JP2016522572A5 - - Google Patents

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JP2016522572A5
JP2016522572A5 JP2016511103A JP2016511103A JP2016522572A5 JP 2016522572 A5 JP2016522572 A5 JP 2016522572A5 JP 2016511103 A JP2016511103 A JP 2016511103A JP 2016511103 A JP2016511103 A JP 2016511103A JP 2016522572 A5 JP2016522572 A5 JP 2016522572A5
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JP2016522572A (ja
JP6377724B2 (ja
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Priority claimed from PCT/EP2014/059106 external-priority patent/WO2014177718A1/en
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JP2016511103A 2013-05-03 2014-05-05 ビームグリッドレイアウト Active JP6377724B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361818919P 2013-05-03 2013-05-03
US61/818,919 2013-05-03
PCT/EP2014/059106 WO2014177718A1 (en) 2013-05-03 2014-05-05 Beam grid layout

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JP2016522572A JP2016522572A (ja) 2016-07-28
JP2016522572A5 true JP2016522572A5 (https=) 2018-07-19
JP6377724B2 JP6377724B2 (ja) 2018-08-22

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JP2016511103A Active JP6377724B2 (ja) 2013-05-03 2014-05-05 ビームグリッドレイアウト

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US (2) US9934943B2 (https=)
EP (2) EP3020062B1 (https=)
JP (1) JP6377724B2 (https=)
NL (1) NL2010760C2 (https=)
WO (1) WO2014177718A1 (https=)

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WO2020030483A1 (en) 2018-08-09 2020-02-13 Asml Netherlands B.V. An apparatus for multiple charged-particle beams
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US11309163B2 (en) * 2019-11-07 2022-04-19 Applied Materials, Inc. Multibeamlet charged particle device and method
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US12525426B2 (en) 2020-05-01 2026-01-13 Asml Netherlands B.V. Enhanced architecture for high-performance detection device
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JP2022034866A (ja) * 2020-08-19 2022-03-04 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置及びその調整方法
EP3982392A1 (en) 2020-10-08 2022-04-13 ASML Netherlands B.V. Multi-beam charged particle column
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WO2022128392A1 (en) * 2020-12-14 2022-06-23 Asml Netherlands B.V. Charged particle system, method of processing a sample using a multi-beam of charged particles
KR20240096776A (ko) * 2021-11-09 2024-06-26 가부시키가이샤 포토 일렉트론 소울 전자총, 전자선 적용 장치 및 멀티 전자빔의 형성 방법
JP7080533B1 (ja) 2021-11-09 2022-06-06 株式会社Photo electron Soul 電子銃、電子線適用装置およびマルチ電子ビームの形成方法
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