AU2010206594A1 - Large area, homogeneous array fabrication including homogeneous substrates - Google Patents

Large area, homogeneous array fabrication including homogeneous substrates Download PDF

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Publication number
AU2010206594A1
AU2010206594A1 AU2010206594A AU2010206594A AU2010206594A1 AU 2010206594 A1 AU2010206594 A1 AU 2010206594A1 AU 2010206594 A AU2010206594 A AU 2010206594A AU 2010206594 A AU2010206594 A AU 2010206594A AU 2010206594 A1 AU2010206594 A1 AU 2010206594A1
Authority
AU
Australia
Prior art keywords
tips
article
array
cantilevers
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2010206594A
Other languages
English (en)
Inventor
Nabil A. Amro
Earl J. Gubbins
Raymond Sanedrin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NanoInk Inc
Original Assignee
NanoInk Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NanoInk Inc filed Critical NanoInk Inc
Publication of AU2010206594A1 publication Critical patent/AU2010206594A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Micromachines (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AU2010206594A 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates Abandoned AU2010206594A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14745209P 2009-01-26 2009-01-26
US61/147,452 2009-01-26
PCT/US2010/022015 WO2010085769A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates

Publications (1)

Publication Number Publication Date
AU2010206594A1 true AU2010206594A1 (en) 2011-07-28

Family

ID=42096549

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2010206594A Abandoned AU2010206594A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including homogeneous substrates

Country Status (8)

Country Link
US (1) US20100221505A1 (enExample)
EP (1) EP2389614A1 (enExample)
JP (1) JP2012515560A (enExample)
KR (1) KR20110124214A (enExample)
AU (1) AU2010206594A1 (enExample)
CA (1) CA2750430A1 (enExample)
SG (1) SG172852A1 (enExample)
WO (1) WO2010085769A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2750425A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
US9276190B2 (en) 2013-10-01 2016-03-01 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD
US9040339B2 (en) 2013-10-01 2015-05-26 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material
EP4003683A4 (en) 2019-07-23 2024-08-07 University Of Massachusetts THERMAL PRINTING OF NANOSTRUCTURED MATERIALS

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USRE23838E (en) 1950-09-14 1954-06-08 Post-deflected color kinescope
US5171992A (en) 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US6635311B1 (en) * 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US6827979B2 (en) 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
US6642129B2 (en) 2001-07-26 2003-11-04 The Board Of Trustees Of The University Of Illinois Parallel, individually addressable probes for nanolithography
SE0102764D0 (sv) 2001-08-17 2001-08-17 Astrazeneca Ab Compounds
US7279046B2 (en) 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
US7060977B1 (en) 2002-05-14 2006-06-13 Nanoink, Inc. Nanolithographic calibration methods
EP1363164B1 (en) 2002-05-16 2015-04-29 NaWoTec GmbH Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
AU2003287618A1 (en) * 2002-11-12 2004-06-03 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US20040228962A1 (en) * 2003-05-16 2004-11-18 Chang Liu Scanning probe microscopy probe and method for scanning probe contact printing
US7690325B2 (en) 2004-04-30 2010-04-06 Bioforce Nanosciences, Inc. Method and apparatus for depositing material onto a surface
US8294090B1 (en) * 2004-10-29 2012-10-23 Japan Science And Technology Agency Substrate for MALDI-TOF MS and mass spectrometry method using the same
EP1846249A2 (en) * 2005-01-10 2007-10-24 Bioforce Nanosciences, Inc. Topographically indexed support substrates
WO2007126689A1 (en) * 2006-04-19 2007-11-08 Northwestern University Article for parallel lithography with two-dimensional pen arrays
JP2009542448A (ja) * 2006-06-28 2009-12-03 ノースウエスタン ユニバーシティ エッチングおよびホールアレイ
US8256017B2 (en) * 2006-08-31 2012-08-28 Nanoink, Inc. Using optical deflection of cantilevers for alignment
AU2007350336A1 (en) * 2006-12-18 2008-10-09 Northwestern University Fabrication of microstructures and nanostructures using etching resist
KR20100015321A (ko) * 2007-03-13 2010-02-12 나노잉크, 인크. 검시창을 사용하는 나노리소그래피
JP5269887B2 (ja) * 2007-05-09 2013-08-21 ナノインク インコーポレーティッド 小型ナノファブリケーション装置
KR20100056453A (ko) * 2007-08-08 2010-05-27 노쓰웨스턴유니버시티 캔틸레버 어레이에 대해 독립적으로 어드레스 가능한 자가 보정 잉킹 방법
AU2009210719A1 (en) * 2008-02-05 2009-08-13 Nanoink, Inc. Array and cantilever array leveling
WO2009132321A1 (en) 2008-04-25 2009-10-29 Northwestern University Polymer pen lithography
GB0812789D0 (en) * 2008-07-12 2008-08-20 Univ Liverpool Materials and methods for cell growth
KR20110119666A (ko) * 2009-01-26 2011-11-02 나노잉크, 인크. 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
CA2750425A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US9918209B2 (en) 2013-10-28 2018-03-13 Microsoft Technology Licensing, Llc Policies for selecting sources for resource strings

Also Published As

Publication number Publication date
WO2010085769A1 (en) 2010-07-29
SG172852A1 (en) 2011-08-29
KR20110124214A (ko) 2011-11-16
JP2012515560A (ja) 2012-07-12
US20100221505A1 (en) 2010-09-02
EP2389614A1 (en) 2011-11-30
CA2750430A1 (en) 2010-07-29

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Legal Events

Date Code Title Description
MK4 Application lapsed section 142(2)(d) - no continuation fee paid for the application