JP2012518073A5 - - Google Patents

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Publication number
JP2012518073A5
JP2012518073A5 JP2011551176A JP2011551176A JP2012518073A5 JP 2012518073 A5 JP2012518073 A5 JP 2012518073A5 JP 2011551176 A JP2011551176 A JP 2011551176A JP 2011551176 A JP2011551176 A JP 2011551176A JP 2012518073 A5 JP2012518073 A5 JP 2012518073A5
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JP
Japan
Prior art keywords
group
monomer
base substrate
porous base
ethylenically unsaturated
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JP2011551176A
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English (en)
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JP5580342B2 (ja
JP2012518073A (ja
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Priority claimed from US12/388,146 external-priority patent/US20100209693A1/en
Priority claimed from US12/701,821 external-priority patent/US20100210160A1/en
Application filed filed Critical
Publication of JP2012518073A publication Critical patent/JP2012518073A/ja
Publication of JP2012518073A5 publication Critical patent/JP2012518073A5/ja
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Publication of JP5580342B2 publication Critical patent/JP5580342B2/ja
Expired - Fee Related legal-status Critical Current
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Claims (10)

  1. 官能化基材の製造法であって、
    1)間隙表面及び外側表面を有する多孔質ベース基材を提供する工程と、
    2)(a)少なくとも1つの(メタ)アクリレート基、及び少なくとも1つの追加のエチレン性不飽和フリーラジカル重合性基を有する少なくとも1つのグラフトモノマーと、任意に(b)少なくとも1つのエチレン性不飽和フリーラジカル重合性基及び親水性基を有する1つ以上の追加のモノマーと、連鎖移動剤と、を含み、(a)及び/又は(b)のモノマーのうち少なくとも1つが親水性である第1の溶液で、前記多孔質ベース基材を飽和する工程と、
    3)前記多孔質ベース基材の前記表面に結合したグラフト化ポリマーを含む第1の官能化基材を形成するために、前記飽和した多孔質ベース基材を調整された量のガンマ線に曝露する工程と、を含む、製造方法。
  2. 前記モノマー(a)がポリ(アルキレンオキシド)ジアクリレートを含む、請求項1に記載の方法。
  3. 少なくとも1つの(メタ)アクリレート基、及び少なくとも1つの追加のエチレン性不飽和フリーラジカル重合性基を有する少なくとも1つのグラフトモノマーを有する前記モノマー(a)が、前記多孔質ベース基材にグラフト化するための第1の(メタ)アクリレート基と、(a)及び/又は(b)モノマーと引き続いて重合するための第2のメタクリレート基と、を含む、請求項1に記載の方法。
  4. 前記第1の溶液が、(b)フリーラジカル重合性基と親水性基とを有する1つ以上の追加のモノマーを含む、請求項1に記載の方法。
  5. 前記モノマー溶液が、
    (a)1〜10重量%の(a)モノマーと、
    (b)1〜10重量%の(b)モノマーと、
    (c)0.02〜0.15重量%の連鎖移動剤と、
    (e)溶媒と、を含む、請求項に記載の方法。
  6. 前記「(a)」モノマーが、式:
    Z−Q−(CH(R)−CH−O)−C(O)−CR=CH、IIであって、
    式中、Zはアクリレート又は非アクリレートの重合性エチレン性不飽和基であり、
    はH又はCHであり、
    は、H又はC〜Cアルキル基であり、nは2〜100であり、Qは共有結合「−」、−O−、−NR−、−CO−、及び−CONRから選択される二価結合基であり、ここでRは、H又はC〜Cアルキルである、請求項1に記載の方法。
  7. 間隙表面及び外側表面を有する多孔質ベース基材と、前記多孔質ベース基材の表面から延在するグラフト化ポリマーと、を含み、前記ポリマーが、
    (a)少なくとも1つの(メタ)アクリレート基及び少なくとも1つの追加のエチレン性不飽和フリーラジカル重合性基を有する少なくとも1つのグラフトモノマーと、
    任意に(b)少なくとも1つのエチレン性不飽和フリーラジカル重合性基及び親水性基を有する1つ以上の追加のモノマーと、(c)連鎖移動剤と、の共重合モノマー単位を含み、
    (a)、及び/又は(b)モノマーのうち少なくとも1つが親水性であり、前記ポリマーの平均重合度が2〜250である、物品。
  8. 前記多孔質ベース基材の前記表面から延在するグラフト化親水性基を更に含む、請求項に記載の物品。
  9. 前記ポリマーがグラフト化ポリ(アルキレンオキシド)ジアクリレートを含んだ、請求項に記載の物品。
  10. 前記多孔質ベース基材がエチレン−トリクロロフルオロエチレン(ECTFE)多孔質ベース基材である、請求項に記載の物品。
JP2011551176A 2009-02-18 2010-02-17 親水性多孔質基材 Expired - Fee Related JP5580342B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US12/388,146 2009-02-18
US12/388,146 US20100209693A1 (en) 2009-02-18 2009-02-18 Hydrophilic porous substrates
US12/701,821 US20100210160A1 (en) 2009-02-18 2010-02-08 Hydrophilic porous substrates
US12/701,821 2010-02-08
PCT/US2010/024401 WO2010096429A1 (en) 2009-02-18 2010-02-17 Hydrophilic porous substrates

Publications (3)

Publication Number Publication Date
JP2012518073A JP2012518073A (ja) 2012-08-09
JP2012518073A5 true JP2012518073A5 (ja) 2013-01-10
JP5580342B2 JP5580342B2 (ja) 2014-08-27

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011551176A Expired - Fee Related JP5580342B2 (ja) 2009-02-18 2010-02-17 親水性多孔質基材

Country Status (7)

Country Link
US (1) US20100210160A1 (ja)
EP (1) EP2398576B1 (ja)
JP (1) JP5580342B2 (ja)
KR (1) KR20110118167A (ja)
CN (1) CN102325584B (ja)
BR (1) BRPI1007815A2 (ja)
WO (1) WO2010096429A1 (ja)

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