JP2013019053A5 - - Google Patents
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- Publication number
- JP2013019053A5 JP2013019053A5 JP2012155181A JP2012155181A JP2013019053A5 JP 2013019053 A5 JP2013019053 A5 JP 2013019053A5 JP 2012155181 A JP2012155181 A JP 2012155181A JP 2012155181 A JP2012155181 A JP 2012155181A JP 2013019053 A5 JP2013019053 A5 JP 2013019053A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vapor deposition
- deposition apparatus
- plasma
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020110069489A KR101288130B1 (ko) | 2011-07-13 | 2011-07-13 | 기상 증착 장치, 기상 증착 방법 및 유기 발광 표시 장치 제조 방법 |
| KR10-2011-0069489 | 2011-07-13 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013019053A JP2013019053A (ja) | 2013-01-31 |
| JP2013019053A5 true JP2013019053A5 (enExample) | 2015-08-27 |
| JP6022242B2 JP6022242B2 (ja) | 2016-11-09 |
Family
ID=46320770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012155181A Active JP6022242B2 (ja) | 2011-07-13 | 2012-07-11 | 気相蒸着装置、気相蒸着方法及び有機発光表示装置の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8883267B2 (enExample) |
| EP (1) | EP2546386B1 (enExample) |
| JP (1) | JP6022242B2 (enExample) |
| KR (1) | KR101288130B1 (enExample) |
| CN (2) | CN102881550B (enExample) |
| TW (1) | TW201303068A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101288130B1 (ko) * | 2011-07-13 | 2013-07-19 | 삼성디스플레이 주식회사 | 기상 증착 장치, 기상 증착 방법 및 유기 발광 표시 장치 제조 방법 |
| DE102012219667A1 (de) * | 2012-10-26 | 2014-04-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Aufbringen einer Aluminiumoxidschicht auf ein Halbleitersubstrat |
| US20140342102A1 (en) * | 2013-05-20 | 2014-11-20 | Advantech Global, Ltd | Small Feature Size Fabrication Using a Shadow Mask Deposition Process |
| KR102651759B1 (ko) * | 2016-10-11 | 2024-03-29 | 삼성디스플레이 주식회사 | 증착장치 |
| CN108149225A (zh) * | 2018-02-06 | 2018-06-12 | 江苏微导纳米装备科技有限公司 | 一种真空反应装置及反应方法 |
| CN109148728B (zh) * | 2018-08-31 | 2019-10-29 | 昆山国显光电有限公司 | 一种显示面板及显示装置 |
| JP6929265B2 (ja) | 2018-12-13 | 2021-09-01 | キヤノン株式会社 | 有機発光装置とその製造方法、照明装置、移動体、撮像装置、電子機器 |
| KR102635841B1 (ko) * | 2020-10-13 | 2024-02-13 | 에이피시스템 주식회사 | 박막 제조 장치 및 방법 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4664890A (en) * | 1984-06-22 | 1987-05-12 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Glow-discharge decomposition apparatus |
| JP2648684B2 (ja) * | 1993-01-13 | 1997-09-03 | 株式会社 半導体エネルギー研究所 | プラズマ気相反応装置 |
| TW349234B (en) * | 1996-07-15 | 1999-01-01 | Applied Materials Inc | RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| JP4089113B2 (ja) * | 1999-12-28 | 2008-05-28 | 株式会社Ｉｈｉ | 薄膜作成装置 |
| US6949450B2 (en) | 2000-12-06 | 2005-09-27 | Novellus Systems, Inc. | Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber |
| JP4770029B2 (ja) * | 2001-01-22 | 2011-09-07 | 株式会社Ｉｈｉ | プラズマｃｖｄ装置及び太陽電池の製造方法 |
| US6713127B2 (en) * | 2001-12-28 | 2004-03-30 | Applied Materials, Inc. | Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD |
| JP2003328126A (ja) * | 2002-05-09 | 2003-11-19 | Konica Minolta Holdings Inc | パターニング方法及び製膜装置 |
| JP2004055401A (ja) * | 2002-07-22 | 2004-02-19 | Sony Corp | 有機膜形成装置 |
| US20050145181A1 (en) | 2003-12-31 | 2005-07-07 | Dickinson Colin J. | Method and apparatus for high speed atomic layer deposition |
| US20060250084A1 (en) * | 2005-05-04 | 2006-11-09 | Eastman Kodak Company | OLED device with improved light output |
| KR101272321B1 (ko) * | 2005-05-09 | 2013-06-07 | 한국에이에스엠지니텍 주식회사 | 복수의 기체 유입구를 가지는 원자층 증착 장치의 반응기 |
| KR100760428B1 (ko) | 2005-05-13 | 2007-09-20 | 오재응 | 기상 증착 반응기 |
| US7348193B2 (en) * | 2005-06-30 | 2008-03-25 | Corning Incorporated | Hermetic seals for micro-electromechanical system devices |
| JP4949695B2 (ja) * | 2006-02-22 | 2012-06-13 | 三菱重工業株式会社 | 光電変換装置の製造装置および光電変換装置の製造方法 |
| EP2006888A4 (en) * | 2006-03-30 | 2011-11-09 | Mitsui Shipbuilding Eng | METHOD AND DEVICE FOR GROWING A PLASMAATOMIC LAYER |
| WO2008047549A1 (fr) * | 2006-10-12 | 2008-04-24 | Konica Minolta Holdings, Inc. | Substrat de film conducteur transparent et procédé de formation d'un film conducteur transparent à base d'oxyde de titane destiné à être utilisé avec celui-ci |
| US20080241384A1 (en) * | 2007-04-02 | 2008-10-02 | Asm Genitech Korea Ltd. | Lateral flow deposition apparatus and method of depositing film by using the apparatus |
| JP2009024224A (ja) * | 2007-07-20 | 2009-02-05 | Konica Minolta Holdings Inc | 炭素膜形成方法 |
| TW200927983A (en) | 2007-12-21 | 2009-07-01 | Ind Tech Res Inst | Atmospheric pressure plasma processing apparatus |
| JP5215685B2 (ja) * | 2008-02-14 | 2013-06-19 | 三井造船株式会社 | 原子層成長装置 |
| KR101006583B1 (ko) | 2008-07-28 | 2011-01-07 | 신웅철 | 수평 배치형 원자층 증착 장치 |
| US8851012B2 (en) | 2008-09-17 | 2014-10-07 | Veeco Ald Inc. | Vapor deposition reactor using plasma and method for forming thin film using the same |
| KR101226426B1 (ko) * | 2008-09-17 | 2013-01-24 | 시너스 테크놀리지, 인코포레이티드 | 플라즈마를 이용한 기상 증착 반응기 및 이를 이용한 박막 형성 방법 |
| KR101097321B1 (ko) * | 2009-12-14 | 2011-12-23 | 삼성모바일디스플레이주식회사 | 유기 발광 장치 및 이의 제조 방법 |
| KR101288130B1 (ko) * | 2011-07-13 | 2013-07-19 | 삼성디스플레이 주식회사 | 기상 증착 장치, 기상 증착 방법 및 유기 발광 표시 장치 제조 방법 |
-
2011
- 2011-07-13 KR KR1020110069489A patent/KR101288130B1/ko active Active
-
2012
- 2012-03-27 US US13/431,880 patent/US8883267B2/en active Active
- 2012-05-23 TW TW101118418A patent/TW201303068A/zh unknown
- 2012-05-23 EP EP12169161.2A patent/EP2546386B1/en active Active
- 2012-07-11 JP JP2012155181A patent/JP6022242B2/ja active Active
- 2012-07-12 CN CN201210241887.4A patent/CN102881550B/zh active Active
- 2012-07-12 CN CN2012203384828U patent/CN202808936U/zh not_active Expired - Lifetime
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