JP2012198522A - Method for manufacturing pattern alignment film, method for manufacturing pattern phase difference film using the same, and manufacturing device thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a pattern alignment film by which a large number of pattern phase difference films can be easily manufactured.SOLUTION: A method for manufacturing a pattern alignment film includes an exposure process for forming an alignment layer, which includes first exposure processing and second exposure processing for irradiating an alignment layer forming layer with polarized ultraviolet while continuously conveying a long alignment film forming film having a transparent film base material and the alignment layer forming layer formed on the transparent film base material and containing an optical alignment material. Polarization directions of polarized ultraviolet irradiation in the first exposure processing and the second exposure processing are different from each other, and the alignment layer forming layer is pattern irradiated with polarized ultraviolet by at least one of the first exposure processing and the second exposure processing.

Description

  The present invention relates to a method for producing a pattern alignment film that can easily and in large quantities produce a patterned retardation film.

  Conventionally, as a flat panel display, a two-dimensional display has been mainstream, but in recent years, a flat panel display capable of three-dimensional display has begun to attract attention, and some of them are commercially available. . Further, in future flat panel displays, it is a natural tendency to be capable of three-dimensional display, and flat panel displays capable of three-dimensional display are being studied in a wide range of fields.

  In order to perform three-dimensional display on a flat panel display, it is usually necessary to display a right-eye video and a left-eye video separately to the viewer in some manner. As a method for separately displaying the right-eye video and the left-eye video, for example, a passive method is known. Such a passive three-dimensional display method will be described with reference to the drawings. FIG. 17 is a schematic diagram illustrating an example of a passive three-dimensional display. As shown in FIG. 17, in this method, first, the pixels constituting the flat panel display are divided into a plurality of types of pixels, that is, a right-eye video display pixel and a left-eye video display pixel. The pixel displays a right-eye image, and the other group of pixels displays a left-eye image. Also, using a linearly polarizing plate and a patterned retardation film on which a patterned retardation layer corresponding to the division pattern of the pixel is formed, a right-eye image and a left-eye image are orthogonal to each other. Convert to polarized light. In addition, the viewer wears circular polarizing glasses that employ circular polarizing lenses that are orthogonal to each other for the right-eye lens and the left-eye lens, so that the right-eye image passes only through the right-eye lens and the left-eye image is displayed. Pass only through the lens for the left eye. In this way, the passive system enables three-dimensional display by allowing the right-eye video to reach only the right eye and the left-eye video to reach only the left eye.

  Such a passive method has an advantage that three-dimensional display can be easily performed by using the pattern retardation film and the corresponding circular polarizing glasses.

  By the way, as described above, in the passive method, it is essential to use a pattern retardation film. However, such a pattern retardation film has not been widely researched and developed, and can be used as a standard technique. There is nothing that has been established. In this regard, Patent Document 1 discloses that as a pattern retardation film, a photo-alignment film having an alignment regulating force controlled in a pattern on a glass substrate and the photo-alignment film are formed. A pattern retardation plate having a retardation layer patterned so as to correspond to a film pattern is disclosed. However, since the pattern retardation plate disclosed in Patent Document 1 is indispensable to use a glass plate, it is expensive and does not mean that a large area can be manufactured. There was a difficulty in its practicality.

  For this reason, practically used pattern retardation films are still in the research and development stage, and few have been known as general ones. As a result, a large amount of inexpensive and simple methods are available. There is a problem that a display device that can be manufactured and can display a three-dimensional image has not been obtained.

JP 2005-49865 A

  This invention is made | formed in view of such a condition, and it aims at providing the manufacturing method of the pattern alignment film which can manufacture a pattern alignment film easily and in large quantities.

  In order to solve the above-mentioned problems, the present invention continuously forms a transparent film substrate and a film for forming a long alignment film formed on the transparent film substrate and having an alignment layer forming layer containing a photoalignment material. The first exposure process and the second exposure process include an exposure process for forming an alignment layer, including a first exposure process and a second exposure process in which the alignment layer forming layer is irradiated with polarized ultraviolet rays while being conveyed. The polarization direction of the polarized ultraviolet rays to be irradiated is different, and at least one of the first exposure process and the second exposure process is a pattern irradiation of polarized ultraviolet rays on the alignment layer forming layer. A method for producing a pattern alignment film is provided.

According to the present invention, the exposure step includes the first alignment region in which the rod-shaped compound can be arranged in a certain direction and the rod-like compound in the direction different from the first alignment region. An alignment layer having two alignment regions can be formed continuously.
Therefore, when a retardation layer containing a rod-like compound is formed on the alignment layer in which such an alignment region is formed, the retardation layer formed on the first alignment region also in the retardation layer according to the pattern (Hereinafter, sometimes referred to as “first retardation region”) and a retardation layer (hereinafter, sometimes referred to as “second retardation region”) formed on the second alignment region. Can be manufactured easily and in large quantities.

  In the present invention, one of the first exposure process and the second exposure process is to irradiate the alignment layer forming layer with polarized ultraviolet light, and the other irradiates the alignment layer forming layer with polarized ultraviolet light over the entire surface. It is preferable. This is because the first alignment region and the second alignment region in which rod-shaped compounds can be arranged in different directions can be formed easily and at low cost.

  In this invention, it is preferable that the said pattern irradiation irradiates polarized ultraviolet rays to the strip | belt-shaped pattern mutually parallel to the longitudinal direction of the said film for elongate alignment film formation. This is because the first alignment region and the second alignment region in which rod-shaped compounds can be arranged in different directions can be formed easily and at low cost.

  In this invention, it is preferable that the said pattern irradiation is performed on the conveyance means which conveys the said film for elongate alignment film formation. The distance between the light source and the film for forming a long alignment film can be kept stable and constant, and the first alignment region and the second alignment region can be formed with high pattern accuracy so that rod-like compounds can be arranged in different directions. Because it can.

  In this invention, it is preferable that the conveyance means which conveys the said film for long alignment film formation of the site | part which receives the said pattern irradiation is a roll for conveyance. This is because the first alignment region and the second alignment region can be formed with high pattern accuracy.

  In this invention, it is preferable that the said pattern irradiation is pattern irradiation of multiple times, and the pattern irradiation of multiple times performed by each exposure process is performed on the same conveyance means. This is because it is easy to align the pattern with respect to the film for forming a long alignment film between the pattern irradiations included in the multiple pattern irradiations, and the first alignment region and the second alignment region can be formed with high pattern accuracy. Moreover, it is because the said film for elongate alignment film formation can be conveyed at high speed.

  In the present invention, it is preferable that both the first exposure process and the second exposure process are pattern irradiation, and the pattern irradiation of both processes is performed on the same conveying means. This is because the alignment of the pattern with respect to the film for forming a long alignment film between the first and second exposure processes is easy, and the first alignment region and the second alignment region can be formed with high pattern accuracy.

  The present invention is an application in which a coating solution for forming a retardation layer containing a rod-shaped compound having refractive index anisotropy is applied onto an alignment layer included in a pattern alignment film formed by the above-described method for producing a pattern alignment film. An alignment step in which the rod-shaped compound contained in the coating film of the coating liquid for forming the retardation layer is arranged along different orientation directions of the first orientation region and the second orientation region contained in the orientation layer; A method for producing a patterned retardation film is provided.

  According to the present invention, by using the pattern alignment film manufactured by the above-described method for manufacturing a pattern alignment film, the pattern retardation films arranged in a pattern can be manufactured easily and in large quantities.

  The present invention provides a transparent film substrate, a conveying means for continuously conveying a film for forming a long alignment film formed on the transparent film substrate and having an alignment layer forming layer containing a photoalignment material, and a continuous Exposure means including a first exposure part and a second exposure part for irradiating polarized ultraviolet rays to the alignment layer forming layer of the film for forming a long alignment film that is transported in a continuous manner, and the first exposure part and the first exposure part The polarization direction of polarized ultraviolet rays irradiated in the two exposure portions is different, and at least one of the first exposure portion and the second exposure portion irradiates the polarized ultraviolet rays in a pattern. An alignment film manufacturing apparatus is provided.

  According to the present invention, by having the transport unit and the exposure unit, the rod-like compound can be arranged in a fixed direction, and the rod-like compound can be arranged in a direction different from the first alignment region. An alignment layer having a second alignment region that can be formed can be formed continuously. For this reason, the pattern orientation film which can form a pattern phase difference film can be manufactured easily and in large quantities.

  In the present invention, it is preferable that one of the first exposure unit and the second exposure unit irradiates polarized ultraviolet rays in a pattern, and the other irradiates the entire surface of polarized ultraviolet rays. This is because the first alignment region and the second alignment region in which rod-shaped compounds can be arranged in different directions can be formed easily and at low cost.

  In this invention, it is preferable that the said pattern irradiation irradiates polarized ultraviolet rays to the strip | belt-shaped pattern mutually parallel to the longitudinal direction of the said film for elongate alignment film formation. This is because the first alignment region and the second alignment region in which rod-shaped compounds can be arranged in different directions can be easily formed.

  In this invention, it is preferable that the said pattern irradiation is performed on the conveyance means which conveys the said film for elongate alignment film formation. This is because the first alignment region and the second alignment region can be formed with high pattern accuracy.

  In this invention, it is preferable that the conveyance means which conveys the said film for long alignment film formation of the site | part which receives the said pattern irradiation is a roll for conveyance. This is because the first alignment region and the second alignment region can be formed with high pattern accuracy.

  In the present invention, it is preferable that the pattern irradiation is a plurality of times of pattern irradiation, and the plurality of times of pattern irradiation performed in each of the exposure units is performed on the same conveying means. This is because it is easy to align the pattern with respect to the film for forming a long alignment film between the pattern irradiations included in the multiple pattern irradiations, and the first alignment region and the second alignment region can be formed with high pattern accuracy. Moreover, it is because the said film for elongate alignment film formation can be conveyed at high speed.

  In the present invention, it is preferable that both the exposure portions of the first exposure portion and the second exposure portion are pattern irradiation, and the pattern irradiation of the both exposure portions is performed on the same conveying means. This is because the alignment of the pattern with respect to the film for forming a long alignment film between the first and second exposure processes is easy, and the first alignment region and the second alignment region can be formed with high pattern accuracy.

  The present invention is for forming a retardation layer containing a rod-shaped compound having refractive index anisotropy on an alignment layer included in the pattern alignment film manufacturing apparatus described above and the pattern alignment film formed by the pattern alignment film manufacturing apparatus. The rod-like compound contained in the coating means for applying the coating liquid and the coating liquid for forming the retardation layer is arranged along different alignment directions of the first alignment area and the second alignment area included in the alignment layer. And a pattern retardation film manufacturing apparatus, characterized by comprising alignment means for aligning and aligning.

  According to the present invention, the pattern retardation film can be manufactured easily and in large quantities by having the pattern alignment film manufacturing apparatus described above.

  According to the method for manufacturing a pattern alignment film of the present invention, there is an effect that the pattern alignment film can be manufactured easily and in large quantities.

It is process drawing which shows an example of the manufacturing method of the pattern orientation film of this invention. It is a schematic diagram which shows an example of the pattern orientation film manufactured by the method of this invention. It is a schematic diagram which shows an example of the pattern orientation film manufactured by the method of this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the other process in the manufacturing method of the pattern orientation film of this invention. It is process drawing which shows an example of the manufacturing method of the pattern phase difference film of this invention. It is explanatory drawing explaining the other process in the manufacturing method of the pattern phase difference film of this invention. It is the schematic which shows an example of the pattern orientation film manufacturing apparatus of this invention. It is the schematic which shows the other example of the pattern orientation film manufacturing apparatus of this invention. It is the schematic which shows an example of the pattern phase difference film manufacturing apparatus of this invention. It is the schematic which shows the other example of the pattern phase difference film manufacturing apparatus of this invention. It is the schematic which shows the example of the liquid crystal display device which can display a three-dimensional image | video with a passive system.

The present invention relates to a method for producing a pattern alignment film, a method for producing a pattern retardation film using the same, and an apparatus for producing a pattern alignment film and a pattern retardation film.
Hereinafter, the manufacturing method of the pattern alignment film, the manufacturing method of the pattern retardation film, the pattern alignment film manufacturing apparatus, and the pattern retardation film manufacturing apparatus of the present invention will be described in detail.

A. Method for Producing Pattern Alignment Film The method for producing a pattern alignment film of the present invention is a method for forming a long alignment film having a transparent film substrate and an alignment layer forming layer formed on the transparent film substrate and containing a photoalignment material. A first exposure process for forming an alignment layer, the first exposure process including a first exposure process and a second exposure process for irradiating the alignment layer forming layer with polarized ultraviolet rays while continuously transporting the film for forming the first exposure process. And the polarization direction of polarized ultraviolet rays irradiated in the second exposure treatment is different, and at least one of the first exposure treatment and the second exposure treatment irradiates the alignment layer forming layer with polarized ultraviolet rays. It is characterized by being.

Such a method for producing a pattern alignment film of the present invention will be described with reference to the drawings. FIG. 1 is a process diagram showing an example of a method for producing a pattern alignment film of the present invention. First, as illustrated in FIG. 1 (a), by applying a coating solution for forming an alignment layer containing a photoreactive material as a photoalignment material on the transparent film substrate 1, and drying the coating film, A long alignment film forming film 3 having an alignment layer forming layer 2 ′ formed on the transparent film substrate 1 and the transparent film substrate 1 and including a photo alignment material is formed. While continuously transporting the film 3, the alignment layer forming layer 2 ′ is irradiated with polarized ultraviolet rays through a mask (FIG. 1B) to form the first alignment region 2 a, and then the first By irradiating polarized ultraviolet rays different from the polarized ultraviolet rays when the alignment region 2a is formed (FIG. 1 (c)), the first alignment region 2a has a second alignment region 2b having a different direction in which rod-shaped compounds are arranged. An alignment layer 2 is formed to form a pattern alignment film 10. (FIG. 1 (d)).
In this example, FIG. 1A shows the alignment layer forming coating solution coating step and the drying step. FIGS. 1B to 1C show the exposure process, FIG. 1B shows the first exposure process, and FIG. 1C shows the second exposure process.

According to this invention, by having the said exposure process, the rod-shaped compound can be arranged in the direction different from the 1st orientation area | region which can arrange a rod-shaped compound in the said orientation layer in a fixed direction, and the said 1st orientation area | region. The second alignment region that can be formed can be formed continuously.
Therefore, when a retardation layer containing a rod-like compound is formed on the alignment layer in which such an alignment region is formed, the retardation layer formed on the first alignment region also in the retardation layer according to the pattern (Hereinafter, sometimes referred to as “first retardation region”) and a retardation layer (hereinafter, sometimes referred to as “second retardation region”) formed on the second alignment region. Can be manufactured easily and in large quantities.
Moreover, when the film in which the first and second alignment regions having the desired alignment regulating force are formed is a long alignment film forming film, for example, it can be stored in a roll shape in this state, Unwinding from the state stored in a state, and can form a retardation layer containing a rod-shaped compound having refractive index anisotropy on the alignment layer, etc. can do.
Furthermore, the pattern retardation film finally obtained can be stored in the form of a roll in the form of a roll, or from the state stored in the form of a roll, the pattern retardation of a desired size can be matched to the size of the display device used. The degree of freedom in the manufacturing process of the display device can be increased, for example, the film can be easily cut out.

The method for producing a pattern alignment film of the present invention includes at least an exposure step.
Hereinafter, each process of the manufacturing method of the pattern orientation film of this invention is demonstrated in detail.

1. Exposure process The exposure process in the manufacturing method of this invention is a process of irradiating the said alignment layer formation layer with a polarized ultraviolet ray, conveying the elongate alignment film formation film continuously.

(1) Film for forming a long alignment film The film for forming a long alignment film used in this step has at least a transparent film substrate and a layer for forming an alignment layer.

a. Transparent film substrate The transparent film substrate constituting the long alignment film forming film used in this step has a function of supporting the alignment layer forming layer, the retardation layer and the like, and is formed in a long shape It is.

  It is preferable that the transparent film base material used for this process is a thing with low retardation. More specifically, the transparent film substrate used in this step preferably has an in-plane retardation value (Re value) in the range of 0 nm to 10 nm, and preferably in the range of 0 nm to 5 nm. More preferably, it is further in the range of 0 nm to 3 nm. When the in-plane retardation value of the transparent film substrate is larger than the above range, the display quality of the display device capable of displaying a three-dimensional image formed by using the long retardation film manufactured by the manufacturing method of the present invention. This is because it may become worse.

  The transparent film substrate used in this step preferably has a transmittance in the visible light region of 80% or more, and more preferably 90% or more. Here, the transmittance | permeability of a transparent film base material can be measured by JISK7361-1 (the test method of the total light transmittance of a plastic transparent material).

It is preferable that the transparent film base material used for this process is a flexible material which has the flexibility which can be wound up in roll shape.
Such flexible materials include cellulose derivatives, norbornene polymers, cycloolefin polymers, polymethyl methacrylate, polyvinyl alcohol, polyimide, polyarylate, polyethylene terephthalate, polysulfone, polyethersulfone, amorphous polyolefin, modified acrylic polymer, polystyrene. And epoxy resins, polycarbonates, polyesters, and the like. Among these, it is preferable to use a cellulose derivative in this step. This is because the cellulose derivative is particularly excellent in optical isotropy, so that a pattern retardation film having excellent optical characteristics can be produced.

  In this step, it is preferable to use a cellulose ester among the cellulose derivatives, and it is preferable to use cellulose acylates among the cellulose esters. This is because cellulose acylates are advantageous in terms of availability because they are widely used industrially.

  As said cellulose acylates, C2-C4 lower fatty acid ester is preferable. The lower fatty acid ester may include only a single lower fatty acid ester such as cellulose acetate, and may include a plurality of fatty acid esters such as cellulose acetate butyrate and cellulose acetate propionate. There may be.

  In this step, cellulose acetate can be particularly preferably used among the above lower fatty acid esters. As the cellulose acetate, it is most preferable to use triacetyl cellulose having an average acetylation degree of 57.5% to 62.5% (substitution degree: 2.6 to 3.0). Here, the degree of acetylation means the amount of bound acetic acid per unit mass of cellulose. The degree of acetylation can be determined by measurement and calculation of the degree of acetylation in ASTM: D-817-91 (test method for cellulose acetate and the like). In addition, the acetylation degree of the triacetyl cellulose which comprises a triacetyl cellulose film can be calculated | required by said method, after removing impurities, such as a plasticizer contained in a film.

  The thickness of the transparent film substrate used in this step is particularly within the range capable of imparting the necessary self-supporting property to the pattern retardation film according to the use of the pattern retardation film produced according to the present invention. Although not limited, it is usually preferably in the range of 25 μm to 125 μm, more preferably in the range of 40 μm to 100 μm, and particularly preferably in the range of 60 μm to 80 μm. This is because if the thickness of the transparent film substrate is thinner than the above range, the required self-supporting property may not be imparted to the pattern retardation film produced according to the present invention. In addition, when the thickness is thicker than the above range, for example, when cutting the long pattern retardation film produced according to the present invention to form a single-wafer pattern retardation film, processing waste increases, This is because the abrasion of the cutting blade may be accelerated.

  The structure of the transparent film base material used for this process is not restricted to the structure which consists of a single layer, You may have the structure by which the several layer was laminated | stacked. When it has the structure by which the several layer was laminated | stacked, the layer of the same composition may be laminated | stacked, and the several layer which has a different composition may be laminated | stacked.

The transparent film base material used in this step is formed in a long shape.
Here, the long shape means that the length is long enough to be wound up in a roll shape, and may be arbitrarily determined according to the weight that can be installed in the manufacturing apparatus. However, specifically, the length is preferably within a range of 10 m or more, more preferably within a range of 50 m to 5000 m, and particularly preferably within a range of 100 m to 4000 m.
Further, the length is preferably 10 times or more with respect to the width, particularly preferably within a range of 50 times to 5000 times, and particularly preferably within a range of 100 times to 4000 times. . It is because it can be made excellent in handleability and the like.

b. Alignment layer forming layer The alignment layer forming layer constituting the long alignment film forming film used in this step contains a photoalignment material and has a rod-like compound having refractive index anisotropy by irradiation with polarized ultraviolet rays. It is possible to form an alignment region having an alignment regulating force that can be arranged in a certain direction.

  Here, the photo-alignment material used in this step refers to a material that can exhibit an alignment regulating force by irradiation with polarized ultraviolet rays. In addition, “orientation regulating force” means an interaction in which rod-shaped compounds described later are arranged.

  Such a photo-alignment material is not particularly limited as long as it exhibits the above-described alignment regulating force by irradiating polarized light. Such photo-alignment materials are largely divided into photoisomerization materials that reversibly change the alignment regulation force by changing only the molecular shape by cis-trans change, and photoreaction materials that change the molecule itself by irradiating polarized light. Can be separated. In this step, any of the photoisomerization material and the photoreaction material can be suitably used, but the photoreaction material is more preferably used. As described above, the photoreactive material is a material that reacts with polarized light to develop an alignment regulating force by irradiating polarized light. Therefore, the photoreactive material can irreversibly develop an alignment regulating force. Therefore, the photoreactive material is superior in the temporal stability of the orientation regulating force.

  The photoreactive material can be further classified according to the type of reaction caused by polarized light irradiation. Specifically, a photodimerization type material that develops an alignment regulation force by causing a photodimerization reaction, a photodegradable material that produces an orientation regulation force by producing a photodecomposition reaction, an orientation regulation by producing a photobinding reaction It can be divided into a photocoupled material that expresses force, and a photolytic-coupled material that develops alignment regulation force by causing a photodecomposition reaction and a photocoupled reaction. Any of the above-mentioned photoreactive materials can be suitably used in this step, but among these, it is more preferable to use a photodimerization type material from the viewpoint of stability and reactivity (sensitivity).

  The photodimerization-type material used for this process will not be specifically limited if it is a material which can express an orientation control force by producing photodimerization reaction. In particular, in this step, the wavelength of light that causes a photodimerization reaction is preferably 280 nm or more, particularly preferably in the range of 280 nm to 400 nm, and more preferably in the range of 300 nm to 380 nm.

  Examples of such a photodimerization-type material include polymers having cinnamate, coumarin, benzylidenephthalimidine, benzylideneacetophenone, diphenylacetylene, stilbazole, uracil, quinolinone, maleimide, or a cinnamylidene acetic acid derivative. In particular, in the process, a polymer having cinnamate or at least one of coumarin, a polymer having cinnamate and coumarin is preferably used. Specific examples of such a photodimerization type material include, for example, JP-A-9-118717, JP-A-10-506420, JP-A-2003-505561, WO2010 / 150748, WO2011 / 126019. And the compounds described in Japanese Laid-Open Patent Publication No. WO2011 / 126021 and WO2011 / 126022.

  As the cinnamate and coumarin in this step, those represented by the following formulas Ia and Ib are preferably used.

In the above formula, A represents pyrimidine-2,5-diyl, pyridine-2,5-diyl, 2,5-thiophenylene, 2,5-furylene, 1,4- or 2,6-naphthylene, Unsubstituted, fluorine, chlorine or a cyclic, linear or branched alkyl residue of 1 to 18 carbon atoms (unsubstituted or mono- or polysubstituted by fluorine, chlorine, 1 Represents phenylene which is mono- or polysubstituted by two or more non-adjacent —CH ₂ — groups which may be independently substituted by the group C.
Wherein B represents a hydrogen atom or a group capable of reacting or interacting with a second substance, such as a polymer, oligomer, monomer, photoactive polymer, photoactive oligomer and / or photoactive monomer or surface. Represents.
In the above formula, C represents —O—, —CO—, —CO—O—, —O—CO—, —NR ₁ —, —NR ₁ —CO—, —CO—NR ₁ —, —NR ₁ —. CO—O—, —O—CO—NR ₁ —, —NR ₁ —CO—NR ₁ —, —CH═CH—, —C≡C—, —O—CO—O— and —Si (CH ₃ ) _It represents a group selected from _2- O—Si (CH ₃ ) ₂ — (R ₁ represents a hydrogen atom or lower alkyl).
In the above formula, D represents —O—, —CO—, —CO—O—, —O—CO—, —NR ₁ —, —NR ₁ —CO—, —CO—NR ₁ —, —NR ₁ —. CO—O—, —O—CO—NR ₁ —, —NR ₁ —CO—NR ₁ —, —CH═CH—, —C≡C—, —O—CO—O— and —Si (CH ₃ ) _It represents a group selected from _2- O—Si (CH ₃ ) ₂ — (R ₁ represents a hydrogen atom or lower alkyl), an aromatic group or an alicyclic group.
In the above formula, S ₁ and S ₂ are independently of each other a single bond or a spacer unit, for example a linear or branched alkylene group having 1 to 40 carbon atoms (unsubstituted, fluorine or chlorine Mono- or poly-substituted, and one or more non-adjacent —CH ₂ — groups may be independently substituted by the group D, but the oxygen atoms are not directly bonded to each other).
In the above formula, Q represents an oxygen atom or —NR ₁ — (R ₁ represents a hydrogen atom or lower alkyl).
In the above formula, X and Y are independently of each other hydrogen, fluorine, chlorine, cyano, alkyl having 1 to 12 carbon atoms (optionally substituted by fluorine and optionally not one or more adjacent). alkyl -CH ₂ - groups are -O -, - CO-O - , - O-CO- and / or an) are replaced by -CH = CH-.
In addition, as such a photodimerization-type material, specifically, what is commercially available as ROP-103 (trade name) from Rolic in WO08 / 031243 and WO08 / 130555 can be used. .

Moreover, as a photo-alignment material used for this process, you may have refractive index anisotropy. This is because when such a photo-alignment material is used, the pattern alignment film manufactured by the manufacturing method of the present invention can be used as a pattern retardation film.
As the photo-alignment material having such a refractive index anisotropy, specifically, those described in JP-A-2002-82224 can be used.

  In addition, the photo-alignment material used for this process may be only one type, or may use two or more types.

The alignment layer forming layer used in this step contains at least a photo-alignment material, but may contain other compounds as necessary.
Such other compounds are not particularly limited as long as they do not impair the alignment regulating force of the alignment layer formed by this step. In this step, as such other compounds, monomers or oligomers having one or more functional groups are preferably used. By including such a monomer or oligomer, when a retardation layer containing a rod-shaped compound having refractive index anisotropy is formed on the alignment layer formed in this step, it has excellent adhesion to the retardation layer. Because it can be made.

  Examples of the monomer or oligomer used in this step include monofunctional monomers having an acrylate functional group (for example, reactive ethyl (meth) acrylate, ethylhexyl (meth) acrylate, styrene, methylstyrene, N-vinylpyrrolidone). ) And polyfunctional monomers (eg, polymethylolpropane tri (meth) acrylate, hexanediol (meth) acrylate, triethylene (polypropylene) glycol diacrylate, tripropylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, penta Erythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di ( ) Acrylate, isocyanuric acid poly (meth) acrylate (for example, isocyanuric acid EO diacrylate)), bisphenol fluorene derivatives (for example, bisphenoxyethanol full orange (meth) acrylate, bisphenol fluor orange epoxy (meth) acrylate), etc. It can be used as a single substance or as a mixture.

  Furthermore, it is preferable to use a monomer or oligomer that is solid at room temperature (20 to 25 ° C.). Thereby, even when the film for forming a long alignment film is stored in a rolled state, blocking due to the alignment layer forming layer sticking to the back surface of the transparent film substrate can be prevented from occurring. It is.

  The content of the monomer or oligomer in this step is not particularly limited as long as it does not impair the alignment regulating force of the alignment layer formed by this step and can exhibit desired adhesion and the like. The range of 0.01 to 3 times the mass of the photo-alignment material is preferable, and the range of 0.05 to 1.5 times is particularly preferable.

  The thickness of the alignment layer forming layer in this step is not particularly limited as long as it is within a range in which a desired alignment regulating force can be expressed with respect to a rod-shaped compound having refractive index anisotropy to be described later. It is preferably within the range of 0.01 μm to 1.0 μm, and particularly preferably within the range of 0.03 μm to 0.5 μm, and particularly preferably within the range of 0.05 μm to 0.20 μm. .

  The method for forming the alignment layer forming layer used in this step is not particularly limited as long as it can form the alignment layer forming layer containing the photo alignment material with a desired thickness. Examples thereof include a method of coating an alignment layer-forming coating solution containing an alignment material on a transparent film substrate.

  The content of the photo-alignment material contained in such a coating liquid for forming an alignment layer is particularly limited as long as the above-mentioned coating liquid for forming an alignment layer is within a range capable of achieving a desired viscosity, depending on the coating method and the like. Is not to be done. Especially in this process, content of the said photo-alignment material in the coating liquid for alignment layer formation is 0.5 mass%-50 mass%, Preferably it is 1 mass%-30 mass%, More preferably, it is 2 masses. It is preferable that it is in the range of% -20 mass%. If the content of the photo-alignment material is larger than the above range, depending on the coating method, it may be difficult to form an alignment layer forming layer having excellent flatness, and if thinner than the above range, This is because the drying load of the solvent increases, so that there is a possibility that the coating speed cannot be in a desired range.

  The solvent used in the alignment layer-forming coating solution in this step is not particularly limited as long as it can dissolve the photo-alignment material or the like at a desired concentration. For example, hydrocarbons such as benzene and hexane Solvents, ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ether solvents such as tetrahydrofuran, 1,2-dimethoxyethane, propylene glycol monoethyl ether (PGME), alkyl halide solvents such as chloroform and dichloromethane, acetic acid Ester solvents such as methyl, ethyl acetate, butyl acetate and propylene glycol monomethyl ether acetate; amide solvents such as N, N-dimethylformamide; sulfoxide solvents such as dimethyl sulfoxide; anone solvents such as cyclohexane; Lumpur, ethanol, and the alcohol solvent propanol can be exemplified, but the invention is not limited thereto. Further, the solvent used in this step may be one kind or a mixed solvent of two or more kinds of solvents.

  The method for applying the alignment layer forming coating solution in this step is not particularly limited as long as it can achieve desired flatness. Specific coating methods include gravure coating, reverse coating, knife coating, dip coating, spray coating, air knife coating, spin coating, roll coating, printing, dipping and lifting, curtain coating Examples thereof include a method, a die coating method, a casting method, a bar coating method, an extrusion coating method, and an E-type coating method.

  The thickness of the coating film for the orientation layer forming coating solution is not particularly limited as long as the desired flatness can be achieved, but is preferably in the range of 0.1 μm to 50 μm, In particular, the range of 0.5 μm to 30 μm is preferable, and the range of 0.5 μm to 10 μm is particularly preferable.

As a method for drying the coating film of the alignment layer forming coating solution, a commonly used drying method such as a heat drying method, a reduced pressure drying method, a gap drying method, or the like can be used. Further, the drying method in this step is not limited to a single method, and a plurality of drying methods may be employed, for example, by changing the drying method sequentially according to the amount of remaining solvent.
Furthermore, as a method of drying the coating film of the alignment layer forming coating solution, a method of applying a drying air adjusted to a certain temperature to the coating film can be used, and such a drying method is used. In this case, the wind speed of the drying air applied to the coating film is preferably 3 m / second or less, and particularly preferably 0.5 m / second or less.

c. Film for forming long alignment film The film for forming long alignment film used in this step includes at least the transparent film substrate and the alignment layer forming layer, but if necessary, the transparent film substrate and the alignment layer. Improvement of adhesion between the forming layers, components such as plasticizers from the transparent film substrate move to the alignment layer forming layer, or the photo-alignment material contained in the alignment layer forming layer moves to the transparent film substrate In order to improve the barrier property to prevent this, an intermediate layer (for example, a layer having a thickness of about 1 μm obtained by curing a crosslinkable monomer such as pentaerythritol triacrylate (PETA)) may be used.
Moreover, it is preferable that the antireflection layer and / or the antiglare layer is formed on the surface opposite to the surface on which the alignment layer forming layer of the transparent film substrate is formed. This is because, when a display device is manufactured using the pattern retardation film obtained by the manufacturing method of the present invention, a display device with good display quality can be obtained.

  The antiglare layer is a layer having a function of reducing screen reflection caused by external light from the sun, a fluorescent lamp, or the like entering and reflecting on the display screen of the display device. On the other hand, the antireflection layer improves the image contrast by suppressing the regular reflectance of the surface, and as a result, has a function of improving the visibility of the image. The antiglare layer and antireflection layer used in this step are not particularly limited as long as they have a desired antiglare function or antireflection function, and are used for display devices for the purpose of improving display image quality. Generally known ones can be used. Examples of the antiglare layer include a resin layer in which fine particles are dispersed, and examples of the antireflection layer include a layer having a configuration in which a plurality of layers having different refractive indexes are stacked. . If an antireflection layer is provided on the outermost surface of the antiglare layer, the visibility of the image in the bright room can be further improved.

(2) Exposure process This process has the 1st exposure process and the 2nd exposure process which irradiate polarized ultraviolet rays to the above-mentioned alignment layer formation layer, conveying the film for long alignment film formation continuously. .
Moreover, the polarization directions of polarized ultraviolet rays irradiated in the first exposure process and the second exposure process are different, and at least one of the first exposure process and the second exposure process is the alignment layer forming layer. The pattern is irradiated with polarized ultraviolet rays.

The method for transporting the film for forming a long alignment film in this step is not particularly limited as long as it is a method capable of continuously transporting the film for forming a long alignment film. The method used can be used. Specifically, a method using a winder for supplying a roll-shaped film for forming a long alignment film and a winder for winding a film for forming a long alignment film or a long pattern alignment film, a belt conveyor, a conveyance And a method using a roll for use. Moreover, the method of using the floating-type conveyance stand which conveys in the state which floated the film for elongate alignment film formation by discharging and sucking | sucking air may be used.
Further, the presence or absence of tension applied to the long alignment film forming film at the time of conveyance is not particularly limited as long as it is a method capable of stably and continuously conveying the long alignment film formation film, It is preferable that the sheet is conveyed with tension applied. This is because continuous conveyance can be performed more stably.

  The color of the conveying means used in this step does not reflect the polarized ultraviolet light that has passed through the long alignment film forming film when it is disposed at the site where the long alignment film forming film is irradiated with polarized ultraviolet light. A color is preferred. Specifically, black is preferable. Examples of such a black method include a method of chromium treatment of the surface.

  The shape of the transport roll in the present invention is not particularly limited as long as it can stably transport the long alignment film forming film. Is preferably one that can keep the distance between the alignment layer forming layer surface of the long alignment film forming film and the exposure means constant, usually, A perfect circular shape is preferable.

The polarization direction of the polarized ultraviolet light irradiated in the first exposure process and the second exposure process in this step may be different in both processes, and the first and second alignment regions in which the directions in which the rod-shaped compounds are arranged are different. Although it will not specifically limit if it can form, It is preferable that it differs by 90 degrees. Forming the first and second alignment regions having an alignment regulating force so that the directions in which the rod-shaped compounds are arranged are orthogonal, that is, the refractive index is the largest in the first retardation region and the second retardation region. This is because the directions (slow axis directions) can be orthogonal to each other, so that it can be more suitably used for manufacturing a display device capable of three-dimensional display.
Note that the direction different by 90 ° means that when a display device capable of three-dimensional display is formed using the pattern retardation film manufactured by the manufacturing method of the present invention, three-dimensional display can be performed with high accuracy. Although it is not particularly limited, it is usually preferably within a range of 90 ° ± 3 °, and more preferably within a range of about 90 ° ± 2 °. It is preferably within the range of about ± 1 °. This is because a display device capable of high-performance three-dimensional display can be obtained.
The direction in which the rod-like compounds are arranged in the alignment region formed by irradiating polarized ultraviolet rays having a polarization direction different by 90 ° is, as illustrated in FIG. 2, the long alignment film forming film. The direction of 90 ° (first alignment region 2a) and 0 ° (first alignment region 2b) with respect to the longitudinal direction or 45 ° (first direction with respect to the longitudinal direction as illustrated in FIG. The orientation region 2a) and the direction of 135 ° (first alignment region 2b) are preferred. This is because the directions of 90 ° and 0 ° make it easy to be used in, for example, a TN type three-dimensional liquid crystal display device. In addition, because the directions are 45 ° and 135 °, it is easy to be used in, for example, a VA type or IPS type three-dimensional liquid crystal display device.
2 to 3 indicate the same members as those in FIG. 1, and the description thereof is omitted here. Moreover, the direction of the arrow in each orientation region is the direction in which rod-shaped compounds are arranged in each region.

The polarized ultraviolet rays irradiated in this step may be condensed or uncondensed, but the pattern irradiation is a long length on a transport roll as described later. When it is performed on an alignment film-forming film, that is, when there is a difference in the distance from the light source of polarized ultraviolet light within the region irradiated with polarized ultraviolet light, the light is condensed in the transport direction. Preferably it is. This is because the influence of the distance from the light source can be reduced and the alignment region can be formed with high pattern accuracy.
In addition, as such a condensing method, the method used generally, for example, the method of using the condensing reflector and condensing lens which have a desired shape can be mentioned. In the present invention, it is preferable that the polarized ultraviolet light is parallel light with respect to the direction (width direction) orthogonal to the transport direction. As a parallelization method, a generally used method, for example, a desired shape is used. Examples thereof include a method using a condensing reflector or a condensing lens.

  The wavelength of the polarized ultraviolet light irradiated in this step is appropriately set according to the photo-alignment material and the like, and the wavelength used when causing the general photo-alignment material to exhibit the alignment regulating force. Specifically, it is preferable to use irradiation light having a wavelength of 210 nm to 380 nm, preferably 230 nm to 380 nm, more preferably 250 nm to 380 nm.

  Such ultraviolet light sources include low-pressure mercury lamps (sterilization lamps, fluorescent chemical lamps, black lights), high-pressure discharge lamps (high-pressure mercury lamps, metal halide lamps), short arc discharge lamps (extra-high pressure mercury lamps, xenon lamps, mercury). Xenon lamp). Of these, a metal halide lamp, a xenon lamp, a high-pressure mercury lamp, and the like can be preferably used.

A method for producing polarized ultraviolet rays to be irradiated in this step is not particularly limited as long as it is a method capable of stably irradiating polarized ultraviolet rays. However, ultraviolet rays are irradiated through a polarizer capable of passing only polarized light in a certain direction. Can be used.
As such a polarizer, one that is generally used for generation of polarized light can be used. For example, a wire grid polarizer having a slit-shaped opening or a plurality of quartz plates are laminated. Examples thereof include a method of performing polarization separation using a Brewster angle, and a method of using a method of performing polarization separation using a Brewster angle of vapor-deposited multilayer films having different refractive indexes.

The amount of polarized ultraviolet light irradiated in this step is not particularly limited as long as it can form an alignment region having a desired alignment regulating force. For example, when the wavelength is 310 nm, 5 mJ preferably in the range of / ^{cm 2} ~500mJ / ^cm 2, inter alia is preferably in the range of ^{7mJ / cm 2 ~300mJ / cm 2} , in the range of 10mJ / cm ² ~100mJ / cm 2 Preferably there is. This is because an alignment region having a sufficient alignment regulating force can be formed.

The irradiation distance of polarized ultraviolet rays in this step, that is, the distance in the transport direction of the film for forming a long alignment film that receives irradiation of polarized ultraviolet rays is particularly suitable as long as the above-mentioned irradiation amount can be obtained in each exposure process. It is not limited and can be appropriately set according to the line speed or the like.
In this step, when the irradiation distance is short, it becomes easy to achieve a high pattern accuracy. When the irradiation distance is long, an alignment region having a sufficient alignment regulating force is obtained even when the line speed is high. There is an advantage that can be.
In addition, as a method of lengthening the irradiation distance, a method of increasing the number of irradiation times of polarized ultraviolet rays in each exposure process or increasing the irradiation area in the transport direction can be exemplified.

As a method of irradiating polarized ultraviolet rays in the first and second exposure treatments in this step, at least one of them is a method in which polarized ultraviolet rays are irradiated onto the alignment layer forming layer in a pattern, and rod-like compounds are arranged. There is no particular limitation as long as the first and second alignment regions having different directions can be formed. Specifically, the first exposure process is the entire surface irradiation, and the second exposure process is the pattern irradiation (first implementation). Aspect), the first exposure processing is pattern irradiation, the second exposure irradiation is full surface irradiation (second embodiment), the first exposure processing is pattern irradiation, and the second exposure processing is pattern irradiation (third embodiment). it can. Here, in the case of the first embodiment, as the alignment layer forming layer, the first alignment region is formed by using a material including a material capable of reversibly changing the alignment regulating force such as a photoisomerization material. And a second alignment region can be formed. Specifically, as illustrated in FIG. 4, the entire surface is irradiated as the first exposure process (FIG. 4A), and then, as the second exposure process, polarized ultraviolet rays having a polarization direction different from that of the first exposure process are used. By pattern irradiation (FIG. 4B), the first alignment region and the second alignment region can be formed (FIG. 4C).
In the case of the second embodiment, as the alignment layer forming layer, a layer containing a material that cannot reversibly change the alignment regulating force, such as a photoreactive material such as a photodimerization type material, is used. Thus, the first alignment region and the second alignment region can be formed. Specifically, as illustrated in FIG. 5, pattern irradiation is performed as the first exposure process (FIG. 5A), and then, as the second exposure process, polarized ultraviolet rays having a polarization direction different from that of the first exposure process are used. By irradiating the entire surface (FIG. 5B), the first alignment region and the second alignment region can be formed (FIG. 5C).
Furthermore, in the case of the third embodiment, the first alignment region and the second alignment are formed by using a material that reversibly changes the alignment regulating force or cannot reversibly change as the alignment layer forming layer. Regions can be formed. Specifically, as illustrated in FIG. 6, pattern irradiation is performed as the first exposure process (FIG. 6A), and then, as the second exposure process, polarized ultraviolet rays having a polarization direction different from that of the first exposure process are used. By pattern irradiating a region different from the region irradiated in the first exposure process (FIG. 6B), the first alignment region and the second alignment region can be formed (FIG. 6C).
4 to 6 indicate the same members as those in FIG. 1, and the description thereof is omitted here.

In this step, it is preferable that one of the first exposure process and the second exposure process is pattern irradiation, and the other is the entire surface irradiation. In particular, the second embodiment, that is, the first exposure process is pattern irradiation. The second exposure process is preferably whole surface irradiation. When the other side is full surface irradiation, it is possible to simplify the equipment for performing the exposure process, and the first alignment region and the second alignment region in which rod-like compounds can be arranged in different directions can be easily and lowly provided. It is because it can form at cost.
Furthermore, since there is no need for pattern alignment in the first exposure process and the second exposure process, the first and second alignment regions with high pattern accuracy can be easily formed.
Moreover, it is because the photoreactive material which is excellent in the temporal stability of an orientation control force as mentioned above can be used as a material which comprises the layer for alignment layer formation by being the method of a 2nd embodiment.

  The pattern irradiation method in this step is not particularly limited as long as it can irradiate polarized ultraviolet rays with high pattern accuracy, but the pattern irradiation transports the film for forming a long alignment film. It is preferable that the exposure unit and the transport unit that perform pattern irradiation are arranged so that the pattern irradiation is performed on the film for forming a long alignment film on the transport unit. In particular, the transport means for transporting the film for forming a long alignment film in the portion that receives the pattern irradiation is a transport roll, that is, the pattern irradiation is for forming a long alignment film on the transport roll. It is preferably performed on the film. The distance between the light source and the film for forming a long alignment film can be stably kept constant, and the first alignment region and the second alignment region in which rod-like compounds can be arranged in different directions can be formed with high accuracy. Because. Moreover, it is because the distance between the light source and the long alignment film forming film can be easily and stably maintained by using the transport roll.

In addition, when performing pattern irradiation in this process so that the irradiation distance becomes long, specifically, pattern irradiation is performed by increasing the number of irradiation times of polarized ultraviolet rays in each exposure process or by increasing the irradiation area in the transport direction. The pattern irradiation method is not particularly limited as long as the pattern-shaped alignment region formed in each exposure process can be formed with high pattern accuracy, but the pattern performed in each exposure process is not limited. Exposure means and transport means for performing pattern irradiation of each exposure process so that the irradiation is performed on the same transport means, that is, the film for forming a long alignment film on the same transport means Is preferably arranged. This is because, by being performed on the same conveying means, it is possible to prevent the film for forming a long alignment film to be conveyed from vibrating in the width direction during conveyance, and to irradiate polarized ultraviolet rays with high pattern accuracy.
Specifically, when the pattern irradiation pattern irradiation is performed a plurality of times, the pattern irradiation performed in each exposure process is a method in which the pattern irradiation is performed on the same conveying means, that is, the pattern irradiation is performed. It is preferable that the exposure unit and the transport unit are arranged so that the pattern irradiation is performed a plurality of times and the pattern irradiation performed in each exposure process is performed on the same transport unit. By performing multiple times of pattern irradiation performed in each exposure process on the same conveying means, it is easy to align the pattern with respect to the film for forming a long alignment film between each pattern irradiation included in the multiple times of pattern irradiation This is because the first alignment region and the second alignment region can be formed with high pattern accuracy. Moreover, even if the irradiation amount is insufficient with one pattern irradiation, it is possible to achieve a sufficient irradiation amount by irradiating the same location multiple times, and the above-mentioned film for forming a long alignment film can be conveyed at high speed. This is because it becomes possible.
FIG. 7 is an explanatory diagram illustrating an example in which multiple pattern irradiations are performed on the same transport unit when the first exposure process performs multiple pattern irradiations from a plurality of first exposure units 32a.

In addition, as a method of performing pattern irradiation when both the first exposure processing and the second exposure processing are pattern irradiation (third embodiment), the pattern processing of both processing is performed on different transport means. Although the pattern irradiation of both processes is performed on the same conveyance means, that is, the first exposure unit and the second exposure unit performing the second exposure process are the same conveyance unit. It is preferable that the exposure means and the conveyance means are arranged so as to be performed on the upper long alignment film forming film. By performing pattern irradiation on the same conveying means, it is easy to align the pattern with respect to the long alignment film forming film between the first and second exposure processes, and the first alignment region and the second alignment region This is because the pattern can be formed with high pattern accuracy.
FIG. 8 shows pattern irradiation in which the first exposure process and the second exposure process irradiate polarized ultraviolet rays in a pattern from the first exposure unit 32a and the second exposure unit 32b, respectively. It is explanatory drawing which shows the example performed by.

The pattern irradiation pattern in this step is not particularly limited as long as the first alignment region and the second alignment region can be stably formed. For example, a strip pattern, a mosaic pattern, a staggered pattern, etc. Can be mentioned. Among these, in this step, a belt-like pattern is preferable, and in particular, the belt-like pattern parallel to the longitudinal direction of the film for forming a long alignment film, that is, the pattern irradiation is the long alignment. It is preferable to irradiate polarized ultraviolet rays to strip-like patterns parallel to each other in the longitudinal direction of the film-forming film. This is because it can be easily formed by fixing the irradiation position of the polarized ultraviolet light and transporting the film for forming a long alignment film in the longitudinal direction. Moreover, it is because pattern irradiation can be performed with high pattern accuracy. In addition, it is easy to make correspondence between the pattern in which the first phase difference region and the second phase difference region are formed and the pattern in which pixels are formed in a color filter or the like used in the display device. is there.
In addition, as an example of irradiating polarized ultraviolet rays to strip-shaped patterns parallel to each other in the longitudinal direction, specifically, FIGS. 4 to 6 already described can be shown. Moreover, in this figure, the long alignment film forming film irradiated with polarized ultraviolet rays is shown from the back in the transport direction.

  The pattern width of the pattern irradiation, that is, the irradiation width and irradiation interval (non-irradiation width) of polarized ultraviolet rays may be the same or different. However, in this step, it is preferable that both widths, that is, the width of the first alignment region to be formed and the width of the second alignment region are the same. The pattern in which the first phase difference region and the second phase difference region are formed and the pattern in which the pixel portion is formed can be easily associated with each other, and as a result, can be easily manufactured. This is because it becomes possible to. When the position is aligned with the stripe line of the color filter, the pattern in which the first alignment region and the second alignment region are formed and the stripe pattern of the color filter are irradiated with a width so as to correspond to each other. Is preferred.

  Specifically, in the case of 3D use, such a pattern width is usually preferably in the range of 50 μm to 1000 μm, and more preferably in the range of 100 μm to 600 μm.

In this step, when both the first exposure process and the second exposure process are pattern irradiation as in the third embodiment, the pattern irradiation pattern of the first exposure process and the second exposure process is the first pattern. In addition, a region (non-irradiation region) where the polarized ultraviolet rays are not irradiated may be provided between the second alignment regions.
FIG. 9 is a process diagram illustrating an example of forming a non-irradiation region. As illustrated in FIG. 5, by using a mask having a light shielding portion that blocks the irradiation of polarized ultraviolet rays in both the first exposure process and the second exposure process (FIGS. 9A to 9B). ), As shown in FIG. 9C, the non-irradiated region 2c can be formed.
In addition, about the agreement in FIG. 9, since it shows the member same as FIG. 1, description here is abbreviate | omitted.

A method for forming a pattern in this step is not particularly limited as long as it is a method capable of irradiating polarized ultraviolet rays in a desired pattern, but it is usually between a film for forming a long alignment film and a light source. A method of arranging a mask having an opening through which polarized ultraviolet rays can pass through only a desired pattern is used.
The material constituting the mask in this step is not particularly limited as long as a desired opening can be formed, and examples thereof include metals and quartz that are hardly deteriorated by ultraviolet rays. In this step, it is particularly preferable that Cr is vapor-deposited in a pattern on synthetic quartz. This is because it has excellent dimensional stability against changes in temperature, humidity, etc., and an alignment region can be formed in the alignment layer forming layer with high pattern accuracy.

  A method for performing the entire surface irradiation in this step is not particularly limited as long as it can stably irradiate polarized ultraviolet rays within a predetermined range. It is preferable to be performed on the film for forming a long alignment film, and it is particularly preferable that the irradiation of the entire surface is performed on the film for forming a long alignment film positioned between the rolls for conveyance. This is because the cost can be reduced. Moreover, it is because the freedom degree of the timing which performs an exposure process can be made high.

When irradiating polarized ultraviolet rays to the alignment layer forming layer in this step, it is preferable to adjust the temperature so that the temperature of the alignment layer forming layer is constant. This is because the alignment region can be formed with high accuracy.
In this step, the temperature is preferably adjusted so that the alignment layer forming layer is in the range of 15 ° C. to 90 ° C., and in particular, the temperature is preferably in the range of 15 ° C. to 60 ° C.
Examples of the temperature control method include a method using a temperature control device such as a general heating / cooling device. Specifically, a method using a blower capable of blowing air at a predetermined temperature, a method using a temperature-adjustable as the conveying means, more specifically, a temperature-adjustable conveying roll, The method using a belt conveyor etc. can be mentioned.

2. Method for Producing Pattern Alignment Film The method for producing a pattern alignment film of the present invention includes at least an exposure step, but may include other steps as necessary.
As such another process, in order to prepare a long alignment film forming film having the alignment layer forming layer 2 ', coating for alignment layer formation is performed on a transparent film substrate as illustrated in FIG. A coating liquid coating process for forming an alignment layer (FIG. 10A) for applying a liquid to form a coating film, and a drying process for drying the coating film 2 'to form a layer for forming an alignment layer (FIG. 10B). ) And an antireflection layer forming step for forming the antireflection layer and / or the antiglare layer 5 on the surface opposite to the surface on which the orientation layer forming layer 2 ′ of the transparent film substrate is formed (FIG. 10C). ~ (D)), or a winding process for winding the pattern alignment film into a roll shape in a long form or a cutting process for cutting the long pattern alignment film to form a pattern alignment film formed on a sheet. You may have.
In the present invention, a method generally used for forming a retardation film can be used as a method for forming each layer in each step.
For example, as the coating method for the alignment layer forming coating liquid in the alignment layer forming coating liquid coating process and the drying method in the drying process, the method described in the above section “1. Exposure process” can be used. .

In the present invention, each of these steps is performed independently, that is, the long alignment film forming film is wound up once in a roll shape for each step, and further unwound to perform a predetermined exposure step. Although it may be wound later, it is preferable that all the steps are performed continuously, that is, continuously by roll-to-roll.
Specifically, it is preferable that the film for forming a long alignment film is continuously produced by roll-to-roll without being wound in a roll shape in the middle until the film for forming a long alignment film becomes a pattern alignment film.

3. Pattern alignment film The pattern alignment film obtained by the production method of the present invention has at least a transparent film substrate and an alignment layer. As described above, the pattern alignment film has an antireflection layer, an antiglare layer, or the like as necessary. It may be.

  As an application of the pattern alignment film obtained by the production method of the present invention, it can be used for forming a pattern retardation film used in a display device for three-dimensional display, and in particular, it can be easily and mass-produced. Is preferably used for forming a patterned retardation film.

B. Next, a method for producing the pattern retardation film of the present invention will be described.
The method for producing a patterned retardation film of the present invention is a method for forming a retardation layer containing a rod-shaped compound having refractive index anisotropy on an alignment layer contained in a pattern alignment film formed by the method for producing a pattern alignment film described above. The coating step of applying the coating liquid and the rod-shaped compound contained in the coating film of the retardation layer forming coating liquid in different orientation directions of the first orientation region and the second orientation region contained in the orientation layer And an alignment step that is arranged along.

A method for producing such a patterned retardation film of the present invention will be described with reference to the drawings. FIG. 11 is a process diagram showing an example of a method for producing a patterned retardation film of the present invention. As illustrated in FIG. 11, the method for producing a patterned retardation film of the present invention is formed by the method for producing a pattern alignment film described above, and the alignment in which the first and second alignment regions (2a and 2b) are formed. A coating solution for forming a retardation layer containing the rod-shaped compound is applied onto the layer 2 (FIG. 11 (a)), and the coating film 4 ′ is heated (FIG. 11 (b)), thereby the rod-shaped compound. Is formed in a certain direction, then cooled to near room temperature and cured by irradiating with ultraviolet rays (FIG. 11 (c)) to form a patterned retardation film 20 ( FIG. 11 (d)).
In addition, Fig.11 (a) is an application | coating process and FIG.11 (b)-(c) is an orientation process.

  According to the present invention, by using the pattern alignment film manufactured by the above-described method for manufacturing a pattern alignment film, the pattern retardation films arranged in a pattern can be manufactured easily and in large quantities.

The manufacturing method of the pattern retardation film of this invention has an application | coating process and an orientation process at least.
Hereinafter, each process of the manufacturing method of the pattern phase difference film of this invention is demonstrated.

1. Coating Step The coating step in the present invention is a coating for forming a retardation layer containing a rod-like compound having refractive index anisotropy on an alignment layer included in the pattern alignment film formed by the above-described method for producing a pattern alignment film. This is a step of applying a liquid.
The pattern alignment film is the same as that described in the section “A. Pattern alignment film manufacturing method”, and the description thereof is omitted here.

  The rod-shaped compound contained in the retardation layer forming coating solution used in this step has refractive index anisotropy, and is arranged in a regular manner along the alignment regulating force of the alignment region. There is no particular limitation as long as a desired retardation can be imparted to the retardation layer. Especially, it is preferable that the rod-shaped compound used for this process is a liquid crystalline material which shows liquid crystallinity. This is because the liquid crystalline material has a large refractive index anisotropy, so that it becomes easy to impart desired retardation to the patterned retardation film produced by the production method of the present invention.

  As said liquid crystalline material used for this process, the material which shows liquid crystal phases, such as a nematic phase and a smectic phase, can be mentioned, for example. In this step, any material exhibiting any of these liquid crystal phases can be suitably used, but it is particularly preferable to use a liquid crystalline material exhibiting a nematic phase. This is because a liquid crystalline material exhibiting a nematic phase is easily arranged regularly as compared with liquid crystalline materials exhibiting other liquid crystal phases.

  In this step, it is preferable to use a material having spacers at both ends of the mesogen as the liquid crystalline material exhibiting the nematic phase. Since the liquid crystalline material having spacers at both ends of the mesogen is excellent in flexibility, by using such a liquid crystalline material, the pattern retardation film produced by the production method of the present invention can be made excellent in transparency. It is.

  Furthermore, as the rod-shaped compound used in this step, those having a polymerizable functional group in the molecule are preferably used, and among them, those having a polymerizable functional group capable of three-dimensional crosslinking are more preferably used. Since the rod-shaped compound has a polymerizable functional group, the rod-shaped compound can be polymerized and fixed, so that a retardation layer having excellent alignment stability and hardly causing a change in retardation with time is obtained. Because you can. In addition, when the rod-shaped compound which has a polymerizable functional group is used, the phase difference layer formed by performing this process will contain the rod-shaped compound bridge | crosslinked by the polymerizable functional group.

  The “three-dimensional cross-linking” means that liquid crystal molecules are polymerized three-dimensionally to form a network (network) structure.

  Examples of the polymerizable functional group include polymerizable functional groups that are polymerized by the action of ionizing radiation such as ultraviolet rays and electron beams, or heat. Representative examples of these polymerizable functional groups include radically polymerizable functional groups or cationic polymerizable functional groups. Further, representative examples of radically polymerizable functional groups include functional groups having at least one addition-polymerizable ethylenically unsaturated double bond, and specific examples include vinyl groups having or not having substituents, An acrylate group (generic name including an acryloyl group, a methacryloyl group, an acryloyloxy group, and a methacryloyloxy group) and the like can be given. Moreover, an epoxy group etc. are mentioned as a specific example of the said cation polymerizable functional group. In addition, examples of the polymerizable functional group include an isocyanate group and an unsaturated triple bond. Among these, from the viewpoint of the process, a functional group having an ethylenically unsaturated double bond is preferably used.

Furthermore, the rod-like compound in this step is a liquid crystalline material exhibiting liquid crystallinity, and those having the polymerizable functional group at the terminal are particularly preferable. By using such a rod-like compound, for example, it can be polymerized three-dimensionally into a network (network) structure, so that it has column stability and excellent optical characteristics. This is because the above can be formed.
In this step, even when a liquid crystalline material having a polymerizable functional group at one end is used, the alignment can be stabilized by crosslinking with other molecules.

  Specific examples of the rod-like compound used in this step include compounds represented by the following formulas (1) to (17).

  In addition, in this process, only 1 type may be used for the said rod-shaped compound, or 2 or more types may be mixed and used for it. For example, when the rod-shaped compound is used by mixing a liquid crystalline material having one or more polymerizable functional groups at both ends and a liquid crystalline material having one or more polymerizable functional groups at one end, The polymerization density (crosslinking density) and the optical properties are preferably adjusted by adjusting the ratio. Further, from the viewpoint of ensuring reliability, a liquid crystalline material having one or more polymerizable functional groups at both ends is preferable, but from the viewpoint of liquid crystal alignment, it is preferable that there is one polymerizable functional group at both ends. .

  The content of the rod-shaped compound used in this step in the coating solution for forming the retardation layer is set to a desired value for the viscosity of the coating solution for forming the retardation layer depending on the coating method applied on the alignment layer. There is no particular limitation as long as it is possible. Especially in this process, it is preferable that it exists in the range of 5 mass%-40 mass% in the said coating liquid for phase difference layer formation, and it exists in the range of 10 mass%-30 mass% especially. Is preferred.

The retardation layer forming coating solution used in this step contains at least the rod-like compound, but usually contains a solvent. Moreover, you may contain another compound as needed.
Such a solvent is not particularly limited as long as it can uniformly dissolve or disperse the rod-like compound, but specifically, it should be the same as the solvent used for the coating liquid for forming the alignment layer. Can do.
The other compound is not particularly limited as long as it does not impair the arrangement order of the rod-like compound in the retardation layer formed by this step. As said other compound used for this process, a polymerization initiator, a polymerization inhibitor, a plasticizer, surfactant, a silane coupling agent etc. can be mentioned, for example.
In this step, when the polymerizable liquid crystal material is used as the rod-shaped compound, it is preferable to use a polymerization initiator or a polymerization inhibitor as the other compound.

  Examples of the polymerization initiator include benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamine) benzophenone, α-amino acetophenone, 4,4-dichloro. Benzophenone, 4-benzoyl-4-methyldiphenyl ketone, dibenzyl ketone, fluorenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, p- tert-Butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyldimethyl ketal, benzylmethoxyethyl acetal, benzo Methyl ether, benzoin butyl ether, anthraquinone, 2-tert-butylanthraquinone, 2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzsuberone, methyleneanthrone, 4-azidobenzylacetophenone, 2,6-bis (p- Azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadion-2- (o-methoxycarbonyl) oxime, 1-phenyl-propanedione-2 -(O-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, 1-phenyl-3-ethoxy-propanetrione-2- (o-benzoyl) oxy , Michler's ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, naphthalene Sulfonyl chloride, quinoline sulfonyl chloride, n-phenylthioacridone, 4,4-azobisisobutyronitrile, diphenyl disulfide, benzthiazole disulfide, triphenylphosphine, camphorquinone, Adeka N1717, carbon tetrabromide, tri Examples include combinations of photoreducing dyes such as bromophenyl sulfone, benzoin peroxide, eosin, and methylene blue with reducing agents such as ascorbic acid and triethanolamine. In this step, these photopolymerization initiators can be used alone or in combination of two or more.

  Furthermore, when using the said photoinitiator, a photoinitiator adjuvant can be used together. Examples of such photopolymerization initiation assistants include tertiary amines such as triethanolamine and methyldiethanolamine, and benzoic acid derivatives such as ethyl 2-dimethylaminoethylbenzoate and ethyl 4-dimethylamidebenzoate. Yes, but not limited to these.

  Examples of the polymerization inhibitor include diphenylpicrylhydrazide, tri-p-nitrophenylmethyl, p-benzoquinone, p-tert-butylcatechol, picric acid, copper chloride, methylhydroquinone, methoquinone, tert-butylhydroquinone and the like. Although a polymerization inhibitor for the reaction can be used, a hydroquinone polymerization inhibitor is preferred from the viewpoint of storage stability, and methyl hydroquinone is particularly preferred.

  In addition, other compounds as shown below can be added to the retardation layer forming coating solution in this step. Other compounds that can be added include, for example, a polyester (meth) acrylate obtained by reacting a (meth) acrylic acid with a polyester prepolymer obtained by condensing a polyhydric alcohol with a monobasic acid or polybasic acid; a polyol Polyurethane (meth) acrylate obtained by reacting a group and a compound having two isocyanate groups with each other and then reacting the reaction product with (meth) acrylic acid; bisphenol A type epoxy resin, bisphenol F type epoxy resin , Epoxy resins such as novolac type epoxy resin, polycarboxylic acid polyglycidyl ester, polyol polyglycidyl ether, aliphatic or cycloaliphatic epoxy resin, amino group epoxy resin, triphenolmethane type epoxy resin, dihydroxybenzene type epoxy resin, (Meta) Photopolymerizable compound in epoxy (meth) acrylate obtained by reacting an acrylic acid; photopolymerizable liquid crystal compound having an acryl group or methacryl group and the like.

  The coating method for the retardation layer forming coating liquid in this step is not particularly limited as long as it can stably form a coating film made of the retardation layer forming coating liquid on the alignment layer. . In this step, the method for applying the coating liquid for forming the retardation layer on the alignment layer and the method for drying the coating film can be the same as those for a general alignment layer forming layer. It can be the same as the forming layer.

The retardation layer formed by this step expresses the retardation by containing the rod-shaped compound. The degree of the retardation is the type of the rod-shaped compound and the thickness of the retardation layer. It is determined depending on
Therefore, the thickness of the retardation layer formed in this step is not particularly limited as long as it is within a range where a predetermined retardation can be achieved, and the pattern position produced by the production method of the present invention is not limited. It is appropriately determined according to the use of the retardation film.
In this step, it is preferable to apply the retardation layer so that the thickness of the retardation layer is within a range corresponding to the in-plane retardation of the retardation layer corresponding to λ / 4 minutes. Thereby, in the pattern phase difference film manufactured by the manufacturing method of this invention, the linearly polarized light which passes the said 1st phase difference area | region and the said 2nd phase difference area | region can be made into the circularly polarized light which has a mutually orthogonal relationship, respectively. This is because a 3D image can be displayed with higher accuracy.

  In this step, when the thickness of the retardation layer is set to a distance within a range in which the in-plane retardation of the retardation layer corresponds to λ / 4 minutes, the specific distance depends on the rod-shaped compound. It is determined as appropriate depending on the type of the above. However, the distance is usually in the range of 0.5 μm to 2 μm as long as it is a rod-shaped compound generally used in this step, but is not limited thereto.

2. Alignment Step The alignment step in the present invention is a method in which the rod-shaped compound contained in the coating film of the retardation layer forming coating liquid is moved along different alignment directions of the first alignment region and the second alignment region included in the alignment layer. That is, it is a step of arranging the rod-like compounds along the alignment regulating force of the second alignment region in which the rod-like compound can be arranged in a direction different from the first alignment region and the first alignment region.
The method for aligning the rod-shaped compounds in this step is not particularly limited as long as the rod-shaped compounds can be aligned in a desired direction, and a general method can be used. In such a case, a method of heating the coating film to a temperature higher than the liquid crystal phase forming temperature of the rod-like compound is used.

The retardation layer formed in this step is formed by forming the alignment layer having the characteristics as described above in the exposure step, so that the first retardation region and the second retardation region become the first alignment region. And it is formed in the same pattern as the pattern in which the second alignment region is formed.
In addition, the pattern which consists of a 1st phase difference area | region and a 2nd phase difference area | region is formed in the phase difference layer formed in this process, for example, putting a sample in polarizing plate cross Nicol, It can be evaluated by confirming that the bright line and the dark line are reversed when rotated. At this time, when the pattern composed of the first phase difference region and the second phase difference region is fine, the pattern may be observed with a polarizing microscope. Further, the direction (angle) of the slow axis in each pattern may be measured by AxoScan described later.

  Specifically, the in-plane retardation value of the retardation layer formed by this step is preferably in the range of 100 nm to 160 nm, more preferably in the range of 110 nm to 150 nm, and 120 nm to More preferably, it is in the range of 140 nm. In the retardation layer formed by this step, the in-plane retardation values indicated by the first retardation region and the second retardation region are substantially the same except that the direction of the slow axis is different.

Here, the in-plane retardation value is an index indicating the degree of birefringence in the in-plane direction of the refractive index anisotropic body. When the refractive index in the fast axis direction orthogonal to the slow axis direction is Ny and the thickness in the direction perpendicular to the in-plane direction of the refractive index anisotropic body is d,
Re [nm] = (Nx−Ny) × d [nm]
It is a value represented by. The in-plane retardation value (Re value) can be measured by, for example, KOBRA-WR manufactured by Oji Scientific Instruments Co., Ltd. by the parallel Nicol rotation method, and the in-plane retardation value of a minute region is AXOMETRICS (USA). Measurements can also be made using a Mueller matrix with an AxoScan made by the manufacturer. In the present specification, unless otherwise stated, the Re value means a value at a wavelength of 589 nm.

  In this step, when a polymerizable liquid crystal material is used as the rod-shaped compound, a curing treatment for polymerizing and curing the polymerizable liquid crystal material may be included. In addition, what is necessary is just to determine arbitrarily as a method to superpose | polymerize the said polymeric liquid crystal material according to the kind of polymeric functional group which the said polymeric liquid crystal material has. In particular, in this step, a method of curing by irradiation with actinic radiation is preferable. The actinic radiation is not particularly limited as long as it is a radiation capable of polymerizing the polymerizable liquid crystal material, but it is usually preferable to use ultraviolet light or visible light from the viewpoint of the ease of the apparatus. Specifically, it can be the same as the ultraviolet ray described in the above section “A. Method for producing pattern alignment film”.

3. Method for Producing Pattern Retardation Film The method for producing a pattern phase difference film of the present invention includes at least the coating step and the orientation step. If necessary, a coating solution for forming a retardation layer is provided after the coating step. It may have a drying step of drying the coating film.

As a method for drying the coating film in the drying step, a commonly used drying method such as a heat drying method, a reduced pressure drying method, a gap drying method, or the like can be used. Further, the drying method in this step is not limited to a single method, and a plurality of drying methods may be employed, for example, by changing the drying method sequentially according to the amount of remaining solvent.
Furthermore, as a method for drying the coating film, a method of applying a drying air adjusted to a certain temperature to the coating film can be used. The wind speed of the drying air is preferably 3 m / second or less, and particularly preferably 0.5 m / second or less.

Further, in the present invention, an adhesive layer forming step (FIGS. 12A to 12B) for forming the adhesive layer 6 on the retardation layer 4 as illustrated in FIG. 12 and a separator laminating step for laminating the separator 7 (FIG. 12 (b)) or after the orientation step, a long pattern retardation film may be cut to have a cutting step for obtaining a pattern retardation film formed on a sheet.
Moreover, since the reference numerals in FIG. 12 indicate the same members as those in FIG. 1, the description thereof is omitted here.

In the present invention, each of these steps is performed independently, that is, after unwinding the long pattern alignment film or the like from the state wound in a roll shape for each step and performing a predetermined treatment. Although it may be wound, it is preferable that all the steps are performed continuously, that is, the raw material is rolled to roll.
Specifically, when the pattern alignment film manufactured by the above-described method for manufacturing a pattern alignment film is long, the pattern retardation film as the final product is rolled from the long pattern alignment film. It is preferable to be manufactured by roll-to-roll without being wound into a shape.

4). Pattern Retardation Film The pattern retardation film produced by the production method of the present invention has a transparent film substrate, an alignment layer, and a retardation layer, and the retardation layer is a first alignment that the alignment layer has. It has a first retardation region and a second retardation region in which rod-like compounds are arranged along the alignment regulating force of the region and the second alignment region.
As a use of the pattern retardation film manufactured by the present invention, it can be used for a display device for three-dimensional display, and in particular, for a display device for three-dimensional display that is required to be manufactured easily and in large quantities. Preferably used.

C. Pattern Alignment Film Manufacturing Apparatus Next, the pattern alignment film manufacturing apparatus of the present invention will be described.
The apparatus for producing a patterned alignment film of the present invention continuously conveys a film for forming a long alignment film formed on a transparent film substrate and the transparent film substrate and having an alignment layer forming layer containing a photoalignment material. And an exposure means including a first exposure part and a second exposure part for irradiating polarized ultraviolet rays to the alignment layer forming layer of the film for forming a long alignment film that is continuously conveyed, The polarization directions of the polarized ultraviolet rays irradiated in the first exposure unit and the second exposure unit are different, and at least one of the first exposure unit and the second exposure unit irradiates the polarized ultraviolet rays in a pattern. It is characterized by this.

Such a pattern alignment film manufacturing apparatus will be described with reference to the drawings. 13 and 14 are schematic views showing an example of the pattern alignment film manufacturing apparatus of the present invention. As illustrated in FIG. 13 and FIG. 14, the pattern alignment film manufacturing apparatus 30 of the present invention includes a feeding unit including an unwinding / winding apparatus 31 a that continuously transports the transparent film substrate 1 and a transport roll 31 b. And an exposure means having a first exposure part 32a and a second exposure part 32b for irradiating polarized ultraviolet rays to the alignment layer forming layer of the long alignment film forming film 3 that is continuously conveyed. . Further, on the transparent film substrate 1, an alignment layer forming coating solution coating device 33a for applying an alignment layer forming coating solution to form an alignment layer forming layer and a drying device 33b for drying the coating film are provided. It is.
Here, in FIG. 13, the first exposure portion 32 a includes a light source 34 that irradiates ultraviolet rays so as to be orthogonal to the alignment layer forming layer, a polarizer 35, and a mask 36 having a patterned opening. The pattern irradiation is performed on the long alignment film forming film 3 on the transport roll. On the other hand, the 2nd exposure part 32b has the polarizer 35 from which the direction of a polarization axis differs from a 1st exposure part.
In FIG. 14, both the first exposure unit 32a and the second exposure unit 32b have the mask 36, and pattern ultraviolet light is irradiated onto the alignment layer forming layer on the transport roll 31b. is there.

According to the present invention, by having the conveying means and the exposing means, the rod-shaped compound can be arranged in a fixed direction in the alignment layer, and the rod-shaped compound in a direction different from the first alignment region. Can be formed continuously. For this reason, a pattern alignment film can be manufactured easily and in large quantities.
Moreover, since the film in which the alignment region having the desired orientation is formed is a long alignment film forming film, for example, it can be stored in a roll shape in this state, or from a state stored in a roll shape Unwinding and forming a retardation layer containing a rod-like compound having refractive index anisotropy on the alignment layer can increase the degree of freedom of the manufacturing process.
Furthermore, it is easy to store the finally obtained pattern alignment film in a roll shape, or to cut out a pattern alignment film of a desired size according to the size of the display device used from the state stored in the roll shape. The degree of freedom in the manufacturing process of the display device can be increased.

The pattern alignment film manufacturing apparatus of the present invention has at least a transport unit and an exposure unit.
Hereinafter, each structure of the pattern orientation film manufacturing apparatus of this invention is demonstrated.

1. Conveying means The conveying means in the present invention continuously conveys the long alignment film forming film.
Such a conveying means is not particularly limited as long as it can continuously convey the long alignment film forming film, and a general conveying means can be used. Specifically, the content can be the same as the content described in the section “A. Pattern alignment film manufacturing method”.

2. Exposure means The exposure means in this invention has a 1st exposure part and a 2nd exposure part which irradiate polarized ultraviolet rays to the alignment layer formation layer of the said film for long alignment film formation conveyed continuously.
In addition, the first exposure unit and the first exposure unit are different in the polarization direction of the polarized ultraviolet light to be irradiated, and at least one of the first exposure unit and the second exposure unit performs pattern irradiation with the polarized ultraviolet light. Is.
In addition, about the film for elongate alignment film formation used for this invention, since it is the same as that of the content as described in the term of the said "A. manufacturing method of a pattern alignment film", description here is abbreviate | omitted.

  As the first and second exposure portions included in the exposure means in the present invention, at least one of them is irradiated with a pattern of polarized ultraviolet rays, and first and second alignment regions having different directions in which rod-shaped compounds are arranged can be formed. Although there is no particular limitation as long as it is a thing, the first exposure part is irradiated with the entire surface, the second exposure part is irradiated with the pattern (fourth embodiment), the first exposure part is irradiated with the pattern, and the second exposure part is irradiated with the whole surface (5th embodiment), 1st exposure part can be pattern irradiation, and 2nd exposure part can be pattern irradiation (6th embodiment). In the case of the fourth embodiment, a material capable of reversibly changing the orientation regulating force is used. In the case of the fifth embodiment, a material capable of reversibly changing the orientation regulating force is used. In the case of the embodiment, a rod-like compound is obtained by using a material for forming an alignment layer that includes a material for changing the alignment regulating force reversibly or not reversibly in the alignment layer forming layer. The first alignment region and the second alignment region can be formed in different directions.

In the present invention, it is particularly preferable that one of the first exposure unit and the second exposure unit irradiates polarized ultraviolet light in a pattern, and the other irradiates the entire surface of polarized ultraviolet light. It is preferable that the aspect, that is, the first exposure part is pattern irradiation and the second exposure part is irradiation of the entire surface. This is because the other side is the entire surface irradiation unit, so that the facility can be simplified and the cost can be reduced.
Moreover, it is because the photoreactive material which is excellent in the temporal stability of orientation control force as mentioned above can be used as a material which comprises the layer for alignment layer formation by being a 5th embodiment.

  In the present invention, the pattern irradiation method, the pattern, the pattern width, the entire surface irradiation method, and the polarization direction of the polarized ultraviolet light irradiated from the first and second exposure parts are the first alignment region having a desired alignment regulating force. And if it can form the 2nd orientation field stably, it will not be limited in particular, It can be the same as that of a content of a paragraph of the above-mentioned "A. Manufacturing method of a pattern orientation film".

Although the 1st and 2nd exposure part in this invention should just be able to irradiate desired polarized ultraviolet rays, it usually has a light source of ultraviolet rays, and a polarizer.
In the case of pattern irradiation, a mask is usually provided.
Furthermore, the 1st and 2nd exposure part in this invention has a slit which narrows the irradiation area | region of the polarized ultraviolet rays irradiated to the alignment layer formation layer of the film for long alignment film formation as needed. Also good.
The light source, the polarizer, the mask, the irradiation amount of the polarized ultraviolet light to be irradiated, and the like can be the same as the contents described in the above section “A. Method for producing pattern alignment film”.

3. Pattern alignment film manufacturing apparatus The pattern alignment film manufacturing apparatus of the present invention has at least a conveying means and an exposure means, but is a layer for forming an alignment layer of a film for forming a long alignment film at a site that is irradiated with polarized ultraviolet rays. It is preferable to have a temperature adjusting device that adjusts the temperature of the liquid crystal to a constant.
Such a temperature control device can be the same as the content described in the section “A. Pattern alignment film manufacturing method”.

In addition, if necessary, a preparation means for forming an alignment layer forming layer on a transparent film substrate to prepare a long alignment film forming film, or a surface on which an alignment layer forming layer of a transparent film substrate is formed An antireflection layer and / or antiglare layer forming means for forming an antireflection layer and / or an antiglare layer on the opposite surface, and a cutting device for cutting a long pattern alignment film may be included.
In addition, about these means etc., what is generally used for formation of retardation film can be used.

In the present invention, each of these means is independently provided, that is, the film for forming a long alignment film is unwound in a roll shape between the means and wound after being subjected to a predetermined treatment. However, it is preferable that the processing performed by all the units be performed continuously, that is, continuously performed by roll-to-roll.
Specifically, it is preferable that each means and the like are arranged from the long alignment film forming film to the pattern alignment film so that the film can be produced by roll-to-roll without being wound in a roll.

D. Pattern Retardation Film Manufacturing Apparatus Next, the pattern retardation film manufacturing apparatus of the present invention will be described.
The pattern retardation film manufacturing apparatus of the present invention is a rod-like compound having refractive index anisotropy on the alignment layer included in the pattern alignment film manufacturing apparatus and the pattern alignment film formed by the pattern alignment film manufacturing apparatus. Coating means for applying a retardation layer-forming coating liquid, and a rod-like compound contained in the coating film of the retardation layer-forming coating liquid, a first orientation region and a second orientation contained in the orientation layer And orientation means for arranging the regions along different orientation directions.

  Such a pattern retardation film manufacturing apparatus of the present invention will be described with reference to the drawings. FIG. 15 is a schematic view showing an example of the pattern retardation film manufacturing apparatus of the present invention. As illustrated in FIGS. 15 and 16, the pattern retardation film manufacturing apparatus 40 of the present invention is formed on the alignment layer of the pattern alignment film 10 formed by the manufacturing apparatus in addition to the above-described pattern alignment film manufacturing apparatus. Coating means 41 for applying a coating solution for forming a retardation layer containing a rod-shaped compound having refractive index anisotropy, and a rod-shaped compound contained in the coating film of the coating solution for forming a retardation layer in the alignment layer The pattern retardation film 20 includes an alignment unit 42 that arranges the first alignment region and the second alignment region that are included in different alignment directions, and a curing unit 43 that irradiates ultraviolet rays to cure the rod-shaped compound. Is to be manufactured.

  According to the present invention, the pattern retardation film can be manufactured easily and in large quantities by having the pattern alignment film manufacturing apparatus described above.

The pattern phase difference film manufacturing apparatus of this invention has at least the above-mentioned pattern alignment film manufacturing apparatus, a coating means, and an orientation means.
Hereinafter, each structure of the pattern retardation film manufacturing apparatus of this invention is demonstrated in detail. In addition, about the said pattern alignment film manufacturing apparatus, since it can be set as the content similar to what was described in the term of the said "C. pattern alignment film manufacturing apparatus", description here is abbreviate | omitted.

1. Coating means The coating means used in the present invention includes a retardation layer forming coating containing a rod-shaped compound having refractive index anisotropy on an alignment layer included in a pattern alignment film formed by the pattern alignment film manufacturing apparatus. It will not specifically limit if a coating liquid can be apply | coated and a coating film of desired thickness can be formed, A common coating device can be used.
The retardation layer forming coating solution used in the present invention can be the same as the content described in the above-mentioned section “B. Method for producing a patterned alignment film”, and thus the description thereof is omitted here. .

2. Alignment means As the alignment means used in the present invention, the first alignment region and the second alignment layer included in the alignment layer are rod-shaped compounds included in the coating film formed of the retardation layer forming coating solution formed on the alignment layer. It is possible to arrange the rod-shaped compounds along the alignment regulating force of the second alignment region which can arrange the rod-shaped compounds along different alignment directions of the alignment region, that is, in the direction different from the first alignment region and the first alignment region. Although it will not specifically limit if it can be used, When a rod-shaped compound is a liquid crystalline material, the heating apparatus which heats the said coating film more than the liquid crystal phase formation temperature of a rod-shaped compound can be used.
In addition, as a heating apparatus, if the said coating film can be made into desired temperature, it will not specifically limit, Specifically, an infrared irradiation apparatus, a warm air blowing apparatus, etc. can be used.

3. Pattern Retardation Film Manufacturing Apparatus The pattern retardation film manufacturing apparatus of the present invention has at least the above-described pattern alignment film manufacturing apparatus, coating unit, and alignment unit. A curing means for curing the retardation layer in which the rod-shaped compounds are arranged in the direction, an adhesive layer forming coating liquid application means for applying an adhesive layer forming coating liquid on the retardation layer to form an adhesive layer, It may have a laminating means for laminating a separator on the adhesive layer. Moreover, you may have a cutting device etc. which cut | judge the pattern retardation film formed in the elongate shape.
The curing means is not particularly limited as long as the retardation layer can be cured, but when the photopolymerization initiator is included in the retardation layer forming coating solution. An exposure apparatus that irradiates ultraviolet rays or the like can be used.

In the present invention, each of these means is independently provided, that is, the film for forming a long alignment film is unwound in a roll shape between the means and wound after being subjected to a predetermined treatment. However, it is preferable that the processing performed by all the units be performed continuously, that is, continuously performed by roll-to-roll.
Specifically, when a film for forming a long alignment film is used as a raw material, the roll is not rolled up in the middle from the film for forming a long alignment film to the pattern retardation film as the final product. It is preferable that each means etc. is arrange | positioned so that it can manufacture with a toe roll.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples.

Example 1
AG (anti-glare) film (Dai Nippon Printing Co., Ltd.) having a haze value of 10-15, in which transparent fine particles are dispersed in a transparent resin on a TAC (cellulose triacetate) film (Fujitac Co., Ltd.) having a thickness of 80 μm. ) Is coated with a coating solution containing PETA and a photopolymerization initiator on the surface opposite to the AG surface and UV cured to form an intermediate layer (block layer) having a thickness of 1 μm, having a width of 1 m and a length of 2000 m. Prepared as a roll stock. With the apparatus shown in FIG. 13, a coating liquid for forming an alignment layer containing a photodimerization reaction type photoalignment material (trade name: ROP-103, manufactured by Lorick) as a photoalignment material is applied to the intermediate layer side and dried. Then, an alignment layer forming layer having a thickness of 0.1 μm was formed. Further, a stripe pattern having a width of 500 μm was formed on the synthetic quartz with chromium in the direction parallel to the transport direction of the original film with polarized ultraviolet rays (polarization axis being 45 degrees with respect to the transport direction of the film) through the wire grid. Irradiated through a mask. Next, polarized ultraviolet rays (with a polarization axis of −45 degrees with respect to the film transport direction) were irradiated through a wire grid without passing through a mask to obtain a pattern alignment film having an alignment layer.
A liquid crystal dissolved in a solvent (licrive (registered trademark) RMS03-013C (trade name) manufactured by Merck & Co., Inc.) is applied on the alignment layer of the patterned pattern alignment film, cooled to near room temperature. Then, a pattern retardation film having a retardation layer thickness of 1 μm was formed by ultraviolet curing.
When the obtained pattern retardation film was observed with a polarizing plate crossed Nicol, it was confirmed that the alignment layer was patterned with a bright and dark pattern.

(Example 2)
Using the apparatus shown in FIG. 14, a pattern having an alignment layer by irradiating polarized ultraviolet rays through a mask in which openings and light shielding portions used in the first polarized ultraviolet irradiation are exchanged in the second polarized ultraviolet irradiation. A pattern retardation film was formed in the same manner as in Example 1 except that the alignment film was formed. When the obtained pattern retardation film was observed with a polarizing plate crossed Nicol, similar results were obtained.

(Example 3)
A pattern retardation film was formed in the same manner as in Example 1 except that the pattern retardation film was continuously formed from the original fabric using the apparatus shown in FIG. When the obtained pattern retardation film was observed with a polarizing plate crossed Nicol, similar results were obtained.

Example 4
A pattern retardation film was formed in the same manner as in Example 3 except that the pattern retardation film was continuously formed from the original fabric using the apparatus shown in FIG. When the obtained pattern retardation film was observed with a polarizing plate crossed Nicol, similar results were obtained.

DESCRIPTION OF SYMBOLS 1 ... Transparent film base material 2 '... Orientation layer formation layer 2 ... Orientation layer 2a ... 1st orientation region 2b ... 2nd orientation region 3 ... Long orientation film formation film 4 ... Phase difference layer 4a ... 1st phase difference Area 4b ... Second retardation area 5 ... Antireflection layer or antiglare layer 6 ... Adhesive layer 7 ... Separator 10 ... Pattern alignment film 20 ... Pattern retardation film 30 ... Pattern alignment film manufacturing apparatus 31a ... Unwinding winder 31b ... Roll 32a for conveyance 32a ... 1st exposure part 32b ... 2nd exposure part 33a ... Coating liquid application apparatus 33b for alignment layer formation ... Drying device 34 ... Light source 35 ... Polarizer 36 ... Mask 40 ... Pattern retardation film manufacturing apparatus 41 ... Application means 42 ... Orientation means 43 ... Curing means

Claims (16)

While continuously transporting a transparent film substrate and a film for forming a long alignment film formed on the transparent film substrate and having an alignment layer forming layer containing a photo-alignment material, on the alignment layer forming layer Including a first exposure process for irradiating polarized ultraviolet light and a second exposure process, and an exposure process for forming an alignment layer;
The polarization ultraviolet rays irradiated in the first exposure process and the second exposure process have different polarization directions, and at least one of the first exposure process and the second exposure process is polarized on the alignment layer forming layer. A method for producing a pattern alignment film, wherein the pattern irradiation is performed with ultraviolet rays. One of the first exposure process and the second exposure process is to pattern-irradiate polarized ultraviolet rays onto the alignment layer forming layer,
2. The method for producing a patterned alignment film according to claim 1, wherein the other is to irradiate the entire surface of the alignment layer forming layer with polarized ultraviolet rays.   3. The pattern alignment film according to claim 1, wherein the pattern irradiation is to irradiate polarized ultraviolet rays to strip-shaped patterns parallel to each other in the longitudinal direction of the film for forming a long alignment film. Manufacturing method.   The method for producing a pattern alignment film according to any one of claims 1 to 3, wherein the pattern irradiation is performed on a conveying unit that conveys the film for forming a long alignment film. .   The method for producing a pattern alignment film according to claim 4, wherein the transport means for transporting the film for forming a long alignment film at a site that receives the pattern irradiation is a transport roll. The pattern irradiation is pattern irradiation multiple times,
6. The method for producing a pattern alignment film according to claim 4, wherein the pattern irradiation performed at least in each exposure process is performed on the same transport means.   7. The process according to claim 4, wherein both the first exposure process and the second exposure process are pattern irradiations, and the pattern irradiations of both processes are performed on the same conveying means. The manufacturing method of the pattern orientation film as described in a term. A position containing a rod-shaped compound having refractive index anisotropy on an alignment layer included in the pattern alignment film formed by the method for producing a pattern alignment film according to any one of claims 1 to 7. An application step of applying a phase difference layer forming coating solution;
An alignment step of arranging the rod-shaped compound contained in the coating film of the retardation layer forming coating solution along different orientation directions of the first orientation region and the second orientation region contained in the orientation layer;
A method for producing a patterned retardation film, comprising: Conveying means for continuously transporting a transparent film substrate and a film for forming a long alignment film having an alignment layer forming layer containing a photo-alignment material formed on the transparent film substrate and continuously transported Exposure means including a first exposure part and a second exposure part for irradiating polarized ultraviolet rays to the alignment layer forming layer of the long alignment film forming film,
The polarization direction of polarized ultraviolet rays irradiated in the first exposure unit and the second exposure unit is different,
At least one of the first exposure unit and the second exposure unit irradiates polarized ultraviolet rays in a pattern.   The patterned alignment film manufacturing apparatus according to claim 9, wherein one of the first exposure unit and the second exposure unit irradiates polarized ultraviolet rays in a pattern, and the other irradiates polarized ultraviolet rays entirely. .   The pattern alignment film according to claim 9 or 10, wherein the pattern irradiation is to irradiate polarized ultraviolet rays to strip-shaped patterns parallel to each other in the longitudinal direction of the film for forming a long alignment film. Manufacturing equipment.   The pattern alignment film manufacturing apparatus according to any one of claims 9 to 11, wherein the pattern irradiation is performed on a transport unit that transports the film for forming a long alignment film.   The pattern alignment film manufacturing apparatus according to claim 12, wherein a transport unit that transports the film for forming a long alignment film at a site that receives the pattern irradiation is a transport roll. The pattern irradiation is pattern irradiation multiple times,
The pattern alignment film manufacturing apparatus according to claim 12, wherein the pattern irradiation performed at least in each of the exposure units is performed on the same transport unit.   15. Both exposure parts of said 1st exposure part and 2nd exposure part are pattern irradiation, and pattern irradiation of said both exposure parts is performed on the same conveyance means, From Claim 12 to 14 characterized by the above-mentioned. The pattern alignment film manufacturing apparatus according to claim 1. The pattern alignment film manufacturing apparatus according to any one of claims 9 to 13,
Application means for applying a retardation layer forming coating solution containing a rod-like compound having refractive index anisotropy onto an alignment layer included in the pattern alignment film formed by the pattern alignment film manufacturing apparatus;
An alignment means for aligning the rod-shaped compound contained in the coating film of the retardation layer forming coating liquid along different orientation directions of the first orientation region and the second orientation region contained in the orientation layer;
An apparatus for producing a patterned retardation film, comprising: