JP5803311B2 - Pattern retardation film manufacturing method, mask used therefor, and pattern retardation film using the same - Google Patents

Description

  The present invention relates to a method for producing a pattern retardation film capable of easily producing a pattern retardation film having excellent pattern accuracy.

  Conventionally, as a flat panel display, a two-dimensional display has been mainstream, but in recent years, a flat panel display capable of three-dimensional display has begun to attract attention, and some of them are commercially available. . Further, in future flat panel displays, it is a natural tendency to be capable of three-dimensional display, and flat panel displays capable of three-dimensional display are being studied in a wide range of fields.

  In order to perform three-dimensional display on a flat panel display, it is usually necessary to display a right-eye video and a left-eye video separately to the viewer in some manner. As a method for separately displaying the right-eye video and the left-eye video, for example, a passive method is known. Such a passive three-dimensional display method will be described with reference to the drawings. FIG. 13 is a schematic diagram illustrating an example of a passive three-dimensional display. As shown in FIG. 13, in this method, first, the pixels constituting the flat panel display are divided into a plurality of types of pixels, that is, a right-eye video display pixel and a left-eye video display pixel, and one group of The pixel displays a right-eye image, and the other group of pixels displays a left-eye image. Also, using a linearly polarizing plate and a patterned retardation film on which a patterned retardation layer corresponding to the division pattern of the pixel is formed, a right-eye image and a left-eye image are orthogonal to each other. Convert to polarized light. In addition, the viewer wears circular polarizing glasses that employ circular polarizing lenses that are orthogonal to each other for the right-eye lens and the left-eye lens, so that the right-eye image passes only through the right-eye lens and the left-eye image is displayed. Pass only through the lens for the left eye. In this way, the passive system enables three-dimensional display by allowing the right-eye video to reach only the right eye and the left-eye video to reach only the left eye.

  Such a passive method has an advantage that three-dimensional display can be easily performed by using the pattern retardation film and the corresponding circular polarizing glasses.

  By the way, as described above, in the passive method, it is essential to use a pattern retardation film. However, such a pattern retardation film has not been widely researched and developed, and can be used as a standard technique. There is nothing that has been established. In this regard, Patent Document 1 discloses that as a pattern retardation film, a photo-alignment film having an alignment regulating force controlled in a pattern on a glass substrate and the photo-alignment film are formed. A pattern retardation plate having a retardation layer patterned so as to correspond to a film pattern is disclosed. However, since the pattern retardation plate disclosed in Patent Document 1 is indispensable to use a glass plate, it is expensive and does not mean that a large area can be manufactured. There was a difficulty in its practicality.

For this reason, practically used pattern retardation films are still in the research and development stage, and few have been known as general ones. As a result, a large amount of inexpensive and simple methods are available. There is a problem that a display device that can be manufactured and can display a three-dimensional image has not been obtained.
Further, when the pattern retardation film is used, there is a problem that two types of patterns, that is, a right-eye video display pixel and a left-eye video display pixel cannot be formed with high pattern accuracy. Specifically, it is difficult to match the pattern of the pattern retardation film to the right-eye and left-eye video display pixels, and opposite phase-difference layers are arranged for the right-eye and left-eye video display pixels, respectively. There has been a problem in that the left-eye video reaches the opposite eye and so-called crosstalk occurs.

JP 2005-49865 A

  This invention is made | formed in view of such a condition, and it aims at providing the manufacturing method of the pattern phase difference film which can manufacture the pattern phase difference film excellent in the pattern precision easily. .

  As a result of repeated studies to solve the above problems, the present inventors have conducted an exposure process for performing pattern exposure on the photo-alignment layer, and a coating solution for forming a retardation layer containing a rod-shaped compound having refractive index anisotropy. When a pattern retardation film is produced by performing a coating step, an alignment step of arranging rod-shaped compounds in a predetermined direction, and a drying step of the coating film, the pattern of the obtained pattern retardation film depends on the conditions of each step. Although subject to various fluctuations, the present inventors have found that the tendency of shrinkage is extremely large compared to the pattern during the exposure process due to the influence of heat shrinkage during the drying process, thus completing the present invention.

  That is, the present invention provides a transparent film substrate, and a film for forming a long alignment film formed on the transparent film substrate and having an alignment layer forming layer containing a photoalignment material, while continuously conveying the film. The first alignment region in which the rod-shaped compounds having refractive index anisotropy are arranged in a certain direction by the first exposure processing and the second exposure processing for irradiating the alignment layer forming layer with polarized ultraviolet rays, and the rod-shaped compound are formed in the first orientation. An exposure step of forming an alignment layer including a second alignment region that is arranged in a direction different from the alignment region; and an application step of applying a retardation layer forming coating solution containing the rod-shaped compound on the alignment layer; An alignment step in which the rod-like compound contained in the coating film of the retardation layer forming coating liquid is arranged along different orientation directions of the first orientation region and the second orientation region contained in the orientation layer, and the paint film Dry and place A pattern retardation comprising: a drying step for forming a difference layer; and a protection step for covering the retardation layer with a protective film in a stable contraction state in which the transparent film substrate after the drying step contracts more than in the exposure step. A method for producing a film, wherein the polarization directions of polarized ultraviolet rays irradiated in the first exposure process and the second exposure process are different from each other, and at least one of the first exposure process and the second exposure process is: The alignment layer forming layer is irradiated with a pattern of polarized ultraviolet light through a mask, and the mask used for pattern irradiation is enlarged so that the transparent film substrate has a target pattern when the transparent film substrate is in a stable contraction state. Provided is a method for producing a patterned retardation film, which is corrected.

According to the present invention, it is possible to easily manufacture a pattern retardation film having excellent pattern accuracy by using a mask that is enlarged and corrected so as to obtain a target pattern in a stable contraction state as described above. The crosstalk as described above can be stably suppressed.
Moreover, the said protection process shall have little influence of moisture absorption of a transparent film base material, and shall have a little dimensional change by covering the said phase difference layer with a protective film when a transparent film base material is a stable contraction state. be able to. Moreover, by performing it at the time of a stable contraction state, the time which the said protection process requires can be shortened, and it can be excellent in production efficiency.

  The present invention is a mask that is used for pattern irradiation in the method for producing a patterned retardation film described above, and is enlarged and corrected so that the transparent film substrate has a target pattern in a stable contraction state. I will provide a.

  According to the present invention, a pattern retardation film having excellent pattern accuracy can be easily formed by enlarging and correcting the transparent film substrate so as to be a target pattern in a stable contraction state. .

  This invention is manufactured by the manufacturing method of the above-mentioned pattern retardation film, The said transparent film base material is a stable contraction state, The pattern retardation film characterized by the above-mentioned.

  According to this invention, when the said transparent film base material is a stable contraction state, it can be set as the thing excellent in dimensional stability. For this reason, the assembly of the three-dimensional display device can be facilitated.

  According to the method for producing a pattern retardation film of the present invention, there is an effect that a pattern retardation film having excellent pattern accuracy can be easily produced.

It is process drawing which shows an example of the manufacturing method of the pattern phase difference film of this invention. It is process drawing which shows an example of the manufacturing method of the pattern phase difference film of this invention. It is explanatory drawing explaining the manufacturing method of the pattern phase difference film of this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the exposure process used for this invention. It is explanatory drawing explaining the other process in the manufacturing method of the pattern phase difference film of this invention. It is process drawing which shows an example of the other process in this invention. It is the schematic which shows the example of the liquid crystal display device which can display a three-dimensional image | video with a passive system.

The present invention relates to a method for producing a patterned retardation film, a mask used therefor, and a patterned retardation film using the same.
Hereinafter, the manufacturing method of a pattern phase difference film of the present invention, a mask, and a pattern phase difference film are explained in detail.

A. Method for Producing Pattern Retardation Film The method for producing a pattern retardation film of the present invention comprises a transparent film substrate, and a long alignment having an alignment layer forming layer formed on the transparent film substrate and containing a photoalignment material. The rod-shaped compounds having refractive index anisotropy are arranged in a certain direction by the first exposure process and the second exposure process in which the alignment layer forming layer is irradiated with polarized ultraviolet rays while continuously transporting the film forming film. An exposure step of forming an alignment layer including a first alignment region and a second alignment region in which the rod-shaped compound is arranged in a direction different from the first alignment region; and a retardation including the rod-shaped compound on the alignment layer The coating step of applying the layer forming coating solution and the rod-like compound contained in the coating film of the retardation layer forming coating solution are differently oriented in the first orientation region and the second orientation region contained in the orientation layer. An alignment step that aligns along the direction, a drying step that dries the coating film to form a retardation layer, and a stable contraction state where the transparent film substrate after the drying step contracts more than during the exposure step, A protective step of covering the retardation layer with a protective film, and a method for producing a patterned retardation film, wherein the polarization directions of polarized ultraviolet rays irradiated in the first exposure process and the second exposure process are different. And at least one of the first exposure process and the second exposure process is to pattern-irradiate the alignment layer forming layer with polarized ultraviolet light through a mask, and the mask used for the pattern irradiation is the transparent The film substrate is enlarged and corrected so as to have a target pattern in a stable contraction state.

Such a method for producing a patterned retardation film of the present invention will be described with reference to the drawings. 1 and 2 are process diagrams showing an example of a method for producing a patterned retardation film of the present invention. First, as illustrated in FIG. 1 (a), by applying a coating solution for forming an alignment layer containing a photoreactive material as a photoalignment material on the transparent film substrate 1, and drying the coating film, A long alignment film forming film 3 having an alignment layer forming layer 2 ′ formed on the transparent film substrate 1 and the transparent film substrate 1 and including a photo alignment material is formed. While continuously transporting the film 3, the alignment layer forming layer 2 ′ is irradiated with polarized ultraviolet rays through a mask (FIG. 1B) to form the first alignment region 2 a, and then the first By irradiating polarized ultraviolet rays different from the polarized ultraviolet rays when the alignment region 2a is formed (FIG. 1 (c)), the first alignment region 2a has a second alignment region 2b having a different direction in which rod-shaped compounds are arranged. An alignment layer 2 is formed (FIG. 1D).
Next, as shown in FIG. 2 (a), a coating solution for forming a retardation layer containing the rod-shaped compound is applied, and the coating film 4 ′ is heated and dried (FIG. 2 (b)), Forming a retardation layer 4 including a first retardation region 4a and a second retardation region 4b in which the rod-shaped compounds are arranged in a certain direction according to the orientation regulating force of the first orientation region 2a and the second orientation region 2b; Then, it cooled to near room temperature, it was made to harden by irradiating with an ultraviolet-ray (FIG.2 (c)), and the pattern phase difference film 10 was formed, and also the transparent film base material 1 contracted rather than the time of the said exposure process. The protective film 21 is laminated on the transparent film substrate 1 and the retardation layer 4 in the stable contraction state (FIGS. 2D to 2E).
Here, the mask used for pattern irradiation is enlarged and corrected so that the transparent film substrate has a target pattern when the transparent film substrate is in a stable contracted state.
In this example, FIG. 1A shows an alignment layer forming coating solution coating step and an alignment layer forming layer drying step. FIGS. 1B to 1C show the exposure process, FIG. 1B shows the first exposure process, and FIG. 1C shows the second exposure process. 2A is an application process, FIG. 2B is an alignment process and a drying process, FIG. 2C is a curing process, and FIGS. 2D to 2E are protection processes. It is.

As mentioned above, the pattern of the pattern retardation film is subject to various fluctuations due to the effects of exposure light, heat, tension, contact with the solvent, etc. in each process during manufacturing, and it is possible to fully grasp the influence. Although compared with before the exposure process and after the drying process, the pattern retardation film containing the transparent film substrate shrinks in the width direction due to the influence of heat during the drying process, and at the same time, the pattern after the drying process is The present inventors have found that the tendency to shrink compared with the pattern before the exposure process is extremely large. For example, when laser marking marks are applied on a transparent film substrate by laser marking before the exposure process, the width of the laser marking marks after the drying process is as shown in FIG. There is a tendency to shrink compared to the width (Ha> Hb).
For this reason, according to the present invention, as described above, by using a mask that has been enlarged and corrected so as to have a target pattern in a stable contraction state, it is possible to achieve stable operation without being affected by conditions in each process. In particular, a pattern retardation film excellent in pattern accuracy can be easily produced. As a result, the passability in the subsequent steps can be improved, and the above-described crosstalk can be stably suppressed.
Moreover, even if it is a case where a pattern is changed, the pattern phase difference film of a desired pattern can be obtained easily and in a short time.

  Moreover, the said protection process shall have little influence of moisture absorption of a transparent film base material, and shall have a little dimensional change by covering the said phase difference layer with a protective film when a transparent film base material is a stable contraction state. be able to. Moreover, by performing it at the time of a stable contraction state, the time which the said protection process requires can be shortened, and it can be excellent in production efficiency.

Further, by having the exposure step, the first alignment region in which the rod-like compound can be arranged in a certain direction in the alignment layer and the rod-like compound can be arranged in a direction different from the first alignment region. Two orientation regions can be formed continuously.
Therefore, when a retardation layer containing a rod-like compound is formed on the alignment layer in which such an alignment region is formed, the retardation layer formed on the first alignment region also in the retardation layer according to the pattern (Hereinafter, sometimes referred to as “first retardation region”) and a retardation layer (hereinafter, sometimes referred to as “second retardation region”) formed on the second alignment region. Can be manufactured easily and in large quantities.
Moreover, when the film in which the first and second alignment regions having the desired alignment regulating force are formed is a long alignment film forming film, for example, it can be stored in a roll shape in this state, Unwinding from the state stored in a state, and can form a retardation layer containing a rod-shaped compound having refractive index anisotropy on the alignment layer, etc. can do.
Furthermore, the pattern retardation film finally obtained can be stored in the form of a roll in the form of a roll, or from the state stored in the form of a roll, the pattern retardation of a desired size can be matched to the size of the display device used. The degree of freedom in the manufacturing process of the display device can be increased, for example, the film can be easily cut out.

The method for producing a patterned retardation film of the present invention includes at least an exposure process, a coating process, an alignment process, a drying process, and a protection process.
Hereinafter, each process of the manufacturing method of the pattern phase difference film of this invention is demonstrated in detail.

1. Exposure process The exposure process in the manufacturing method of the present invention includes a first exposure process and a second exposure process in which the alignment layer forming layer is irradiated with polarized ultraviolet rays while continuously conveying the long alignment film forming film. A step of forming an alignment layer including a first alignment region in which rod-like compounds having refractive index anisotropy are arranged in a certain direction and a second alignment region in which the rod-like compound is arranged in a direction different from the first alignment region; is there.
Moreover, the polarization directions of polarized ultraviolet rays irradiated in the first exposure process and the second exposure process are different, and at least one of the first exposure process and the second exposure process is the alignment layer forming layer. A pattern is irradiated with polarized ultraviolet rays through a mask.

(1) Mask The mask used in this step is used for the above pattern irradiation, and is expanded and corrected so that the transparent film substrate has a target pattern in a stable contraction state contracted from that in this step. It is what has been.

Here, the stable shrinkage state refers to a state where it can absorb moisture slowly and expand under normal temperature and normal humidity, for example, the width of the transparent film substrate included in the pattern retardation film after the drying step. Ht, the width in the absolutely dry state of the transparent film substrate included in the pattern retardation film after the drying step is H0, in the saturated expansion state of the transparent film substrate included in the pattern retardation film after the drying step When the width is H1, the expansion coefficient represented by (Ht−H0) / (H1−H0) × 100 is in the range of 0.05% to 90%.
In this step, the expansion coefficient is preferably in the range of 0.5% to 50%, particularly preferably in the range of 3% to 40%. By being within such a range, there is little dimensional change due to moisture absorption and expansion from the surrounding environment, and the time to reach a stable contraction state can be shortened, and the time required for the protection step is shortened. Because it can be done. Moreover, as a result, it can be made excellent in production efficiency.

Regarding the width H1 of the saturated expansion state, after the transparent film substrate is immersed in water at room temperature (temperature 25 ± 3 ° C. for 1 hour), water droplets on the surface are removed with an air gun, wiper, etc. This means that one surface of the base material is spread on a smooth flat surface, for example, a glass stage, a metal stage such as a SUS material or aluminum.
Further, regarding the width H0 in the absolutely dry state, the moisture content of the transparent film substrate (unit%; the mass of moisture / the mass of the transparent film substrate × 100) included in the pattern retardation film after the drying step is horizontal. A graph with the vertical axis representing the width of the transparent film substrate contained in the pattern retardation film is created on the axis, and the width H0 when the moisture content is 0 can be extrapolated.

In this step, the method for measuring the moisture content is not particularly limited as long as it is a method that can be accurately measured using the transparent film substrate after the drying step, for example, after the drying step. A method can be used in which a 10 cm × 10 cm sample is cut out from the transparent film substrate and obtained from the mass change before and after heating for 5 minutes at a temperature of 23 ± 2 ° C. under atmospheric pressure.
The method for obtaining transparent film substrates having different moisture contents is not particularly limited as long as it can be adjusted so that a graph can be created with high accuracy. For example, adjustment of temperature, humidity, etc. is possible. Examples thereof include a method in which the transparent film substrate is placed in a thermostat and the temperature, humidity, and standing time are adjusted.

  In this step, the measurement of the width and moisture content of such a transparent film substrate is carried out from a pattern retardation film or a long alignment film forming film to a protective film, an alignment layer, a retardation layer, an alignment layer forming layer, etc. This is performed using a transparent film substrate from which all components other than the transparent film substrate have been peeled off.

  In this step, the method for measuring the width of the transparent film substrate is not particularly limited as long as the above expansion coefficient and magnification can be stably calculated. For example, the total width of the transparent film substrate is measured. Or a method of measuring the width of a part of the transparent film substrate. As a method using the partial width, for example, as shown in FIG. 3 described above, a method using two laser marking marks M formed in parallel with the width direction by laser marking can be cited.

Moreover, the transparent film base material at the time of the said stable shrinkage | contraction state shrink | contracts rather than the time of this process.
As the shrinkage rate (Hb / Ha) when the width of the transparent film substrate at the time of pattern irradiation in this step is Ha, after the drying step, and the width of the transparent film substrate in a stable shrinkage state is Hb. Is not particularly limited as long as it is less than 1, but is preferably in the range of 0.99 to 0.999999, more preferably in the range of 0.999 to 0.99999. It is preferably within the range of 0.999 to 0.9999. This is because when the shrinkage rate is in the above-described range, the mask can be stably corrected by enlargement correction. On the other hand, if it is smaller than the above range, there is a possibility that the time change due to moisture absorption of the transparent film substrate width after the drying process is too rapid and difficult to control.
Note that, due to the influence of the drying step, the width H1 in the saturated expansion state is usually narrower than the width Ha of the transparent film substrate during pattern irradiation in this step.

In this step, the above-mentioned transparent film base material is enlarged and corrected so as to have a desired pattern when in a stable contraction state. This means that the transparent film base material is in a contracted state more than when this step is performed. In the contracted state, the pattern of the first alignment region and the second alignment region of the alignment layer, that is, the pattern of the first retardation region and the second retardation region included in the retardation layer becomes the target pattern. Thus, the mask pattern size is adjusted.
Specifically, when the width of the transparent film substrate at the time of pattern irradiation in this step is Ha, the width of the transparent film substrate after the drying step and in a stably contracted state is Hb, the transparent film substrate The size of the mask pattern that is enlarged and corrected so as to be the target pattern when the material is in a stable contracted state is the pattern required for the pattern retardation film manufactured by the manufacturing method of the present invention, which is the target pattern. Is obtained by correcting the magnification of Ha / Hb times, that is, corrected for reciprocal times of the contraction rate (Hb / Ha).
Therefore, when the pattern is a belt-like pattern parallel to each other in the longitudinal direction of the long alignment film forming film, the width and period of the mask are corrected to enlarge the width and period of the target pattern by Ha / Hb times. It will be a thing.
If the pattern is not a parallel belt-like pattern, the shape of the mask pattern is a similar shape obtained by correcting the shape of the target pattern by Ha / Hb magnification correction.

  The pattern of the mask used in this step, that is, the pattern irradiation pattern is not particularly limited as long as the first alignment region and the second alignment region can be stably formed. Pattern, staggered pattern, and the like. Among these, in this step, a belt-like pattern is preferable, and in particular, the belt-like pattern parallel to the longitudinal direction of the film for forming a long alignment film, that is, the pattern irradiation is the long alignment. It is preferable to irradiate polarized ultraviolet rays to strip-like patterns parallel to each other in the longitudinal direction of the film-forming film. This is because it can be easily formed by fixing the irradiation position of the polarized ultraviolet light and transporting the film for forming a long alignment film in the longitudinal direction. Moreover, it is because pattern irradiation can be performed with high pattern accuracy. In addition, it is easy to make correspondence between the pattern in which the first phase difference region and the second phase difference region are formed and the pattern in which pixels are formed in a color filter or the like used in the display device. is there.

  The pattern width of the mask, that is, the irradiation width and the irradiation interval (non-irradiation width) of polarized ultraviolet rays may be the same or different. However, in this step, it is preferable that both widths, that is, the width of the first alignment region to be formed and the width of the second alignment region are the same. The pattern in which the first phase difference region and the second phase difference region are formed and the pattern in which the pixel portion is formed can be easily associated with each other, and as a result, can be easily manufactured. This is because it becomes possible to. When the position is aligned with the stripe line of the color filter, the pattern in which the first alignment region and the second alignment region are formed and the stripe pattern of the color filter are irradiated with a width so as to correspond to each other. Is preferred.

As such a pattern width, specifically, in the case of three-dimensional display use, specifically, it is usually preferably in the range of 50 μm to 1000 μm, and more preferably in the range of 100 μm to 600 μm. .
In addition, the specific pattern width here refers to the pattern width of the alignment layer when the transparent film substrate contained in the pattern retardation film produced by the production method of the present invention is in a stable contracted state. is there. Therefore, the pattern width of the mask used in this step, that is, the width of the opening of the mask is a width obtained by multiplying such a width by the magnification.

The material constituting the mask in this step is not particularly limited as long as a desired opening can be formed, and examples thereof include metals and quartz that are hardly deteriorated by ultraviolet rays.
Specifically, a metal substrate such as SUS patterned by etching, laser processing, or electroforming, and further subjected to surface treatment such as nickel plating as necessary can be used. Further, a light shielding film made of emulsion (silver salt) or chromium can be provided on a substrate made of soda lime glass or quartz.
In this step, it is particularly preferable that Cr is patterned on synthetic quartz. This is because it is excellent in dimensional stability and ultraviolet transmittance with respect to temperature and humidity changes, and the alignment region can be formed in the alignment layer forming layer with high pattern accuracy.

  The thickness of the synthetic quartz mask in this step is not particularly limited as long as the pattern can be formed with high dimensional accuracy, but is preferably in the range of 1 mm to 20 mm, and more preferably in the range of 5 mm to 18 mm. It is preferable that it is in the range, and it is especially preferable that it exists in the range of 9 mm-16 mm. This is because when the thickness is within the above-described range, the thickness can be reduced, the dimensional accuracy can be high, and it is not too heavy when handled as a photomask.

(2) Long alignment film forming film The long alignment film forming film used in this step has at least a transparent film substrate and an alignment layer forming layer.

a. Transparent film substrate The transparent film substrate constituting the long alignment film forming film used in this step has a function of supporting the alignment layer forming layer, the retardation layer and the like, and is formed in a long shape It is.

  It is preferable that the transparent film base material used for this process is a thing with small phase difference. More specifically, the transparent film substrate used in this step preferably has an in-plane retardation value (Re value) in the range of 0 nm to 10 nm, and preferably in the range of 0 nm to 5 nm. More preferably, it is further in the range of 0 nm to 3 nm. When the in-plane retardation value of the transparent film substrate is larger than the above range, the display quality of the display device capable of displaying a three-dimensional image formed by using the long retardation film manufactured by the manufacturing method of the present invention. This is because it may become worse.

  The transparent film substrate used in this step preferably has a transmittance in the visible light region of 80% or more, and more preferably 90% or more. Here, the transmittance | permeability of a transparent film base material can be measured by JISK7361-1 (the test method of the total light transmittance of a plastic transparent material).

It is preferable that the transparent film base material used for this process is a flexible material which has the flexibility which can be wound up in roll shape.
Such flexible materials include cellulose derivatives, norbornene polymers, cycloolefin polymers, polymethyl methacrylate, polyvinyl alcohol, polyimide, polyarylate, polyethylene terephthalate, polysulfone, polyethersulfone, amorphous polyolefin, modified acrylic polymer, polystyrene. And epoxy resins, polycarbonates, polyesters, and the like. Among these, it is preferable to use a cellulose derivative in this step. This is because the cellulose derivative is particularly excellent in optical isotropy, so that a pattern retardation film having excellent optical characteristics can be produced.

  In this step, it is preferable to use a cellulose ester among the cellulose derivatives, and it is preferable to use cellulose acylates among the cellulose esters. This is because cellulose acylates are advantageous in terms of availability because they are widely used industrially.

  As said cellulose acylates, C2-C4 lower fatty acid ester is preferable. The lower fatty acid ester may include only a single lower fatty acid ester such as cellulose acetate, and may include a plurality of fatty acid esters such as cellulose acetate butyrate and cellulose acetate propionate. There may be.

  In this step, cellulose acetate can be particularly preferably used among the above lower fatty acid esters. As the cellulose acetate, it is most preferable to use triacetyl cellulose having an average acetylation degree of 57.5% to 62.5% (substitution degree: 2.6 to 3.0). Here, the degree of acetylation means the amount of bound acetic acid per unit mass of cellulose. The degree of acetylation can be determined by measurement and calculation of the degree of acetylation in ASTM: D-817-91 (test method for cellulose acetate and the like). In addition, the acetylation degree of the triacetyl cellulose which comprises a triacetyl cellulose film can be calculated | required by said method, after removing impurities, such as a plasticizer contained in a film.

  The thickness of the transparent film substrate used in this step is particularly within the range capable of imparting the necessary self-supporting property to the pattern retardation film according to the use of the pattern retardation film produced according to the present invention. Although not limited, it is usually preferably in the range of 25 μm to 125 μm, more preferably in the range of 40 μm to 100 μm, and particularly preferably in the range of 60 μm to 80 μm. This is because if the thickness of the transparent film substrate is thinner than the above range, the required self-supporting property may not be imparted to the pattern retardation film produced according to the present invention. In addition, when the thickness is thicker than the above range, for example, when cutting the long pattern retardation film produced according to the present invention to form a single-wafer pattern retardation film, processing waste increases, This is because the abrasion of the cutting blade may be accelerated.

  The structure of the transparent film base material used for this process is not restricted to the structure which consists of a single layer, You may have the structure by which the several layer was laminated | stacked. When it has the structure by which the several layer was laminated | stacked, the layer of the same composition may be laminated | stacked, and the several layer which has a different composition may be laminated | stacked.

The transparent film base material used in this step is formed in a long shape.
Here, the long shape means that the length is long enough to be wound up in a roll shape, and may be arbitrarily determined according to the weight that can be installed in the manufacturing apparatus. However, specifically, the length is preferably within a range of 10 m or more, more preferably within a range of 50 m to 5000 m, and particularly preferably within a range of 100 m to 4000 m.
Further, the length is preferably 10 times or more with respect to the width, particularly preferably within a range of 50 times to 5000 times, and particularly preferably within a range of 100 times to 4000 times. . It is because it can be made excellent in handleability and the like.

b. Alignment layer forming layer The alignment layer forming layer constituting the long alignment film forming film used in this step contains a photoalignment material and has a rod-like compound having refractive index anisotropy by irradiation with polarized ultraviolet rays. It is possible to form an alignment region having an alignment regulating force that can be arranged in a certain direction.

  Here, the photo-alignment material used in this step refers to a material that can exhibit an alignment regulating force by irradiation with polarized ultraviolet rays. In addition, “orientation regulating force” means an interaction in which rod-shaped compounds described later are arranged.

  Such a photo-alignment material is not particularly limited as long as it exhibits the above-described alignment regulating force by irradiating polarized light. Such photo-alignment materials are largely divided into photoisomerization materials that reversibly change the alignment regulation force by changing only the molecular shape by cis-trans change, and photoreaction materials that change the molecule itself by irradiating polarized light. Can be separated. In this step, any of the photoisomerization material and the photoreaction material can be suitably used, but the photoreaction material is more preferably used. As described above, the photoreactive material is a material that reacts with polarized light to develop an alignment regulating force by irradiating polarized light. Therefore, the photoreactive material can irreversibly develop an alignment regulating force. Therefore, the photoreactive material is superior in the temporal stability of the orientation regulating force.

  The photoreactive material can be further classified according to the type of reaction caused by polarized light irradiation. Specifically, a photodimerization type material that develops an alignment regulation force by causing a photodimerization reaction, a photodegradable material that produces an orientation regulation force by producing a photodecomposition reaction, an orientation regulation by producing a photobinding reaction It can be divided into a photocoupled material that expresses force, and a photolytic-coupled material that develops alignment regulation force by causing a photodecomposition reaction and a photocoupled reaction. Any of the above-mentioned photoreactive materials can be suitably used in this step, but among these, it is more preferable to use a photodimerization type material from the viewpoint of stability and reactivity (sensitivity).

  The photodimerization-type material used for this process will not be specifically limited if it is a material which can express an orientation control force by producing photodimerization reaction. In particular, in this step, the wavelength of light that causes a photodimerization reaction is preferably 280 nm or more, particularly preferably in the range of 280 nm to 400 nm, and more preferably in the range of 300 nm to 380 nm.

  Examples of such a photodimerization-type material include polymers having cinnamate, coumarin, benzylidenephthalimidine, benzylideneacetophenone, diphenylacetylene, stilbazole, uracil, quinolinone, maleimide, or a cinnamylidene acetic acid derivative. In particular, in the process, a polymer having cinnamate or at least one of coumarin, a polymer having cinnamate and coumarin is preferably used. Specific examples of such a photodimerization type material are described in, for example, JP-A-9-118717, JP-T-10-506420, JP-T2003-505561, and WO2010 / 150748. A compound can be mentioned.

  As the cinnamate and coumarin in this step, those represented by the following formulas Ia and Ib are preferably used.

In the above formula, A represents pyrimidine-2,5-diyl, pyridine-2,5-diyl, 2,5-thiophenylene, 2,5-furylene, 1,4- or 2,6-naphthylene, Unsubstituted, fluorine, chlorine or a cyclic, linear or branched alkyl residue of 1 to 18 carbon atoms (unsubstituted or mono- or polysubstituted by fluorine, chlorine, 1 Represents phenylene which is mono- or polysubstituted by two or more non-adjacent —CH ₂ — groups which may be independently substituted by the group C.
Wherein B represents a hydrogen atom or a group capable of reacting or interacting with a second substance, such as a polymer, oligomer, monomer, photoactive polymer, photoactive oligomer and / or photoactive monomer or surface. Represents.
In the above formula, the group C is —O—, —CO—, —CO—O—, —O—CO—, —NR ₁ —, —NR ₁ —CO—, —CO—NR ₁ —, —NR _1. —CO—O—, —O—CO—NR ₁ —, —NR ₁ —CO—NR ₁ —, —CH═CH—, —C≡C—, —O—CO—O— and —Si (CH ₃ ) ₂ —O—Si (CH ₃ ) ₂ — (R ₁ represents a hydrogen atom or lower alkyl).
In the above formula, S ₁ and S ₂ are independently of each other a single bond or a spacer unit, for example a linear or branched alkylene group having 1 to 40 carbon atoms (unsubstituted, fluorine or chlorine Mono- or poly-substituted, and one or more non-adjacent —CH ₂ — groups may be independently substituted by the group D, but the oxygen atoms are not directly bonded to each other).
In the above formula, the group D is —O—, —CO—, —CO—O—, —O—CO—, —NR ₁ —, —NR ₁ —CO—, —CO—NR ₁ —, —NR _1. —CO—O—, —O—CO—NR ₁ —, —NR ₁ —CO—NR ₁ —, —CH═CH—, —C≡C—, —O—CO—O— and —Si (CH ₃ ) ₂ -O-Si (CH ₃ ) _2- (R ₁ represents a hydrogen atom or lower alkyl), a group selected from aromatic groups or alicyclic groups.
In the above formula, Q represents an oxygen atom or —NR ₁ — (R ₁ represents a hydrogen atom or lower alkyl).
In the above formula, X and Y are independently of each other hydrogen, fluorine, chlorine, cyano, alkyl having 1 to 12 carbon atoms (optionally substituted by fluorine and optionally not one or more adjacent). alkyl -CH ₂ - groups are -O -, - CO-O - , - O-CO- and / or an) are replaced by -CH = CH-.
In addition, as such a photodimerization-type material, specifically, what is commercially available as ROP-103 (trade name) from Rollic Corporation in WO08 / 031243 and WO08 / 130555 can be used. .

Moreover, as a photo-alignment material used for this process, you may have refractive index anisotropy. This is because when such a photo-alignment material is used, the process can be simplified.
As the photo-alignment material having such a refractive index anisotropy, specifically, those described in JP-A-2002-82224 can be used.

  In addition, the photo-alignment material used for this process may be only one type, or may use two or more types.

The alignment layer forming layer used in this step contains at least a photo-alignment material, but may contain other compounds as necessary.
Such other compounds are not particularly limited as long as they do not impair the alignment regulating force of the alignment layer formed by this step. In this step, as such other compounds, monomers or oligomers having one or more functional groups are preferably used. By including such a monomer or oligomer, when a retardation layer containing a rod-shaped compound having refractive index anisotropy is formed on the alignment layer formed in this step, it has excellent adhesion to the retardation layer. Because it can be made.

  Examples of the monomer or oligomer used in this step include monofunctional monomers having an acrylate functional group (for example, reactive ethyl (meth) acrylate, ethylhexyl (meth) acrylate, styrene, methylstyrene, N-vinylpyrrolidone). ) And polyfunctional monomers (eg, polymethylolpropane tri (meth) acrylate, hexanediol (meth) acrylate, triethylene (polypropylene) glycol diacrylate, tripropylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, penta Erythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di ( ) Acrylate, isocyanuric acid poly (meth) acrylate (for example, isocyanuric acid EO diacrylate)), bisphenol fluorene derivatives (for example, bisphenoxyethanol full orange (meth) acrylate, bisphenol fluor orange epoxy (meth) acrylate), etc. It can be used as a single substance or as a mixture.

  Furthermore, it is preferable to use a monomer or oligomer that is solid at room temperature (20 to 25 ° C.). Thereby, even when the film for forming a long alignment film is stored in a rolled state, blocking due to the alignment layer forming layer sticking to the back surface of the transparent film substrate can be prevented from occurring. It is.

  The content of the monomer or oligomer in this step is not particularly limited as long as it does not impair the alignment regulating force of the alignment layer formed by this step and can exhibit desired adhesion and the like. The range of 0.01 to 3 times the mass of the photo-alignment material is preferable, and the range of 0.05 to 1.5 times is particularly preferable.

  The thickness of the alignment layer forming layer in this step is not particularly limited as long as it is within a range in which a desired alignment regulating force can be expressed with respect to a rod-shaped compound having refractive index anisotropy to be described later. It is preferably within the range of 0.01 μm to 1.0 μm, and particularly preferably within the range of 0.03 μm to 0.5 μm, and particularly preferably within the range of 0.05 μm to 0.20 μm. .

  The method for forming the alignment layer forming layer used in this step is not particularly limited as long as it can form the alignment layer forming layer containing the photo alignment material with a desired thickness. Examples thereof include a method of coating an alignment layer-forming coating solution containing an alignment material on a transparent film substrate.

  The content of the photo-alignment material contained in such a coating liquid for forming an alignment layer is particularly limited as long as the above-mentioned coating liquid for forming an alignment layer is within a range capable of achieving a desired viscosity, depending on the coating method and the like. Is not to be done. Especially in this process, content of the said photo-alignment material in the coating liquid for alignment layer formation is 0.5 mass%-50 mass%, Preferably it is 1 mass%-30 mass%, More preferably, it is 2 masses. It is preferable that it is in the range of% -20 mass%. If the content of the photo-alignment material is larger than the above range, depending on the coating method, it may be difficult to form an alignment layer forming layer having excellent flatness, and if thinner than the above range, This is because the drying load of the solvent increases, so that there is a possibility that the coating speed cannot be in a desired range.

  The solvent used in the alignment layer-forming coating solution in this step is not particularly limited as long as it can dissolve the photo-alignment material or the like at a desired concentration. For example, hydrocarbons such as benzene and hexane Solvents, ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ether solvents such as tetrahydrofuran, 1,2-dimethoxyethane, propylene glycol monoethyl ether (PGME), alkyl halide solvents such as chloroform and dichloromethane, acetic acid Ester solvents such as methyl, ethyl acetate, butyl acetate and propylene glycol monomethyl ether acetate; amide solvents such as N, N-dimethylformamide; sulfoxide solvents such as dimethyl sulfoxide; anone solvents such as cyclohexane; Lumpur, ethanol, and the alcohol solvent propanol can be exemplified, but the invention is not limited thereto. Further, the solvent used in this step may be one kind or a mixed solvent of two or more kinds of solvents.

  The method for applying the alignment layer forming coating solution in this step is not particularly limited as long as it can achieve desired flatness. Specific coating methods include gravure coating, reverse coating, knife coating, dip coating, spray coating, air knife coating, spin coating, roll coating, printing, dipping and lifting, curtain coating Examples thereof include a method, a die coating method, a casting method, a bar coating method, an extrusion coating method, and an E-type coating method.

  The thickness of the coating film for the orientation layer forming coating solution is not particularly limited as long as the desired flatness can be achieved, but is preferably in the range of 0.1 μm to 50 μm, In particular, the range of 0.5 μm to 30 μm is preferable, and the range of 0.5 μm to 10 μm is particularly preferable.

As a method for drying the coating film of the alignment layer forming coating solution, a commonly used drying method such as a heat drying method, a vacuum drying method, a gap drying method, or the like can be used. Further, the drying method in this step is not limited to a single method, and a plurality of drying methods may be employed, for example, by changing the drying method sequentially according to the amount of remaining solvent.
Furthermore, as a method of drying the coating film of the alignment layer forming coating solution, a method of applying a drying air adjusted to a certain temperature to the coating film can be used, and such a drying method is used. In this case, the wind speed of the drying air applied to the coating film is preferably 3 m / second or less, and particularly preferably 0.5 m / second or less.

c. Film for forming long alignment film The film for forming long alignment film used in this step includes at least the transparent film substrate and the alignment layer forming layer, but if necessary, the transparent film substrate and the alignment layer. Improvement of adhesion between the forming layers, components such as plasticizers from the transparent film substrate move to the alignment layer forming layer, or the photo-alignment material contained in the alignment layer forming layer moves to the transparent film substrate In order to improve the barrier property to prevent this, an intermediate layer (for example, a layer having a thickness of about 1 μm obtained by curing a crosslinkable monomer such as pentaerythritol triacrylate (PETA)) may be used.
Moreover, it is preferable that the antireflection layer and / or the antiglare layer is formed on the surface opposite to the surface on which the alignment layer forming layer of the transparent film substrate is formed. This is because, when a display device is manufactured using the pattern retardation film obtained by the manufacturing method of the present invention, a display device with good display quality can be obtained.

  The antiglare layer is a layer having a function of reducing screen reflection caused by external light from the sun, a fluorescent lamp, or the like entering and reflecting on the display screen of the display device. On the other hand, the antireflection layer improves the image contrast by suppressing the regular reflectance of the surface, and as a result, has a function of improving the visibility of the image. The antiglare layer and antireflection layer used in this step are not particularly limited as long as they have a desired antiglare function or antireflection function, and are used for display devices for the purpose of improving display image quality. Generally known ones can be used. Examples of the antiglare layer include a resin layer in which fine particles are dispersed, and examples of the antireflection layer include a layer having a configuration in which a plurality of layers having different refractive indexes are stacked. . If an antireflection layer is provided on the outermost surface of the antiglare layer, the visibility of the image in the bright room can be further improved.

Moreover, in this process, it is preferable to have a barrier layer that suppresses hygroscopic expansion of the transparent film substrate on the surface opposite to the surface on which the orientation layer forming layer of the transparent film substrate is formed. It is because the dimensional change by the rapid hygroscopic expansion of the said transparent film base material can be suppressed.
Such a barrier layer is not particularly limited as long as it can suppress hygroscopic expansion of the transparent film substrate, and examples thereof include aluminum oxide, silicon oxide, silicon nitride, silicon oxide, aluminum oxide, and titanium oxide. Indium oxide, tin oxide, ITO (indium tin oxide), tantalum oxide, zirconium oxide, niobium oxide, or other inorganic material single layer, or organic layer single layer mainly composed of a crosslinkable acrylate material, or two or more layers thereof A laminated composite film can be mentioned. Also, the above-mentioned anti-reflection layer, anti-glare layer, etc. can be used as a barrier layer.

(3) Exposure process This process has the 1st exposure process and 2nd exposure process which irradiate a polarized ultraviolet ray to the said layer for alignment layer formation, conveying the film for long alignment film formation continuously. .
Moreover, the polarization directions of polarized ultraviolet rays irradiated in the first exposure process and the second exposure process are different, and at least one of the first exposure process and the second exposure process is the alignment layer forming layer. A pattern is irradiated with polarized ultraviolet rays through a mask.

The method for transporting the film for forming a long alignment film in this step is not particularly limited as long as it is a method capable of continuously transporting the film for forming a long alignment film. The method used can be used. Specifically, a method using a winder for supplying a roll-shaped film for forming a long alignment film and a winder for winding the film for forming a long alignment film, a method using a belt conveyor, a transport roll, etc. Can be mentioned. Moreover, the method of using the floating-type conveyance stand which conveys in the state which floated the film for elongate alignment film formation by discharging and sucking | sucking air may be used.
Further, the presence or absence of tension applied to the long alignment film forming film at the time of conveyance is not particularly limited as long as it is a method capable of stably and continuously conveying the long alignment film formation film, It is preferable that the sheet is conveyed with tension applied. This is because continuous conveyance can be performed more stably.

  The color of the conveying means used in this step does not reflect the polarized ultraviolet light that has passed through the long alignment film forming film when it is disposed at the site where the long alignment film forming film is irradiated with polarized ultraviolet light. A color is preferred. Specifically, black is preferable. Examples of such a black method include a method of chromium treatment of the surface.

  The shape of the transport roll in the present invention is not particularly limited as long as it can stably transport the long alignment film forming film. Is preferably one that can keep the distance between the alignment layer forming layer surface of the long alignment film forming film and the exposure means constant, usually, A perfect circular shape is preferable.

The polarization direction of the polarized ultraviolet light irradiated in the first exposure process and the second exposure process in this step may be different in both processes, and the first and second alignment regions in which the directions in which the rod-shaped compounds are arranged are different. Although it will not specifically limit if it can form, It is preferable that it differs by 90 degrees. Forming the first and second alignment regions having an alignment regulating force so that the directions in which the rod-shaped compounds are arranged are orthogonal, that is, the refractive index is the largest in the first retardation region and the second retardation region. This is because the directions (slow axis directions) can be orthogonal to each other, so that it can be more suitably used for manufacturing a display device capable of three-dimensional display.
Note that the direction different by 90 ° means that when a display device capable of three-dimensional display is formed using the pattern retardation film manufactured by the manufacturing method of the present invention, three-dimensional display can be performed with high accuracy. Although it is not particularly limited, it is usually preferably within a range of 90 ° ± 3 °, and more preferably within a range of about 90 ° ± 2 °. It is preferably within the range of about ± 1 °. This is because a display device capable of high-performance three-dimensional display can be obtained.
The direction in which the rod-shaped compounds are arranged in the alignment region formed by irradiating polarized ultraviolet rays having different polarization directions by 90 ° is, as illustrated in FIG. 4, the long alignment film forming film. The direction of 90 ° (first alignment region 2a) and 0 ° (first alignment region 2b) with respect to the longitudinal direction or 45 ° (first direction with respect to the longitudinal direction as illustrated in FIG. The orientation region 2a) and the direction of 135 ° (first alignment region 2b) are preferred. This is because the directions of 90 ° and 0 ° make it easy to be used in, for example, a TN type three-dimensional liquid crystal display device. In addition, because the directions are 45 ° and 135 °, it is easy to be used in, for example, a VA type or IPS type three-dimensional liquid crystal display device.
4 to 5 indicate the same members as those in FIG. 1, and thus the description thereof is omitted here. Moreover, the direction of the arrow in each orientation region is the direction in which rod-shaped compounds are arranged in each region.

The polarized ultraviolet rays irradiated in this step may be condensed or uncondensed, but the pattern irradiation is a long length on a transport roll as described later. When it is performed on an alignment film-forming film, that is, when there is a difference in the distance from the light source of polarized ultraviolet light within the region irradiated with polarized ultraviolet light, the light is condensed in the transport direction. Preferably it is. This is because the influence of the distance from the light source can be reduced and the alignment region can be formed with high pattern accuracy.
In addition, as such a condensing method, the method used generally, for example, the method of using the condensing reflector and condensing lens which have a desired shape can be mentioned. In the present invention, it is preferable that the polarized ultraviolet light is parallel light with respect to the direction (width direction) orthogonal to the transport direction. As a parallelization method, a generally used method, for example, a desired shape is used. Examples thereof include a method using a condensing reflector or a condensing lens.

  The wavelength of the polarized ultraviolet light irradiated in this step is appropriately set according to the photo-alignment material and the like, and the wavelength used when causing the general photo-alignment material to exhibit the alignment regulating force. Specifically, it is preferable to use irradiation light having a wavelength of 210 nm to 380 nm, preferably 230 nm to 380 nm, more preferably 250 nm to 380 nm.

  Such ultraviolet light sources include low-pressure mercury lamps (sterilization lamps, fluorescent chemical lamps, black lights), high-pressure discharge lamps (high-pressure mercury lamps, metal halide lamps), short arc discharge lamps (extra-high pressure mercury lamps, xenon lamps, mercury). Xenon lamp). Of these, a metal halide lamp, a xenon lamp, a high-pressure mercury lamp, and the like can be preferably used.

A method for producing polarized ultraviolet rays to be irradiated in this step is not particularly limited as long as it is a method capable of stably irradiating polarized ultraviolet rays. However, ultraviolet rays are irradiated through a polarizer capable of passing only polarized light in a certain direction. Can be used.
As such a polarizer, one that is generally used for generation of polarized light can be used. For example, a wire grid polarizer having a slit-shaped opening or a plurality of quartz plates are laminated. Examples thereof include a method of performing polarization separation using a Brewster angle, and a method of using a method of performing polarization separation using a Brewster angle of vapor-deposited multilayer films having different refractive indexes.

The amount of polarized ultraviolet light irradiated in this step is not particularly limited as long as it can form an alignment region having a desired alignment regulating force. For example, when the wavelength is 310 nm, 5 mJ preferably in the range of / ^{cm 2} ~500mJ / ^cm 2, inter alia is preferably in the range of ^{7mJ / cm 2 ~300mJ / cm 2} , in the range of 10mJ / cm ² ~100mJ / cm 2 Preferably there is. This is because an alignment region having a sufficient alignment regulating force can be formed.

The irradiation distance of polarized ultraviolet rays in this step, that is, the distance in the transport direction of the film for forming a long alignment film that receives irradiation of polarized ultraviolet rays is particularly suitable as long as the above-mentioned irradiation amount can be obtained in each exposure process. It is not limited and can be appropriately set according to the line speed or the like.
In this step, when the irradiation distance is short, it becomes easy to achieve a high pattern accuracy. When the irradiation distance is long, an alignment region having a sufficient alignment regulating force is obtained even when the line speed is high. There is an advantage that can be.
In addition, as a method of lengthening the irradiation distance, a method of increasing the number of irradiation times of polarized ultraviolet rays in each exposure process or increasing the irradiation area in the transport direction can be exemplified.

As a method of irradiating polarized ultraviolet rays in the first and second exposure treatments in this step, at least one of them is a method in which polarized ultraviolet rays are irradiated onto the alignment layer forming layer in a pattern, and rod-like compounds are arranged. There is no particular limitation as long as the first and second alignment regions having different directions can be formed. Specifically, the first exposure process is the entire surface irradiation, and the second exposure process is the pattern irradiation (first implementation). Aspect), the first exposure processing is pattern irradiation, the second exposure irradiation is full surface irradiation (second embodiment), the first exposure processing is pattern irradiation, and the second exposure processing is pattern irradiation (third embodiment). it can. Here, in the case of the first embodiment, as the alignment layer forming layer, the first alignment region is formed by using a material including a material capable of reversibly changing the alignment regulating force such as a photoisomerization material. And a second alignment region can be formed. Specifically, as illustrated in FIG. 6, the entire surface is irradiated as the first exposure process (FIG. 6A), and then polarized ultraviolet rays having a polarization direction different from that of the first exposure process are used as the second exposure process. By pattern irradiation (FIG. 6B), the first alignment region and the second alignment region can be formed (FIG. 6C).
In the case of the second embodiment, as the alignment layer forming layer, a layer containing a material that cannot reversibly change the alignment regulating force, such as a photoreactive material such as a photodimerization type material, is used. Thus, the first alignment region and the second alignment region can be formed. Specifically, as illustrated in FIG. 7, pattern irradiation is performed as the first exposure process (FIG. 7A), and then polarized ultraviolet light having a polarization direction different from that of the first exposure process is applied as the second exposure process. By irradiating the entire surface (FIG. 7B), the first alignment region and the second alignment region can be formed (FIG. 7C).
Furthermore, in the case of the third embodiment, the first alignment region and the second alignment are formed by using a material that reversibly changes the alignment regulating force or cannot reversibly change as the alignment layer forming layer. Regions can be formed. Specifically, as illustrated in FIG. 8, pattern irradiation is performed as the first exposure process (FIG. 8A), and then, as the second exposure process, polarized ultraviolet rays having a polarization direction different from that of the first exposure process are used. By pattern irradiating a region different from the region irradiated in the first exposure process (FIG. 8B), the first alignment region and the second alignment region can be formed (FIG. 8C).
In addition, about the code | symbol in FIGS. 6-8, since it shows the member same as FIG. 1, description here is abbreviate | omitted. Further, in this example, polarized ultraviolet rays are irradiated onto strip-shaped patterns parallel to each other in the longitudinal direction.

In this step, it is preferable that one of the first exposure process and the second exposure process is pattern irradiation, and the other is the entire surface irradiation. In particular, the second embodiment, that is, the first exposure process is pattern irradiation. The second exposure process is preferably whole surface irradiation. When the other side is full surface irradiation, it is possible to simplify the equipment for performing the exposure process, and the first alignment region and the second alignment region in which rod-like compounds can be arranged in different directions can be easily and lowly provided. It is because it can form at cost.
Furthermore, since there is no need for pattern alignment in the first exposure process and the second exposure process, the first and second alignment regions with high pattern accuracy can be easily formed.
Moreover, it is because the photoreactive material which is excellent in the temporal stability of an orientation control force as mentioned above can be used as a material which comprises the layer for alignment layer formation by being the method of a 2nd embodiment.

  The pattern irradiation method in this step is not particularly limited as long as it can irradiate polarized ultraviolet rays with high pattern accuracy, but the pattern irradiation transports the film for forming a long alignment film. It is preferable that the exposure unit and the transport unit that perform pattern irradiation are arranged so that the pattern irradiation is performed on the film for forming a long alignment film on the transport unit. In particular, the transport means for transporting the film for forming a long alignment film in the portion that receives the pattern irradiation is a transport roll, that is, the pattern irradiation is for forming a long alignment film on the transport roll. It is preferably performed on the film. The distance between the light source and the film for forming a long alignment film can be stably kept constant, and the first alignment region and the second alignment region in which rod-like compounds can be arranged in different directions can be formed with high accuracy. Because. Moreover, it is because the distance between the light source and the long alignment film forming film can be easily and stably maintained by using the transport roll.

In addition, when performing pattern irradiation in this process so that the irradiation distance becomes long, specifically, pattern irradiation is performed by increasing the number of irradiation times of polarized ultraviolet rays in each exposure process or by increasing the irradiation area in the transport direction. The pattern irradiation method is not particularly limited as long as the pattern-shaped alignment region formed in each exposure process can be formed with high pattern accuracy, but the pattern performed in each exposure process is not limited. Exposure means and transport means for performing pattern irradiation of each exposure process so that the irradiation is performed on the same transport means, that is, the film for forming a long alignment film on the same transport means Is preferably arranged. This is because, by being performed on the same conveying means, it is possible to prevent the film for forming a long alignment film to be conveyed from vibrating in the width direction during conveyance, and to irradiate polarized ultraviolet rays with high pattern accuracy.
Specifically, when the pattern irradiation pattern irradiation is performed a plurality of times, the pattern irradiation performed in each exposure process is a method in which the pattern irradiation is performed on the same conveying means, that is, the pattern irradiation is performed. It is preferable that the exposure unit and the transport unit are arranged so that the pattern irradiation is performed a plurality of times and the pattern irradiation performed in each exposure process is performed on the same transport unit. By performing multiple times of pattern irradiation performed in each exposure process on the same conveying means, it is easy to align the pattern with respect to the film for forming a long alignment film between each pattern irradiation included in the multiple times of pattern irradiation This is because the first alignment region and the second alignment region can be formed with high pattern accuracy. Moreover, even if the irradiation amount is insufficient with one pattern irradiation, it is possible to achieve a sufficient irradiation amount by irradiating the same location multiple times, and the above-mentioned film for forming a long alignment film can be conveyed at high speed. This is because it becomes possible.
FIG. 9 is an explanatory diagram illustrating an example in which multiple pattern irradiations are performed on the same transport unit when the first exposure process performs multiple pattern irradiations from a plurality of first exposure units 32a.
In addition, about the code | symbol in FIG. 9, since it shows the member same as FIG. 1, description here is abbreviate | omitted.

In addition, as a method of performing pattern irradiation when both the first exposure processing and the second exposure processing are pattern irradiation (third embodiment), the pattern processing of both processing is performed on different transport means. Although the pattern irradiation of both processes is performed on the same conveyance means, that is, the first exposure unit and the second exposure unit performing the second exposure process are the same conveyance unit. It is preferable that the exposure means and the conveyance means are arranged so as to be performed on the upper long alignment film forming film. By performing pattern irradiation on the same conveying means, it is easy to align the pattern with respect to the long alignment film forming film between the first and second exposure processes, and the first alignment region and the second alignment region This is because the pattern can be formed with high pattern accuracy.
FIG. 10 shows the pattern irradiation in which the first exposure process and the second exposure process irradiate polarized ultraviolet rays from the first exposure unit 32a and the second exposure unit 32b in a pattern, respectively. It is explanatory drawing which shows the example performed by.
Note that the reference numerals in FIG. 10 indicate the same members as those in FIG.

In this step, when both the first exposure process and the second exposure process are pattern irradiation as in the third embodiment, the pattern irradiation pattern of the first exposure process and the second exposure process is the first pattern. In addition, a region (non-irradiation region) where the polarized ultraviolet rays are not irradiated may be provided between the second alignment regions.
FIG. 11 is a process diagram showing an example of forming a non-irradiation region. As illustrated in FIG. 11, by using a mask having a light shielding portion that blocks the irradiation of polarized ultraviolet rays in both the first exposure process and the second exposure process (FIGS. 11A to 11B). ), A non-irradiated region 2c can be formed as shown in FIG.
In addition, about the code | symbol in FIG. 11, since it shows the member same as FIG. 1, description here is abbreviate | omitted.

  A method for performing the entire surface irradiation in this step is not particularly limited as long as it can stably irradiate polarized ultraviolet rays within a predetermined range. It is preferable to be performed on the film for forming a long alignment film. In particular, it is preferable that the entire surface irradiation is performed on the film for forming a long alignment film located between the rolls for conveyance. This is because the cost can be reduced. Moreover, it is because the freedom degree of the timing which performs an exposure process can be made high.

When irradiating polarized ultraviolet rays to the alignment layer forming layer in this step, it is preferable to adjust the temperature so that the temperature of the alignment layer forming layer is constant. This is because the alignment region can be formed with high accuracy.
In this step, the temperature is preferably adjusted so that the alignment layer forming layer is in the range of 15 ° C. to 90 ° C., and in particular, the temperature is preferably in the range of 15 ° C. to 60 ° C.
Examples of the temperature control method include a method using a temperature control device such as a general heating / cooling device. Specifically, a method using a blower capable of blowing air at a predetermined temperature, a method using a temperature-adjustable as the conveying means, more specifically, a temperature-adjustable conveying roll, The method using a belt conveyor etc. can be mentioned.

(4) Alignment layer The alignment layer formed by this process contains the said photo-alignment material, the 1st alignment area | region which arranges the rod-shaped compound which has refractive index anisotropy in a fixed direction, and the said rod-shaped compound are said 1st. A second alignment region arranged in a direction different from the alignment region is included.

2. Application Step The application step in the present invention is a step of applying a retardation layer forming coating solution containing the rod-shaped compound on the alignment layer.

  The rod-shaped compound contained in the retardation layer forming coating solution used in this step has refractive index anisotropy, and is arranged in a regular manner along the alignment regulating force of the alignment region. There is no particular limitation as long as a desired retardation can be imparted to the retardation layer. Especially, it is preferable that the rod-shaped compound used for this process is a liquid crystalline material which shows liquid crystallinity. This is because the liquid crystalline material has a large refractive index anisotropy, so that it becomes easy to impart desired retardation to the patterned retardation film produced by the production method of the present invention.

  As said liquid crystalline material used for this process, the material which shows liquid crystal phases, such as a nematic phase and a smectic phase, can be mentioned, for example. In this step, any material exhibiting any of these liquid crystal phases can be suitably used, but it is particularly preferable to use a liquid crystalline material exhibiting a nematic phase. This is because a liquid crystalline material exhibiting a nematic phase is easily arranged regularly as compared with liquid crystalline materials exhibiting other liquid crystal phases.

  In this step, it is preferable to use a material having spacers at both ends of the mesogen as the liquid crystalline material exhibiting the nematic phase. Since the liquid crystalline material having spacers at both ends of the mesogen is excellent in flexibility, by using such a liquid crystalline material, the pattern retardation film produced by the production method of the present invention can be made excellent in transparency. It is.

  Furthermore, as the rod-shaped compound used in this step, those having a polymerizable functional group in the molecule are preferably used, and among them, those having a polymerizable functional group capable of three-dimensional crosslinking are more preferably used. Since the rod-shaped compound has a polymerizable functional group, the rod-shaped compound can be polymerized and fixed, so that a retardation layer having excellent alignment stability and hardly causing a change in retardation with time is obtained. Because you can. In addition, when the rod-shaped compound which has a polymerizable functional group is used, the phase difference layer formed by performing this process will contain the rod-shaped compound bridge | crosslinked by the polymerizable functional group.

  The “three-dimensional cross-linking” means that liquid crystal molecules are polymerized three-dimensionally to form a network (network) structure.

  Examples of the polymerizable functional group include polymerizable functional groups that are polymerized by the action of ionizing radiation such as ultraviolet rays and electron beams, or heat. Representative examples of these polymerizable functional groups include radically polymerizable functional groups or cationic polymerizable functional groups. Further, representative examples of radically polymerizable functional groups include functional groups having at least one addition-polymerizable ethylenically unsaturated double bond, and specific examples include vinyl groups having or not having substituents, An acrylate group (generic name including an acryloyl group, a methacryloyl group, an acryloyloxy group, and a methacryloyloxy group) and the like can be given. Moreover, an epoxy group etc. are mentioned as a specific example of the said cation polymerizable functional group. In addition, examples of the polymerizable functional group include an isocyanate group and an unsaturated triple bond. Among these, from the viewpoint of the process, a functional group having an ethylenically unsaturated double bond is preferably used.

Furthermore, the rod-like compound in this step is a liquid crystalline material exhibiting liquid crystallinity, and those having the polymerizable functional group at the terminal are particularly preferable. By using such a rod-like compound, for example, it can be polymerized three-dimensionally into a network (network) structure, so that it has column stability and excellent optical characteristics. This is because the above can be formed.
In this step, even when a liquid crystalline material having a polymerizable functional group at one end is used, the alignment can be stabilized by crosslinking with other molecules.

  Specific examples of the rod-like compound used in this step include compounds represented by the following formulas (1) to (17).

  In addition, in this process, only 1 type may be used for the said rod-shaped compound, or 2 or more types may be mixed and used for it. For example, when the rod-shaped compound is used by mixing a liquid crystalline material having one or more polymerizable functional groups at both ends and a liquid crystalline material having one or more polymerizable functional groups at one end, The polymerization density (crosslinking density) and the optical properties are preferably adjusted by adjusting the ratio. Further, from the viewpoint of ensuring reliability, a liquid crystalline material having one or more polymerizable functional groups at both ends is preferable, but from the viewpoint of liquid crystal alignment, it is preferable that there is one polymerizable functional group at both ends. .

  The content of the rod-shaped compound used in this step in the coating solution for forming the retardation layer is set to a desired value for the viscosity of the coating solution for forming the retardation layer depending on the coating method applied on the alignment layer. There is no particular limitation as long as it is possible. Especially in this process, it is preferable that it exists in the range of 5 mass%-40 mass% in the said coating liquid for phase difference layer formation, and it exists in the range of 10 mass%-30 mass% especially. Is preferred.

The retardation layer forming coating solution used in this step contains at least the rod-like compound, but usually contains a solvent. Moreover, you may contain another compound as needed.
Such a solvent is not particularly limited as long as it can uniformly dissolve or disperse the rod-like compound, but specifically, it should be the same as the solvent used for the coating liquid for forming the alignment layer. Can do.
The other compound is not particularly limited as long as it does not impair the arrangement order of the rod-like compound in the retardation layer formed by this step. As said other compound used for this process, a polymerization initiator, a polymerization inhibitor, a plasticizer, surfactant, a silane coupling agent etc. can be mentioned, for example.
In this step, when the polymerizable liquid crystal material is used as the rod-shaped compound, it is preferable to use a polymerization initiator or a polymerization inhibitor as the other compound.

  Examples of the polymerization initiator include benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamine) benzophenone, α-amino acetophenone, 4,4-dichloro. Benzophenone, 4-benzoyl-4-methyldiphenyl ketone, dibenzyl ketone, fluorenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, p- tert-Butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyldimethyl ketal, benzylmethoxyethyl acetal, benzo Methyl ether, benzoin butyl ether, anthraquinone, 2-tert-butylanthraquinone, 2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzsuberone, methyleneanthrone, 4-azidobenzylacetophenone, 2,6-bis (p- Azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadion-2- (o-methoxycarbonyl) oxime, 1-phenyl-propanedione-2 -(O-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, 1-phenyl-3-ethoxy-propanetrione-2- (o-benzoyl) oxy , Michler's ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, naphthalene Sulfonyl chloride, quinoline sulfonyl chloride, n-phenylthioacridone, 4,4-azobisisobutyronitrile, diphenyl disulfide, benzthiazole disulfide, triphenylphosphine, camphorquinone, Adeka N1717, carbon tetrabromide, tri Examples include combinations of photoreducing dyes such as bromophenyl sulfone, benzoin peroxide, eosin, and methylene blue with reducing agents such as ascorbic acid and triethanolamine. In this step, these photopolymerization initiators can be used alone or in combination of two or more.

  Furthermore, when using the said photoinitiator, a photoinitiator adjuvant can be used together. Examples of such photopolymerization initiation assistants include tertiary amines such as triethanolamine and methyldiethanolamine, and benzoic acid derivatives such as ethyl 2-dimethylaminoethylbenzoate and ethyl 4-dimethylamidebenzoate. Yes, but not limited to these.

  Examples of the polymerization inhibitor include diphenylpicrylhydrazide, tri-p-nitrophenylmethyl, p-benzoquinone, p-tert-butylcatechol, picric acid, copper chloride, methylhydroquinone, methoquinone, tert-butylhydroquinone and the like. Although a polymerization inhibitor for the reaction can be used, a hydroquinone polymerization inhibitor is preferred from the viewpoint of storage stability, and methyl hydroquinone is particularly preferred.

  In addition, other compounds as shown below can be added to the retardation layer forming coating solution in this step. Other compounds that can be added include, for example, a polyester (meth) acrylate obtained by reacting a (meth) acrylic acid with a polyester prepolymer obtained by condensing a polyhydric alcohol with a monobasic acid or polybasic acid; a polyol Polyurethane (meth) acrylate obtained by reacting a group and a compound having two isocyanate groups with each other and then reacting the reaction product with (meth) acrylic acid; bisphenol A type epoxy resin, bisphenol F type epoxy resin , Epoxy resins such as novolac type epoxy resin, polycarboxylic acid polyglycidyl ester, polyol polyglycidyl ether, aliphatic or cycloaliphatic epoxy resin, amino group epoxy resin, triphenolmethane type epoxy resin, dihydroxybenzene type epoxy resin, (Meta) Photopolymerizable compound in epoxy (meth) acrylate obtained by reacting an acrylic acid; photopolymerizable liquid crystal compound having an acryl group or methacryl group and the like.

  The coating method for the retardation layer forming coating liquid in this step is not particularly limited as long as it can stably form a coating film made of the retardation layer forming coating liquid on the alignment layer. . In this step, the method of applying the coating liquid for forming the retardation layer onto the alignment layer can be the same as that of a general alignment layer forming layer, for example, the same as the above alignment layer forming layer. can do.

The retardation layer formed by this step expresses the retardation by containing the rod-shaped compound. The degree of the retardation is the type of the rod-shaped compound and the thickness of the retardation layer. It is determined depending on
Therefore, the thickness of the retardation layer formed in this step is not particularly limited as long as it is within a range where a predetermined retardation can be achieved, and the pattern position produced by the production method of the present invention is not limited. It is appropriately determined according to the use of the retardation film.
In this step, it is preferable to apply the retardation layer so that the thickness of the retardation layer is within a range corresponding to the in-plane retardation of the retardation layer corresponding to λ / 4 minutes. Thereby, in the pattern phase difference film manufactured by the manufacturing method of this invention, the linearly polarized light which passes the said 1st phase difference area | region and the said 2nd phase difference area | region can be made into the circularly polarized light which has a mutually orthogonal relationship, respectively. This is because a 3D image can be displayed with higher accuracy.

  In this step, when the thickness of the retardation layer is set to a distance within a range in which the in-plane retardation of the retardation layer corresponds to λ / 4 minutes, the specific distance depends on the rod-shaped compound. It is determined as appropriate depending on the type of the above. However, the distance is usually in the range of 0.5 μm to 2 μm as long as it is a rod-shaped compound generally used in this step, but is not limited thereto.

3. Alignment Step The alignment step in the present invention is a method in which the rod-shaped compound contained in the coating film of the retardation layer forming coating liquid is moved along different alignment directions of the first alignment region and the second alignment region included in the alignment layer. That is, it is a step of arranging the rod-like compounds along the alignment regulating force of the second alignment region in which the rod-like compound can be arranged in a direction different from the first alignment region and the first alignment region.
The method for aligning the rod-shaped compounds in this step is not particularly limited as long as the rod-shaped compounds can be aligned in a desired direction, and a general method can be used. In such a case, a method of heating the coating film to a temperature higher than the liquid crystal phase forming temperature of the rod-like compound is used.

The retardation layer formed in this step is formed by forming the alignment layer having the characteristics as described above in the exposure step, so that the first retardation region and the second retardation region become the first alignment region. And it is formed in the same pattern as the pattern in which the second alignment region is formed.
In addition, the pattern which consists of a 1st phase difference area | region and a 2nd phase difference area | region is formed in the phase difference layer formed in this process, for example, putting a sample in polarizing plate cross Nicol, It can be evaluated by confirming that the bright line and the dark line are reversed when rotated. At this time, when the pattern composed of the first phase difference region and the second phase difference region is fine, the pattern may be observed with a polarizing microscope. Further, the direction (angle) of the slow axis in each pattern may be measured by AxoScan described later.

  Specifically, the in-plane retardation value of the retardation layer formed by this step is preferably in the range of 100 nm to 160 nm, more preferably in the range of 110 nm to 150 nm, and 120 nm to More preferably, it is in the range of 140 nm. In the retardation layer formed by this step, the in-plane retardation values indicated by the first retardation region and the second retardation region are substantially the same except that the direction of the slow axis is different.

Here, the in-plane retardation value is an index indicating the degree of birefringence in the in-plane direction of the refractive index anisotropic body, and the refractive index in the slow axis direction having the largest refractive index in the in-plane direction is represented by Nx. When the refractive index in the fast axis direction orthogonal to the slow axis direction is Ny and the thickness in the direction perpendicular to the in-plane direction of the refractive index anisotropic body is d,
Re [nm] = (Nx−Ny) × d [nm]
It is a value represented by. The in-plane retardation value (Re value) can be measured by, for example, KOBRA-WR manufactured by Oji Scientific Instruments Co., Ltd. by the parallel Nicol rotation method, and the in-plane retardation value of a minute region is AXOMETRICS (USA). Measurements can also be made using a Mueller matrix with an AxoScan made by the manufacturer. In the present specification, unless otherwise stated, the Re value means a value at a wavelength of 589 nm.

4). Drying process The drying process in this invention is a process of drying the said coating film and forming a phase difference layer.

As a method for drying the coating film in the drying step, a commonly used drying method such as a heat drying method, a reduced pressure drying method, a gap drying method, or the like can be used. Further, the drying method in this step is not limited to a single method, and a plurality of drying methods may be employed, for example, by changing the drying method sequentially according to the amount of remaining solvent.
Furthermore, as a method for drying the coating film, a method of applying a drying air adjusted to a certain temperature to the coating film can be used. When using such a drying method, the method is applied to the coating film. The wind speed of the drying air is preferably 3 m / second or less, and particularly preferably 0.5 m / second or less.

Moreover, as temperature conditions, it is preferable to be in the range of 40 ° C to 150 ° C, and in particular, it is preferable to be in the range of 50 ° C to 120 ° C, and particularly in the range of 55 ° C to 105 ° C. Is preferred.
In addition, the humidity condition is preferably controlled within a temperature range of 23 ± 3 ° C. and a range of 50 ± 10% RH in a state before being heated to be sprayed on the film.
The drying time is preferably in the range of 0.2 to 30 minutes, more preferably in the range of 0.5 to 20 minutes, and particularly in the range of 1 to 10 minutes. It is preferable that This is because the solvent can be stably removed under the above-described temperature and time conditions.

  The execution timing of this step may be performed after the alignment step or may be performed simultaneously with the alignment step.

  The retardation layer formed by this step contains the rod-shaped compound, and the first position in which the rod-shaped compound is arranged along the alignment regulating force of the first alignment region and the second alignment region of the alignment layer. It has a phase difference region and a second phase difference region.

In this step, when a polymerizable liquid crystal material is used as the rod-shaped compound, a curing treatment for polymerizing and curing the polymerizable liquid crystal material may be included. In addition, what is necessary is just to determine arbitrarily as a method to superpose | polymerize the said polymeric liquid crystal material according to the kind of polymeric functional group which the said polymeric liquid crystal material has. In particular, in this step, a method of curing by irradiation with actinic radiation is preferable. The actinic radiation is not particularly limited as long as it is a radiation capable of polymerizing the polymerizable liquid crystal material, but it is usually preferable to use ultraviolet light or visible light from the viewpoint of the ease of the apparatus. Specifically, it can be the same as the ultraviolet ray described in the section “(3) Exposure process” of “1. Exposure process”. By undergoing such a curing treatment, they can be polymerized with each other to form a network structure, so that the above-mentioned having row stability and excellent optical properties can be formed. Because you can.
In addition, as the timing which implements the said hardening process, if it is after the said orientation process, it will not specifically limit, It can carry out after the said orientation process or a drying process.

5. Protection Step The protection step in the present invention is a step of covering the retardation layer with a protective film when the transparent film substrate after the drying step is in a stable contracted state.

  In this step, it is sufficient to cover at least the retardation layer, but if necessary, the surface on the opposite side of the surface on which the retardation layer of the transparent film substrate is formed is also covered with a protective film. May be.

The protective film used in this step is not particularly limited as long as it can prevent moisture absorption by the transparent film substrate on which the retardation layer and the retardation layer are formed, and the retardation film. Those commonly used in the production of can be used.
Specifically, polyvinyl halide resin, ethylene vinyl copolymer, vinyl acetate resin, resin containing cellulose derivative, cycloolefin resin, acrylic resin, polyamide resin, polyimide resin, polyolefin resin, polyvinyl alcohol resin, ethylene vinyl Examples include acetate resin, poly (ethylene terephthalate) resin, polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polycarbonate resin, and polystyrene resin. It can be preferably used. This is because moisture absorption of the retardation layer and the transparent film substrate on which the retardation layer is formed can be stably protected.

  The method for covering the retardation layer in this step with a protective film is not particularly limited as long as it is a method for covering the retardation layer and the transparent film substrate on which the retardation layer is formed so as to be stably protected from moisture absorption. Although not intended, a method of laminating a protective film on the retardation layer directly or via an adhesive layer, or a method of covering the entire patterned retardation film that includes the retardation layer and is wound up in a roll shape Etc.

In this step, when the transparent film substrate is in a stable contraction state, as a method of covering the retardation layer with a protective film, the time (stabilization time) required from immediately after the drying step to the stable contraction state is measured in advance. Can be used.
Such stabilization time varies depending on the conditions of each step, the environment in which this step is performed, the configuration of the pattern retardation film, and the like. In this step, 0.1 minute to 24 immediately after the drying step. It is preferably within the range of time, more preferably within the range of 0.5 minutes to 2 hours, and particularly preferably within the range of 1 minute to 12 minutes. This is because the above-described stable contraction state can be stably reached and the process can be easily passed.

6). Method for Producing Pattern Retardation Film The method for producing a pattern phase difference film of the present invention includes at least the exposure step, the coating step, the orientation step, the drying step, and the protection step. In order to prepare a film for forming a long alignment film, a coating liquid for alignment layer formation is applied by applying an application liquid for alignment layer formation on a transparent film substrate as illustrated in FIG. Step (FIG. 12 (a)), coating layer 2 ″ is dried, and an orientation layer forming layer drying step for forming an orientation layer forming layer (FIG. 12 (b)) and orientation layer formation of a transparent film substrate A barrier layer forming step (FIGS. 12C to 12D) for forming a barrier layer including an antireflection layer and / or an antiglare layer 5 on the surface opposite to the surface on which the working layer 2 ′ is formed, or orientation After the process, cut the long pattern retardation film It may have a cutting step to obtain a patterned retardation film which is formed on the sheet.
The timing of performing the alignment layer forming coating solution coating step and the alignment layer forming layer drying step is not particularly limited as long as it is performed before the exposure step. Further, the timing of performing the barrier layer forming step is not particularly limited as long as the barrier layer can be stably formed, and may be the same timing as the protective step. It is preferably before the alignment layer coating step. This is because the transparent film substrate can be excellent in dimensional stability. The barrier layer forming step may be performed only once. For example, an antireflection layer and / or an antiglare layer is formed as a barrier layer before the exposure step, and after the drying step, It may be performed a plurality of times, such as separately forming another barrier layer on the antireflection layer and / or antiglare layer.
In addition, about the code | symbol in FIG. 12, since it shows the member same as FIG. 1, description here is abbreviate | omitted.

In the present invention, each of these steps is performed independently, that is, a film containing a long transparent film substrate is unwound in a roll shape for each step, and a predetermined treatment is performed. Although it may wind up after performing, it is preferable that all the processes are performed continuously, that is, it is performed by roll-to-roll from a raw material.
Specifically, when the pattern retardation film produced by the above-described method for producing a pattern retardation film is long, the pattern retardation film that is the final product is formed from the film for forming a long alignment film. It is preferable to manufacture with a roll toe roll, without winding up in the shape of a roll on the way.

7). Pattern retardation film The pattern retardation film produced by the production method of the present invention has a transparent film substrate, an alignment layer, and a retardation layer, and the alignment layer has a rod-like compound having refractive index anisotropy. Including a first alignment region in which the alignment is arranged in a certain direction and a second alignment region in which the rod-shaped compound is arranged in a direction different from the first alignment region. It has a first retardation region and a second retardation region in which rod-like compounds are arranged along the orientation regulating force of the first orientation region and the second orientation region.
As a use of the pattern retardation film manufactured by the present invention, it can be used for a display device for three-dimensional display, and in particular, for a display device for three-dimensional display that is required to be manufactured easily and in large quantities. Preferably used.

B. Mask Next, the mask of the present invention will be described.
The mask of the present invention is used for pattern irradiation in the method for producing a patterned retardation film described above, and is characterized in that the transparent film substrate is enlarged and corrected so as to have a target pattern in a stable contraction state. To do.

  Specific examples of the mask of the present invention include those already shown in FIG.

  According to the present invention, a pattern retardation film having excellent pattern accuracy can be easily formed by enlarging and correcting the transparent film substrate so as to be a target pattern in a stable contraction state. .

  In addition, since the mask of this invention can be made to be the same as that of the content as described in the above-mentioned item of "A. Pattern retardation film manufacturing method", description here is abbreviate | omitted.

  In addition, as a method for determining whether or not the mask of the present invention is enlarged and corrected so that the transparent film substrate has a target pattern when the transparent film substrate is in a stable contracted state, For comparison, a method for confirming whether the size of the mask pattern is large can be mentioned.

C. Next, the pattern retardation film of the present invention will be described.
The pattern retardation film of the present invention is produced by the above-described method for producing a pattern retardation film, and the transparent film substrate is in a stable contraction state.

  Specifically, the pattern retardation film of the present invention can be as shown in FIG. 2 already described.

  According to this invention, when the said transparent film base material is a stable contraction state, it can be set as the thing excellent in dimensional stability. For this reason, the assembly of the three-dimensional display device can be facilitated.

  The patterned retardation film of the present invention is produced by the above-described method for producing a patterned retardation film, and includes at least a transparent film substrate, an alignment layer, and a retardation layer. Since each of such configurations can be the same as the content described in the section “A. Pattern retardation film manufacturing method”, description thereof is omitted here.

Further, as to whether or not the transparent film substrate is in a stably contracted state, all components other than the transparent film substrate such as a protective film, an alignment layer, and a retardation layer are peeled from the pattern retardation film of the present invention. When the transparent film substrate is taken out and brought into a saturated expansion state, it can be confirmed by whether or not there is elongation in the width direction of the transparent film substrate.
More specifically, it can be confirmed by measuring the expansion coefficient described in the above section “A. Method for producing pattern retardation film”.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples.

[Comparative example]
AG (anti-glare) film (Dai Nippon Printing Co., Ltd.) having a haze value of 10-15, in which transparent fine particles are dispersed in a transparent resin on a TAC (cellulose triacetate) film (Fujitac Co., Ltd.) having a thickness of 80 μm. ) Was prepared as a roll-shaped original fabric having a width of 1 m and a length of 2000 m. A coating liquid for forming an alignment layer containing a photodimerization reaction type photo-alignment material (trade name: ROP-103, manufactured by Lorick Co., Ltd.) as the photo-alignment material is applied and dried on the side opposite to the AG surface, and the thickness is 0. A 1 μm alignment layer forming layer was formed. Further, using the apparatus shown in FIG. 3, while the film is continuously supplied from the original fabric, polarized ultraviolet rays (polarization axis is 45 degrees with respect to the film conveyance direction) passing through the wire grid are conveyed in the original fabric. Irradiation was performed through a synthetic quartz chrome mask in which 781 aperture patterns with a width of 500 μm extending in a direction parallel to the direction were formed with line and space = 1: 1. In this case, the distance between the opening center at one end of the stripe pattern on the mask and the opening center at the other end, that is, the total pitch is 780 mm. Next, polarized ultraviolet rays (with a polarization axis of −45 degrees with respect to the film transport direction) were irradiated through a wire grid without passing through a mask to obtain a long patterned alignment film having an alignment layer.

  On the alignment layer of the patterned long pattern alignment film, a liquid crystal dissolved in a solvent (licrive (registered trademark) RMS03-013C (trade name) manufactured by Merck Co., Ltd.) is applied, dried (liquid crystal alignment), and close to room temperature. The film was cooled and cured with ultraviolet rays to form a long pattern retardation film having a retardation layer thickness of 1 μm. The protective film was not affixed.

  The obtained long pattern retardation film was unwound and cut into a sheet, and the total pitch of the pattern on the film was measured as follows.

  A linear polarizing plate is laid on the surface of a glass stage of a precision three-dimensional coordinate measuring machine AMIC-1300 manufactured by SOKIA in an environment of 23 ± 1.5 ° C. and 50 ± 10% RH, and a pattern retardation film is placed thereon. Further, a transparent glass plate having a thickness of 2.8 mm was laminated thereon so that wrinkles and sagging would not occur in the pattern retardation film. A circularly polarizing plate was attached to the surface of the objective lens of the camera. Thus, by observing with transmitted illumination, it was confirmed that a bright and dark stripe pattern corresponding to the mask was formed on the pattern retardation film on the monitor. Subsequently, when the original roll before cutting into a sheet was cut out at random from five sheets at various positions, and the total pitch of the pattern was measured, 77.98655 mm, 77.9127 mm, 779.9990 mm, 779. 6146 mm and 780.0143 mm.

[Example]
Similar to the comparative example, except that the retardation layer was cured with ultraviolet rays, and then a protective film (polyethylene terephthalate film, thickness 60 μm) having a width of 1 m was continuously laminated so as to be laminated on the surface of the retardation layer and wound into a roll. Thus, a pattern retardation film was formed. Since the film was continuously transported at a constant speed, the time that elapses until the polyethylene terephthalate film is laminated after the pattern retardation film leaves the liquid crystal layer drying step was 7.5 minutes. Thereafter, the sheet was cut into a sheet shape in the same manner as in the comparative example, and 5 sheets were randomly extracted from various positions on the original roll, and the total pitch of the pattern was measured. The results were 7795782 mm and 779.6037 mm. , 779.6114 mm, 7795383 mm, 7795917 mm.
From the examples and comparative examples, it was confirmed that the comparative examples were swollen by moisture absorption after the drying step by not using a protective film. In addition, it was confirmed that there was little variation in width in the examples.

DESCRIPTION OF SYMBOLS 1 ... Transparent film base material 2 '... Orientation layer formation layer 2 ... Orientation layer 2a ... 1st orientation region 2b ... 2nd orientation region 3 ... Long orientation film formation film 4 ... Phase difference layer 4a ... 1st phase difference Area 4b Second retardation area 5 Antireflection layer or antiglare layer 10 Pattern retardation film

Claims (6)

While continuously transporting a transparent film substrate and a film for forming a long alignment film formed on the transparent film substrate and having an alignment layer forming layer containing a photo-alignment material, on the alignment layer forming layer A first alignment region in which rod-shaped compounds having refractive index anisotropy are arranged in a certain direction by the first exposure processing and the second exposure processing to irradiate polarized ultraviolet rays, and the rod-shaped compound in a direction different from the first alignment region. An exposure step of forming an alignment layer including a second alignment region to be arranged in
On the alignment layer, an application step of applying a retardation layer forming coating solution containing the rod-shaped compound;
An alignment step of arranging rod-shaped compounds contained in the coating film of the retardation layer forming coating liquid along different orientation directions of the first orientation region and the second orientation region contained in the orientation layer;
Drying the coating film to form a retardation layer; and
In the stable shrinkage state in which the transparent film substrate after the drying step shrinks more than in the exposure step, a protection step of covering the retardation layer with a protective film;
A method for producing a patterned retardation film having
The polarized ultraviolet rays irradiated in the first exposure process and the second exposure process have different polarization directions, and at least one of the first exposure process and the second exposure process is for forming the alignment layer. The layer is irradiated with a pattern of the polarized ultraviolet light through a mask,
The method for producing a pattern retardation film, wherein the mask used for the pattern irradiation is enlarged and corrected so that the transparent film substrate has a target pattern when the transparent film substrate is in a stable contraction state.   The width of the transparent film substrate included in the pattern retardation film after the drying step is Ht, and the width of the transparent film substrate included in the pattern retardation film after the drying step is H0. When the width in the saturated expansion state of the transparent film substrate included in the pattern retardation film after the drying step is H1, (Ht−H0) / (H1−H0) × 100 The method for producing a patterned retardation film according to claim 1, wherein an expansion coefficient is in a range of 0.05% to 90%.   The method for producing a patterned retardation film according to claim 2, wherein the expansion coefficient is in a range of 0.5% to 50%. The first exposure process is a whole surface irradiation, and the second exposure process is a pattern irradiation, or the first exposure process is a pattern irradiation, and the second exposure process is a whole surface irradiation. The method for producing a patterned retardation film according to any one of claims 1 to 3, wherein the pattern retardation film is characterized by the following.   The liquid crystalline material having one or more polymerizable functional groups at both ends and a liquid crystalline material having one or more polymerizable functional groups at one end are mixed and used as the rod-shaped compound. The manufacturing method of the pattern phase difference film as described in any one of Claims 1-5.   The said protection process also covers the surface on the opposite side to the surface in which the said phase difference layer of the said transparent film base material was formed with the said protective film, The any one of Claim 1-5 characterized by the above-mentioned. The manufacturing method of the pattern retardation film of Claim.