JP2012518073A5 - - Google Patents
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- JP2012518073A5 JP2012518073A5 JP2011551176A JP2011551176A JP2012518073A5 JP 2012518073 A5 JP2012518073 A5 JP 2012518073A5 JP 2011551176 A JP2011551176 A JP 2011551176A JP 2011551176 A JP2011551176 A JP 2011551176A JP 2012518073 A5 JP2012518073 A5 JP 2012518073A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- monomer
- base substrate
- porous base
- ethylenically unsaturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims 12
- 239000000178 monomer Substances 0.000 claims 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 6
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- 125000004386 diacrylate group Chemical group 0.000 claims 2
- 229920000578 graft polymer Polymers 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims 2
- 238000006116 polymerization reaction Methods 0.000 claims 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 1
- 229920001780 ECTFE Polymers 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- -1 ethylene-trichlorofluoroethylene Chemical group 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- 230000001105 regulatory Effects 0.000 claims 1
- 238000009738 saturating Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Claims (10)
- 官能化基材の製造法であって、
1)間隙表面及び外側表面を有する多孔質ベース基材を提供する工程と、
2)(a)少なくとも1つの(メタ)アクリレート基、及び少なくとも1つの追加のエチレン性不飽和フリーラジカル重合性基を有する少なくとも1つのグラフトモノマーと、任意に(b)少なくとも1つのエチレン性不飽和フリーラジカル重合性基及び親水性基を有する1つ以上の追加のモノマーと、連鎖移動剤と、を含み、(a)及び/又は(b)のモノマーのうち少なくとも1つが親水性である第1の溶液で、前記多孔質ベース基材を飽和する工程と、
3)前記多孔質ベース基材の前記表面に結合したグラフト化ポリマーを含む第1の官能化基材を形成するために、前記飽和した多孔質ベース基材を調整された量のガンマ線に曝露する工程と、を含む、製造方法。 - 前記モノマー(a)がポリ(アルキレンオキシド)ジアクリレートを含む、請求項1に記載の方法。
- 少なくとも1つの(メタ)アクリレート基、及び少なくとも1つの追加のエチレン性不飽和フリーラジカル重合性基を有する少なくとも1つのグラフトモノマーを有する前記モノマー(a)が、前記多孔質ベース基材にグラフト化するための第1の(メタ)アクリレート基と、(a)及び/又は(b)モノマーと引き続いて重合するための第2のメタクリレート基と、を含む、請求項1に記載の方法。
- 前記第1の溶液が、(b)フリーラジカル重合性基と親水性基とを有する1つ以上の追加のモノマーを含む、請求項1に記載の方法。
- 前記モノマー溶液が、
(a)1〜10重量%の(a)モノマーと、
(b)1〜10重量%の(b)モノマーと、
(c)0.02〜0.15重量%の連鎖移動剤と、
(e)溶媒と、を含む、請求項1に記載の方法。
- 前記「(a)」モノマーが、式:
Z−Q−(CH(R1)−CH2−O)n−C(O)−CR3=CH2、IIであって、
式中、Zはアクリレート又は非アクリレートの重合性エチレン性不飽和基であり、
R3はH又はCH3であり、
R1は、H又はC1〜C4アルキル基であり、nは2〜100であり、Qは共有結合「−」、−O−、−NR1−、−CO2−、及び−CONR1から選択される二価結合基であり、ここでR1は、H又はC1〜C4アルキルである、請求項1に記載の方法。 - 間隙表面及び外側表面を有する多孔質ベース基材と、前記多孔質ベース基材の表面から延在するグラフト化ポリマーと、を含み、前記ポリマーが、
(a)少なくとも1つの(メタ)アクリレート基及び少なくとも1つの追加のエチレン性不飽和フリーラジカル重合性基を有する少なくとも1つのグラフトモノマーと、
任意に(b)少なくとも1つのエチレン性不飽和フリーラジカル重合性基及び親水性基を有する1つ以上の追加のモノマーと、(c)連鎖移動剤と、の共重合モノマー単位を含み、
(a)、及び/又は(b)モノマーのうち少なくとも1つが親水性であり、前記ポリマーの平均重合度が2〜250である、物品。 - 前記多孔質ベース基材の前記表面から延在するグラフト化親水性基を更に含む、請求項7に記載の物品。
- 前記ポリマーがグラフト化ポリ(アルキレンオキシド)ジアクリレートを含んだ、請求項7に記載の物品。
- 前記多孔質ベース基材がエチレン−トリクロロフルオロエチレン(ECTFE)多孔質ベース基材である、請求項7に記載の物品。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/388,146 | 2009-02-18 | ||
US12/388,146 US20100209693A1 (en) | 2009-02-18 | 2009-02-18 | Hydrophilic porous substrates |
US12/701,821 US20100210160A1 (en) | 2009-02-18 | 2010-02-08 | Hydrophilic porous substrates |
US12/701,821 | 2010-02-08 | ||
PCT/US2010/024401 WO2010096429A1 (en) | 2009-02-18 | 2010-02-17 | Hydrophilic porous substrates |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012518073A JP2012518073A (ja) | 2012-08-09 |
JP2012518073A5 true JP2012518073A5 (ja) | 2013-01-10 |
JP5580342B2 JP5580342B2 (ja) | 2014-08-27 |
Family
ID=42109747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011551176A Expired - Fee Related JP5580342B2 (ja) | 2009-02-18 | 2010-02-17 | 親水性多孔質基材 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100210160A1 (ja) |
EP (1) | EP2398576B1 (ja) |
JP (1) | JP5580342B2 (ja) |
KR (1) | KR20110118167A (ja) |
CN (1) | CN102325584B (ja) |
BR (1) | BRPI1007815A2 (ja) |
WO (1) | WO2010096429A1 (ja) |
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WO2014050993A1 (ja) | 2012-09-28 | 2014-04-03 | 富士フイルム株式会社 | 高分子機能性膜及びその製造方法 |
RU2015121358A (ru) * | 2012-11-06 | 2016-12-27 | Секисуй Кемикал Ко., Лтд. | Теплостойкая микропористая пленка на основе синтетической смолы, способ ее получения, сепаратор для аккумуляторной батареи с неводным электролитом и аккумуляторная батарея с неводным электролитом |
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US9958364B2 (en) | 2013-10-03 | 2018-05-01 | 3M Innovative Properties Company | Ligand functionalized substrates with enhanced binding capacity |
US9962662B2 (en) * | 2014-06-30 | 2018-05-08 | Pall Corporation | Fluorinated polymer and use thereof in the preparation of hydrophilic membranes (vi) |
WO2016153915A1 (en) | 2015-03-24 | 2016-09-29 | 3M Innovative Properties Company | Method of purifying a biological composition and article therefor |
US10722848B2 (en) | 2015-10-23 | 2020-07-28 | 3M Innovative Properties Company | Filtration medium sequence for biomaterial purification |
TWI645896B (zh) * | 2017-11-24 | 2019-01-01 | 國立高雄科技大學 | 油水分離膜 |
US10892296B2 (en) | 2017-11-27 | 2021-01-12 | Seoul Viosys Co., Ltd. | Light emitting device having commonly connected LED sub-units |
US10892297B2 (en) | 2017-11-27 | 2021-01-12 | Seoul Viosys Co., Ltd. | Light emitting diode (LED) stack for a display |
US10748881B2 (en) | 2017-12-05 | 2020-08-18 | Seoul Viosys Co., Ltd. | Light emitting device with LED stack for display and display apparatus having the same |
US10784240B2 (en) | 2018-01-03 | 2020-09-22 | Seoul Viosys Co., Ltd. | Light emitting device with LED stack for display and display apparatus having the same |
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CN115895013B (zh) * | 2021-08-25 | 2024-02-09 | 中国石油化工股份有限公司 | 亲水表面及其制备方法和应用 |
CN114800728B (zh) * | 2022-06-07 | 2023-05-16 | 山东美邦尼新型材料有限公司 | 一种防噪音的环保型胶合板的制造方法 |
CN115090134B (zh) * | 2022-06-29 | 2023-11-03 | 天津鼎芯膜科技有限公司 | 一种具有梯度孔结构的膜材料及其制备方法和应用 |
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-
2010
- 2010-02-08 US US12/701,821 patent/US20100210160A1/en not_active Abandoned
- 2010-02-17 KR KR1020117021486A patent/KR20110118167A/ko not_active Application Discontinuation
- 2010-02-17 JP JP2011551176A patent/JP5580342B2/ja not_active Expired - Fee Related
- 2010-02-17 WO PCT/US2010/024401 patent/WO2010096429A1/en active Application Filing
- 2010-02-17 BR BRPI1007815A patent/BRPI1007815A2/pt not_active IP Right Cessation
- 2010-02-17 EP EP20100705243 patent/EP2398576B1/en not_active Not-in-force
- 2010-02-17 CN CN201080008348.5A patent/CN102325584B/zh not_active Expired - Fee Related
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