SG172852A1 - Large area, homogeneous array fabrication including homogeneous substrates - Google Patents

Large area, homogeneous array fabrication including homogeneous substrates Download PDF

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Publication number
SG172852A1
SG172852A1 SG2011048980A SG2011048980A SG172852A1 SG 172852 A1 SG172852 A1 SG 172852A1 SG 2011048980 A SG2011048980 A SG 2011048980A SG 2011048980 A SG2011048980 A SG 2011048980A SG 172852 A1 SG172852 A1 SG 172852A1
Authority
SG
Singapore
Prior art keywords
tips
article
array
cantilevers
substrate
Prior art date
Application number
SG2011048980A
Other languages
English (en)
Inventor
Nabil A Amro
Raymond Sanedrin
Earl J Gubbins
Original Assignee
Nanoink Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanoink Inc filed Critical Nanoink Inc
Publication of SG172852A1 publication Critical patent/SG172852A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Micromachines (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
SG2011048980A 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates SG172852A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14745209P 2009-01-26 2009-01-26
PCT/US2010/022015 WO2010085769A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates

Publications (1)

Publication Number Publication Date
SG172852A1 true SG172852A1 (en) 2011-08-29

Family

ID=42096549

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011048980A SG172852A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates

Country Status (8)

Country Link
US (1) US20100221505A1 (enExample)
EP (1) EP2389614A1 (enExample)
JP (1) JP2012515560A (enExample)
KR (1) KR20110124214A (enExample)
AU (1) AU2010206594A1 (enExample)
CA (1) CA2750430A1 (enExample)
SG (1) SG172852A1 (enExample)
WO (1) WO2010085769A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
WO2010085767A1 (en) * 2009-01-26 2010-07-29 Nanoink. Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US9276190B2 (en) 2013-10-01 2016-03-01 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD
US9040339B2 (en) 2013-10-01 2015-05-26 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material
US12174533B2 (en) 2019-07-23 2024-12-24 University Of Massachusetts Thermal imprinting of nanostructure materials

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USRE23838E (en) 1950-09-14 1954-06-08 Post-deflected color kinescope
US5171992A (en) * 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US6827979B2 (en) * 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
US6635311B1 (en) * 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
US6642129B2 (en) * 2001-07-26 2003-11-04 The Board Of Trustees Of The University Of Illinois Parallel, individually addressable probes for nanolithography
SE0102764D0 (sv) 2001-08-17 2001-08-17 Astrazeneca Ab Compounds
AU2003211027A1 (en) 2002-03-27 2003-10-13 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
US7060977B1 (en) * 2002-05-14 2006-06-13 Nanoink, Inc. Nanolithographic calibration methods
EP1363164B1 (en) 2002-05-16 2015-04-29 NaWoTec GmbH Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
US7034854B2 (en) 2002-11-12 2006-04-25 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US20040228962A1 (en) * 2003-05-16 2004-11-18 Chang Liu Scanning probe microscopy probe and method for scanning probe contact printing
US7690325B2 (en) 2004-04-30 2010-04-06 Bioforce Nanosciences, Inc. Method and apparatus for depositing material onto a surface
ATE491938T1 (de) * 2004-10-29 2011-01-15 Japan Science & Tech Agency Substrat für maldi-tof-ms und massenspektrometrisches verfahren unter verwendung davon
WO2006076272A2 (en) * 2005-01-10 2006-07-20 Bioforce Nanosciences, Inc. Topographically indexed support substrates
EP2013662B1 (en) * 2006-04-19 2013-08-14 Northwestern University Article for parallel lithography with two-dimensional pen arrays
CA2654973A1 (en) * 2006-06-28 2008-07-31 Northwestern University Etching and hole arrays
US8256017B2 (en) * 2006-08-31 2012-08-28 Nanoink, Inc. Using optical deflection of cantilevers for alignment
KR20090101943A (ko) * 2006-12-18 2009-09-29 노쓰웨스턴유니버시티 에칭 레지스트를 이용한 미세구조 및 나노구조의 제조
KR20100015321A (ko) * 2007-03-13 2010-02-12 나노잉크, 인크. 검시창을 사용하는 나노리소그래피
CA2681443A1 (en) 2007-05-09 2008-11-20 Nanoink, Inc. Compact nanofabrication apparatus
EP2185975A1 (en) * 2007-08-08 2010-05-19 Northwestern University Independently-addressable, self-correcting inking for cantilever arrays
US8256018B2 (en) * 2008-02-05 2012-08-28 Nanoink, Inc. Array and cantilever array leveling
ES2687650T3 (es) 2008-04-25 2018-10-26 Northwestern University Litografía de Plumas de Polímero
GB0812789D0 (en) * 2008-07-12 2008-08-20 Univ Liverpool Materials and methods for cell growth
US20100227063A1 (en) * 2009-01-26 2010-09-09 Nanoink, Inc. Large area, homogeneous array fabrication including substrate temperature control
WO2010085767A1 (en) * 2009-01-26 2010-07-29 Nanoink. Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
US9918209B2 (en) 2013-10-28 2018-03-13 Microsoft Technology Licensing, Llc Policies for selecting sources for resource strings

Also Published As

Publication number Publication date
EP2389614A1 (en) 2011-11-30
CA2750430A1 (en) 2010-07-29
WO2010085769A1 (en) 2010-07-29
JP2012515560A (ja) 2012-07-12
KR20110124214A (ko) 2011-11-16
AU2010206594A1 (en) 2011-07-28
US20100221505A1 (en) 2010-09-02

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