JP2011525168A - 溶融精製及び運搬システム - Google Patents
溶融精製及び運搬システム Download PDFInfo
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- 238000007670 refining Methods 0.000 title description 4
- 239000000155 melt Substances 0.000 claims abstract description 207
- 239000002245 particle Substances 0.000 claims abstract description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 38
- 229910052710 silicon Inorganic materials 0.000 claims description 38
- 239000010703 silicon Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 35
- 238000000746 purification Methods 0.000 claims description 30
- 238000001816 cooling Methods 0.000 claims description 26
- 239000012530 fluid Substances 0.000 claims description 14
- 238000004891 communication Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 8
- 238000013519 translation Methods 0.000 claims description 5
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 3
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 3
- 229910002601 GaN Inorganic materials 0.000 claims description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 230000006698 induction Effects 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
- 238000007711 solidification Methods 0.000 abstract description 11
- 230000008023 solidification Effects 0.000 abstract description 11
- 239000002893 slag Substances 0.000 abstract description 10
- 239000012141 concentrate Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 210000004027 cell Anatomy 0.000 description 17
- 239000007789 gas Substances 0.000 description 17
- 235000012431 wafers Nutrition 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
- 230000008014 freezing Effects 0.000 description 13
- 238000007710 freezing Methods 0.000 description 13
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 11
- 229910010271 silicon carbide Inorganic materials 0.000 description 11
- 235000012239 silicon dioxide Nutrition 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 238000005520 cutting process Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- 229910052582 BN Inorganic materials 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 238000005086 pumping Methods 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000007667 floating Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004781 supercooling Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910001567 cementite Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 210000001787 dendrite Anatomy 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- -1 hydrogen ions Chemical class 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910021422 solar-grade silicon Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
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- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- C30B28/00—Production of homogeneous polycrystalline material with defined structure
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Abstract
【選択図】図9
Description
γ=Cs/Cl<1
を有する全ての溶質によって作用することができる。ここで、γは析出係数であり、Csは固液界面での固体中の濃度であり、Clは液体中の濃度である。このように、これらの溶質は、固液界面において、液体よりも固体の方が可溶でない。多くの化合物、例えば、銀、アルミニウム、金、銅、カーボン、鉄、リチウム、マンガン、ニッケル、硫黄及びタンタルは、このようにして、溶融液10から除去されることができる。当業者にとって公知の他の溶質も、同様に、溶融液から除去されることができる。クーラー90及びヒーター91のパラメータは、少なくともいくらかの酸素及びホウ素を除去するように構成されることができる。例えば、複数のパス又は凝固及び溶融サイクルは、酸素又はホウ素の除去に必要となりうる。
Claims (17)
- チャンバ内の溶融液の第一の部分を第一の方向に凝固するステップと、
前記第一の方向の前記溶融液の前記第一の部分の一部を溶融し、前記溶融液の第二の部分は凝固されたままにするステップと、
前記チャンバから前記溶融液を流すステップと、
前記チャンバから前記第二の部分を除去するステップと、
を含む精製方法。 - 前記溶融液は、シリコン、シリコンゲルマニウム、ガリウム、窒化ガリウムからなる群から選択される、請求項1に記載の方法。
- 前記凝固するステップ中、前記溶融液内の溶質及び前記第二の部分を濃縮するステップをさらに含む請求項1に記載の方法。
- 前記除去するステップは、前記チャンバから前記第二の部分を落下するステップを含む請求項1に記載の方法。
- 前記除去するステップは、前記第二の部分を溶融するステップと、前記チャンバから前記第二の部分を流すステップとを含む請求項1に記載の方法。
- 溶融液を精製する装置であって、
キャビティ、注入口、放出口が画定しているチャンバと、
クーラーと、
ヒーターと、
前記チャンバに沿って、前記クーラー及び前記ヒーターを第一の方向に並進するように構成される並進機構と、
を含む溶融液を精製する装置。 - 前記ヒーターは、オームヒーター、誘導コイル、抵抗ヒーターのうちの少なくとも一つで構成される請求項6に記載の装置。
- 前記クーラー及び前記ヒーターの間に絶縁体をさらに含む請求項6の装置。
- シートを形成する装置であって、
溶融液を形成するように構成されるるつぼと、
前記るつぼと流体連結する第一のポンプと、
前記第一のポンプと流体連結する精製システムと、
前記精製システムと流体連結する第二のポンプと、
シートを形成するために前記溶融液を凝固するように構成されたシート形成装置とを含み、該シート形成装置は、前記第二のポンプと第一のパスに沿って流体連結しており、前記溶融液を保持するように構成されるチャネルを確定する容器と、前記溶融液上に配置される冷却板とを有する、
シートを形成する装置。 - 前記シート形成装置は、余水路を含み、前記溶融液及び前記シートは、前記チャネル内を該余水路へ向かい流れる請求項9に記載の装置。
- 前記精製システムは、
キャビティ、注入口、放出口を画定するチャンバと、
クーラーと、
ヒーターと、
前記チャンバに沿って、前記クーラー及び前記ヒーターを第一の方向に並進するように構成される並進機構と、
を含む請求項9に記載の装置。 - フィルタをさらに含む請求項9に記載の装置。
- 粒子トラップをさらに含む請求項9に記載の装置。
- 前記精製システムと流体連結する第三のポンプをさらに含み、前記シート形成装置が該第三のポンプと流体連結する請求項9に記載の装置。
- 前記シート形成装置と前記第二のポンプとの間に第二のパスをさらに含み、該第二のパスは前記溶融液が前記シート形成装置に循環をするように構成される請求項9に記載の装置。
- 前記シート形成装置は前記精製システムと流体連結する請求項9に記載の装置。
- 前記第一のポンプ及び前記第二のポンプは、
前記溶融液を保持するように構成されるキャビティを画定しているチャンバと、
前記チャンバと流体連結するガス供給源と、
前記チャンバと流体連結する第一のパイプと、
前記チャンバと流体連結する第二のパイプと、
前記第一のパイプと前記第二のパイプとの間に配置される第一のバルブと、
前記チャンバと前記第二のパイプとの間に配置される第二のバルブと、
を含む請求項9に記載の装置。
Applications Claiming Priority (5)
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US7424908P | 2008-06-20 | 2008-06-20 | |
US61/074,249 | 2008-06-20 | ||
US12/487,119 | 2009-06-18 | ||
US12/487,119 US9567691B2 (en) | 2008-06-20 | 2009-06-18 | Melt purification and delivery system |
PCT/US2009/047947 WO2009155512A2 (en) | 2008-06-20 | 2009-06-19 | Melt purification and delivery system |
Publications (3)
Publication Number | Publication Date |
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JP2011525168A true JP2011525168A (ja) | 2011-09-15 |
JP2011525168A5 JP2011525168A5 (ja) | 2012-08-02 |
JP5639053B2 JP5639053B2 (ja) | 2014-12-10 |
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Country Status (6)
Country | Link |
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US (1) | US9567691B2 (ja) |
JP (1) | JP5639053B2 (ja) |
KR (2) | KR101647076B1 (ja) |
CN (1) | CN102119242B (ja) |
TW (1) | TWI449816B (ja) |
WO (1) | WO2009155512A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016046983A1 (ja) * | 2014-09-26 | 2016-03-31 | 株式会社日立製作所 | 結晶成長方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5870263B2 (ja) * | 2012-04-20 | 2016-02-24 | パナソニックIpマネジメント株式会社 | シリコン単結晶育成用るつぼの製造方法 |
US10179958B2 (en) * | 2016-09-16 | 2019-01-15 | Varian Semiconductor Equipment Associates, Inc | Apparatus and method for crystalline sheet growth |
KR102214807B1 (ko) | 2018-10-24 | 2021-02-09 | 상명대학교 산학협력단 | 빅데이터 모델링을 활용한 어린이 안전 통학로 구축방법 |
CN115164594A (zh) * | 2022-05-16 | 2022-10-11 | 山东科朗特微波设备有限公司 | 智能化隧道式挥发设备 |
CN118615743A (zh) * | 2024-08-12 | 2024-09-10 | 崇义富百乐发展有限公司 | 一种冷冻浓缩装置 |
Family Cites Families (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3128912A (en) * | 1964-04-14 | Metering device for molten metal | ||
US3093087A (en) * | 1958-08-19 | 1963-06-11 | Carborundum Co | Method and apparatus for handling molten, non-ferrous metals |
NL135664C (ja) * | 1964-04-29 | |||
US3430680A (en) * | 1966-06-16 | 1969-03-04 | George R Leghorn | Method of forming structural shapes from molten material by stream casting |
US3681033A (en) * | 1969-01-31 | 1972-08-01 | Gen Motors Corp | Horizontal growth of crystal ribbons |
US3635791A (en) * | 1969-08-04 | 1972-01-18 | Gen Motors Corp | Pressure pouring in a vacuum environment |
US3607115A (en) * | 1969-10-29 | 1971-09-21 | Gen Motors Corp | Crystal pulling from molten melts including solute introduction means below the seed-melt interface |
US3759671A (en) * | 1971-10-15 | 1973-09-18 | Gen Motors Corp | Horizontal growth of crystal ribbons |
US4133517A (en) * | 1974-09-30 | 1979-01-09 | Commonwealth Scientific And Industrial Research Organization | Continuous reflux refining of metals |
US3976229A (en) * | 1975-03-31 | 1976-08-24 | Pyles Industries, Inc. | Hot melt dispensing apparatus |
DE2633961C2 (de) * | 1975-07-28 | 1986-01-02 | Mitsubishi Kinzoku K.K. | Verfahren zum Ziehen eines dünnen Halbleiter-Einkristallbandes |
JPS5261180A (en) * | 1975-11-14 | 1977-05-20 | Toyo Shirikon Kk | Horizontal growth of crystal ribbons |
US4094731A (en) * | 1976-06-21 | 1978-06-13 | Interlake, Inc. | Method of purifying silicon |
US4121965A (en) * | 1976-07-16 | 1978-10-24 | The United States Of America As Represented By The Administrator Of The National Aeronautics & Space Administration | Method of controlling defect orientation in silicon crystal ribbon growth |
US4246429A (en) | 1978-06-23 | 1981-01-20 | Janssen Pharmaceutica, N.V. | Novel α-amino-phenylacetic acid derivatives |
US4200621A (en) * | 1978-07-18 | 1980-04-29 | Motorola, Inc. | Sequential purification and crystal growth |
JPS5580798A (en) * | 1978-12-09 | 1980-06-18 | Agency Of Ind Science & Technol | Ribbon crystal growing method by lateral pulling |
JPS5580797A (en) * | 1978-12-09 | 1980-06-18 | Agency Of Ind Science & Technol | Ribbon crystal growing method by lateral pulling accompanied by circulating melt convection |
US4256717A (en) | 1979-05-24 | 1981-03-17 | Aluminum Company Of America | Silicon purification method |
US4246249A (en) * | 1979-05-24 | 1981-01-20 | Aluminum Company Of America | Silicon purification process |
US4289571A (en) * | 1979-06-25 | 1981-09-15 | Energy Materials Corporation | Method and apparatus for producing crystalline ribbons |
US4417944A (en) * | 1980-07-07 | 1983-11-29 | Jewett David N | Controlled heat sink for crystal ribbon growth |
DE3130953C3 (de) * | 1980-10-14 | 1995-06-29 | Thiele Gmbh & Co Kg | Zweiteiliges Kratzeisen für Mittelkettenförderer |
DE3049376A1 (de) | 1980-12-29 | 1982-07-29 | Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen | Verfahren zur herstellung vertikaler pn-uebergaenge beim ziehen von siliciumscheiben aus einer siliciumschmelze |
US4594229A (en) * | 1981-02-25 | 1986-06-10 | Emanuel M. Sachs | Apparatus for melt growth of crystalline semiconductor sheets |
DE3132776A1 (de) * | 1981-08-19 | 1983-03-03 | Heliotronic Gmbh | Verfahren zur herstellung grob- bis einkristalliner folien aus halbleitermaterial |
JPS598688A (ja) | 1982-07-06 | 1984-01-17 | Matsushita Electric Ind Co Ltd | 薄膜結晶の製造方法 |
US4599132A (en) * | 1985-01-18 | 1986-07-08 | Energy Materials Corporation | Guidance system for low angle silicon ribbon growth |
FR2592064B1 (fr) * | 1985-12-23 | 1988-02-12 | Elf Aquitaine | Dispositif pour former un bain d'un materiau semi-conducteur fondu afin d'y faire croitre un element cristallin |
US4873063A (en) * | 1986-01-06 | 1989-10-10 | Bleil Carl E | Apparatus for zone regrowth of crystal ribbons |
US5074758A (en) * | 1988-11-25 | 1991-12-24 | Mcintyre Glover C | Slurry pump |
US5055157A (en) * | 1990-02-05 | 1991-10-08 | Bleil Carl E | Method of crystal ribbon growth |
US5229083A (en) * | 1990-02-05 | 1993-07-20 | Bleil Carl E | Method and apparatus for crystal ribbon growth |
US5069742A (en) * | 1990-02-05 | 1991-12-03 | Bleil Carl E | Method and apparatus for crystal ribbon growth |
US5394825A (en) | 1992-02-28 | 1995-03-07 | Crystal Systems, Inc. | Method and apparatus for growing shaped crystals |
US5454423A (en) * | 1993-06-30 | 1995-10-03 | Kubota Corporation | Melt pumping apparatus and casting apparatus |
US5384825A (en) * | 1993-07-01 | 1995-01-24 | Motorola, Inc. | Method for memory dialing for cellular telephones |
JP3223081B2 (ja) * | 1995-10-02 | 2001-10-29 | 松下電器産業株式会社 | 電池用電極基板の製造法およびこれに用いる鋳型 |
US6111191A (en) * | 1997-03-04 | 2000-08-29 | Astropower, Inc. | Columnar-grained polycrystalline solar cell substrate and improved method of manufacture |
US6090199A (en) * | 1999-05-03 | 2000-07-18 | Evergreen Solar, Inc. | Continuous melt replenishment for crystal growth |
JP3656821B2 (ja) * | 1999-09-14 | 2005-06-08 | シャープ株式会社 | 多結晶シリコンシートの製造装置及び製造方法 |
JP2002289599A (ja) | 2001-03-27 | 2002-10-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
TW500839B (en) * | 2001-10-30 | 2002-09-01 | Univ Nat Taiwan | System and method for growing single crystal by rotary unidirectional setting |
JP3820198B2 (ja) * | 2002-08-27 | 2006-09-13 | ミッドウエスト リサーチ インスティチュート | 精製シリコンの製造装置 |
US7867334B2 (en) * | 2004-03-29 | 2011-01-11 | Kyocera Corporation | Silicon casting apparatus and method of producing silicon ingot |
WO2005122691A2 (en) * | 2004-06-16 | 2005-12-29 | Mosaic Crystals Ltd. | Crystal growth method and apparatus |
US8057598B2 (en) * | 2006-06-13 | 2011-11-15 | Young Sang Cho | Manufacturing equipment for polysilicon ingot |
JP2009099359A (ja) | 2007-10-16 | 2009-05-07 | Sekisui Chem Co Ltd | 表面処理装置 |
US8064071B2 (en) * | 2008-03-14 | 2011-11-22 | Varian Semiconductor Equipment Associates, Inc. | Floating sheet measurement apparatus and method |
US7855087B2 (en) * | 2008-03-14 | 2010-12-21 | Varian Semiconductor Equipment Associates, Inc. | Floating sheet production apparatus and method |
-
2009
- 2009-06-18 US US12/487,119 patent/US9567691B2/en not_active Expired - Fee Related
- 2009-06-19 CN CN2009801311768A patent/CN102119242B/zh not_active Expired - Fee Related
- 2009-06-19 KR KR1020117001315A patent/KR101647076B1/ko active IP Right Grant
- 2009-06-19 JP JP2011514840A patent/JP5639053B2/ja not_active Expired - Fee Related
- 2009-06-19 WO PCT/US2009/047947 patent/WO2009155512A2/en active Application Filing
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2016046983A1 (ja) * | 2014-09-26 | 2016-03-31 | 株式会社日立製作所 | 結晶成長方法 |
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TW201009132A (en) | 2010-03-01 |
CN102119242B (zh) | 2013-09-25 |
KR20110031472A (ko) | 2011-03-28 |
KR101647076B1 (ko) | 2016-08-09 |
TWI449816B (zh) | 2014-08-21 |
WO2009155512A2 (en) | 2009-12-23 |
CN102119242A (zh) | 2011-07-06 |
KR101756402B1 (ko) | 2017-07-11 |
JP5639053B2 (ja) | 2014-12-10 |
WO2009155512A3 (en) | 2010-04-08 |
KR20160096728A (ko) | 2016-08-16 |
US20100050686A1 (en) | 2010-03-04 |
US9567691B2 (en) | 2017-02-14 |
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