JP2011511928A - 形状測定装置及びその方法 - Google Patents

形状測定装置及びその方法 Download PDF

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Publication number
JP2011511928A
JP2011511928A JP2010523935A JP2010523935A JP2011511928A JP 2011511928 A JP2011511928 A JP 2011511928A JP 2010523935 A JP2010523935 A JP 2010523935A JP 2010523935 A JP2010523935 A JP 2010523935A JP 2011511928 A JP2011511928 A JP 2011511928A
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Japan
Prior art keywords
laser
shape measuring
generated
emitted
shape
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JP2010523935A
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English (en)
Japanese (ja)
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JP2011511928A5 (enExample
Inventor
キム、ジェ‐ワン
エオン、タエ‐ボング
キム、ジョン‐アン
カン、チュ‐シク
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Korea Research Institute of Standards and Science
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Korea Research Institute of Standards and Science
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Publication date
Application filed by Korea Research Institute of Standards and Science filed Critical Korea Research Institute of Standards and Science
Publication of JP2011511928A publication Critical patent/JP2011511928A/ja
Publication of JP2011511928A5 publication Critical patent/JP2011511928A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2010523935A 2007-09-07 2008-08-19 形状測定装置及びその方法 Pending JP2011511928A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070091213A KR100925783B1 (ko) 2007-09-07 2007-09-07 형상 측정장치 및 그 방법
PCT/KR2008/004810 WO2009031770A1 (en) 2007-09-07 2008-08-19 Shape measurement apparatus and method

Publications (2)

Publication Number Publication Date
JP2011511928A true JP2011511928A (ja) 2011-04-14
JP2011511928A5 JP2011511928A5 (enExample) 2011-05-26

Family

ID=40429055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010523935A Pending JP2011511928A (ja) 2007-09-07 2008-08-19 形状測定装置及びその方法

Country Status (4)

Country Link
US (1) US8279448B2 (enExample)
JP (1) JP2011511928A (enExample)
KR (1) KR100925783B1 (enExample)
WO (1) WO2009031770A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105890538A (zh) * 2014-12-30 2016-08-24 广东工业大学 三表面干涉式高精度曲面轮廓测量系统及方法
CN105371777B (zh) * 2015-10-29 2018-03-09 北京交通大学 实时测量物体变形的方法和系统
WO2019205890A1 (zh) * 2018-04-28 2019-10-31 Oppo广东移动通信有限公司 图像处理方法、装置、计算机可读存储介质和电子设备
US12196672B2 (en) 2020-05-07 2025-01-14 Hand Held Products, Inc. Apparatuses, systems, and methods for sample testing
US11846574B2 (en) 2020-10-29 2023-12-19 Hand Held Products, Inc. Apparatuses, systems, and methods for sample capture and extraction

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63311104A (ja) * 1987-06-15 1988-12-19 Olympus Optical Co Ltd 半導体レ−ザ−干渉計
JPH039202A (ja) * 1989-06-07 1991-01-17 Canon Inc 測長方法及び装置
JPH04297807A (ja) * 1991-03-27 1992-10-21 Mitsutoyo Corp 位相シフトマイクロフィゾー干渉計
JPH07306006A (ja) * 1994-05-12 1995-11-21 Asahi Optical Co Ltd 半導体レーザ位相シフト干渉計における位相検出方法
JPH10215027A (ja) * 1997-01-29 1998-08-11 Mitsubishi Heavy Ind Ltd 光周波数可変動作方法及び装置
JPH11218411A (ja) * 1998-02-02 1999-08-10 Fuji Xerox Co Ltd 干渉計測方法および干渉計測装置
JP2001059714A (ja) * 1999-08-20 2001-03-06 Inst Of Physical & Chemical Res 形状測定方法及び装置
JP2002214049A (ja) * 2001-01-17 2002-07-31 Ando Electric Co Ltd 波長モニタ
JP2006266841A (ja) * 2005-03-23 2006-10-05 National Institute Of Advanced Industrial & Technology 干渉縞による形状・段差測定方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4907237A (en) * 1988-10-18 1990-03-06 The United States Of America As Represented By The Secretary Of Commerce Optical feedback locking of semiconductor lasers
US5077748A (en) * 1991-04-01 1991-12-31 International Business Machines Corporation Laser system and method
JPH05206561A (ja) * 1992-01-27 1993-08-13 Nippon Telegr & Teleph Corp <Ntt> 光帰還型光周波数オフセットロック装置
JP3421309B2 (ja) * 2000-09-01 2003-06-30 日本電信電話株式会社 表面形状測定方法及び表面形状測定器
WO2003044454A1 (en) * 2001-11-15 2003-05-30 Zygo Corporation Dispersive null-optics for aspheric surface and wavefront metrology
US6882666B2 (en) * 2002-10-22 2005-04-19 Inplane Photonics, Inc. Kink free operation of pump lasers having diffraction grating for providing wavelength stabilization

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63311104A (ja) * 1987-06-15 1988-12-19 Olympus Optical Co Ltd 半導体レ−ザ−干渉計
JPH039202A (ja) * 1989-06-07 1991-01-17 Canon Inc 測長方法及び装置
JPH04297807A (ja) * 1991-03-27 1992-10-21 Mitsutoyo Corp 位相シフトマイクロフィゾー干渉計
JPH07306006A (ja) * 1994-05-12 1995-11-21 Asahi Optical Co Ltd 半導体レーザ位相シフト干渉計における位相検出方法
JPH10215027A (ja) * 1997-01-29 1998-08-11 Mitsubishi Heavy Ind Ltd 光周波数可変動作方法及び装置
JPH11218411A (ja) * 1998-02-02 1999-08-10 Fuji Xerox Co Ltd 干渉計測方法および干渉計測装置
JP2001059714A (ja) * 1999-08-20 2001-03-06 Inst Of Physical & Chemical Res 形状測定方法及び装置
JP2002214049A (ja) * 2001-01-17 2002-07-31 Ando Electric Co Ltd 波長モニタ
JP2006266841A (ja) * 2005-03-23 2006-10-05 National Institute Of Advanced Industrial & Technology 干渉縞による形状・段差測定方法

Also Published As

Publication number Publication date
KR100925783B1 (ko) 2009-11-11
WO2009031770A1 (en) 2009-03-12
KR20090025971A (ko) 2009-03-11
US8279448B2 (en) 2012-10-02
US20100182614A1 (en) 2010-07-22

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