JP2012510149A5 - - Google Patents
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- Publication number
- JP2012510149A5 JP2012510149A5 JP2011536876A JP2011536876A JP2012510149A5 JP 2012510149 A5 JP2012510149 A5 JP 2012510149A5 JP 2011536876 A JP2011536876 A JP 2011536876A JP 2011536876 A JP2011536876 A JP 2011536876A JP 2012510149 A5 JP2012510149 A5 JP 2012510149A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl
- aryl
- groups
- alkenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000005915 C6-C14 aryl group Chemical group 0.000 claims 25
- 125000000217 alkyl group Chemical group 0.000 claims 19
- 125000000753 cycloalkyl group Chemical group 0.000 claims 19
- 229920002554 vinyl polymer Polymers 0.000 claims 19
- 125000003118 aryl group Chemical group 0.000 claims 16
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 14
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 14
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 14
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims 14
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims 11
- 229910052736 halogen Inorganic materials 0.000 claims 11
- 150000002367 halogens Chemical class 0.000 claims 11
- 125000001072 heteroaryl group Chemical group 0.000 claims 11
- 125000004093 cyano group Chemical group *C#N 0.000 claims 9
- 125000001188 haloalkyl group Chemical group 0.000 claims 9
- 125000004414 alkyl thio group Chemical group 0.000 claims 8
- 229920000642 polymer Polymers 0.000 claims 8
- 125000003545 alkoxy group Chemical group 0.000 claims 7
- 125000000332 coumarinyl group Chemical group O1C(=O)C(=CC2=CC=CC=C12)* 0.000 claims 6
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 5
- 125000000304 alkynyl group Chemical group 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 5
- 125000000171 (C1-C6) haloalkyl group Chemical group 0.000 claims 4
- 125000006708 (C5-C14) heteroaryl group Chemical group 0.000 claims 4
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 claims 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims 3
- 229910003849 O-Si Inorganic materials 0.000 claims 3
- 229910003872 O—Si Inorganic materials 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical group OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims 2
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 claims 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims 2
- 238000002835 absorbance Methods 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 229920001577 copolymer Polymers 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 230000009477 glass transition Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 239000008096 xylene Substances 0.000 claims 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims 1
- 229920002873 Polyethylenimine Polymers 0.000 claims 1
- 239000004793 Polystyrene Substances 0.000 claims 1
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 125000000232 haloalkynyl group Chemical group 0.000 claims 1
- 125000004043 oxo group Chemical group O=* 0.000 claims 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims 1
- -1 polymaleimides Polymers 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000004926 polymethyl methacrylate Substances 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 229920002689 polyvinyl acetate Polymers 0.000 claims 1
- 239000011118 polyvinyl acetate Substances 0.000 claims 1
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 0 C*(C)C(CC(C)(C)C)c(cc1)ccc1OC(COc(cc1)cc(C=C2)c1OC2=O)=O Chemical compound C*(C)C(CC(C)(C)C)c(cc1)ccc1OC(COc(cc1)cc(C=C2)c1OC2=O)=O 0.000 description 8
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11740408P | 2008-11-24 | 2008-11-24 | |
| US61/117,404 | 2008-11-24 | ||
| PCT/EP2009/065569 WO2010057984A2 (en) | 2008-11-24 | 2009-11-20 | Photocurable polymeric dielectrics and methods of preparation and use thereof |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014139115A Division JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012510149A JP2012510149A (ja) | 2012-04-26 |
| JP2012510149A5 true JP2012510149A5 (OSRAM) | 2013-02-14 |
| JP5684715B2 JP5684715B2 (ja) | 2015-03-18 |
Family
ID=42084518
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011536876A Active JP5684715B2 (ja) | 2008-11-24 | 2009-11-20 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
| JP2014139115A Expired - Fee Related JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014139115A Expired - Fee Related JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8937301B2 (OSRAM) |
| EP (2) | EP2660889A3 (OSRAM) |
| JP (2) | JP5684715B2 (OSRAM) |
| KR (2) | KR101717398B1 (OSRAM) |
| CN (2) | CN102224611B (OSRAM) |
| TW (1) | TWI491622B (OSRAM) |
| WO (1) | WO2010057984A2 (OSRAM) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011126076A1 (ja) * | 2010-04-09 | 2011-10-13 | 大日本印刷株式会社 | 薄膜トランジスタ基板 |
| JP6027962B2 (ja) * | 2011-03-30 | 2016-11-16 | 株式会社Adeka | 重合性液晶組成物、偏光発光性塗料、新規ナフトラクタム誘導体、新規クマリン誘導体、新規ナイルレッド誘導体及び新規アントラセン誘導体 |
| JP6161636B2 (ja) * | 2012-02-07 | 2017-07-12 | フレックステラ， インコーポレイテッドＦｌｅｘｔｅｒｒａ， Ｉｎｃ． | 光硬化性高分子材料および関連電子デバイス |
| US9171961B2 (en) | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
| EP3007214B1 (en) * | 2013-06-07 | 2018-09-19 | Fujifilm Corporation | Composition for forming gate insulating film, organic thin film transistor, electronic paper, and display device |
| EP3087812B9 (en) | 2013-12-24 | 2021-06-09 | Flexterra, Inc. | Support structures for an attachable, two-dimensional flexible electronic device |
| JP6034326B2 (ja) * | 2014-03-26 | 2016-11-30 | 富士フイルム株式会社 | 半導体素子及び絶縁層形成用組成物 |
| US10261634B2 (en) | 2014-03-27 | 2019-04-16 | Flexterra, Inc. | Infrared touch system for flexible displays |
| WO2015183567A1 (en) | 2014-05-28 | 2015-12-03 | Polyera Corporation | Low power display updates |
| US9606439B2 (en) | 2014-07-15 | 2017-03-28 | Eastman Kodak Company | Forming conductive metal patterns using water-soluble polymers |
| WO2016046659A1 (en) * | 2014-09-25 | 2016-03-31 | Basf Se | Ether-based polymers as photo-crosslinkable dielectrics |
| TWI683185B (zh) | 2014-10-24 | 2020-01-21 | 美商飛利斯有限公司 | 可光圖案化組成物以及使用該可光圖案化組成物製造電晶體元件的方法 |
| US9761817B2 (en) | 2015-03-13 | 2017-09-12 | Corning Incorporated | Photo-patternable gate dielectrics for OFET |
| US10254795B2 (en) | 2015-05-06 | 2019-04-09 | Flexterra, Inc. | Attachable, flexible display device with flexible tail |
| EP3133065A1 (en) * | 2015-08-21 | 2017-02-22 | Merck Patent GmbH | Compounds for optically active devices |
| WO2017038948A1 (ja) * | 2015-09-02 | 2017-03-09 | 富士フイルム株式会社 | 有機薄膜トランジスタ、有機薄膜トランジスタの製造方法、有機半導体組成物、有機半導体膜および有機半導体膜の製造方法 |
| DE102015119939A1 (de) | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
| CN105628262A (zh) * | 2015-12-20 | 2016-06-01 | 华南理工大学 | 基于有机弹性体栅绝缘层的薄膜晶体管压力传感器 |
| CN105810819B (zh) * | 2016-05-04 | 2018-09-04 | 国家纳米科学中心 | 一种有机分子螺旋生长薄膜场效应晶体管及其制备方法和应用 |
| JP6801374B2 (ja) * | 2016-10-31 | 2020-12-16 | 東ソー株式会社 | 重合体、絶縁膜及びこれを含む有機電界効果トランジスタデバイス |
| TWI614505B (zh) * | 2017-02-18 | 2018-02-11 | 以紫外光照射提高矽基表面原生氧化層品質之裝置與方法 | |
| EP3597673B1 (en) | 2017-03-16 | 2023-06-07 | Tosoh Corporation | Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same |
| WO2018168676A1 (ja) | 2017-03-16 | 2018-09-20 | 東ソー株式会社 | 光架橋性重合体、絶縁膜、平坦化膜、親撥パターニング膜及びこれを含む有機電界効果トランジスタデバイス |
| CN107621751B (zh) * | 2017-09-21 | 2021-02-09 | 儒芯微电子材料（上海）有限公司 | 含碱性香豆素结构的聚合物树脂及其光刻胶组合物 |
| KR102540663B1 (ko) * | 2021-04-29 | 2023-06-12 | 이화여자대학교 산학협력단 | 병솔 고분자를 포함하는 트랜지스터 게이트절연층용 고분자 박막 및 이를 포함하는 유기전계효과트랜지스터 |
| US20240400736A1 (en) * | 2021-08-30 | 2024-12-05 | Flexterra, Inc. | Colored dielectric polymer materials and devices using them |
| CN113793901B (zh) * | 2021-09-16 | 2023-11-07 | 南京大学 | 一种基于聚合物掺杂n-型有机半导体的并五苯有机场效应晶体管 |
Family Cites Families (31)
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| JPS5560503A (en) * | 1978-10-30 | 1980-05-07 | Cosmo Co Ltd | Lactone group-containing vinylphenol-type polymer and its preparation |
| US5739295A (en) * | 1997-03-07 | 1998-04-14 | Hoechst Celanese Corporation | Photoactive coumarin sulfonate compounds |
| US5773591A (en) * | 1997-03-07 | 1998-06-30 | Hoechst Celanese Corp. | Process for preparing coumarin sulfonates |
| GB9720922D0 (en) * | 1997-10-02 | 1997-12-03 | Smith & Nephew | Adhesives |
| JP4433526B2 (ja) * | 1999-10-07 | 2010-03-17 | コニカミノルタホールディングス株式会社 | 液晶性高分子水系分散物の製造方法、液晶性高分子水系分散物、光学素子の製造方法及び光学素子 |
| AU2001281343A1 (en) | 2000-07-24 | 2002-02-05 | Northwestern University | N-type thiophene semiconductors |
| US6585914B2 (en) | 2000-07-24 | 2003-07-01 | Northwestern University | N-type thiophene semiconductors |
| JP4305637B2 (ja) * | 2003-06-19 | 2009-07-29 | 信越化学工業株式会社 | 高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| JP2005093921A (ja) * | 2003-09-19 | 2005-04-07 | Canon Inc | 電界効果型有機トランジスタおよびその製造方法 |
| JP4921982B2 (ja) | 2004-01-26 | 2012-04-25 | ノースウエスタン ユニバーシティ | ペリレンｎ型半導体及び関連装置 |
| JP2006024862A (ja) * | 2004-07-09 | 2006-01-26 | Nippon Hoso Kyokai <Nhk> | 有機トランジスタおよび有機トランジスタの製造方法 |
| CA2579407A1 (en) | 2004-09-14 | 2006-03-14 | Northwestern University | Carbonyl-functionalized thiophene compounds and related device stuctures |
| WO2007001407A2 (en) * | 2004-10-06 | 2007-01-04 | Cornerstone Research Group, Inc. | Light activated shape memory co-polymers |
| EP2016594A2 (en) | 2006-05-11 | 2009-01-21 | Northwestern University | Silole-based polymers and semiconductor materials prepared from the same |
| WO2007146250A2 (en) | 2006-06-12 | 2007-12-21 | Northwestern University | Naphthalene-based semiconductor materials and methods of preparing and use thereof |
| KR101224723B1 (ko) * | 2006-09-15 | 2013-01-21 | 삼성전자주식회사 | 유기 절연막 조성물, 이를 이용하여 제조된 유기 절연막 및유기 박막 트랜지스터 |
| WO2008051552A2 (en) | 2006-10-25 | 2008-05-02 | Northwestern University | Organic semiconductor materials and methods of preparing and use thereof |
| WO2008063583A1 (en) | 2006-11-17 | 2008-05-29 | Polyera Corporation | Acene-based organic semiconductor materials and methods of preparing and using the same |
| WO2008063609A2 (en) | 2006-11-17 | 2008-05-29 | Polyera Corporation | Diimide-based semiconductor materials and methods of preparing and using the same |
| EP2089442B1 (en) * | 2006-11-28 | 2014-10-01 | Polyera Corporation | Photopolymer-based dielectric materials and methods of preparation and use thereof |
| EP2104676A2 (en) | 2007-01-08 | 2009-09-30 | Polyera Corporation | Methods for preparing arene-bis(dicarboximide)-based semiconducting materials and related intermediates for preparing same |
| US8022214B2 (en) | 2007-01-24 | 2011-09-20 | Polyera Corporation | Organic semiconductor materials and precursors thereof |
| KR101316291B1 (ko) * | 2007-02-16 | 2013-10-08 | 삼성전자주식회사 | 공중합체, 유기절연층 조성물 및 그를 이용하여 제조된유기 절연층 및 유기 박막 트랜지스터 |
| JP4911469B2 (ja) * | 2007-09-28 | 2012-04-04 | 富士フイルム株式会社 | レジスト組成物及びこれを用いたパターン形成方法 |
| JP5683274B2 (ja) | 2008-02-05 | 2015-03-11 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | リレン−（π−受容体）コポリマーから製造される半導体材料 |
| CN101952988B (zh) | 2008-02-05 | 2015-12-16 | 巴斯夫欧洲公司 | 苝半导体及其制备方法和用途 |
| WO2009144205A1 (en) | 2008-05-30 | 2009-12-03 | Basf Se | Rylene-based semiconductor materials and methods of preparation and use thereof |
| WO2010000755A1 (en) | 2008-07-02 | 2010-01-07 | Basf Se | High performance solution processable semiconducting polymers based on alternat-ing donor acceptor copolymers |
| US8580384B2 (en) * | 2010-01-17 | 2013-11-12 | Polyera Corporation | Dielectric materials and methods of preparation and use thereof |
| KR20130112882A (ko) * | 2010-09-02 | 2013-10-14 | 메르크 파텐트 게엠베하 | 유기 전자 디바이스의 제조 방법 |
| US9171961B2 (en) * | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
-
2009
- 2009-11-20 WO PCT/EP2009/065569 patent/WO2010057984A2/en not_active Ceased
- 2009-11-20 EP EP20130179103 patent/EP2660889A3/en not_active Withdrawn
- 2009-11-20 JP JP2011536876A patent/JP5684715B2/ja active Active
- 2009-11-20 EP EP09759719.9A patent/EP2368281B1/en not_active Not-in-force
- 2009-11-20 CN CN200980146851.4A patent/CN102224611B/zh not_active Expired - Fee Related
- 2009-11-20 US US13/128,961 patent/US8937301B2/en active Active
- 2009-11-20 KR KR1020157036689A patent/KR101717398B1/ko active Active
- 2009-11-20 CN CN201310529741.4A patent/CN103560206B/zh not_active Expired - Fee Related
- 2009-11-20 KR KR1020117014710A patent/KR101712680B1/ko active Active
- 2009-11-24 TW TW098139975A patent/TWI491622B/zh not_active IP Right Cessation
-
2014
- 2014-07-04 JP JP2014139115A patent/JP5960202B2/ja not_active Expired - Fee Related
- 2014-08-25 US US14/467,839 patent/US9923158B2/en active Active
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