JP2011516884A5 - - Google Patents

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Publication number
JP2011516884A5
JP2011516884A5 JP2011503986A JP2011503986A JP2011516884A5 JP 2011516884 A5 JP2011516884 A5 JP 2011516884A5 JP 2011503986 A JP2011503986 A JP 2011503986A JP 2011503986 A JP2011503986 A JP 2011503986A JP 2011516884 A5 JP2011516884 A5 JP 2011516884A5
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JP
Japan
Prior art keywords
electrode
layer
channel
interrogation
tunnel
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JP2011503986A
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English (en)
Japanese (ja)
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JP2011516884A (ja
JP5303028B2 (ja
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Priority claimed from PCT/US2009/002172 external-priority patent/WO2009126257A1/en
Publication of JP2011516884A publication Critical patent/JP2011516884A/ja
Publication of JP2011516884A5 publication Critical patent/JP2011516884A5/ja
Application granted granted Critical
Publication of JP5303028B2 publication Critical patent/JP5303028B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011503986A 2008-04-07 2009-04-07 マイクロ流体センサの製造方法 Expired - Fee Related JP5303028B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US12324808P 2008-04-07 2008-04-07
US61/123,248 2008-04-07
US12412108P 2008-04-14 2008-04-14
US61/124,121 2008-04-14
PCT/US2009/002172 WO2009126257A1 (en) 2008-04-07 2009-04-07 Method for manufactiring a microfluidic sensor

Publications (3)

Publication Number Publication Date
JP2011516884A JP2011516884A (ja) 2011-05-26
JP2011516884A5 true JP2011516884A5 (enExample) 2012-09-06
JP5303028B2 JP5303028B2 (ja) 2013-10-02

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ID=41162160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011503986A Expired - Fee Related JP5303028B2 (ja) 2008-04-07 2009-04-07 マイクロ流体センサの製造方法

Country Status (5)

Country Link
US (2) US8182635B2 (enExample)
EP (1) EP2265923A4 (enExample)
JP (1) JP5303028B2 (enExample)
CN (1) CN101999071B (enExample)
WO (1) WO2009126257A1 (enExample)

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