JP2012533888A - 溝付きcmp研磨pad - Google Patents
溝付きcmp研磨pad Download PDFInfo
- Publication number
- JP2012533888A JP2012533888A JP2012520766A JP2012520766A JP2012533888A JP 2012533888 A JP2012533888 A JP 2012533888A JP 2012520766 A JP2012520766 A JP 2012520766A JP 2012520766 A JP2012520766 A JP 2012520766A JP 2012533888 A JP2012533888 A JP 2012533888A
- Authority
- JP
- Japan
- Prior art keywords
- polishing pad
- polishing
- pad
- groove
- grooves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Abstract
Description
Claims (20)
- 基板の化学機械研磨における使用に適した研磨パッドであって、
当該研磨パッドが、ランディング面が溝を隔てた状態で複数の溝を画成する表面を具備し、前記ランディング面がほぼ同一平面上の研磨面を全体として画成し、各溝が、幅WLを有するランディング面によって任意の二つの隣接溝が隔てられた状態で、少なくとも0.25mmの深さと、幅WGとを有し、率WL/WGが3以下である、研磨パッド。 - 前記複数の溝が同心の実質的に円状の溝を具備する、請求項1に記載の研磨パッド。
- 前記溝が1.3mm以下の深さを有する、請求項1に記載の研磨パッド。
- 各溝の深さが0.25〜1.3mmの範囲内である、請求項1に記載の研磨パッド。
- 各ランディング面についてのWLが2.0mm以下である、請求項1に記載の研磨パッド。
- 各ランディング面についてのWLが0.76〜1.5mmの範囲内である、請求項1に記載の研磨パッド。
- 各溝についてのWGが0.48〜0.96mmの範囲内である、請求項1に記載の研磨パッド。
- 各溝がほぼ同じ深さを有する、請求項1に記載の研磨パッド。
- 各溝がほぼ同じWGを有する、請求項1に記載の研磨パッド。
- 各ランディング面がほぼ同じWLを有する、請求項1に記載の研磨パッド。
- 基板の化学機械研磨における使用に適した研磨パッドであって、
当該研磨パッドが、渦巻状ランディング面が複数ターンの渦巻状溝を隔てた状態で渦巻状溝を画成する表面を具備し、前記渦巻状ランディング面がほぼ同一平面上の研磨面を画成し、前記溝が、少なくとも0.25mmの深さと、幅WGとを有し、前記ランディング面が幅WLを有し、率WL/WGが3以下である、研磨パッド。 - 前記渦巻状溝が1.3mm以下の深さを有する、請求項11に記載の研磨パッド。
- 前記溝の深さが0.25〜1.3mmの範囲内である、請求項11に記載の研磨パッド。
- WLが2.0mm以下である、請求項11に記載の研磨パッド。
- WLが0.76〜1.5mmの範囲内である、請求項11に記載の研磨パッド。
- WGが0.48〜0.96mmの範囲内である、請求項11に記載の研磨パッド。
- 前記率WL/WGが2以下である、請求項11に記載の研磨パッド。
- 前記率WL/WGが1以下である、請求項11に記載の研磨パッド。
- 前記率WL/WGが2以下である、請求項1に記載の研磨パッド。
- 前記率WL/WGが1以下である、請求項1に記載の研磨パッド。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US27106809P | 2009-07-16 | 2009-07-16 | |
US61/271,068 | 2009-07-16 | ||
PCT/US2010/042073 WO2011008918A2 (en) | 2009-07-16 | 2010-07-15 | Grooved cmp polishing pad |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2012533888A true JP2012533888A (ja) | 2012-12-27 |
Family
ID=43450188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012520766A Pending JP2012533888A (ja) | 2009-07-16 | 2010-07-15 | 溝付きcmp研磨pad |
Country Status (7)
Country | Link |
---|---|
US (1) | US20110014858A1 (ja) |
JP (1) | JP2012533888A (ja) |
KR (1) | KR101478414B1 (ja) |
CN (1) | CN102498549A (ja) |
SG (2) | SG177625A1 (ja) |
TW (1) | TWI519384B (ja) |
WO (1) | WO2011008918A2 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009018434B4 (de) * | 2009-04-22 | 2023-11-30 | Ev Group Gmbh | Aufnahmeeinrichtung zur Aufnahme von Halbleitersubstraten |
DE102011082777A1 (de) * | 2011-09-15 | 2012-02-09 | Siltronic Ag | Verfahren zum beidseitigen Polieren einer Halbleiterscheibe |
JP2014124718A (ja) * | 2012-12-26 | 2014-07-07 | Toyo Tire & Rubber Co Ltd | 積層研磨パッドの製造方法 |
TWI599447B (zh) * | 2013-10-18 | 2017-09-21 | 卡博特微電子公司 | 具有偏移同心溝槽圖樣之邊緣排除區的cmp拋光墊 |
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
CN113579992A (zh) | 2014-10-17 | 2021-11-02 | 应用材料公司 | 使用加成制造工艺的具复合材料特性的cmp衬垫建构 |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
WO2017074773A1 (en) | 2015-10-30 | 2017-05-04 | Applied Materials, Inc. | An apparatus and method of forming a polishing article that has a desired zeta potential |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US10875146B2 (en) * | 2016-03-24 | 2020-12-29 | Rohm And Haas Electronic Materials Cmp Holdings | Debris-removal groove for CMP polishing pad |
USD816774S1 (en) * | 2016-03-25 | 2018-05-01 | Craig Franklin Edevold | Spiral pattern for cribbage board |
SG11201906131WA (en) * | 2017-01-20 | 2019-08-27 | Applied Materials Inc | A thin plastic polishing article for cmp applications |
USD855110S1 (en) * | 2017-01-31 | 2019-07-30 | Gary Peterson | Game board |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
KR20210042171A (ko) | 2018-09-04 | 2021-04-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 진보한 폴리싱 패드들을 위한 제형들 |
CN112720282B (zh) * | 2020-12-31 | 2022-04-08 | 湖北鼎汇微电子材料有限公司 | 一种抛光垫 |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
CN113829176B (zh) * | 2021-08-31 | 2023-04-14 | 北京航天控制仪器研究所 | 一种用于铍材镜体研磨抛光的研磨平板及研磨抛光方法 |
CN114274043B (zh) * | 2021-12-29 | 2023-02-24 | 湖北鼎汇微电子材料有限公司 | 一种抛光垫 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004009156A (ja) * | 2002-06-03 | 2004-01-15 | Jsr Corp | 研磨パッド及び複層型研磨パッド |
JP2004034176A (ja) * | 2002-06-28 | 2004-02-05 | Jsr Corp | 研磨パッド |
JP2004071985A (ja) * | 2002-08-08 | 2004-03-04 | Jsr Corp | 半導体ウェハ用研磨パッドの加工方法及び半導体ウェハ用研磨パッド |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5921855A (en) * | 1997-05-15 | 1999-07-13 | Applied Materials, Inc. | Polishing pad having a grooved pattern for use in a chemical mechanical polishing system |
DE60109601T2 (de) * | 2000-05-27 | 2006-02-09 | Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington | Rillen-polierkissen zum chemisch-mechanischen planarisieren |
US6736709B1 (en) * | 2000-05-27 | 2004-05-18 | Rodel Holdings, Inc. | Grooved polishing pads for chemical mechanical planarization |
JP3658591B2 (ja) * | 2002-04-03 | 2005-06-08 | 東邦エンジニアリング株式会社 | 研磨パッドおよび該研磨パッドを用いた半導体基板の製造方法 |
US20040014413A1 (en) * | 2002-06-03 | 2004-01-22 | Jsr Corporation | Polishing pad and multi-layer polishing pad |
JP2004167605A (ja) * | 2002-11-15 | 2004-06-17 | Rodel Nitta Co | 研磨パッドおよび研磨装置 |
JP3872081B2 (ja) * | 2004-12-29 | 2007-01-24 | 東邦エンジニアリング株式会社 | 研磨用パッド |
CN101024260A (zh) * | 2006-02-24 | 2007-08-29 | 三芳化学工业股份有限公司 | 具有表面纹路的抛光垫和其制造方法与制造装置 |
US8192257B2 (en) * | 2006-04-06 | 2012-06-05 | Micron Technology, Inc. | Method of manufacture of constant groove depth pads |
-
2010
- 2010-07-15 WO PCT/US2010/042073 patent/WO2011008918A2/en active Application Filing
- 2010-07-15 CN CN2010800414168A patent/CN102498549A/zh active Pending
- 2010-07-15 SG SG2012002234A patent/SG177625A1/en unknown
- 2010-07-15 KR KR1020127003925A patent/KR101478414B1/ko not_active IP Right Cessation
- 2010-07-15 SG SG10201404152UA patent/SG10201404152UA/en unknown
- 2010-07-15 JP JP2012520766A patent/JP2012533888A/ja active Pending
- 2010-07-16 TW TW099123549A patent/TWI519384B/zh not_active IP Right Cessation
- 2010-07-16 US US12/837,705 patent/US20110014858A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004009156A (ja) * | 2002-06-03 | 2004-01-15 | Jsr Corp | 研磨パッド及び複層型研磨パッド |
JP2004034176A (ja) * | 2002-06-28 | 2004-02-05 | Jsr Corp | 研磨パッド |
JP2004071985A (ja) * | 2002-08-08 | 2004-03-04 | Jsr Corp | 半導体ウェハ用研磨パッドの加工方法及び半導体ウェハ用研磨パッド |
Also Published As
Publication number | Publication date |
---|---|
US20110014858A1 (en) | 2011-01-20 |
TW201121711A (en) | 2011-07-01 |
KR20120042985A (ko) | 2012-05-03 |
KR101478414B1 (ko) | 2014-12-31 |
TWI519384B (zh) | 2016-02-01 |
WO2011008918A3 (en) | 2011-04-28 |
SG177625A1 (en) | 2012-02-28 |
WO2011008918A2 (en) | 2011-01-20 |
CN102498549A (zh) | 2012-06-13 |
SG10201404152UA (en) | 2014-09-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2012533888A (ja) | 溝付きcmp研磨pad | |
KR101161883B1 (ko) | 고정화된 3차원 연삭 용품의 제자리 활성화 | |
US8133096B2 (en) | Multi-phase polishing pad | |
JP6468999B2 (ja) | 化学機械研磨パッドコンディショナ | |
JP2008062367A (ja) | 研磨装置、研磨パッド、研磨方法 | |
US10272540B2 (en) | System and method for polishing substrate | |
WO2006009634A1 (en) | Continuous contour polishing of a multi-material surface | |
US20060276111A1 (en) | Conditioning element for electrochemical mechanical processing | |
KR20110124988A (ko) | Cmp 패드 컨디셔너 및 그 제조방법 | |
US6800020B1 (en) | Web-style pad conditioning system and methods for implementing the same | |
WO2015015706A1 (ja) | ドレッシング方法及びドレッシング装置 | |
JP2012130995A (ja) | ドレッサ | |
JP3797948B2 (ja) | ダイヤモンド工具 | |
TWI735795B (zh) | 拋光墊修整器及化學機械平坦化的方法 | |
WO2018118047A1 (en) | Conditioning disks to condition semiconductor wafer polishing pads | |
KR101808150B1 (ko) | Cmp 패드 컨디셔너 | |
KR100678303B1 (ko) | 화학 기계적 연마(cmp) 패드 드레서 및 화학 기계적연마(cmp) 장치 | |
KR101162759B1 (ko) | Cvd 패드 컨디셔너 전처리방법 및 상기 방법으로 전 처리된 cvd 패드 컨디셔너 | |
Tseng et al. | Microreplicated pad conditioner for copper and copper barrier CMP applications | |
CN110871407A (zh) | 抛光垫修整器及化学机械平坦化的方法 | |
Ishizuka et al. | PCD Dressers for Chemical Mechanical Planarization with Uniform Polishing | |
KR20150058127A (ko) | Cmp 패드 컨디셔너 | |
JP2015018835A (ja) | 研磨パッドおよび化学的機械的研磨装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20121001 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131126 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140225 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140304 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140526 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20141202 |