JP2012240099A5 - - Google Patents
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- Publication number
- JP2012240099A5 JP2012240099A5 JP2011114374A JP2011114374A JP2012240099A5 JP 2012240099 A5 JP2012240099 A5 JP 2012240099A5 JP 2011114374 A JP2011114374 A JP 2011114374A JP 2011114374 A JP2011114374 A JP 2011114374A JP 2012240099 A5 JP2012240099 A5 JP 2012240099A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- containing liquid
- liquid
- processing
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims 65
- 239000007789 gas Substances 0.000 claims 51
- 230000001678 irradiating effect Effects 0.000 claims 7
- 238000003672 processing method Methods 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 1
- 238000011084 recovery Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011114374A JP5809445B2 (ja) | 2011-05-23 | 2011-05-23 | レーザ処理装置及び方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011114374A JP5809445B2 (ja) | 2011-05-23 | 2011-05-23 | レーザ処理装置及び方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015179649A Division JP5992081B2 (ja) | 2015-09-11 | 2015-09-11 | レーザ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012240099A JP2012240099A (ja) | 2012-12-10 |
| JP2012240099A5 true JP2012240099A5 (enExample) | 2014-07-03 |
| JP5809445B2 JP5809445B2 (ja) | 2015-11-10 |
Family
ID=47462340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011114374A Expired - Fee Related JP5809445B2 (ja) | 2011-05-23 | 2011-05-23 | レーザ処理装置及び方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5809445B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6125261B2 (ja) * | 2013-02-12 | 2017-05-10 | 三菱重工業株式会社 | ウォータジェットピーニング圧縮残留応力試験方法 |
| JP5997804B1 (ja) * | 2015-06-03 | 2016-09-28 | 株式会社Ihi | 表面処理装置 |
| JP6571711B2 (ja) | 2017-04-03 | 2019-09-04 | ファナック株式会社 | レーザ装置 |
| JP7165079B2 (ja) * | 2019-03-12 | 2022-11-02 | 日本タングステン株式会社 | 加工用クーラント供給機構、および、加工用クーラントの供給方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5057184A (en) * | 1990-04-06 | 1991-10-15 | International Business Machines Corporation | Laser etching of materials in liquids |
| JPH06333910A (ja) * | 1993-05-27 | 1994-12-02 | Nippondenso Co Ltd | レーザによるエッチング方法 |
| JPH11145108A (ja) * | 1997-11-05 | 1999-05-28 | Denso Corp | 微細加工方法および微細加工装置 |
| JP2005324238A (ja) * | 2004-05-17 | 2005-11-24 | Toyota Motor Corp | レーザ加工方法および装置 |
| JP2011088799A (ja) * | 2009-10-26 | 2011-05-06 | Mitsubishi Electric Corp | 半導体装置の製造方法およびレーザー加工装置 |
-
2011
- 2011-05-23 JP JP2011114374A patent/JP5809445B2/ja not_active Expired - Fee Related
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