JP2012527765A5 - - Google Patents
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- JP2012527765A5 JP2012527765A5 JP2012511391A JP2012511391A JP2012527765A5 JP 2012527765 A5 JP2012527765 A5 JP 2012527765A5 JP 2012511391 A JP2012511391 A JP 2012511391A JP 2012511391 A JP2012511391 A JP 2012511391A JP 2012527765 A5 JP2012527765 A5 JP 2012527765A5
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- 238000000034 method Methods 0.000 claims description 79
- 238000009792 diffusion process Methods 0.000 claims description 21
- 238000013139 quantization Methods 0.000 claims description 11
- 238000005070 sampling Methods 0.000 claims description 10
- 238000009877 rendering Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000001459 lithography Methods 0.000 claims 2
- 241000023320 Luma <angiosperm> Species 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- OSWPMRLSEDHDFF-UHFFFAOYSA-N methyl salicylate Chemical compound COC(=O)C1=CC=CC=C1O OSWPMRLSEDHDFF-UHFFFAOYSA-N 0.000 claims 1
- 238000007781 pre-processing Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17976509P | 2009-05-20 | 2009-05-20 | |
| US17976009P | 2009-05-20 | 2009-05-20 | |
| US61/179,765 | 2009-05-20 | ||
| US61/179,760 | 2009-05-20 | ||
| US25712209P | 2009-11-02 | 2009-11-02 | |
| US61/257,122 | 2009-11-02 | ||
| PCT/IB2010/052180 WO2010134018A2 (en) | 2009-05-20 | 2010-05-17 | Pattern data conversion for lithography system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012527765A JP2012527765A (ja) | 2012-11-08 |
| JP2012527765A5 true JP2012527765A5 (https=) | 2013-07-04 |
| JP5801289B2 JP5801289B2 (ja) | 2015-10-28 |
Family
ID=43126596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012511391A Active JP5801289B2 (ja) | 2009-05-20 | 2010-05-17 | リソグラフシステムのためのパターンデータ変換 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8710465B2 (https=) |
| EP (1) | EP2443647B1 (https=) |
| JP (1) | JP5801289B2 (https=) |
| KR (1) | KR101614460B1 (https=) |
| CN (1) | CN102460633B (https=) |
| TW (1) | TWI485530B (https=) |
| WO (1) | WO2010134018A2 (https=) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003276779A1 (en) * | 2002-10-30 | 2004-05-25 | Mapper Lithography Ip B.V. | Electron beam exposure system |
| EP2433294B1 (en) * | 2009-05-20 | 2016-07-27 | Mapper Lithography IP B.V. | Method of generating a two-level pattern for lithographic processing and pattern generator using the same |
| KR101757837B1 (ko) * | 2009-05-20 | 2017-07-26 | 마퍼 리쏘그라피 아이피 비.브이. | 듀얼 패스 스캐닝 |
| US9482963B2 (en) | 2010-12-20 | 2016-11-01 | Asml Netherlands B.V. | Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus |
| JP5951753B2 (ja) * | 2011-04-22 | 2016-07-13 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | リソグラフィ機のクラスタのためのネットワークアーキテクチャおよびプロトコル |
| WO2012177282A1 (en) * | 2011-06-23 | 2012-12-27 | Intel Corporation | Stochastic rasterization with selective culling |
| JP5836773B2 (ja) | 2011-11-25 | 2015-12-24 | キヤノン株式会社 | 描画装置、及び物品の製造方法 |
| WO2013079316A2 (en) * | 2011-11-29 | 2013-06-06 | Asml Netherlands B.V. | Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method |
| JP5881851B2 (ja) | 2011-12-06 | 2016-03-09 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置、セットポイントデータを提供する装置、デバイス製造方法、セットポイントデータの計算方法、およびコンピュータプログラム |
| US9354502B2 (en) | 2012-01-12 | 2016-05-31 | Asml Netherlands B.V. | Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program |
| US8893059B2 (en) | 2012-02-06 | 2014-11-18 | Kla-Tencor Corporation | Pattern data system for high-performance maskless electron beam lithography |
| JP6128744B2 (ja) * | 2012-04-04 | 2017-05-17 | キヤノン株式会社 | 描画装置、描画方法、および、物品の製造方法 |
| FR2994749B1 (fr) | 2012-08-24 | 2015-07-24 | Commissariat Energie Atomique | Procede de preparation d’un motif a imprimer sur plaque ou sur masque par lithographie a faisceau d’electrons, systeme de conception de circuit imprime et programme d’ordinateur correspondants. |
| JP2014049467A (ja) * | 2012-08-29 | 2014-03-17 | Canon Inc | 描画装置、それを用いた物品の製造方法 |
| US9245714B2 (en) | 2012-10-01 | 2016-01-26 | Kla-Tencor Corporation | System and method for compressed data transmission in a maskless lithography system |
| CN102956420B (zh) * | 2012-10-30 | 2016-11-16 | 中国科学院上海应用物理研究所 | 电子射线源产生装置及产生低剂量率电子射线的方法 |
| JP6215586B2 (ja) * | 2012-11-02 | 2017-10-18 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置 |
| JP2014110307A (ja) * | 2012-11-30 | 2014-06-12 | Canon Inc | 描画装置、および、物品の製造方法 |
| JP2014204012A (ja) * | 2013-04-05 | 2014-10-27 | キヤノン株式会社 | 描画装置、及び物品の製造方法 |
| CN106896647B (zh) * | 2013-10-22 | 2019-05-10 | 应用材料公司 | 用于基于网的处理的无掩模平版印刷 |
| US9460260B2 (en) * | 2014-02-21 | 2016-10-04 | Mapper Lithography Ip B.V. | Enhanced stitching by overlap dose and feature reduction |
| EP2950325B1 (en) * | 2014-05-30 | 2018-11-28 | IMS Nanofabrication GmbH | Compensation of dose inhomogeneity using overlapping exposure spots |
| US20150372096A1 (en) * | 2014-06-20 | 2015-12-24 | Ishiang Shih | High Electron Mobility Transistors and Integrated Circuits with Improved Feature Uniformity and Reduced defects for Microwave and Millimetre Wave Applications |
| KR20160049171A (ko) | 2014-10-24 | 2016-05-09 | 삼성디스플레이 주식회사 | 마스크리스 노광 장치, 마스크리스 노광 방법 및 이에 의해 제조되는 표시 기판 |
| KR102418581B1 (ko) * | 2015-10-21 | 2022-07-08 | 삼성전자주식회사 | 패턴 생성 방법 및 이를 수행하기 위한 패턴 발생기 |
| US10460071B2 (en) * | 2015-11-04 | 2019-10-29 | D2S, Inc. | Shaped beam lithography including temperature effects |
| US9852876B2 (en) | 2016-02-08 | 2017-12-26 | Nuflare Technology, Inc. | Multi charged particle beam writing apparatus and multi charged particle beam writing method |
| US20180068047A1 (en) | 2016-09-08 | 2018-03-08 | Mapper Lithography Ip B.V. | Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system |
| EP3563199A4 (en) * | 2016-09-08 | 2020-08-19 | ASML Netherlands B.V. | PRODUCTION OF UNIQUE CHIPS WITH A LITHOGRAPHY SYSTEM WITH MULTIPLE CARRIER PART JETS |
| NL2019502B1 (en) * | 2016-09-08 | 2018-08-31 | Mapper Lithography Ip Bv | Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system |
| CN106444307B (zh) * | 2016-09-30 | 2017-11-21 | 西安立芯光电科技有限公司 | 一种用于激光芯片制造中平边补偿对准的光刻方法 |
| EP3355337B8 (en) * | 2017-01-27 | 2024-04-10 | IMS Nanofabrication GmbH | Advanced dose-level quantization for multibeam-writers |
| KR102415583B1 (ko) | 2017-06-30 | 2022-07-04 | 삼성전자주식회사 | Opc 모델의 최적화 방법 및 이를 이용한 반도체 소자의 제조 방법 |
| JP7126367B2 (ja) | 2018-03-29 | 2022-08-26 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
| US10593509B2 (en) | 2018-07-17 | 2020-03-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
| US10483080B1 (en) * | 2018-07-17 | 2019-11-19 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
| US10884395B2 (en) * | 2018-12-22 | 2021-01-05 | D2S, Inc. | Method and system of reducing charged particle beam write time |
| KR102919104B1 (ko) | 2020-02-03 | 2026-01-29 | 아이엠에스 나노패브릭케이션 게엠베하 | 멀티―빔 라이터의 블러 변화 보정 |
| KR102922552B1 (ko) | 2020-04-24 | 2026-02-04 | 아이엠에스 나노패브릭케이션 게엠베하 | 대전 입자 소스 |
| EP4095882A1 (en) * | 2021-05-25 | 2022-11-30 | IMS Nanofabrication GmbH | Pattern data processing for programmable direct-write apparatus |
| US12500060B2 (en) | 2021-07-14 | 2025-12-16 | Ims Nanofabrication Gmbh | Electromagnetic lens |
| US12154756B2 (en) | 2021-08-12 | 2024-11-26 | Ims Nanofabrication Gmbh | Beam pattern device having beam absorber structure |
| US20240210837A1 (en) * | 2022-12-22 | 2024-06-27 | The Hong Kong Polytechnic University | Digital ultraviolet lithography method and apparatus |
| CN115857286A (zh) * | 2023-01-10 | 2023-03-28 | 广州粤芯半导体技术有限公司 | 一种曝光方法、装置及电子设备 |
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| US3157308A (en) | 1961-09-05 | 1964-11-17 | Clark Mfg Co J L | Canister type container and method of making the same |
| US3159408A (en) | 1961-10-05 | 1964-12-01 | Grace W R & Co | Chuck |
| US4524308A (en) | 1984-06-01 | 1985-06-18 | Sony Corporation | Circuits for accomplishing electron beam convergence in color cathode ray tubes |
| US5363213A (en) * | 1992-06-08 | 1994-11-08 | Xerox Corporation | Unquantized resolution conversion of bitmap images using error diffusion |
| WO1994025880A1 (en) | 1993-04-30 | 1994-11-10 | Board Of Regents, The University Of Texas System | Megavoltage scanning imager and method for its use |
| EP0766405A1 (en) | 1995-09-29 | 1997-04-02 | STMicroelectronics S.r.l. | Successive approximation register without redundancy |
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| US7064869B2 (en) * | 2001-06-22 | 2006-06-20 | Eastman Kodak Company | Method for halftoning a multi-channel digital color image having at least one group of similar color channels |
| US7095484B1 (en) * | 2001-06-27 | 2006-08-22 | University Of South Florida | Method and apparatus for maskless photolithography |
| WO2003040829A2 (en) * | 2001-11-07 | 2003-05-15 | Applied Materials, Inc. | Maskless printer using photoelectric conversion of a light beam array |
| SE0104238D0 (sv) | 2001-12-14 | 2001-12-14 | Micronic Laser Systems Ab | Method and apparatus for patterning a workpiece |
| US6768125B2 (en) * | 2002-01-17 | 2004-07-27 | Ims Nanofabrication, Gmbh | Maskless particle-beam system for exposing a pattern on a substrate |
| US7116447B2 (en) * | 2002-05-24 | 2006-10-03 | Eastman Kodak Company | Halftone dot-growth technique using a dot edge-detection scheme |
| ATE538412T1 (de) | 2002-10-25 | 2012-01-15 | Mapper Lithography Ip Bv | Lithographisches system |
| AU2003276779A1 (en) | 2002-10-30 | 2004-05-25 | Mapper Lithography Ip B.V. | Electron beam exposure system |
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| ATE524822T1 (de) | 2003-05-28 | 2011-09-15 | Mapper Lithography Ip Bv | Belichtungsverfahren für strahlen aus geladenen teilchen |
| ATE381728T1 (de) | 2003-07-30 | 2008-01-15 | Mapper Lithography Ip Bv | Modulator-schaltkreise |
| JP2007517239A (ja) * | 2003-11-12 | 2007-06-28 | マイクロニック レーザー システムズ アクチボラゲット | Ｓｌｍスタンプ像の欠陥を修正する方法及び装置 |
| US7075093B2 (en) * | 2004-05-12 | 2006-07-11 | Gorski Richard M | Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation |
| US7294440B2 (en) * | 2004-07-23 | 2007-11-13 | International Business Machines Corporation | Method to selectively correct critical dimension errors in the semiconductor industry |
| US7477772B2 (en) * | 2005-05-31 | 2009-01-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression |
| US7706607B2 (en) * | 2005-06-23 | 2010-04-27 | Microsoft Corporation | Optimized color image encoding and decoding using color space parameter data |
| US7709815B2 (en) | 2005-09-16 | 2010-05-04 | Mapper Lithography Ip B.V. | Lithography system and projection method |
| JP4745089B2 (ja) * | 2006-03-08 | 2011-08-10 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画方法、描画データ作成方法及びプログラム |
| TWI432908B (zh) | 2006-03-10 | 2014-04-01 | 瑪波微影Ｉｐ公司 | 微影系統及投射方法 |
| JP5339671B2 (ja) * | 2006-06-26 | 2013-11-13 | 株式会社オーク製作所 | 描画システム |
| US8259285B2 (en) * | 2006-12-14 | 2012-09-04 | Asml Holding N.V. | Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data |
| KR101570974B1 (ko) | 2008-02-26 | 2015-11-23 | 마퍼 리쏘그라피 아이피 비.브이. | 투사 렌즈 배열체 |
| JP5408674B2 (ja) | 2008-02-26 | 2014-02-05 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | 投影レンズ構成体 |
| US8445869B2 (en) | 2008-04-15 | 2013-05-21 | Mapper Lithography Ip B.V. | Projection lens arrangement |
| US8018623B2 (en) * | 2008-02-29 | 2011-09-13 | Eastman Kodak Company | Multi-level halftoning providing reduced error diffusion artifacts |
| WO2009141428A1 (en) | 2008-05-23 | 2009-11-26 | Mapper Lithography Ip B.V. | Imaging system |
| WO2009147202A1 (en) | 2008-06-04 | 2009-12-10 | Mapper Lithography Ip B.V. | Writing strategy |
| TWI479530B (zh) | 2008-10-01 | 2015-04-01 | Mapper Lithography Ip Bv | 靜電透鏡結構、靜電透鏡陣列、帶電粒子的子束微影系統以及製造絕緣結構的方法 |
| KR101657218B1 (ko) * | 2008-12-05 | 2016-09-13 | 마이크로닉 마이데이타 에이비 | 마이크로-리소그래피 인쇄에서의 그레디언트 기반 이미지 리샘플링 |
| KR101757837B1 (ko) | 2009-05-20 | 2017-07-26 | 마퍼 리쏘그라피 아이피 비.브이. | 듀얼 패스 스캐닝 |
| US9305747B2 (en) * | 2010-11-13 | 2016-04-05 | Mapper Lithography Ip B.V. | Data path for lithography apparatus |
| WO2016158421A1 (ja) | 2015-04-03 | 2016-10-06 | 株式会社日立ハイテクノロジーズ | 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置 |
-
2010
- 2010-05-17 WO PCT/IB2010/052180 patent/WO2010134018A2/en not_active Ceased
- 2010-05-17 EP EP10775887.2A patent/EP2443647B1/en active Active
- 2010-05-17 KR KR1020117030536A patent/KR101614460B1/ko active Active
- 2010-05-17 CN CN201080032976.7A patent/CN102460633B/zh active Active
- 2010-05-17 JP JP2012511391A patent/JP5801289B2/ja active Active
- 2010-05-19 TW TW099115882A patent/TWI485530B/zh active
-
2011
- 2011-11-10 US US13/293,426 patent/US8710465B2/en active Active
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