JP2011524245A - 物質の相転移方法 - Google Patents
物質の相転移方法 Download PDFInfo
- Publication number
- JP2011524245A JP2011524245A JP2011509920A JP2011509920A JP2011524245A JP 2011524245 A JP2011524245 A JP 2011524245A JP 2011509920 A JP2011509920 A JP 2011509920A JP 2011509920 A JP2011509920 A JP 2011509920A JP 2011524245 A JP2011524245 A JP 2011524245A
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- substance
- metal
- phase transition
- reactor
- plasma
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- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000007704 transition Effects 0.000 title claims abstract description 15
- 239000000126 substance Substances 0.000 claims abstract description 37
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 150000004703 alkoxides Chemical class 0.000 claims abstract description 5
- 229910001960 metal nitrate Inorganic materials 0.000 claims abstract description 5
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 3
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 9
- 229910001507 metal halide Inorganic materials 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- -1 AlCl 3 Inorganic materials 0.000 claims description 3
- 239000000443 aerosol Substances 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 3
- 229910021617 Indium monochloride Inorganic materials 0.000 claims description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 2
- 229910007926 ZrCl Inorganic materials 0.000 claims description 2
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 claims description 2
- 238000000859 sublimation Methods 0.000 abstract description 10
- 230000008022 sublimation Effects 0.000 abstract description 10
- 239000012071 phase Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 9
- 230000008016 vaporization Effects 0.000 description 7
- 238000009834 vaporization Methods 0.000 description 7
- 230000005855 radiation Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- OVKHEVLQASDMFJ-UHFFFAOYSA-N triazanium trichloride Chemical compound [NH4+].[NH4+].[NH4+].[Cl-].[Cl-].[Cl-] OVKHEVLQASDMFJ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/48—Halides, with or without other cations besides aluminium
- C01F7/56—Chlorides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
- C22B4/005—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
- C22B4/08—Apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0869—Feeding or evacuating the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0879—Solid
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
- C22B34/129—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08 obtaining metallic titanium from titanium compounds by dissociation, e.g. thermic dissociation of titanium tetraiodide, or by electrolysis or with the use of an electric arc
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- General Health & Medical Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
Claims (7)
- 物質及び物質混合物の相転移方法において、物質又は物質混合物をプラズマ反応器中に導入し、この物質又は物質混合物を高エネルギー相に変換させ、かつ生成物を気体の形又はエーロゾルとして適した形で、プラズマ反応器から取り出し、及び/又はその使用に提供する、前記方法。
- 金属塩、金属硝酸塩及び/又は金属アルコキシド及び他の気化可能な金属有機化合物を物質として使用する、請求項1に記載の方法。
- 金属ハロゲン化物、SiCl4、TiCl4、SnCl4、VdCl4又は金属硝酸塩又は金属アルコキシドを気化する、請求項1又は2に記載の方法。
- 金属ハロゲン化物、AlCl3、ZrCl4、NbCl4、InCl3、FeCl3を昇華する、請求項1又は2に記載の方法。
- 金属塩、例えばYCl3、SnCl2、NbCl5、FeCl2を融解し、かつ、望ましい場合には、引き続いて気化する、請求項1又は2に記載の方法。
- 三塩化アルミニウムを昇華する、請求項4に記載の方法。
- 相転移を、放電により生じたイオン化ガス中で生じさせる、請求項1から6までのいずれか1項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008001851.1 | 2008-05-19 | ||
DE102008001851A DE102008001851A1 (de) | 2008-05-19 | 2008-05-19 | Verfahren zur Phasenumwandlung von Stoffen |
PCT/EP2009/055548 WO2009141234A1 (en) | 2008-05-19 | 2009-05-07 | Process for the phase transformation of substances |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011524245A true JP2011524245A (ja) | 2011-09-01 |
JP5523447B2 JP5523447B2 (ja) | 2014-06-18 |
Family
ID=41078365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011509920A Active JP5523447B2 (ja) | 2008-05-19 | 2009-05-07 | 物質の相転移方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8486157B2 (ja) |
EP (1) | EP2276546B1 (ja) |
JP (1) | JP5523447B2 (ja) |
CN (1) | CN102036724B (ja) |
DE (1) | DE102008001851A1 (ja) |
UA (1) | UA107650C2 (ja) |
WO (1) | WO2009141234A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103000502A (zh) * | 2012-10-29 | 2013-03-27 | 江苏卡迪诺节能保温材料有限公司 | 一种在硅片上实施铝扩散的方法 |
CN103212349B (zh) * | 2013-04-27 | 2015-02-18 | 清华大学 | 一种升华凝华法纳米气溶胶发生系统及其使用方法和应用 |
CN103386204A (zh) * | 2013-08-13 | 2013-11-13 | 长沙自洁换热器科技有限公司 | 聚合铝生产的热泵蒸发热泵干燥节能技术 |
CN110777360B (zh) * | 2019-11-01 | 2020-09-22 | 西北工业大学 | 一种化学气相沉积负压状态下粉末前驱体的进料装置 |
US20230040683A1 (en) * | 2021-08-06 | 2023-02-09 | PlasmaDent Inc. | Plasma-generating nozzle and plasma device including same |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58161767A (ja) * | 1982-03-17 | 1983-09-26 | Nippon Telegr & Teleph Corp <Ntt> | バナジウムの真空蒸着法 |
JPS60248880A (ja) * | 1984-05-25 | 1985-12-09 | Hitachi Ltd | グロ−放電による被覆方法及び装置 |
JPS61118912A (ja) * | 1984-11-07 | 1986-06-06 | ブラウン・ボバリ・ウント・シー・アクチエンゲゼルシヤフト | 超伝導繊維束の製造方法 |
JPS6376802A (ja) * | 1986-09-19 | 1988-04-07 | Daido Gakuen | 表面に異質の被膜を付着させた微粒子の製法 |
JPH03264610A (ja) * | 1990-03-15 | 1991-11-25 | Nok Corp | 超微粒子の製造方法 |
US5213851A (en) * | 1990-04-17 | 1993-05-25 | Alfred University | Process for preparing ferrite films by radio-frequency generated aerosol plasma deposition in atmosphere |
JPH05269372A (ja) * | 1992-03-27 | 1993-10-19 | Toyo Ink Mfg Co Ltd | セラミックス粉末の製造方法 |
JPH0710510A (ja) * | 1993-06-17 | 1995-01-13 | Nippon Steel Chem Co Ltd | 酸窒化物薄膜の製造方法 |
JPH11502760A (ja) * | 1995-03-14 | 1999-03-09 | ロッキード アイダホ テクノロジーズ カンパニー | 高速冷却反応器及び方法 |
JP2002253954A (ja) * | 2001-02-28 | 2002-09-10 | C I Kasei Co Ltd | 超微粒子の製造装置および製造方法 |
JP2004223431A (ja) * | 2003-01-24 | 2004-08-12 | Phoenix Techno:Kk | ガス化装置、多段型ガス化装置及びガス化容器 |
JP2005523349A (ja) * | 2002-04-10 | 2005-08-04 | ダウ・コーニング・アイルランド・リミテッド | ゲルおよび粉体の調製法 |
JP2006247446A (ja) * | 2005-03-08 | 2006-09-21 | Nisshin Seifun Group Inc | 微粒子の製造方法と装置 |
JP2008509065A (ja) * | 2004-08-04 | 2008-03-27 | エボニック デグサ ゲーエムベーハー | 水素化合物を含有する四塩化珪素または四塩化ゲルマニウムを精製する方法および装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2928805C2 (de) | 1979-07-17 | 1982-03-11 | Degussa Ag, 6000 Frankfurt | Vorrichtung zum Verdampfen von Aluminiumtrichlorid |
EP0728036B1 (de) | 1993-11-12 | 1998-01-14 | Gerhard Gergely | Verfahren zum herstellen von granulat |
US5478608A (en) * | 1994-11-14 | 1995-12-26 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating method and apparatus |
DE19502352C2 (de) | 1995-01-26 | 1997-03-27 | Urban Dipl Ing Stricker | Vorrichtung zur Wärmebehandlung von kunststoffhaltigen Schüttgütern |
US5711089A (en) | 1995-03-03 | 1998-01-27 | Hosokawa Bepex Corporation | Radiant heater for processing of polymers |
DE19904196C1 (de) | 1998-12-24 | 2000-10-19 | Gogas Goch Gmbh & Co | Trockner für Schüttgut |
DE10242797A1 (de) | 2002-09-14 | 2004-03-25 | Degussa Ag | Verfahren und Vorrichtung zur Phasenumwandlung von Stoffen |
DE102005022707A1 (de) | 2005-05-18 | 2006-11-23 | Degussa Ag | Verfahren und Vorrichtung zur Phasenumwandlung von Stoffen |
-
2008
- 2008-05-19 DE DE102008001851A patent/DE102008001851A1/de not_active Withdrawn
-
2009
- 2009-05-07 JP JP2011509920A patent/JP5523447B2/ja active Active
- 2009-05-07 CN CN2009801184033A patent/CN102036724B/zh active Active
- 2009-05-07 EP EP09749724A patent/EP2276546B1/en active Active
- 2009-05-07 UA UAA201015247A patent/UA107650C2/uk unknown
- 2009-05-07 WO PCT/EP2009/055548 patent/WO2009141234A1/en active Application Filing
- 2009-05-07 US US12/991,721 patent/US8486157B2/en active Active
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58161767A (ja) * | 1982-03-17 | 1983-09-26 | Nippon Telegr & Teleph Corp <Ntt> | バナジウムの真空蒸着法 |
JPS60248880A (ja) * | 1984-05-25 | 1985-12-09 | Hitachi Ltd | グロ−放電による被覆方法及び装置 |
JPS61118912A (ja) * | 1984-11-07 | 1986-06-06 | ブラウン・ボバリ・ウント・シー・アクチエンゲゼルシヤフト | 超伝導繊維束の製造方法 |
JPS6376802A (ja) * | 1986-09-19 | 1988-04-07 | Daido Gakuen | 表面に異質の被膜を付着させた微粒子の製法 |
JPH03264610A (ja) * | 1990-03-15 | 1991-11-25 | Nok Corp | 超微粒子の製造方法 |
US5213851A (en) * | 1990-04-17 | 1993-05-25 | Alfred University | Process for preparing ferrite films by radio-frequency generated aerosol plasma deposition in atmosphere |
JPH05269372A (ja) * | 1992-03-27 | 1993-10-19 | Toyo Ink Mfg Co Ltd | セラミックス粉末の製造方法 |
JPH0710510A (ja) * | 1993-06-17 | 1995-01-13 | Nippon Steel Chem Co Ltd | 酸窒化物薄膜の製造方法 |
JPH11502760A (ja) * | 1995-03-14 | 1999-03-09 | ロッキード アイダホ テクノロジーズ カンパニー | 高速冷却反応器及び方法 |
JP2002253954A (ja) * | 2001-02-28 | 2002-09-10 | C I Kasei Co Ltd | 超微粒子の製造装置および製造方法 |
JP2005523349A (ja) * | 2002-04-10 | 2005-08-04 | ダウ・コーニング・アイルランド・リミテッド | ゲルおよび粉体の調製法 |
JP2004223431A (ja) * | 2003-01-24 | 2004-08-12 | Phoenix Techno:Kk | ガス化装置、多段型ガス化装置及びガス化容器 |
JP2008509065A (ja) * | 2004-08-04 | 2008-03-27 | エボニック デグサ ゲーエムベーハー | 水素化合物を含有する四塩化珪素または四塩化ゲルマニウムを精製する方法および装置 |
JP2006247446A (ja) * | 2005-03-08 | 2006-09-21 | Nisshin Seifun Group Inc | 微粒子の製造方法と装置 |
Also Published As
Publication number | Publication date |
---|---|
JP5523447B2 (ja) | 2014-06-18 |
EP2276546A1 (en) | 2011-01-26 |
DE102008001851A1 (de) | 2009-11-26 |
UA107650C2 (uk) | 2015-02-10 |
US20110123424A1 (en) | 2011-05-26 |
EP2276546B1 (en) | 2012-11-28 |
US8486157B2 (en) | 2013-07-16 |
CN102036724B (zh) | 2013-09-18 |
WO2009141234A1 (en) | 2009-11-26 |
CN102036724A (zh) | 2011-04-27 |
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