JP2016522572A5 - - Google Patents

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JP2016522572A5
JP2016522572A5 JP2016511103A JP2016511103A JP2016522572A5 JP 2016522572 A5 JP2016522572 A5 JP 2016522572A5 JP 2016511103 A JP2016511103 A JP 2016511103A JP 2016511103 A JP2016511103 A JP 2016511103A JP 2016522572 A5 JP2016522572 A5 JP 2016522572A5
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apertures
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JP6377724B2 (ja
JP2016522572A (ja
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Priority claimed from PCT/EP2014/059106 external-priority patent/WO2014177718A1/en
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JP2016511103A 2013-05-03 2014-05-05 ビームグリッドレイアウト Active JP6377724B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361818919P 2013-05-03 2013-05-03
US61/818,919 2013-05-03
PCT/EP2014/059106 WO2014177718A1 (en) 2013-05-03 2014-05-05 Beam grid layout

Publications (3)

Publication Number Publication Date
JP2016522572A JP2016522572A (ja) 2016-07-28
JP2016522572A5 true JP2016522572A5 (https=) 2018-07-19
JP6377724B2 JP6377724B2 (ja) 2018-08-22

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JP2016511103A Active JP6377724B2 (ja) 2013-05-03 2014-05-05 ビームグリッドレイアウト

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US (2) USRE49952E1 (https=)
EP (2) EP3651183B1 (https=)
JP (1) JP6377724B2 (https=)
NL (1) NL2010760C2 (https=)
WO (1) WO2014177718A1 (https=)

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US11469076B2 (en) 2018-06-12 2022-10-11 Asml Netherlands B.V. System and method for scanning a sample using multi-beam inspection apparatus
US10593509B2 (en) 2018-07-17 2020-03-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
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JP7234052B2 (ja) 2019-06-28 2023-03-07 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム画像取得方法
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JP2022034866A (ja) * 2020-08-19 2022-03-04 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置及びその調整方法
CN116325069A (zh) 2020-09-03 2023-06-23 Asml荷兰有限公司 多束带电粒子柱
EP3982392A1 (en) 2020-10-08 2022-04-13 ASML Netherlands B.V. Multi-beam charged particle column
IL303577A (en) * 2020-12-14 2023-08-01 Asml Netherlands Bv Charged particle system, a sample processing method using multiple beams of charged particles
EP4432328A4 (en) * 2021-11-09 2025-11-05 Photo Electron Soul Inc Electron gun, electron beam application device and multi-electron beam formation method
JP7080533B1 (ja) 2021-11-09 2022-06-06 株式会社Photo electron Soul 電子銃、電子線適用装置およびマルチ電子ビームの形成方法
EP4202970A1 (en) * 2021-12-24 2023-06-28 ASML Netherlands B.V. Alignment determination method and computer program
WO2023202819A1 (en) 2022-04-18 2023-10-26 Asml Netherlands B.V. Charged particle optical device and method
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US20250349508A1 (en) * 2024-05-10 2025-11-13 Ims Nanofabrication Gmbh Apparatus and Method for Writing a Moveable Target in a Multi-Column Exposure Apparatus

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