JP5517827B2 - 真空処理装置およびプラズマ処理方法 - Google Patents
真空処理装置およびプラズマ処理方法 Download PDFInfo
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- JP5517827B2 JP5517827B2 JP2010182564A JP2010182564A JP5517827B2 JP 5517827 B2 JP5517827 B2 JP 5517827B2 JP 2010182564 A JP2010182564 A JP 2010182564A JP 2010182564 A JP2010182564 A JP 2010182564A JP 5517827 B2 JP5517827 B2 JP 5517827B2
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010182564A JP5517827B2 (ja) | 2010-08-17 | 2010-08-17 | 真空処理装置およびプラズマ処理方法 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010182564A JP5517827B2 (ja) | 2010-08-17 | 2010-08-17 | 真空処理装置およびプラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012043909A JP2012043909A (ja) | 2012-03-01 |
| JP2012043909A5 JP2012043909A5 (https=) | 2013-08-29 |
| JP5517827B2 true JP5517827B2 (ja) | 2014-06-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2010182564A Active JP5517827B2 (ja) | 2010-08-17 | 2010-08-17 | 真空処理装置およびプラズマ処理方法 |
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| JP (1) | JP5517827B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102468140B1 (ko) * | 2022-05-24 | 2022-11-18 | (주)거성 | 교체가 용이한 증착장치용 일체화 실드 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02149339A (ja) * | 1988-11-30 | 1990-06-07 | Toshiba Corp | マイクロ波プラズマ処理装置 |
| DE3912569A1 (de) * | 1989-04-17 | 1990-10-18 | Siemens Ag | Verfahren und vorrichtung zur erzeugung eines elektrischen hochfrequenzfeldes in einem nutzraum |
| JP4302010B2 (ja) * | 2004-07-14 | 2009-07-22 | 三菱重工業株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| JP5517509B2 (ja) * | 2009-07-08 | 2014-06-11 | 三菱重工業株式会社 | 真空処理装置 |
| JP5199962B2 (ja) * | 2009-08-05 | 2013-05-15 | 三菱重工業株式会社 | 真空処理装置 |
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| JP2012043909A (ja) | 2012-03-01 |
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