JP2012521090A5 - - Google Patents

Download PDF

Info

Publication number
JP2012521090A5
JP2012521090A5 JP2012500800A JP2012500800A JP2012521090A5 JP 2012521090 A5 JP2012521090 A5 JP 2012521090A5 JP 2012500800 A JP2012500800 A JP 2012500800A JP 2012500800 A JP2012500800 A JP 2012500800A JP 2012521090 A5 JP2012521090 A5 JP 2012521090A5
Authority
JP
Japan
Prior art keywords
layer
delta
solar cell
tunnel diode
semiconductor material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012500800A
Other languages
English (en)
Japanese (ja)
Other versions
JP5794974B2 (ja
JP2012521090A (ja
Filing date
Publication date
Priority claimed from US12/404,795 external-priority patent/US9722131B2/en
Application filed filed Critical
Publication of JP2012521090A publication Critical patent/JP2012521090A/ja
Publication of JP2012521090A5 publication Critical patent/JP2012521090A5/ja
Application granted granted Critical
Publication of JP5794974B2 publication Critical patent/JP5794974B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012500800A 2009-03-16 2010-02-04 太陽電池内のトンネル接合の高濃度ドープ層 Active JP5794974B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/404,795 2009-03-16
US12/404,795 US9722131B2 (en) 2009-03-16 2009-03-16 Highly doped layer for tunnel junctions in solar cells
PCT/US2010/023171 WO2010107522A1 (en) 2009-03-16 2010-02-04 Highly doped layer for tunnel junctions in solar cells

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015120850A Division JP6093401B2 (ja) 2009-03-16 2015-06-16 太陽電池内のトンネル接合の高濃度ドープ層

Publications (3)

Publication Number Publication Date
JP2012521090A JP2012521090A (ja) 2012-09-10
JP2012521090A5 true JP2012521090A5 (enExample) 2013-03-28
JP5794974B2 JP5794974B2 (ja) 2015-10-14

Family

ID=42396457

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012500800A Active JP5794974B2 (ja) 2009-03-16 2010-02-04 太陽電池内のトンネル接合の高濃度ドープ層
JP2015120850A Active JP6093401B2 (ja) 2009-03-16 2015-06-16 太陽電池内のトンネル接合の高濃度ドープ層

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015120850A Active JP6093401B2 (ja) 2009-03-16 2015-06-16 太陽電池内のトンネル接合の高濃度ドープ層

Country Status (5)

Country Link
US (2) US9722131B2 (enExample)
EP (1) EP2409334B1 (enExample)
JP (2) JP5794974B2 (enExample)
CN (1) CN102341913B (enExample)
WO (1) WO2010107522A1 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11417788B2 (en) * 2010-11-19 2022-08-16 The Boeing Company Type-II high bandgap tunnel junctions of InP lattice constant for multijunction solar cells
US20120216857A1 (en) * 2011-02-28 2012-08-30 Atomic Energy Council-Institute Of Nuclear Energy Research Solar Cell Assembly with an Improved Photocurrent Collection Efficiency
JP5681607B2 (ja) * 2011-03-28 2015-03-11 株式会社東芝 光電変換素子
EP2721647A2 (en) * 2011-06-15 2014-04-23 3M Innovative Properties Company Solar cell with improved conversion efficiency
CN102244134B (zh) * 2011-08-02 2013-05-15 厦门市三安光电科技有限公司 一种高效四结太阳能电池及其制作方法
WO2013033671A1 (en) * 2011-09-02 2013-03-07 Amberwave, Inc. Solar cell
US9263611B2 (en) * 2011-11-17 2016-02-16 Solar Junction Corporation Method for etching multi-layer epitaxial material
US9178098B2 (en) * 2012-02-29 2015-11-03 The Boeing Company Solar cell with delta doping layer
EP2865016B1 (en) 2012-06-22 2024-06-05 Epiworks, Inc. Manufacturing semiconductor-based multi-junction photovoltaic devices
CN102751389A (zh) * 2012-07-19 2012-10-24 厦门市三安光电科技有限公司 一种高效多结太阳能电池的制备方法
US9997659B2 (en) * 2012-09-14 2018-06-12 The Boeing Company Group-IV solar cell structure using group-IV or III-V heterostructures
US11495705B2 (en) * 2012-09-14 2022-11-08 The Boeing Company Group-IV solar cell structure using group-IV or III-V heterostructures
US9099595B2 (en) 2012-09-14 2015-08-04 The Boeing Company Group-IV solar cell structure using group-IV or III-V heterostructures
US10903383B2 (en) 2012-09-14 2021-01-26 The Boeing Company Group-IV solar cell structure using group-IV or III-V heterostructures
US11646388B2 (en) * 2012-09-14 2023-05-09 The Boeing Company Group-IV solar cell structure using group-IV or III-V heterostructures
US9985160B2 (en) * 2012-09-14 2018-05-29 The Boeing Company Group-IV solar cell structure using group-IV or III-V heterostructures
JP6582591B2 (ja) * 2014-07-11 2019-10-02 株式会社リコー 化合物半導体太陽電池、及び、化合物半導体太陽電池の製造方法
CN104393115B (zh) * 2014-11-18 2016-07-27 上海空间电源研究所 一种多结砷化镓太阳电池一次腐蚀工艺方法
US10910506B1 (en) * 2015-04-09 2021-02-02 Solaero Technologies Corp. Solar cell with gradation in the top window layer
DE102015006379B4 (de) * 2015-05-18 2022-03-17 Azur Space Solar Power Gmbh Skalierbare Spannungsquelle
CN107093647A (zh) * 2017-04-06 2017-08-25 江苏中天科技股份有限公司 激光光伏电池及其制备方法
JP7122119B2 (ja) * 2017-05-25 2022-08-19 昭和電工光半導体株式会社 発光ダイオード
US10439103B2 (en) 2017-05-25 2019-10-08 Showa Denko K. K. Light-emitting diode and method for manufacturing tunnel junction layer
CN108493284B (zh) * 2018-05-03 2020-03-10 扬州乾照光电有限公司 一种晶格失配的多结太阳能电池及其制作方法
CN111261744A (zh) * 2018-11-30 2020-06-09 东泰高科装备科技有限公司 多结太阳能电池及其制备方法
CN111341872B (zh) * 2018-12-18 2022-10-25 紫石能源有限公司 一种砷化镓太阳能电池外延结构及其生长方法
DE102020001185A1 (de) 2020-02-25 2021-08-26 Azur Space Solar Power Gmbh Stapelförmige monolithische aufrecht-metamorphe lll-V-Mehrfachsolarzelle
US12267062B2 (en) 2020-06-17 2025-04-01 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with three-layer electrodes

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6437060A (en) 1987-08-03 1989-02-07 Nippon Telegraph & Telephone Semiconductor element
US5342453A (en) * 1992-11-13 1994-08-30 Midwest Research Institute Heterojunction solar cell
JP3250425B2 (ja) * 1995-09-13 2002-01-28 日立電線株式会社 化合物半導体ウエハ及び太陽電池
US6316715B1 (en) * 2000-03-15 2001-11-13 The Boeing Company Multijunction photovoltaic cell with thin 1st (top) subcell and thick 2nd subcell of same or similar semiconductor material
WO2002023640A1 (en) 2000-09-14 2002-03-21 Optowell Co., Ltd. Nitride compound semiconductor light emitting device having a tunnel junction structure and fabrication method thereof
JP2003218374A (ja) * 2002-01-23 2003-07-31 Sharp Corp Iii−v族太陽電池
DE102004023856B4 (de) * 2004-05-12 2006-07-13 Rwe Space Solar Power Gmbh Solarzelle mit integrierter Schutzdiode und zusätzlich auf dieser angeordneten Tunneldiode

Similar Documents

Publication Publication Date Title
JP2012521090A5 (enExample)
JP6093401B2 (ja) 太陽電池内のトンネル接合の高濃度ドープ層
JP2014514746A5 (enExample)
CN104300015B (zh) AlGaAs/GaInAs/Ge连续光谱太阳能电池
JP2013508966A5 (enExample)
WO2009140196A3 (en) Solar cells and method of making solar cells
Huang et al. Design of passivation layers on axial junction GaAs nanowire solar cells
CN102832274B (zh) 倒装太阳能电池及其制备方法
JP6473220B2 (ja) デルタドーピング層を有する太陽電池
Almansouri et al. Designing bottom silicon solar cells for multijunction devices
CN101304051B (zh) 具渐变式超晶格结构的太阳电池
Tiwari et al. GaP/InGaAs/InGaSb triple junction current matched photovoltaic cell with optimized thickness and quantum efficiency
CN102651419A (zh) 四结级联太阳能电池及其制备方法
CN103199142B (zh) GaInP/GaAs/InGaAs/Ge四结太阳能电池及其制备方法
CN102790117B (zh) GaInP/GaAs/InGaNAs/Ge四结太阳能电池及其制备方法
CN103077983A (zh) 多结太阳能电池及其制备方法
CN103346190B (zh) Si衬底的四结级联太阳能电池及其制备方法
CN102790119B (zh) GaInP/GaAs/Ge/Ge四结太阳能电池及其制备方法
CN104685641B (zh) 光伏装置及其制造方法
CN103258874B (zh) 一种基于图形化锗衬底的三结太阳能电池及其制备方法
CN103943712A (zh) 一种超宽带隙隧穿结
KR100913114B1 (ko) 고온 특성이 개선된 벌크형 실리콘 태양 전지 및 그 제조방법
Sayad et al. Simulation study of InGaN/GaN multiple quantum well solar cells
CN104201229B (zh) 多结太阳能电池及其制备方法
Zhang Heterovalent II-VI and III-V semiconductor integration: A platform for solar cell and other optoelectronic device applications