JP5794974B2 - 太陽電池内のトンネル接合の高濃度ドープ層 - Google Patents
太陽電池内のトンネル接合の高濃度ドープ層 Download PDFInfo
- Publication number
- JP5794974B2 JP5794974B2 JP2012500800A JP2012500800A JP5794974B2 JP 5794974 B2 JP5794974 B2 JP 5794974B2 JP 2012500800 A JP2012500800 A JP 2012500800A JP 2012500800 A JP2012500800 A JP 2012500800A JP 5794974 B2 JP5794974 B2 JP 5794974B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- delta
- dopant
- tunnel diode
- solar cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002019 doping agent Substances 0.000 claims description 139
- 239000000463 material Substances 0.000 claims description 66
- 239000004065 semiconductor Substances 0.000 claims description 41
- 230000000295 complement effect Effects 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 25
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 18
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 4
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 claims description 3
- 229910021480 group 4 element Inorganic materials 0.000 claims description 3
- 229910005540 GaP Inorganic materials 0.000 claims description 2
- 229910021476 group 6 element Inorganic materials 0.000 claims description 2
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 claims 1
- 229910021478 group 5 element Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 33
- 239000000370 acceptor Substances 0.000 description 22
- 238000000151 deposition Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 9
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 6
- 229910052733 gallium Inorganic materials 0.000 description 6
- 239000003574 free electron Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000005641 tunneling Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- -1 GaInP Inorganic materials 0.000 description 2
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/127—The active layers comprising only Group III-V materials, e.g. GaAs or InP
- H10F71/1272—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/142—Photovoltaic cells having only PN homojunction potential barriers comprising multiple PN homojunctions, e.g. tandem cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/144—Photovoltaic cells having only PN homojunction potential barriers comprising only Group III-V materials, e.g. GaAs,AlGaAs, or InP photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/124—Active materials comprising only Group III-V materials, e.g. GaAs
- H10F77/1248—Active materials comprising only Group III-V materials, e.g. GaAs having three or more elements, e.g. GaAlAs, InGaAs or InGaAsP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/70—Tunnel-effect diodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Sustainable Energy (AREA)
- Sustainable Development (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/404,795 | 2009-03-16 | ||
| US12/404,795 US9722131B2 (en) | 2009-03-16 | 2009-03-16 | Highly doped layer for tunnel junctions in solar cells |
| PCT/US2010/023171 WO2010107522A1 (en) | 2009-03-16 | 2010-02-04 | Highly doped layer for tunnel junctions in solar cells |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015120850A Division JP6093401B2 (ja) | 2009-03-16 | 2015-06-16 | 太陽電池内のトンネル接合の高濃度ドープ層 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012521090A JP2012521090A (ja) | 2012-09-10 |
| JP2012521090A5 JP2012521090A5 (enExample) | 2013-03-28 |
| JP5794974B2 true JP5794974B2 (ja) | 2015-10-14 |
Family
ID=42396457
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012500800A Active JP5794974B2 (ja) | 2009-03-16 | 2010-02-04 | 太陽電池内のトンネル接合の高濃度ドープ層 |
| JP2015120850A Active JP6093401B2 (ja) | 2009-03-16 | 2015-06-16 | 太陽電池内のトンネル接合の高濃度ドープ層 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015120850A Active JP6093401B2 (ja) | 2009-03-16 | 2015-06-16 | 太陽電池内のトンネル接合の高濃度ドープ層 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9722131B2 (enExample) |
| EP (1) | EP2409334B1 (enExample) |
| JP (2) | JP5794974B2 (enExample) |
| CN (1) | CN102341913B (enExample) |
| WO (1) | WO2010107522A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11417788B2 (en) * | 2010-11-19 | 2022-08-16 | The Boeing Company | Type-II high bandgap tunnel junctions of InP lattice constant for multijunction solar cells |
| US20120216857A1 (en) * | 2011-02-28 | 2012-08-30 | Atomic Energy Council-Institute Of Nuclear Energy Research | Solar Cell Assembly with an Improved Photocurrent Collection Efficiency |
| JP5681607B2 (ja) * | 2011-03-28 | 2015-03-11 | 株式会社東芝 | 光電変換素子 |
| EP2721647A2 (en) * | 2011-06-15 | 2014-04-23 | 3M Innovative Properties Company | Solar cell with improved conversion efficiency |
| CN102244134B (zh) * | 2011-08-02 | 2013-05-15 | 厦门市三安光电科技有限公司 | 一种高效四结太阳能电池及其制作方法 |
| WO2013033671A1 (en) * | 2011-09-02 | 2013-03-07 | Amberwave, Inc. | Solar cell |
| US9263611B2 (en) * | 2011-11-17 | 2016-02-16 | Solar Junction Corporation | Method for etching multi-layer epitaxial material |
| US9178098B2 (en) * | 2012-02-29 | 2015-11-03 | The Boeing Company | Solar cell with delta doping layer |
| EP2865016B1 (en) | 2012-06-22 | 2024-06-05 | Epiworks, Inc. | Manufacturing semiconductor-based multi-junction photovoltaic devices |
| CN102751389A (zh) * | 2012-07-19 | 2012-10-24 | 厦门市三安光电科技有限公司 | 一种高效多结太阳能电池的制备方法 |
| US9997659B2 (en) * | 2012-09-14 | 2018-06-12 | The Boeing Company | Group-IV solar cell structure using group-IV or III-V heterostructures |
| US11495705B2 (en) * | 2012-09-14 | 2022-11-08 | The Boeing Company | Group-IV solar cell structure using group-IV or III-V heterostructures |
| US9099595B2 (en) | 2012-09-14 | 2015-08-04 | The Boeing Company | Group-IV solar cell structure using group-IV or III-V heterostructures |
| US10903383B2 (en) | 2012-09-14 | 2021-01-26 | The Boeing Company | Group-IV solar cell structure using group-IV or III-V heterostructures |
| US11646388B2 (en) * | 2012-09-14 | 2023-05-09 | The Boeing Company | Group-IV solar cell structure using group-IV or III-V heterostructures |
| US9985160B2 (en) * | 2012-09-14 | 2018-05-29 | The Boeing Company | Group-IV solar cell structure using group-IV or III-V heterostructures |
| JP6582591B2 (ja) * | 2014-07-11 | 2019-10-02 | 株式会社リコー | 化合物半導体太陽電池、及び、化合物半導体太陽電池の製造方法 |
| CN104393115B (zh) * | 2014-11-18 | 2016-07-27 | 上海空间电源研究所 | 一种多结砷化镓太阳电池一次腐蚀工艺方法 |
| US10910506B1 (en) * | 2015-04-09 | 2021-02-02 | Solaero Technologies Corp. | Solar cell with gradation in the top window layer |
| DE102015006379B4 (de) * | 2015-05-18 | 2022-03-17 | Azur Space Solar Power Gmbh | Skalierbare Spannungsquelle |
| CN107093647A (zh) * | 2017-04-06 | 2017-08-25 | 江苏中天科技股份有限公司 | 激光光伏电池及其制备方法 |
| JP7122119B2 (ja) * | 2017-05-25 | 2022-08-19 | 昭和電工光半導体株式会社 | 発光ダイオード |
| US10439103B2 (en) | 2017-05-25 | 2019-10-08 | Showa Denko K. K. | Light-emitting diode and method for manufacturing tunnel junction layer |
| CN108493284B (zh) * | 2018-05-03 | 2020-03-10 | 扬州乾照光电有限公司 | 一种晶格失配的多结太阳能电池及其制作方法 |
| CN111261744A (zh) * | 2018-11-30 | 2020-06-09 | 东泰高科装备科技有限公司 | 多结太阳能电池及其制备方法 |
| CN111341872B (zh) * | 2018-12-18 | 2022-10-25 | 紫石能源有限公司 | 一种砷化镓太阳能电池外延结构及其生长方法 |
| DE102020001185A1 (de) | 2020-02-25 | 2021-08-26 | Azur Space Solar Power Gmbh | Stapelförmige monolithische aufrecht-metamorphe lll-V-Mehrfachsolarzelle |
| US12267062B2 (en) | 2020-06-17 | 2025-04-01 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonators with three-layer electrodes |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6437060A (en) | 1987-08-03 | 1989-02-07 | Nippon Telegraph & Telephone | Semiconductor element |
| US5342453A (en) * | 1992-11-13 | 1994-08-30 | Midwest Research Institute | Heterojunction solar cell |
| JP3250425B2 (ja) * | 1995-09-13 | 2002-01-28 | 日立電線株式会社 | 化合物半導体ウエハ及び太陽電池 |
| US6316715B1 (en) * | 2000-03-15 | 2001-11-13 | The Boeing Company | Multijunction photovoltaic cell with thin 1st (top) subcell and thick 2nd subcell of same or similar semiconductor material |
| WO2002023640A1 (en) | 2000-09-14 | 2002-03-21 | Optowell Co., Ltd. | Nitride compound semiconductor light emitting device having a tunnel junction structure and fabrication method thereof |
| JP2003218374A (ja) * | 2002-01-23 | 2003-07-31 | Sharp Corp | Iii−v族太陽電池 |
| DE102004023856B4 (de) * | 2004-05-12 | 2006-07-13 | Rwe Space Solar Power Gmbh | Solarzelle mit integrierter Schutzdiode und zusätzlich auf dieser angeordneten Tunneldiode |
-
2009
- 2009-03-16 US US12/404,795 patent/US9722131B2/en active Active
-
2010
- 2010-02-04 WO PCT/US2010/023171 patent/WO2010107522A1/en not_active Ceased
- 2010-02-04 JP JP2012500800A patent/JP5794974B2/ja active Active
- 2010-02-04 EP EP10703764.0A patent/EP2409334B1/en active Active
- 2010-02-04 CN CN201080009936.0A patent/CN102341913B/zh active Active
-
2015
- 2015-06-16 JP JP2015120850A patent/JP6093401B2/ja active Active
-
2016
- 2016-09-16 US US15/267,192 patent/US10326042B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US10326042B2 (en) | 2019-06-18 |
| US9722131B2 (en) | 2017-08-01 |
| JP6093401B2 (ja) | 2017-03-08 |
| US20170005217A1 (en) | 2017-01-05 |
| EP2409334B1 (en) | 2020-09-30 |
| US20100229930A1 (en) | 2010-09-16 |
| CN102341913B (zh) | 2015-08-12 |
| CN102341913A (zh) | 2012-02-01 |
| JP2012521090A (ja) | 2012-09-10 |
| WO2010107522A1 (en) | 2010-09-23 |
| EP2409334A1 (en) | 2012-01-25 |
| JP2015201659A (ja) | 2015-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6093401B2 (ja) | 太陽電池内のトンネル接合の高濃度ドープ層 | |
| KR101633953B1 (ko) | 나노와이어를 가지는 다중-접합 광전지 | |
| US10128394B2 (en) | Nanowire-based solar cell structure | |
| KR101908742B1 (ko) | 다중접합 태양전지를 위한 인화인듐 격자 상수의 타입-2 고 밴드갭 터널 접합 | |
| US20090173373A1 (en) | Group III-Nitride Solar Cell with Graded Compositions | |
| CN101589474A (zh) | 活性区域带有具有能量阱的纳米结构的太阳能电池 | |
| KR101783971B1 (ko) | 금속 디스크 어레이를 구비한 적층형 태양전지 | |
| US20120318324A1 (en) | Laterally Arranged Multiple-Bandgap Solar Cells | |
| KR101921239B1 (ko) | 화합물 반도체 태양 전지 | |
| KR100913114B1 (ko) | 고온 특성이 개선된 벌크형 실리콘 태양 전지 및 그 제조방법 | |
| CN102386252A (zh) | 多接面光电池元件 | |
| HK1231253B (en) | Nanowire-based solar cell structure | |
| HK1231253A (en) | Nanowire-based solar cell structure | |
| HK1231253A1 (en) | Nanowire-based solar cell structure | |
| HK1147141A (en) | Nanowire-based solar cell structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130204 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130204 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131120 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131126 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140225 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140304 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140324 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140331 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140523 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140729 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20141201 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20150109 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150317 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150616 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150714 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150811 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5794974 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |