JP2012509572A5 - - Google Patents

Download PDF

Info

Publication number
JP2012509572A5
JP2012509572A5 JP2011520416A JP2011520416A JP2012509572A5 JP 2012509572 A5 JP2012509572 A5 JP 2012509572A5 JP 2011520416 A JP2011520416 A JP 2011520416A JP 2011520416 A JP2011520416 A JP 2011520416A JP 2012509572 A5 JP2012509572 A5 JP 2012509572A5
Authority
JP
Japan
Prior art keywords
mirror
psd
pair
plasma
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011520416A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012509572A (ja
JP5449352B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2009/059045 external-priority patent/WO2010012588A1/en
Publication of JP2012509572A publication Critical patent/JP2012509572A/ja
Publication of JP2012509572A5 publication Critical patent/JP2012509572A5/ja
Application granted granted Critical
Publication of JP5449352B2 publication Critical patent/JP5449352B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011520416A 2008-07-30 2009-07-15 放射源、リソグラフィ装置、およびデバイス製造方法 Expired - Fee Related JP5449352B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US8475908P 2008-07-30 2008-07-30
US61/084,759 2008-07-30
US9244308P 2008-08-28 2008-08-28
US61/092,443 2008-08-28
PCT/EP2009/059045 WO2010012588A1 (en) 2008-07-30 2009-07-15 Radiation source, lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2012509572A JP2012509572A (ja) 2012-04-19
JP2012509572A5 true JP2012509572A5 (enExample) 2012-08-30
JP5449352B2 JP5449352B2 (ja) 2014-03-19

Family

ID=41134690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011520416A Expired - Fee Related JP5449352B2 (ja) 2008-07-30 2009-07-15 放射源、リソグラフィ装置、およびデバイス製造方法

Country Status (6)

Country Link
US (1) US20110122389A1 (enExample)
JP (1) JP5449352B2 (enExample)
KR (1) KR101619272B1 (enExample)
CN (1) CN102105836A (enExample)
NL (1) NL2003202A1 (enExample)
WO (1) WO2010012588A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003192A1 (nl) * 2008-07-30 2010-02-02 Asml Netherlands Bv Alignment of collector device in lithographic apparatus.
NL2009372A (en) * 2011-09-28 2013-04-02 Asml Netherlands Bv Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods.
KR102755819B1 (ko) * 2016-01-18 2025-01-15 에이에스엠엘 네델란즈 비.브이. 빔 측정 시스템, 리소그래피 시스템, 및 방법
DE102017212534A1 (de) * 2017-07-21 2019-01-24 Carl Zeiss Smt Gmbh Optisches System, Lithographieanlage, Verfahren zum Herstellen eines optischen Systems sowie Verfahren zum Austauschen eines Moduls
DE102020200158A1 (de) 2020-01-09 2021-07-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102020212229B3 (de) * 2020-09-29 2022-01-20 Carl Zeiss Smt Gmbh Blenden-Vorrichtung zur Begrenzung eines Strahlengangs zwischen einer Lichtquelle und einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die Projektionslithographie
DE102024201763A1 (de) 2024-02-27 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zur Vermessung einer Ist-Orientierung einer Reflexionsfläche eines aktorisch verkippbaren Nutz-Einzelspiegels sowie Messeinrichtung zur Durchführung des Verfahrens

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000100685A (ja) 1998-09-17 2000-04-07 Nikon Corp 露光装置及び該装置を用いた露光方法
AU2003277893A1 (en) * 2002-09-30 2004-04-23 Asml Netherlands B.V. Illumination system for a wavelength = 193 nm, comprising sensors for determining the illumination
US7113261B2 (en) * 2004-06-08 2006-09-26 Asml Netherlands B.V. Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
US7098466B2 (en) * 2004-06-30 2006-08-29 Intel Corporation Adjustable illumination source
WO2007054291A1 (en) * 2005-11-10 2007-05-18 Carl Zeiss Smt Ag Euv illumination system with a system for measuring fluctuations of the light source

Similar Documents

Publication Publication Date Title
JP2012509572A5 (enExample)
JP5549230B2 (ja) 測距装置、測距用モジュール及びこれを用いた撮像装置
JP5440801B2 (ja) 基準球検出装置、基準球位置検出装置、及び、三次元座標測定装置
US6480266B2 (en) Autofocus distance-measuring optical system
US10168145B2 (en) Three dimensional shape measurement apparatus, control method therefor, and storage medium
JP2006098771A5 (enExample)
JP2012518804A5 (enExample)
KR102177005B1 (ko) 기판 정렬을 위한 머신 비전 시스템 및 정렬 장치
WO2013015143A1 (en) Image pickup apparatus
WO2012042943A1 (ja) 投光ビームの調整方法
CN102252634B (zh) 基于望远系统的激光多自由度精密测量系统
JP5626367B2 (ja) 焦点位置維持装置及び顕微鏡
JP2011185767A (ja) 形状測定装置及び形状測定方法
CN101813867A (zh) 半通过镜头无反光镜相位比较对焦数码相机系统
JP2010152140A5 (enExample)
WO2014073401A2 (en) Distance measuring apparatus
US9588260B2 (en) Microlens substrate and imaging apparatus
JPS6042725A (ja) 焦点検出装置
JP3609988B2 (ja) 焦点検出装置
JP2007139935A5 (enExample)
JP2011090166A (ja) ステレオ撮像装置
JP2016114615A (ja) 撮像装置
JP3655875B2 (ja) カメラの測距装置
JP2018072375A (ja) 光学部品保持枠の偏心量測定方法
JP6072511B2 (ja) 位置調整装置、および位置調整方法