TWI518757B - 清理材料及使用該清理材料的清理設備 - Google Patents
清理材料及使用該清理材料的清理設備 Download PDFInfo
- Publication number
- TWI518757B TWI518757B TW099120641A TW99120641A TWI518757B TW I518757 B TWI518757 B TW I518757B TW 099120641 A TW099120641 A TW 099120641A TW 99120641 A TW99120641 A TW 99120641A TW I518757 B TWI518757 B TW I518757B
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning
- cleaning material
- particles
- substrate
- pva
- Prior art date
Links
- 239000011538 cleaning material Substances 0.000 title claims description 154
- 238000004140 cleaning Methods 0.000 title claims description 153
- 239000000758 substrate Substances 0.000 claims description 207
- 239000002245 particle Substances 0.000 claims description 199
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 171
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 171
- 239000000356 contaminant Substances 0.000 claims description 140
- 229920000642 polymer Polymers 0.000 claims description 53
- 239000007788 liquid Substances 0.000 claims description 40
- 239000004065 semiconductor Substances 0.000 claims description 36
- 239000000126 substance Substances 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 14
- 230000007246 mechanism Effects 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 14
- 238000011109 contamination Methods 0.000 claims description 7
- 239000008367 deionised water Substances 0.000 claims description 7
- 229910021641 deionized water Inorganic materials 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000003344 environmental pollutant Substances 0.000 claims description 5
- 230000003993 interaction Effects 0.000 claims description 5
- 231100000719 pollutant Toxicity 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 230000008961 swelling Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 31
- 238000001035 drying Methods 0.000 description 23
- 238000011010 flushing procedure Methods 0.000 description 9
- 230000005499 meniscus Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000009472 formulation Methods 0.000 description 7
- 239000002699 waste material Substances 0.000 description 7
- 230000001747 exhibiting effect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007792 addition Methods 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000009933 burial Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910021654 trace metal Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3753—Polyvinylalcohol; Ethers or esters thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
- C11D17/0013—Liquid compositions with insoluble particles in suspension
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
- C11D17/003—Colloidal solutions, e.g. gels; Thixotropic solutions or pastes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Dispersion Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/491,213 US8367594B2 (en) | 2009-06-24 | 2009-06-24 | Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201110210A TW201110210A (en) | 2011-03-16 |
| TWI518757B true TWI518757B (zh) | 2016-01-21 |
Family
ID=43381398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099120641A TWI518757B (zh) | 2009-06-24 | 2010-06-24 | 清理材料及使用該清理材料的清理設備 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8367594B2 (enExample) |
| JP (1) | JP5662435B2 (enExample) |
| KR (1) | KR101625703B1 (enExample) |
| CN (1) | CN102803564B (enExample) |
| SG (1) | SG176795A1 (enExample) |
| TW (1) | TWI518757B (enExample) |
| WO (1) | WO2010151513A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170056631A (ko) * | 2014-09-18 | 2017-05-23 | 어플라이드 머티어리얼스, 인코포레이티드 | 엔지니어링된 점성 유체를 이용한 고효율 ｃｍｐ 후 세정을 위한 방법 및 장치 |
| CN106319848B (zh) * | 2015-06-29 | 2020-05-22 | 青岛海尔滚筒洗衣机有限公司 | 一种滚筒洗衣机 |
| KR102208754B1 (ko) | 2017-07-10 | 2021-01-28 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
| US10748757B2 (en) | 2017-09-21 | 2020-08-18 | Honeywell International, Inc. | Thermally removable fill materials for anti-stiction applications |
| US10727044B2 (en) | 2017-09-21 | 2020-07-28 | Honeywell International Inc. | Fill material to mitigate pattern collapse |
| US10468243B2 (en) | 2017-11-22 | 2019-11-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing semiconductor device and method of cleaning substrate |
| WO2020077406A1 (en) * | 2018-10-16 | 2020-04-23 | Saban Ventures Pty Limited | Apparatus and method for cleaning a medical device |
| CN111744891B (zh) * | 2020-05-22 | 2022-06-10 | 西安奕斯伟材料科技有限公司 | 研磨机吸附台表面的清洁方法 |
| CN111760847A (zh) * | 2020-06-19 | 2020-10-13 | 东莞市佳骏电子科技有限公司 | 一种半导体产品的清洗工艺 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6012A (en) * | 1849-01-09 | Lithographing co | ||
| US9015A (en) * | 1852-06-15 | Manufacture of granular fuel from brush-wood and twigs | ||
| US3819525A (en) * | 1972-08-21 | 1974-06-25 | Avon Prod Inc | Cosmetic cleansing preparation |
| JPS54153779A (en) | 1978-05-25 | 1979-12-04 | Kuraray Co Ltd | Preparation of polyvinyl alcohol base selective transmission membrane |
| US4777089A (en) * | 1985-05-08 | 1988-10-11 | Lion Corporation | Microcapsule containing hydrous composition |
| JP2562624B2 (ja) * | 1986-11-07 | 1996-12-11 | 昭和電工株式会社 | 水溶性マイクロカプセルおよび液体洗剤組成物 |
| US5281357A (en) * | 1993-03-25 | 1994-01-25 | Lever Brothers Company, Division Of Conopco, Inc. | Protease containing heavy duty liquid detergent compositions comprising capsules comprising non-proteolytic enzyme and composite polymer |
| US20030162398A1 (en) * | 2002-02-11 | 2003-08-28 | Small Robert J. | Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
| US7799752B2 (en) * | 2002-08-14 | 2010-09-21 | Quest International Services B.V. | Compositions comprising encapsulated material |
| US7737097B2 (en) | 2003-06-27 | 2010-06-15 | Lam Research Corporation | Method for removing contamination from a substrate and for making a cleaning solution |
| JP4668528B2 (ja) * | 2003-09-05 | 2011-04-13 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
| US20050136670A1 (en) * | 2003-12-19 | 2005-06-23 | Ameen Joseph G. | Compositions and methods for controlled polishing of copper |
| US20050194562A1 (en) * | 2004-02-23 | 2005-09-08 | Lavoie Raymond L.Jr. | Polishing compositions for controlling metal interconnect removal rate in semiconductor wafers |
| JP4814502B2 (ja) * | 2004-09-09 | 2011-11-16 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びそれを用いた研磨方法 |
| JP2006278392A (ja) | 2005-03-28 | 2006-10-12 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
| JP4912791B2 (ja) * | 2006-08-21 | 2012-04-11 | Ｊｓｒ株式会社 | 洗浄用組成物、洗浄方法及び半導体装置の製造方法 |
| US8211846B2 (en) * | 2007-12-14 | 2012-07-03 | Lam Research Group | Materials for particle removal by single-phase and two-phase media |
| US7915215B2 (en) * | 2008-10-17 | 2011-03-29 | Appleton Papers Inc. | Fragrance-delivery composition comprising boron and persulfate ion-crosslinked polyvinyl alcohol microcapsules and method of use thereof |
| US8227394B2 (en) * | 2008-11-07 | 2012-07-24 | Lam Research Corporation | Composition of a cleaning material for particle removal |
-
2009
- 2009-06-24 US US12/491,213 patent/US8367594B2/en not_active Expired - Fee Related
-
2010
- 2010-06-21 KR KR1020117030897A patent/KR101625703B1/ko not_active Expired - Fee Related
- 2010-06-21 SG SG2011091691A patent/SG176795A1/en unknown
- 2010-06-21 JP JP2012517635A patent/JP5662435B2/ja not_active Expired - Fee Related
- 2010-06-21 CN CN201080027509.5A patent/CN102803564B/zh not_active Expired - Fee Related
- 2010-06-21 WO PCT/US2010/039396 patent/WO2010151513A1/en not_active Ceased
- 2010-06-24 TW TW099120641A patent/TWI518757B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR20120109999A (ko) | 2012-10-09 |
| JP5662435B2 (ja) | 2015-01-28 |
| CN102803564A (zh) | 2012-11-28 |
| WO2010151513A1 (en) | 2010-12-29 |
| CN102803564B (zh) | 2015-04-29 |
| US8367594B2 (en) | 2013-02-05 |
| TW201110210A (en) | 2011-03-16 |
| US20100331226A1 (en) | 2010-12-30 |
| KR101625703B1 (ko) | 2016-05-30 |
| SG176795A1 (en) | 2012-01-30 |
| JP2012531748A (ja) | 2012-12-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |