JP2011510820A5 - - Google Patents

Download PDF

Info

Publication number
JP2011510820A5
JP2011510820A5 JP2010545377A JP2010545377A JP2011510820A5 JP 2011510820 A5 JP2011510820 A5 JP 2011510820A5 JP 2010545377 A JP2010545377 A JP 2010545377A JP 2010545377 A JP2010545377 A JP 2010545377A JP 2011510820 A5 JP2011510820 A5 JP 2011510820A5
Authority
JP
Japan
Prior art keywords
energy
irradiation
laser beam
detector
dimension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010545377A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011510820A (ja
JP5425813B2 (ja
Filing date
Publication date
Priority claimed from US12/027,442 external-priority patent/US8723073B2/en
Application filed filed Critical
Publication of JP2011510820A publication Critical patent/JP2011510820A/ja
Publication of JP2011510820A5 publication Critical patent/JP2011510820A5/ja
Application granted granted Critical
Publication of JP5425813B2 publication Critical patent/JP5425813B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010545377A 2008-02-07 2009-01-22 レーザ光源のエネルギを制御するための照射装置及び方法 Active JP5425813B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/027,442 US8723073B2 (en) 2008-02-07 2008-02-07 Illumination apparatus and method for controlling energy of a laser source
US12/027,442 2008-02-07
PCT/EP2009/000365 WO2009097967A1 (en) 2008-02-07 2009-01-22 Illuminating apparatus and method for controlling energy of a laser source

Publications (3)

Publication Number Publication Date
JP2011510820A JP2011510820A (ja) 2011-04-07
JP2011510820A5 true JP2011510820A5 (https=) 2012-03-08
JP5425813B2 JP5425813B2 (ja) 2014-02-26

Family

ID=40583220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010545377A Active JP5425813B2 (ja) 2008-02-07 2009-01-22 レーザ光源のエネルギを制御するための照射装置及び方法

Country Status (7)

Country Link
US (1) US8723073B2 (https=)
EP (1) EP2245497B1 (https=)
JP (1) JP5425813B2 (https=)
KR (1) KR101606105B1 (https=)
SG (1) SG188785A1 (https=)
TW (1) TWI481136B (https=)
WO (1) WO2009097967A1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006131924A2 (en) 2005-06-07 2006-12-14 Oree, Advanced Illumination Solutions Inc. Illumination apparatus
US8272758B2 (en) 2005-06-07 2012-09-25 Oree, Inc. Illumination apparatus and methods of forming the same
US8215815B2 (en) 2005-06-07 2012-07-10 Oree, Inc. Illumination apparatus and methods of forming the same
US7929816B2 (en) * 2007-12-19 2011-04-19 Oree, Inc. Waveguide sheet containing in-coupling, propagation, and out-coupling regions
US7907804B2 (en) 2007-12-19 2011-03-15 Oree, Inc. Elimination of stitch artifacts in a planar illumination area
EP2260341A2 (en) 2008-03-05 2010-12-15 Oree, Advanced Illumination Solutions INC. Illumination apparatus and methods of forming the same
US8297786B2 (en) 2008-07-10 2012-10-30 Oree, Inc. Slim waveguide coupling apparatus and method
US8301002B2 (en) 2008-07-10 2012-10-30 Oree, Inc. Slim waveguide coupling apparatus and method
JP4618360B2 (ja) * 2008-10-10 2011-01-26 ソニー株式会社 レーザアニール方法およびレーザアニール装置
US8624527B1 (en) 2009-03-27 2014-01-07 Oree, Inc. Independently controllable illumination device
US8328406B2 (en) 2009-05-13 2012-12-11 Oree, Inc. Low-profile illumination device
WO2010150202A2 (en) 2009-06-24 2010-12-29 Oree, Advanced Illumination Solutions Inc. Illumination apparatus with high conversion efficiency and methods of forming the same
US20120325784A1 (en) * 2011-06-24 2012-12-27 Applied Materials, Inc. Novel thermal processing apparatus
US8591072B2 (en) 2011-11-16 2013-11-26 Oree, Inc. Illumination apparatus confining light by total internal reflection and methods of forming the same
WO2014006501A1 (en) 2012-07-03 2014-01-09 Yosi Shani Planar remote phosphor illumination apparatus
KR102285121B1 (ko) * 2019-04-10 2021-08-03 고려대학교 세종산학협력단 레이저를 이용한 비정질 반도체 결정화 장치 및 그의 제어방법
KR20210131510A (ko) 2020-04-23 2021-11-03 삼성디스플레이 주식회사 라인 빔 형성 장치
DE102020130651B3 (de) * 2020-11-19 2022-05-05 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserbeleuchtung auf einer Arbeitsebene

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5331466A (en) * 1991-04-23 1994-07-19 Lions Eye Institute Of Western Australia Inc. Method and apparatus for homogenizing a collimated light beam
DE4220705C2 (de) * 1992-06-24 2003-03-13 Lambda Physik Ag Vorrichtung zum Aufteilen eines Lichtstrahles in homogene Teilstrahlen
US5609780A (en) * 1994-11-14 1997-03-11 International Business Machines, Corporation Laser system
JPH08247790A (ja) * 1995-03-10 1996-09-27 Sefuto Kenkyusho:Kk 位置検出装置
DE19520187C1 (de) 1995-06-01 1996-09-12 Microlas Lasersystem Gmbh Optik zum Herstellen einer scharfen Beleuchtungslinie aus einem Laserstrahl
US5880461A (en) * 1996-06-12 1999-03-09 The Regents Of The University Of California Low noise optical position sensor
JPH11283933A (ja) * 1998-01-29 1999-10-15 Toshiba Corp レ―ザ照射装置，非単結晶半導体膜の製造方法及び液晶表示装置の製造方法
JP2000202673A (ja) * 2000-01-01 2000-07-25 Semiconductor Energy Lab Co Ltd レ―ザ―照射装置
AU2002230592A1 (en) * 2000-10-27 2002-05-06 Molecular Devices Corporation Light detection device
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
JP2003053578A (ja) * 2001-08-15 2003-02-26 Sumitomo Heavy Ind Ltd レーザビームのプロファイル調整方法及び装置
JP2003258349A (ja) * 2002-03-04 2003-09-12 Toshiba Corp レーザ加工方法、その装置および薄膜加工方法
US7180918B2 (en) * 2003-05-16 2007-02-20 Metal Improvement Company, Llc Self-seeded single-frequency solid-state ring laser and system using same
JP4567984B2 (ja) * 2004-01-30 2010-10-27 株式会社 日立ディスプレイズ 平面表示装置の製造装置
JP2005294493A (ja) * 2004-03-31 2005-10-20 Toshiba Corp レーザプロセスおよびレーザアニール装置
JP2006049606A (ja) * 2004-08-05 2006-02-16 Sumitomo Heavy Ind Ltd レーザ加工装置
US7422988B2 (en) * 2004-11-12 2008-09-09 Applied Materials, Inc. Rapid detection of imminent failure in laser thermal processing of a substrate
TWI361123B (en) 2004-12-22 2012-04-01 Zeiss Carl Laser Optics Gmbh Optical illumination system for creating a line beam

Similar Documents

Publication Publication Date Title
JP2011510820A5 (https=)
CN101821659B (zh) 色差共聚焦传感器
CN109799074B (zh) 一种光学薄膜激光损伤阈值快速测量装置
JP7003182B2 (ja) 光電子測定装置
JP2010169496A5 (https=)
CN102974936A (zh) 激光焦点定位系统及将材料定位于激光焦点处的方法
JP2013130856A5 (https=)
JP2019178923A (ja) 測距ユニット及び光照射装置
KR101279578B1 (ko) 레이저 가공용 오토포커싱 장치 및 이를 이용한 오토포커싱 방법
JP7064606B2 (ja) レーザ加工システムの焦点位置を特定する装置、それを備えたレーザ加工システム、および、レーザ加工システムの焦点位置の特定方法
TWI623367B (zh) 雷射加工系統及即時確認加工量的方法
US9945656B2 (en) Multi-function spectroscopic device
JP2015152405A5 (https=)
KR102247676B1 (ko) 측정속도 향상형 미세플라스틱 검출장치
CN110966931A (zh) 一种飞秒激光加工形态参数时间分辨共焦测量方法及装置
CN113543922B (zh) 激光加工装置
JP2018533014A5 (https=)
KR102143187B1 (ko) 레이저 가공 장치 및 이를 이용한 레이저 가공 방법
JP5518052B2 (ja) 超音波のレーザ発生のための中空コア導波器
JP7138417B2 (ja) 異物検査装置、異物検査方法、インプリント装置および物品製造方法
JPH09159572A (ja) 光学装置
CN205374277U (zh) 一种可变角度的光学元件表面吸收特性测量装置
CN104503100A (zh) 基于光栅衍射的晶体自准直调整装置和方法
JP2008546188A5 (https=)
JP5539330B2 (ja) 超音波のレーザ発生のためのブロック端末ファイバ