JP2012043909A5 - - Google Patents

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Publication number
JP2012043909A5
JP2012043909A5 JP2010182564A JP2010182564A JP2012043909A5 JP 2012043909 A5 JP2012043909 A5 JP 2012043909A5 JP 2010182564 A JP2010182564 A JP 2010182564A JP 2010182564 A JP2010182564 A JP 2010182564A JP 2012043909 A5 JP2012043909 A5 JP 2012043909A5
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JP
Japan
Prior art keywords
substrate
electrode
side ridge
ridge electrode
pin
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JP2010182564A
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English (en)
Japanese (ja)
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JP5517827B2 (ja
JP2012043909A (ja
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Priority to JP2010182564A priority Critical patent/JP5517827B2/ja
Priority claimed from JP2010182564A external-priority patent/JP5517827B2/ja
Publication of JP2012043909A publication Critical patent/JP2012043909A/ja
Publication of JP2012043909A5 publication Critical patent/JP2012043909A5/ja
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Publication of JP5517827B2 publication Critical patent/JP5517827B2/ja
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JP2010182564A 2010-08-17 2010-08-17 真空処理装置およびプラズマ処理方法 Active JP5517827B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010182564A JP5517827B2 (ja) 2010-08-17 2010-08-17 真空処理装置およびプラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010182564A JP5517827B2 (ja) 2010-08-17 2010-08-17 真空処理装置およびプラズマ処理方法

Publications (3)

Publication Number Publication Date
JP2012043909A JP2012043909A (ja) 2012-03-01
JP2012043909A5 true JP2012043909A5 (https=) 2013-08-29
JP5517827B2 JP5517827B2 (ja) 2014-06-11

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ID=45899899

Family Applications (1)

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JP2010182564A Active JP5517827B2 (ja) 2010-08-17 2010-08-17 真空処理装置およびプラズマ処理方法

Country Status (1)

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JP (1) JP5517827B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102468140B1 (ko) * 2022-05-24 2022-11-18 (주)거성 교체가 용이한 증착장치용 일체화 실드

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02149339A (ja) * 1988-11-30 1990-06-07 Toshiba Corp マイクロ波プラズマ処理装置
DE3912569A1 (de) * 1989-04-17 1990-10-18 Siemens Ag Verfahren und vorrichtung zur erzeugung eines elektrischen hochfrequenzfeldes in einem nutzraum
JP4302010B2 (ja) * 2004-07-14 2009-07-22 三菱重工業株式会社 プラズマ処理装置及びプラズマ処理方法
JP5517509B2 (ja) * 2009-07-08 2014-06-11 三菱重工業株式会社 真空処理装置
JP5199962B2 (ja) * 2009-08-05 2013-05-15 三菱重工業株式会社 真空処理装置

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