TW200801853A - Treating device and manufacturing method for substrate - Google Patents
Treating device and manufacturing method for substrateInfo
- Publication number
- TW200801853A TW200801853A TW96113892A TW96113892A TW200801853A TW 200801853 A TW200801853 A TW 200801853A TW 96113892 A TW96113892 A TW 96113892A TW 96113892 A TW96113892 A TW 96113892A TW 200801853 A TW200801853 A TW 200801853A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- treatment solution
- treatment
- ozone bubble
- manufacturing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Provided are a substrate treatment apparatus (1) and a substrate manufacturing method by which process management is facilitated and the structure is simplified. A substrate (W) is stored in a treatment tank (2) to be impregnated with a treatment solution (F), the treatment solution (F) sucked from the inside of the treatment tank (2) is heated up to 55 DEG C by a heater (6), then, an ozone bubble treatment solution (FB) is generated by mixing ozone gas. Then, the ozone bubble treatment solution (FB) is supplied to a film (Wa) (subject to be treated) in a high-speed water flow status by jetting the ozone bubble treatment solution by an ozone bubble jetting section (9).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006116400 | 2006-04-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200801853A true TW200801853A (en) | 2008-01-01 |
Family
ID=38625098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW96113892A TW200801853A (en) | 2006-04-20 | 2007-04-20 | Treating device and manufacturing method for substrate |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2007123198A1 (en) |
TW (1) | TW200801853A (en) |
WO (1) | WO2007123198A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011000861A1 (en) * | 2011-02-22 | 2012-08-23 | Rena Gmbh | Method for treating an object, in particular a solar cell substrate, and device for carrying out the method |
WO2014020693A1 (en) * | 2012-07-31 | 2014-02-06 | 三洋電機株式会社 | Method for producing solar cell |
WO2014020687A1 (en) | 2012-07-31 | 2014-02-06 | 三洋電機株式会社 | Method for producing solar cell |
JP7202632B2 (en) * | 2019-01-24 | 2023-01-12 | 株式会社ジェイ・イー・ティ | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001269631A (en) * | 2000-03-27 | 2001-10-02 | Dainippon Screen Mfg Co Ltd | Substrate cleaning device |
JP4444557B2 (en) * | 2002-08-29 | 2010-03-31 | 月島環境エンジニアリング株式会社 | Ozone water heat treatment method and heat treatment apparatus |
JP2004266000A (en) * | 2003-02-28 | 2004-09-24 | Dainippon Screen Mfg Co Ltd | Method and apparatus for processing substrate |
-
2007
- 2007-04-20 WO PCT/JP2007/058617 patent/WO2007123198A1/en active Application Filing
- 2007-04-20 TW TW96113892A patent/TW200801853A/en unknown
- 2007-04-20 JP JP2008512161A patent/JPWO2007123198A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2007123198A1 (en) | 2007-11-01 |
JPWO2007123198A1 (en) | 2009-09-03 |
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