AU2001255614A1 - High throughput multipass printing with lithographic quality - Google Patents

High throughput multipass printing with lithographic quality

Info

Publication number
AU2001255614A1
AU2001255614A1 AU2001255614A AU5561401A AU2001255614A1 AU 2001255614 A1 AU2001255614 A1 AU 2001255614A1 AU 2001255614 A AU2001255614 A AU 2001255614A AU 5561401 A AU5561401 A AU 5561401A AU 2001255614 A1 AU2001255614 A1 AU 2001255614A1
Authority
AU
Australia
Prior art keywords
high throughput
multipass printing
lithographic quality
lithographic
quality
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001255614A
Inventor
Jan M. Chabala
Sriram Krishnaswami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of AU2001255614A1 publication Critical patent/AU2001255614A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30488—Raster scan

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2001255614A 2000-06-01 2001-04-23 High throughput multipass printing with lithographic quality Abandoned AU2001255614A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US58566300A 2000-06-01 2000-06-01
US09/585,663 2000-06-01
PCT/US2001/013166 WO2001093303A2 (en) 2000-06-01 2001-04-23 High throughput multipass printing with lithographic quality

Publications (1)

Publication Number Publication Date
AU2001255614A1 true AU2001255614A1 (en) 2001-12-11

Family

ID=24342410

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001255614A Abandoned AU2001255614A1 (en) 2000-06-01 2001-04-23 High throughput multipass printing with lithographic quality

Country Status (2)

Country Link
AU (1) AU2001255614A1 (en)
WO (1) WO2001093303A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6645677B1 (en) 2000-09-18 2003-11-11 Micronic Laser Systems Ab Dual layer reticle blank and manufacturing process
DE10297208T5 (en) 2001-09-12 2005-01-05 Micronic Laser Systems Ab Improved method and apparatus using an SLM
US7302111B2 (en) 2001-09-12 2007-11-27 Micronic Laser Systems A.B. Graphics engine for high precision lithography
SE0104238D0 (en) 2001-12-14 2001-12-14 Micronic Laser Systems Ab Method and apparatus for patterning a workpiece
US7106490B2 (en) 2001-12-14 2006-09-12 Micronic Laser Systems Ab Methods and systems for improved boundary contrast
US7186486B2 (en) 2003-08-04 2007-03-06 Micronic Laser Systems Ab Method to pattern a substrate
JP2007522671A (en) 2004-02-25 2007-08-09 マイクロニック レーザー システムズ アクチボラゲット Method for exposing a pattern and emulating a mask in optical maskless lithography
KR101657053B1 (en) 2008-04-24 2016-09-13 마이크로닉 마이데이타 에이비 Spatial light modulator with structured mirror surfaces
US8539395B2 (en) 2010-03-05 2013-09-17 Micronic Laser Systems Ab Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
JP5709465B2 (en) * 2010-10-29 2015-04-30 キヤノン株式会社 Drawing apparatus and article manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5103101A (en) * 1991-03-04 1992-04-07 Etec Systems, Inc. Multiphase printing for E-beam lithography
US5393987A (en) * 1993-05-28 1995-02-28 Etec Systems, Inc. Dose modulation and pixel deflection for raster scan lithography
US5621216A (en) * 1996-04-26 1997-04-15 International Business Machines Corporation Hardware/software implementation for multipass E-beam mask writing

Also Published As

Publication number Publication date
WO2001093303A3 (en) 2003-10-30
WO2001093303A2 (en) 2001-12-06

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