SG172852A1 - Large area, homogeneous array fabrication including homogeneous substrates - Google Patents
Large area, homogeneous array fabrication including homogeneous substrates Download PDFInfo
- Publication number
- SG172852A1 SG172852A1 SG2011048980A SG2011048980A SG172852A1 SG 172852 A1 SG172852 A1 SG 172852A1 SG 2011048980 A SG2011048980 A SG 2011048980A SG 2011048980 A SG2011048980 A SG 2011048980A SG 172852 A1 SG172852 A1 SG 172852A1
- Authority
- SG
- Singapore
- Prior art keywords
- tips
- article
- array
- cantilevers
- substrate
- Prior art date
Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Micromachines (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14745209P | 2009-01-26 | 2009-01-26 | |
| PCT/US2010/022015 WO2010085769A1 (en) | 2009-01-26 | 2010-01-25 | Large area, homogeneous array fabrication including homogeneous substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG172852A1 true SG172852A1 (en) | 2011-08-29 |
Family
ID=42096549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2011048980A SG172852A1 (en) | 2009-01-26 | 2010-01-25 | Large area, homogeneous array fabrication including homogeneous substrates |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20100221505A1 (enExample) |
| EP (1) | EP2389614A1 (enExample) |
| JP (1) | JP2012515560A (enExample) |
| KR (1) | KR20110124214A (enExample) |
| AU (1) | AU2010206594A1 (enExample) |
| CA (1) | CA2750430A1 (enExample) |
| SG (1) | SG172852A1 (enExample) |
| WO (1) | WO2010085769A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8214916B2 (en) * | 2009-01-26 | 2012-07-03 | Nanoink, Inc. | Large area, homogeneous array fabrication including leveling with use of bright spots |
| US20100229264A1 (en) * | 2009-01-26 | 2010-09-09 | Nanoink, Inc. | Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
| US9040339B2 (en) | 2013-10-01 | 2015-05-26 | The Pen | Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material |
| US9276190B2 (en) | 2013-10-01 | 2016-03-01 | The Pen | Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD |
| US12174533B2 (en) | 2019-07-23 | 2024-12-24 | University Of Massachusetts | Thermal imprinting of nanostructure materials |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE23838E (en) | 1950-09-14 | 1954-06-08 | Post-deflected color kinescope | |
| US5171992A (en) * | 1990-10-31 | 1992-12-15 | International Business Machines Corporation | Nanometer scale probe for an atomic force microscope, and method for making same |
| US6635311B1 (en) | 1999-01-07 | 2003-10-21 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or products thereby |
| US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| US7291284B2 (en) | 2000-05-26 | 2007-11-06 | Northwestern University | Fabrication of sub-50 nm solid-state nanostructures based on nanolithography |
| US6642129B2 (en) * | 2001-07-26 | 2003-11-04 | The Board Of Trustees Of The University Of Illinois | Parallel, individually addressable probes for nanolithography |
| SE0102764D0 (sv) | 2001-08-17 | 2001-08-17 | Astrazeneca Ab | Compounds |
| AU2003211027A1 (en) | 2002-03-27 | 2003-10-13 | Nanoink, Inc. | Method and apparatus for aligning patterns on a substrate |
| US7060977B1 (en) * | 2002-05-14 | 2006-06-13 | Nanoink, Inc. | Nanolithographic calibration methods |
| EP1363164B1 (en) * | 2002-05-16 | 2015-04-29 | NaWoTec GmbH | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| US7034854B2 (en) | 2002-11-12 | 2006-04-25 | Nanoink, Inc. | Methods and apparatus for ink delivery to nanolithographic probe systems |
| US20040228962A1 (en) | 2003-05-16 | 2004-11-18 | Chang Liu | Scanning probe microscopy probe and method for scanning probe contact printing |
| US7690325B2 (en) | 2004-04-30 | 2010-04-06 | Bioforce Nanosciences, Inc. | Method and apparatus for depositing material onto a surface |
| ATE491938T1 (de) * | 2004-10-29 | 2011-01-15 | Japan Science & Tech Agency | Substrat für maldi-tof-ms und massenspektrometrisches verfahren unter verwendung davon |
| US7339282B2 (en) | 2005-01-10 | 2008-03-04 | Bioforce Nanosciences, Inc. | Topographically indexed support substrates |
| WO2007126689A1 (en) * | 2006-04-19 | 2007-11-08 | Northwestern University | Article for parallel lithography with two-dimensional pen arrays |
| EP2044485B1 (en) * | 2006-06-28 | 2013-06-05 | Northwestern University | Etching hole arrays |
| US8256017B2 (en) * | 2006-08-31 | 2012-08-28 | Nanoink, Inc. | Using optical deflection of cantilevers for alignment |
| US20120141731A1 (en) * | 2006-12-18 | 2012-06-07 | Mirkin Chad A | Fabrication of microstructures and nanostructures using etching resist |
| KR20100015321A (ko) * | 2007-03-13 | 2010-02-12 | 나노잉크, 인크. | 검시창을 사용하는 나노리소그래피 |
| EP2156246A1 (en) * | 2007-05-09 | 2010-02-24 | Nanoink, Inc. | Compact nanofabrication apparatus |
| AU2008284284A1 (en) * | 2007-08-08 | 2009-02-12 | Northwestern University | Independently-addressable, self-correcting inking for cantilever arrays |
| JP2011513945A (ja) * | 2008-02-05 | 2011-04-28 | ナノインク インコーポレーティッド | アレイおよびカンチレバーアレイのレベリング方法 |
| CN102037407B (zh) | 2008-04-25 | 2014-01-01 | 西北大学 | 聚合物笔平版印刷术 |
| GB0812789D0 (en) * | 2008-07-12 | 2008-08-20 | Univ Liverpool | Materials and methods for cell growth |
| US8214916B2 (en) * | 2009-01-26 | 2012-07-03 | Nanoink, Inc. | Large area, homogeneous array fabrication including leveling with use of bright spots |
| US20100229264A1 (en) * | 2009-01-26 | 2010-09-09 | Nanoink, Inc. | Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
| WO2010085770A1 (en) * | 2009-01-26 | 2010-07-29 | Nanoink, Inc. | Large area, homogeneous array fabrication including substrate temperature control |
| US9918209B2 (en) | 2013-10-28 | 2018-03-13 | Microsoft Technology Licensing, Llc | Policies for selecting sources for resource strings |
-
2010
- 2010-01-25 US US12/656,310 patent/US20100221505A1/en not_active Abandoned
- 2010-01-25 AU AU2010206594A patent/AU2010206594A1/en not_active Abandoned
- 2010-01-25 JP JP2011548194A patent/JP2012515560A/ja active Pending
- 2010-01-25 SG SG2011048980A patent/SG172852A1/en unknown
- 2010-01-25 EP EP10702949A patent/EP2389614A1/en not_active Withdrawn
- 2010-01-25 CA CA2750430A patent/CA2750430A1/en not_active Abandoned
- 2010-01-25 WO PCT/US2010/022015 patent/WO2010085769A1/en not_active Ceased
- 2010-01-25 KR KR1020117017435A patent/KR20110124214A/ko not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010085769A1 (en) | 2010-07-29 |
| EP2389614A1 (en) | 2011-11-30 |
| JP2012515560A (ja) | 2012-07-12 |
| US20100221505A1 (en) | 2010-09-02 |
| CA2750430A1 (en) | 2010-07-29 |
| KR20110124214A (ko) | 2011-11-16 |
| AU2010206594A1 (en) | 2011-07-28 |
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