JP2012099568A5 - - Google Patents

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Publication number
JP2012099568A5
JP2012099568A5 JP2010244366A JP2010244366A JP2012099568A5 JP 2012099568 A5 JP2012099568 A5 JP 2012099568A5 JP 2010244366 A JP2010244366 A JP 2010244366A JP 2010244366 A JP2010244366 A JP 2010244366A JP 2012099568 A5 JP2012099568 A5 JP 2012099568A5
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JP
Japan
Prior art keywords
substrate
projection system
width
drawing apparatus
predetermined direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2010244366A
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English (en)
Japanese (ja)
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JP5709465B2 (ja
JP2012099568A (ja
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Priority to JP2010244366A priority Critical patent/JP5709465B2/ja
Priority claimed from JP2010244366A external-priority patent/JP5709465B2/ja
Priority to US13/281,797 priority patent/US20120107748A1/en
Publication of JP2012099568A publication Critical patent/JP2012099568A/ja
Publication of JP2012099568A5 publication Critical patent/JP2012099568A5/ja
Application granted granted Critical
Publication of JP5709465B2 publication Critical patent/JP5709465B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010244366A 2010-10-29 2010-10-29 描画装置、および、物品の製造方法 Expired - Fee Related JP5709465B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010244366A JP5709465B2 (ja) 2010-10-29 2010-10-29 描画装置、および、物品の製造方法
US13/281,797 US20120107748A1 (en) 2010-10-29 2011-10-26 Drawing apparatus and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010244366A JP5709465B2 (ja) 2010-10-29 2010-10-29 描画装置、および、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2012099568A JP2012099568A (ja) 2012-05-24
JP2012099568A5 true JP2012099568A5 (https=) 2013-12-12
JP5709465B2 JP5709465B2 (ja) 2015-04-30

Family

ID=45997143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010244366A Expired - Fee Related JP5709465B2 (ja) 2010-10-29 2010-10-29 描画装置、および、物品の製造方法

Country Status (2)

Country Link
US (1) US20120107748A1 (https=)
JP (1) JP5709465B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013069813A (ja) * 2011-09-21 2013-04-18 Canon Inc 描画装置、および、物品の製造方法
JP6195349B2 (ja) * 2013-04-26 2017-09-13 キヤノン株式会社 描画装置、描画方法、および物品の製造方法
DE102019005362A1 (de) * 2019-07-31 2021-02-04 Carl Zeiss Multisem Gmbh Verfahren zum Betreiben eines Vielzahl-Teilchenstrahlsystems unter Veränderung der numerischen Apertur, zugehöriges Computerprogrammprodukt und Vielzahl-Teilchenstrahlsystem
US20250349508A1 (en) * 2024-05-10 2025-11-13 Ims Nanofabrication Gmbh Apparatus and Method for Writing a Moveable Target in a Multi-Column Exposure Apparatus

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH038321A (ja) * 1989-06-06 1991-01-16 Mitsubishi Electric Corp 微細幅パターンの描画方法
KR950002578B1 (ko) * 1991-03-13 1995-03-23 후지쓰 가부시끼가이샤 전자빔 노광방법
JP3518097B2 (ja) * 1995-09-29 2004-04-12 株式会社ニコン 荷電粒子線転写装置，パターン分割方法，マスクおよび荷電粒子線転写方法
JP3647128B2 (ja) * 1996-03-04 2005-05-11 キヤノン株式会社 電子ビーム露光装置とその露光方法
JP3457474B2 (ja) * 1996-07-17 2003-10-20 株式会社東芝 荷電ビーム描画装置
US6175122B1 (en) * 1998-01-09 2001-01-16 International Business Machines Corporation Method for writing a pattern using multiple variable shaped electron beams
JPH11307445A (ja) * 1998-04-23 1999-11-05 Nikon Corp 荷電粒子線露光装置及びその投影マスク
US6768124B2 (en) * 1999-10-19 2004-07-27 Nikon Corporation Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same
AU2001255614A1 (en) * 2000-06-01 2001-12-11 Applied Materials, Inc. High throughput multipass printing with lithographic quality
WO2002040980A1 (en) * 2000-11-17 2002-05-23 Ebara Corporation Wafer inspecting method, wafer inspecting instrument, and electron beam apparatus
US7061581B1 (en) * 2004-11-22 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7126672B2 (en) * 2004-12-27 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468506B2 (en) * 2005-01-26 2008-12-23 Applied Materials, Israel, Ltd. Spot grid array scanning system
JP4378648B2 (ja) * 2006-10-06 2009-12-09 エルピーダメモリ株式会社 照射パターンデータ作成方法、マスク製造方法、及び描画システム
KR101757837B1 (ko) * 2009-05-20 2017-07-26 마퍼 리쏘그라피 아이피 비.브이. 듀얼 패스 스캐닝
JP6128744B2 (ja) * 2012-04-04 2017-05-17 キヤノン株式会社 描画装置、描画方法、および、物品の製造方法

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