrate support part which concern on one Embodiment of this invention. 本発明の一実施形態に係る基板搬送装置から直接基板を基板支持部に支持させた状態を示す斜視図である。It is a perspective view which shows the state which made the board | substrate support part support the board | substrate directly from the board | substrate conveyance apparatus which concerns on one Embodiment of this invention. 本発明の一実施形態に係る基板支持部に設けた摩擦力低減手段と当付けピンを示す斜視図である。It is a perspective view which shows the frictional force reduction means and contact pin which were provided in the board | substrate support part which concerns on one Embodiment of this invention. 本発明の一実施形態に係る基板支持部によりY方向の基準位置合わせを行った状態を示す斜視図である。It is a perspective view which shows the state which performed the reference position alignment of the Y direction by the board | substrate support part which concerns on one Embodiment of this invention. 本発明の一実施形態に係る基板搬送装置上の基板の搬送方向Xの基準位置合わせを位置決めピンを用いて行った状態を示す斜視図である。It is a perspective view which shows the state which performed the reference position alignment of the conveyance direction X of the board | substrate on the board | substrate conveyance apparatus which concerns on one Embodiment of this invention using the positioning pin. 本発明の一実施形態に係る基板搬送装置上の基板の搬送方向Xの基準位置合わせを行うセンサーを示す斜視図である。It is a perspective view which shows the sensor which performs the reference | standard position alignment of the conveyance direction X of the board | substrate on the board | substrate conveyance apparatus which concerns on one Embodiment of this invention.

符号の説明Explanation of symbols

1 基板
1a 基板の下面(裏面)
1c 基板の表面
3a 光源
4 基板支持部
4h 摩擦力低減手段
6 基板搬送装置
6a 回転軸
6l 回転軸駆動手段
O3 軸線
X 搬送方向
Y 搬送方向の直交方向

1 Substrate 1a Bottom surface (back surface) of substrate
1c Substrate surface 3a Light source 4 Substrate support 4h Friction force reducing means 6 Substrate transport device 6a Rotating shaft 6l Rotating shaft driving means O3 Axis X Conveying direction Y The direction orthogonal to the conveying direction

Claims (3)

光源で発した光を基板支持部に保持した基板に照射させながら前記基板の検査を行う外観検査方法において、
前記基板を搬送する基板搬送装置の搬送面よりも下方に前記基板支持部を配置しておき、該基板支持部の上方に前記基板が搬送されてきた段階で、前記基板支持部を上方に移動するとともに前記基板をすくい上げて該基板支持部に支持させ、前記基板支持部で支持した前記基板に対して検査を行った段階で、前記基板支持部を元の位置に戻すことで前記基板を前記基板搬送装置の前記搬送面上に戻すことを特徴とする外観検査方法。
In the appearance inspection method for inspecting the substrate while irradiating the substrate held by the substrate support with the light emitted from the light source,
The substrate support unit is arranged below the transfer surface of the substrate transfer device that transfers the substrate, and the substrate support unit is moved upward when the substrate is transferred above the substrate support unit. In addition, the substrate is scooped up and supported by the substrate support unit, and when the substrate supported by the substrate support unit is inspected, the substrate support unit is returned to the original position to return the substrate to the original position. An appearance inspection method characterized by returning to the transfer surface of the substrate transfer apparatus.
請求項1記載の外観検査方法において、
前記基板搬送装置の搬送面上を移動する前記基板が前記基板支持部の上方に配された段階で、前記基板の搬送方向の基準位置合わせを前記基板搬送装置の前記搬送面上で行い、前記基板を支持するように移動した前記基板支持部の傾斜によって、前記基板支持部上を滑るように前記基板を前記搬送方向に直交する方向に移動させて前記基板の前記搬送方向に直交する方向の基準位置合わせを行うことを特徴とする外観検査方法。
The appearance inspection method according to claim 1,
In the stage where the substrate moving on the transfer surface of the substrate transfer device is arranged above the substrate support part, the reference position alignment in the transfer direction of the substrate is performed on the transfer surface of the substrate transfer device, and Due to the inclination of the substrate support portion moved so as to support the substrate, the substrate is moved in a direction orthogonal to the transport direction so as to slide on the substrate support portion, and in a direction orthogonal to the transport direction of the substrate. An appearance inspection method characterized by performing reference alignment.
光源で発した光を基板支持部に保持した基板に照射させながら前記基板の検査を行うための外観検査装置であって、
前記基板を搬送する基板搬送装置の搬送面よりも下方に前記基板支持部が配置され、該基板支持部は、上方に搬送されてきた前記基板を上方に移動しつつすくい上げて保持するように構成されていることを特徴とする外観検査装置。

An appearance inspection apparatus for inspecting the substrate while irradiating the substrate held by the substrate support with light emitted from a light source,
The substrate support unit is disposed below a transfer surface of a substrate transfer apparatus that transfers the substrate, and the substrate support unit is configured to scoop up and hold the substrate that has been transferred upward. An appearance inspection apparatus characterized by being made.

JP2006184508A 2006-07-04 2006-07-04 Visual inspection method and system Withdrawn JP2008014706A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009231437A (en) * 2008-03-21 2009-10-08 Olympus Corp Macro inspection device, macro inspection system, and macro inspection method
JP2013079847A (en) * 2011-10-03 2013-05-02 Olympus Corp Substrate inspection apparatus and substrate inspection method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009231437A (en) * 2008-03-21 2009-10-08 Olympus Corp Macro inspection device, macro inspection system, and macro inspection method
JP2013079847A (en) * 2011-10-03 2013-05-02 Olympus Corp Substrate inspection apparatus and substrate inspection method

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