JP2012531748A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012531748A5 JP2012531748A5 JP2012517635A JP2012517635A JP2012531748A5 JP 2012531748 A5 JP2012531748 A5 JP 2012531748A5 JP 2012517635 A JP2012517635 A JP 2012517635A JP 2012517635 A JP2012517635 A JP 2012517635A JP 2012531748 A5 JP2012531748 A5 JP 2012531748A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning agent
- application example
- particles
- dry
- pva particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012459 cleaning agent Substances 0.000 claims description 38
- 239000002245 particle Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 19
- 239000004372 Polyvinyl alcohol Substances 0.000 description 23
- 229920002451 polyvinyl alcohol Polymers 0.000 description 23
- 239000000356 contaminant Substances 0.000 description 13
- 239000007788 liquid Substances 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000011148 porous material Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 4
- 239000003599 detergent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000007792 addition Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/491,213 US8367594B2 (en) | 2009-06-24 | 2009-06-24 | Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particles |
| US12/491,213 | 2009-06-24 | ||
| PCT/US2010/039396 WO2010151513A1 (en) | 2009-06-24 | 2010-06-21 | Damage-free high efficiency particle removal clean |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012531748A JP2012531748A (ja) | 2012-12-10 |
| JP2012531748A5 true JP2012531748A5 (enExample) | 2013-08-08 |
| JP5662435B2 JP5662435B2 (ja) | 2015-01-28 |
Family
ID=43381398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012517635A Expired - Fee Related JP5662435B2 (ja) | 2009-06-24 | 2010-06-21 | 損傷を与えない高効率な粒子除去洗浄 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8367594B2 (enExample) |
| JP (1) | JP5662435B2 (enExample) |
| KR (1) | KR101625703B1 (enExample) |
| CN (1) | CN102803564B (enExample) |
| SG (1) | SG176795A1 (enExample) |
| TW (1) | TWI518757B (enExample) |
| WO (1) | WO2010151513A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170056631A (ko) * | 2014-09-18 | 2017-05-23 | 어플라이드 머티어리얼스, 인코포레이티드 | 엔지니어링된 점성 유체를 이용한 고효율 cmp 후 세정을 위한 방법 및 장치 |
| CN106319848B (zh) * | 2015-06-29 | 2020-05-22 | 青岛海尔滚筒洗衣机有限公司 | 一种滚筒洗衣机 |
| KR102208754B1 (ko) | 2017-07-10 | 2021-01-28 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
| US10748757B2 (en) | 2017-09-21 | 2020-08-18 | Honeywell International, Inc. | Thermally removable fill materials for anti-stiction applications |
| US10727044B2 (en) | 2017-09-21 | 2020-07-28 | Honeywell International Inc. | Fill material to mitigate pattern collapse |
| US10468243B2 (en) | 2017-11-22 | 2019-11-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing semiconductor device and method of cleaning substrate |
| WO2020077406A1 (en) * | 2018-10-16 | 2020-04-23 | Saban Ventures Pty Limited | Apparatus and method for cleaning a medical device |
| CN111744891B (zh) * | 2020-05-22 | 2022-06-10 | 西安奕斯伟材料科技有限公司 | 研磨机吸附台表面的清洁方法 |
| CN111760847A (zh) * | 2020-06-19 | 2020-10-13 | 东莞市佳骏电子科技有限公司 | 一种半导体产品的清洗工艺 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6012A (en) * | 1849-01-09 | Lithographing co | ||
| US9015A (en) * | 1852-06-15 | Manufacture of granular fuel from brush-wood and twigs | ||
| US3819525A (en) * | 1972-08-21 | 1974-06-25 | Avon Prod Inc | Cosmetic cleansing preparation |
| JPS54153779A (en) | 1978-05-25 | 1979-12-04 | Kuraray Co Ltd | Preparation of polyvinyl alcohol base selective transmission membrane |
| US4777089A (en) * | 1985-05-08 | 1988-10-11 | Lion Corporation | Microcapsule containing hydrous composition |
| JP2562624B2 (ja) * | 1986-11-07 | 1996-12-11 | 昭和電工株式会社 | 水溶性マイクロカプセルおよび液体洗剤組成物 |
| US5281357A (en) * | 1993-03-25 | 1994-01-25 | Lever Brothers Company, Division Of Conopco, Inc. | Protease containing heavy duty liquid detergent compositions comprising capsules comprising non-proteolytic enzyme and composite polymer |
| US20030162398A1 (en) * | 2002-02-11 | 2003-08-28 | Small Robert J. | Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
| US7799752B2 (en) * | 2002-08-14 | 2010-09-21 | Quest International Services B.V. | Compositions comprising encapsulated material |
| US7737097B2 (en) | 2003-06-27 | 2010-06-15 | Lam Research Corporation | Method for removing contamination from a substrate and for making a cleaning solution |
| JP4668528B2 (ja) * | 2003-09-05 | 2011-04-13 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
| US20050136670A1 (en) * | 2003-12-19 | 2005-06-23 | Ameen Joseph G. | Compositions and methods for controlled polishing of copper |
| US20050194562A1 (en) * | 2004-02-23 | 2005-09-08 | Lavoie Raymond L.Jr. | Polishing compositions for controlling metal interconnect removal rate in semiconductor wafers |
| JP4814502B2 (ja) * | 2004-09-09 | 2011-11-16 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びそれを用いた研磨方法 |
| JP2006278392A (ja) | 2005-03-28 | 2006-10-12 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
| JP4912791B2 (ja) * | 2006-08-21 | 2012-04-11 | Jsr株式会社 | 洗浄用組成物、洗浄方法及び半導体装置の製造方法 |
| US8211846B2 (en) * | 2007-12-14 | 2012-07-03 | Lam Research Group | Materials for particle removal by single-phase and two-phase media |
| US7915215B2 (en) * | 2008-10-17 | 2011-03-29 | Appleton Papers Inc. | Fragrance-delivery composition comprising boron and persulfate ion-crosslinked polyvinyl alcohol microcapsules and method of use thereof |
| US8227394B2 (en) * | 2008-11-07 | 2012-07-24 | Lam Research Corporation | Composition of a cleaning material for particle removal |
-
2009
- 2009-06-24 US US12/491,213 patent/US8367594B2/en not_active Expired - Fee Related
-
2010
- 2010-06-21 KR KR1020117030897A patent/KR101625703B1/ko not_active Expired - Fee Related
- 2010-06-21 SG SG2011091691A patent/SG176795A1/en unknown
- 2010-06-21 JP JP2012517635A patent/JP5662435B2/ja not_active Expired - Fee Related
- 2010-06-21 CN CN201080027509.5A patent/CN102803564B/zh not_active Expired - Fee Related
- 2010-06-21 WO PCT/US2010/039396 patent/WO2010151513A1/en not_active Ceased
- 2010-06-24 TW TW099120641A patent/TWI518757B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012531748A5 (enExample) | ||
| JP5237825B2 (ja) | 半導体基板を洗浄する方法および装置 | |
| CN102209595B (zh) | 两相污染物移除介质的组成和应用 | |
| JP5518163B2 (ja) | 半導体基板を洗浄する方法および装置 | |
| JP5662435B2 (ja) | 損傷を与えない高効率な粒子除去洗浄 | |
| CN104002252B (zh) | 超细磨料生物高分子柔性抛光膜及其制备方法 | |
| TWI789534B (zh) | 熱剝離型黏著片 | |
| TWI738812B (zh) | 表面處理組合物 | |
| TW201033357A (en) | Composition of a cleaning material for particle removal | |
| JP2016538359A5 (enExample) | ||
| US20160083676A1 (en) | Method and apparatus for high efficiency post cmp clean using engineered viscous fluid | |
| US9723915B2 (en) | Brush cleaning method | |
| CN105102391B (zh) | 带保护膜的玻璃制品和其制造方法 | |
| TWI617524B (zh) | Glass product with protective film and manufacturing method thereof | |
| JP2016139690A (ja) | レーザーダイシング用保護膜組成物及びその応用 | |
| CN213988837U (zh) | 晶圆双面清洗设备 | |
| CN204149063U (zh) | 湿制程夹持机构 | |
| HK40066721A (zh) | 工作表面清理系统和方法 | |
| Kashyap et al. | Silicon substrate strength enhancement depending on nanostructure morphology | |
| JP2016017127A (ja) | 仮固定用ホットメルト接着シート、積層体、および、被加工部材の加工方法 |