JP2012108126A5 - - Google Patents

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Publication number
JP2012108126A5
JP2012108126A5 JP2011244597A JP2011244597A JP2012108126A5 JP 2012108126 A5 JP2012108126 A5 JP 2012108126A5 JP 2011244597 A JP2011244597 A JP 2011244597A JP 2011244597 A JP2011244597 A JP 2011244597A JP 2012108126 A5 JP2012108126 A5 JP 2012108126A5
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JP
Japan
Prior art keywords
diffractometer
sample
sample stage
crystal
ray beam
Prior art date
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Application number
JP2011244597A
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English (en)
Japanese (ja)
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JP2012108126A (ja
JP6009156B2 (ja
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Priority claimed from US12/949,539 external-priority patent/US8488740B2/en
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Publication of JP2012108126A publication Critical patent/JP2012108126A/ja
Publication of JP2012108126A5 publication Critical patent/JP2012108126A5/ja
Application granted granted Critical
Publication of JP6009156B2 publication Critical patent/JP6009156B2/ja
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JP2011244597A 2010-11-18 2011-11-08 回折装置 Active JP6009156B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/949,539 US8488740B2 (en) 2010-11-18 2010-11-18 Diffractometer
US12/949,539 2010-11-18

Publications (3)

Publication Number Publication Date
JP2012108126A JP2012108126A (ja) 2012-06-07
JP2012108126A5 true JP2012108126A5 (enExample) 2014-12-11
JP6009156B2 JP6009156B2 (ja) 2016-10-19

Family

ID=44925381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011244597A Active JP6009156B2 (ja) 2010-11-18 2011-11-08 回折装置

Country Status (4)

Country Link
US (1) US8488740B2 (enExample)
EP (1) EP2455747B1 (enExample)
JP (1) JP6009156B2 (enExample)
CN (1) CN102565108B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105758880B (zh) * 2016-04-11 2019-02-05 西北核技术研究所 基于闪光x光机的超快x射线衍射成像方法及系统
EP3469352B1 (en) 2017-12-15 2020-02-05 Tankbots, Inc. Methods for performing tasks in a tank containing hazardous substances
US11614414B2 (en) * 2018-10-19 2023-03-28 Commonwealth Scientific And Industrial Research Organisation Energy-dispersive X-ray diffraction analyser comprising a substantially X-ray transparent member having an improved reflection geometry
CN109374660B (zh) * 2018-11-22 2024-09-06 北京科技大学 用于排笔光束的高通量粉末衍射的装置
MX2021004777A (es) 2019-02-20 2021-06-08 Tankbots Inc Metodos para realizar tareas inherentemente de manera segura en un tanque que contiene sustancias peligrosas.
US12436115B2 (en) 2022-02-25 2025-10-07 Proto Patents Ltd. Transmission X-ray diffraction apparatus and related method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE322066B (enExample) * 1968-01-25 1970-03-23 Incentive Res & Dev Ab
JPS58165045A (ja) * 1982-03-26 1983-09-30 Hitachi Ltd 結晶方位迅速測定装置
JPH02107952A (ja) 1988-10-15 1990-04-19 Sumitomo Metal Ind Ltd 粉末のx線回析測定方法
US4928294A (en) 1989-03-24 1990-05-22 U.S. Government As Represented By The Director, National Security Agency Method and apparatus for line-modified asymmetric crystal topography
EP0553911A1 (en) * 1992-01-27 1993-08-04 Koninklijke Philips Electronics N.V. Position-sensitive X-ray analysis
JPH06194498A (ja) * 1992-08-31 1994-07-15 Hitachi Ltd マイクロx線回折装置
US5923720A (en) 1997-06-17 1999-07-13 Molecular Metrology, Inc. Angle dispersive x-ray spectrometer
DE29716107U1 (de) 1997-09-08 1997-10-30 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 80539 München Strahlführungssystem für Neutronen zur Grenzflächenuntersuchung
JP3734366B2 (ja) * 1998-03-20 2006-01-11 株式会社リガク X線分析装置
JP2002530671A (ja) * 1998-11-25 2002-09-17 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放物状のx線ミラーと水晶モノクロメータを含むx線分析装置
US7430277B2 (en) * 2002-06-19 2008-09-30 Xeoncs Optical device for X-ray applications
JP4178399B2 (ja) * 2003-09-25 2008-11-12 株式会社島津製作所 X線ct装置
JP4498089B2 (ja) * 2004-06-21 2010-07-07 株式会社リコー 静電荷現像用トナー評価方法及び静電荷現像用トナー
EP1720006A1 (en) * 2005-05-02 2006-11-08 F. Hoffmann-La Roche Ag Method and apparatus for x-ray diffraction analysis
JP4685877B2 (ja) 2005-11-02 2011-05-18 株式会社リガク 微結晶粒の方位分布測定方法及びその装置
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角x線散乱測定装置
JP2009109447A (ja) * 2007-11-01 2009-05-21 Rigaku Corp X線検査装置およびx線検査方法
US8080791B2 (en) * 2008-12-12 2011-12-20 Fei Company X-ray detector for electron microscope
JP4971383B2 (ja) * 2009-03-25 2012-07-11 株式会社リガク X線回折方法及びx線回折装置

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