JP2012515560A5 - - Google Patents

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Publication number
JP2012515560A5
JP2012515560A5 JP2011548194A JP2011548194A JP2012515560A5 JP 2012515560 A5 JP2012515560 A5 JP 2012515560A5 JP 2011548194 A JP2011548194 A JP 2011548194A JP 2011548194 A JP2011548194 A JP 2011548194A JP 2012515560 A5 JP2012515560 A5 JP 2012515560A5
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JP
Japan
Prior art keywords
article
present
surface area
deposit
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011548194A
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English (en)
Japanese (ja)
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JP2012515560A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2010/022015 external-priority patent/WO2010085769A1/en
Publication of JP2012515560A publication Critical patent/JP2012515560A/ja
Publication of JP2012515560A5 publication Critical patent/JP2012515560A5/ja
Pending legal-status Critical Current

Links

JP2011548194A 2009-01-26 2010-01-25 均質基板を含む大面積均質アレイの製作方法 Pending JP2012515560A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14745209P 2009-01-26 2009-01-26
US61/147,452 2009-01-26
PCT/US2010/022015 WO2010085769A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates

Publications (2)

Publication Number Publication Date
JP2012515560A JP2012515560A (ja) 2012-07-12
JP2012515560A5 true JP2012515560A5 (enExample) 2013-03-14

Family

ID=42096549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011548194A Pending JP2012515560A (ja) 2009-01-26 2010-01-25 均質基板を含む大面積均質アレイの製作方法

Country Status (8)

Country Link
US (1) US20100221505A1 (enExample)
EP (1) EP2389614A1 (enExample)
JP (1) JP2012515560A (enExample)
KR (1) KR20110124214A (enExample)
AU (1) AU2010206594A1 (enExample)
CA (1) CA2750430A1 (enExample)
SG (1) SG172852A1 (enExample)
WO (1) WO2010085769A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2750425A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
US9276190B2 (en) 2013-10-01 2016-03-01 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD
US9040339B2 (en) 2013-10-01 2015-05-26 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material
EP4003683A4 (en) 2019-07-23 2024-08-07 University Of Massachusetts THERMAL PRINTING OF NANOSTRUCTURED MATERIALS

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USRE23838E (en) 1950-09-14 1954-06-08 Post-deflected color kinescope
US5171992A (en) 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US6635311B1 (en) * 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US6827979B2 (en) 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
US6642129B2 (en) 2001-07-26 2003-11-04 The Board Of Trustees Of The University Of Illinois Parallel, individually addressable probes for nanolithography
SE0102764D0 (sv) 2001-08-17 2001-08-17 Astrazeneca Ab Compounds
US7279046B2 (en) 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
US7060977B1 (en) 2002-05-14 2006-06-13 Nanoink, Inc. Nanolithographic calibration methods
EP1363164B1 (en) 2002-05-16 2015-04-29 NaWoTec GmbH Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
AU2003287618A1 (en) * 2002-11-12 2004-06-03 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US20040228962A1 (en) * 2003-05-16 2004-11-18 Chang Liu Scanning probe microscopy probe and method for scanning probe contact printing
US7690325B2 (en) 2004-04-30 2010-04-06 Bioforce Nanosciences, Inc. Method and apparatus for depositing material onto a surface
US8294090B1 (en) * 2004-10-29 2012-10-23 Japan Science And Technology Agency Substrate for MALDI-TOF MS and mass spectrometry method using the same
EP1846249A2 (en) * 2005-01-10 2007-10-24 Bioforce Nanosciences, Inc. Topographically indexed support substrates
WO2007126689A1 (en) * 2006-04-19 2007-11-08 Northwestern University Article for parallel lithography with two-dimensional pen arrays
JP2009542448A (ja) * 2006-06-28 2009-12-03 ノースウエスタン ユニバーシティ エッチングおよびホールアレイ
US8256017B2 (en) * 2006-08-31 2012-08-28 Nanoink, Inc. Using optical deflection of cantilevers for alignment
AU2007350336A1 (en) * 2006-12-18 2008-10-09 Northwestern University Fabrication of microstructures and nanostructures using etching resist
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AU2009210719A1 (en) * 2008-02-05 2009-08-13 Nanoink, Inc. Array and cantilever array leveling
WO2009132321A1 (en) 2008-04-25 2009-10-29 Northwestern University Polymer pen lithography
GB0812789D0 (en) * 2008-07-12 2008-08-20 Univ Liverpool Materials and methods for cell growth
KR20110119666A (ko) * 2009-01-26 2011-11-02 나노잉크, 인크. 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
CA2750425A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US9918209B2 (en) 2013-10-28 2018-03-13 Microsoft Technology Licensing, Llc Policies for selecting sources for resource strings

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