JP2011505696A - アルカリ金属クラスター化合物を使用するoledデバイス - Google Patents
アルカリ金属クラスター化合物を使用するoledデバイス Download PDFInfo
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- JP2011505696A JP2011505696A JP2010535968A JP2010535968A JP2011505696A JP 2011505696 A JP2011505696 A JP 2011505696A JP 2010535968 A JP2010535968 A JP 2010535968A JP 2010535968 A JP2010535968 A JP 2010535968A JP 2011505696 A JP2011505696 A JP 2011505696A
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- Prior art keywords
- group
- subunit
- alkali metal
- formula
- cluster compound
- Prior art date
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- Granted
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 147
- 229910052783 alkali metal Inorganic materials 0.000 title claims abstract description 64
- 150000001340 alkali metals Chemical class 0.000 title abstract description 11
- -1 alkali metal salt Chemical class 0.000 claims abstract description 157
- 239000003446 ligand Substances 0.000 claims abstract description 52
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 18
- 125000000129 anionic group Chemical group 0.000 claims abstract description 15
- 230000007935 neutral effect Effects 0.000 claims abstract description 12
- 125000003118 aryl group Chemical group 0.000 claims description 84
- 229910052739 hydrogen Inorganic materials 0.000 claims description 43
- 239000001257 hydrogen Substances 0.000 claims description 43
- 125000000623 heterocyclic group Chemical group 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 35
- 239000002184 metal Substances 0.000 claims description 35
- 125000004122 cyclic group Chemical group 0.000 claims description 22
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 21
- 125000004429 atom Chemical group 0.000 claims description 21
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 125000004104 aryloxy group Chemical group 0.000 claims description 18
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 17
- 125000003277 amino group Chemical group 0.000 claims description 16
- 229910052744 lithium Inorganic materials 0.000 claims description 16
- 125000003342 alkenyl group Chemical group 0.000 claims description 15
- 238000000859 sublimation Methods 0.000 claims description 15
- 230000008022 sublimation Effects 0.000 claims description 15
- 125000004414 alkyl thio group Chemical group 0.000 claims description 14
- 125000000304 alkynyl group Chemical group 0.000 claims description 14
- 125000005110 aryl thio group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 14
- 239000007787 solid Substances 0.000 claims description 14
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 11
- 229920006395 saturated elastomer Polymers 0.000 claims description 11
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 6
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000463 material Substances 0.000 description 169
- 239000010410 layer Substances 0.000 description 136
- NAGIDYXJHFPQIS-UHFFFAOYSA-M lithium;2-(1,10-phenanthrolin-2-yl)phenolate Chemical compound [Li+].[O-]C1=CC=CC=C1C1=CC=C(C=CC=2C3=NC=CC=2)C3=N1 NAGIDYXJHFPQIS-UHFFFAOYSA-M 0.000 description 89
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 73
- 229910052799 carbon Inorganic materials 0.000 description 66
- 229910052757 nitrogen Inorganic materials 0.000 description 52
- 239000002019 doping agent Substances 0.000 description 43
- 125000001424 substituent group Chemical group 0.000 description 38
- 229910052741 iridium Inorganic materials 0.000 description 33
- 238000002347 injection Methods 0.000 description 31
- 239000007924 injection Substances 0.000 description 31
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 30
- 239000000758 substrate Substances 0.000 description 22
- 230000005525 hole transport Effects 0.000 description 21
- 239000002904 solvent Substances 0.000 description 21
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 20
- 125000004432 carbon atom Chemical group C* 0.000 description 19
- 239000013078 crystal Substances 0.000 description 19
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 18
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 18
- 239000000203 mixture Substances 0.000 description 17
- 239000012044 organic layer Substances 0.000 description 17
- UFNKDFPFGYHAKC-UHFFFAOYSA-N 2-(1,10-phenanthrolin-2-yl)phenol Chemical compound Oc1ccccc1-c1ccc2ccc3cccnc3c2n1 UFNKDFPFGYHAKC-UHFFFAOYSA-N 0.000 description 16
- 239000007983 Tris buffer Substances 0.000 description 16
- 230000000903 blocking effect Effects 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 13
- 150000002431 hydrogen Chemical class 0.000 description 13
- 125000006850 spacer group Chemical group 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 125000003107 substituted aryl group Chemical group 0.000 description 12
- 229910052782 aluminium Inorganic materials 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 238000000151 deposition Methods 0.000 description 11
- 239000011368 organic material Substances 0.000 description 11
- 229910052760 oxygen Chemical group 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 230000008021 deposition Effects 0.000 description 10
- COLNWNFTWHPORY-UHFFFAOYSA-M lithium;8-hydroxyquinoline-2-carboxylate Chemical class [Li+].C1=C(C([O-])=O)N=C2C(O)=CC=CC2=C1 COLNWNFTWHPORY-UHFFFAOYSA-M 0.000 description 10
- 125000004433 nitrogen atom Chemical group N* 0.000 description 10
- 239000001301 oxygen Chemical group 0.000 description 10
- 238000012546 transfer Methods 0.000 description 10
- 125000005259 triarylamine group Chemical group 0.000 description 10
- 239000000539 dimer Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- QYFFZCJJIGFACI-UHFFFAOYSA-N 2-(2-methoxyphenyl)-1,10-phenanthroline hydrochloride Chemical compound Cl.COc1ccccc1-c1ccc2ccc3cccnc3c2n1 QYFFZCJJIGFACI-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- KJOUEATVKMSUCR-UHFFFAOYSA-M lithium;2,3,4,5,6-pentafluorophenolate Chemical compound [Li+].[O-]C1=C(F)C(F)=C(F)C(F)=C1F KJOUEATVKMSUCR-UHFFFAOYSA-M 0.000 description 7
- 125000001624 naphthyl group Chemical group 0.000 description 7
- 239000008188 pellet Substances 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000000376 reactant Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- JHRMQHFRVPVGHL-UHFFFAOYSA-N 2-chloro-1,10-phenanthroline Chemical compound C1=CN=C2C3=NC(Cl)=CC=C3C=CC2=C1 JHRMQHFRVPVGHL-UHFFFAOYSA-N 0.000 description 6
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 229910052733 gallium Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 6
- 239000013638 trimer Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 0 Cc1c(*)c(*(*)*)c(*)c(*2*)c1C(C1)[C@@]1(C1C3=C(*=C)C(*(*)*)=C(*)C1*)c1c2c(*)c(*(*)*)c(*)c1*3=C Chemical compound Cc1c(*)c(*(*)*)c(*)c(*2*)c1C(C1)[C@@]1(C1C3=C(*=C)C(*(*)*)=C(*)C1*)c1c2c(*)c(*(*)*)c(*)c1*3=C 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 5
- 150000004982 aromatic amines Chemical class 0.000 description 5
- 125000000732 arylene group Chemical group 0.000 description 5
- 150000001716 carbazoles Chemical class 0.000 description 5
- 150000001721 carbon Chemical group 0.000 description 5
- 239000010406 cathode material Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000008187 granular material Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000011593 sulfur Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 4
- STTGYIUESPWXOW-UHFFFAOYSA-N 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline Chemical compound C=12C=CC3=C(C=4C=CC=CC=4)C=C(C)N=C3C2=NC(C)=CC=1C1=CC=CC=C1 STTGYIUESPWXOW-UHFFFAOYSA-N 0.000 description 4
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 150000002641 lithium Chemical group 0.000 description 4
- 229940006487 lithium cation Drugs 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 229960003540 oxyquinoline Drugs 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 4
- HRGDZIGMBDGFTC-UHFFFAOYSA-N platinum(2+) Chemical compound [Pt+2] HRGDZIGMBDGFTC-UHFFFAOYSA-N 0.000 description 4
- 230000006798 recombination Effects 0.000 description 4
- 238000005215 recombination Methods 0.000 description 4
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical class C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- ROEQGIFOWRQYHD-UHFFFAOYSA-N (2-methoxyphenyl)boronic acid Chemical compound COC1=CC=CC=C1B(O)O ROEQGIFOWRQYHD-UHFFFAOYSA-N 0.000 description 3
- ZOKIJILZFXPFTO-UHFFFAOYSA-N 4-methyl-n-[4-[1-[4-(4-methyl-n-(4-methylphenyl)anilino)phenyl]cyclohexyl]phenyl]-n-(4-methylphenyl)aniline Chemical compound C1=CC(C)=CC=C1N(C=1C=CC(=CC=1)C1(CCCCC1)C=1C=CC(=CC=1)N(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZOKIJILZFXPFTO-UHFFFAOYSA-N 0.000 description 3
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 150000001454 anthracenes Chemical class 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 125000006575 electron-withdrawing group Chemical group 0.000 description 3
- 230000001815 facial effect Effects 0.000 description 3
- 125000002541 furyl group Chemical group 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical group C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 125000003367 polycyclic group Chemical group 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 3
- 125000001544 thienyl group Chemical group 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical group C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 2
- YIMJTKGCISAWIF-UHFFFAOYSA-N 2-(2-methoxyphenyl)-1,10-phenanthroline dihydrochloride Chemical compound Cl.Cl.COC1=CC=CC=C1C1=CC=C(C=CC=2C3=NC=CC=2)C3=N1 YIMJTKGCISAWIF-UHFFFAOYSA-N 0.000 description 2
- KYGSXEYUWRFVNY-UHFFFAOYSA-N 2-pyran-2-ylidenepropanedinitrile Chemical class N#CC(C#N)=C1OC=CC=C1 KYGSXEYUWRFVNY-UHFFFAOYSA-N 0.000 description 2
- OBAJPWYDYFEBTF-UHFFFAOYSA-N 2-tert-butyl-9,10-dinaphthalen-2-ylanthracene Chemical compound C1=CC=CC2=CC(C3=C4C=CC=CC4=C(C=4C=C5C=CC=CC5=CC=4)C4=CC=C(C=C43)C(C)(C)C)=CC=C21 OBAJPWYDYFEBTF-UHFFFAOYSA-N 0.000 description 2
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- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
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- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
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- 239000006069 physical mixture Substances 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
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- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
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- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
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- 125000006413 ring segment Chemical group 0.000 description 1
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- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
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- 239000000741 silica gel Substances 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
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- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
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- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000005621 tetraalkylammonium salts Chemical class 0.000 description 1
- 150000003518 tetracenes Chemical class 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- ARZGWBJFLJBOTR-UHFFFAOYSA-N tetradecanamide Chemical compound CCCCCCCCCCCCCC(N)=O.CCCCCCCCCCCCCC(N)=O ARZGWBJFLJBOTR-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-O triethylammonium ion Chemical compound CC[NH+](CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-O 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N trihydridoboron Substances B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-O triphenylphosphanium Chemical compound C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-O 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
M-X−R (VI)
(式中、Mはアルカリ金属カチオンであり、Xは酸素、窒素、又は硫黄を含むアニオン性原子であり、Rは炭素を含有する有機ラジカルである)に従う式を有する。式(VI)において、Xは好ましくは酸素であり、且つRは好ましくは芳香族炭化水素又は複素環である。
本発明は、小分子材料、オリゴマー材料、ポリマー材料、又はこれらの組み合わせを用いた多くのOLED構成で利用することができる。このような構成には、単一のアノードとカソードとを有する非常に単純な構造から、より複雑なデバイス(例えば、複数のアノードとカソードとが直交配列を成して画素を形成するパッシブマトリクスディスプレイ、及び各画素が例えば薄膜トランジスタ(TFT)によって独立して制御されるアクティブマトリクスディスプレイ)までが含まれる。本発明が首尾よく実施される有機層の構成は多数ある。本発明にとって必須の要件は、カソード、アノード、LEL、ETL、及びHILである。
所望のEL発光をアノードを通して見る場合には、アノード120は、対象となる発光に対して透明であるか、又は実質的に透明である必要がある。本発明で用いられる透明なアノード用の一般的な材料は、インジウム−スズ酸化物(ITO)、インジウム−亜鉛酸化物(IZO)、及びスズ酸化物であるが、他の金属酸化物(アルミニウムをドープした亜鉛酸化物、インジウムをドープした亜鉛酸化物、マグネシウム−インジウム酸化物、ニッケル−タングステン酸化物が挙げられるが、これらに限定されない)も有効である。これらの酸化物に加え、金属窒化物(例えば窒化ガリウム)、金属セレン化物(例えばセレン化亜鉛)、及び金属硫化物(例えば硫化亜鉛)をアノード120として用いることができる。EL発光をカソード140のみを通して見るような用途ではアノード120の透光特性は重要でなく、透明、不透明又は反射性の任意の導電性材料を使用することができる。この用途での導体の例としては、金、イリジウム、モリブデン、パラジウム、及び白金が挙げられるが、これらに限定されない。典型的なアノード用材料は、光透過性であろうとそうでなかろうと、仕事関数が4.1eV以上である。望ましいアノード用材料は、一般に、任意の好適な手段(例えば蒸着、スパッタリング、化学蒸着、又は電気化学的手段)で堆積させる。アノードは、既知のフォトリソグラフィ法を利用してパターニングすることができる。任意で、アノードを研磨した後に他の層を塗布することで表面粗度を小さくして、短絡を最少にすること、又は反射性を向上させることができる。
必ずしも必要な訳ではないが、OLEDにHILを設けることが有用であることが多い。OLED中のHIL130は、アノードからHTLへの正孔の注入を促進する役割を果たし得るが、それによりOLEDの駆動電圧が低下する。HIL130に使用するのに好適な材料としては、米国特許第4,720,432号明細書に記載されるようなポルフィリン化合物、及び幾つかの芳香族アミン(例えば4,4’,4’’−トリス[(3−エチルフェニル)フェニルアミノ]トリフェニルアミン(m−TDATA))が挙げられるが、これらに限定されない。OLEDに有用であることが報告されている代替的な正孔注入材料は、欧州特許出願公開第0891121号明細書及び欧州特許出願公開第1029909号明細書に記載されている。後述する芳香族第三級アミンも正孔注入材料として有用であり得る。ジピラジノ[2,3−f:2’,3’−h]キノキサリンヘキサカルボニトリル等の他の有用な正孔注入材料が、米国特許出願公開第2004/0113547号明細書及び米国特許第6,720,573号明細書に記載されている。また、米国特許第6,423,429号明細書に記載されるように、p型ドープ有機層もHILに有用である。「p型ドープ有機層」という用語は、この層がドープ後に半導体特性を有し、この層を流れる電流が実質的に正孔により搬送されることを意味する。導伝性は、ドーパントからホスト材料への正孔の移動による電荷移動錯体の形成によってもたらされる。
HTL132は、少なくとも1つの正孔輸送材料(例えば芳香族第三級アミン)を含有する。芳香族第三級アミンは、炭素原子(そのうちの少なくとも1つは芳香環の成員である)のみに結合する少なくとも1つの三価窒素原子を含有する化合物であると理解される。芳香族第三級アミンの1つの形態は、アリールアミン(例えばモノアリールアミン、ジアリールアミン、トリアリールアミン又は高分子アリールアミン)である。単量体トリアリールアミンの例は、Klupfel et al.の米国特許第3,180,730号明細書に示されている。1つ以上のビニルラジカル、又は少なくとも1つの活性な水素含有基で置換された他の好適なトリアリールアミンは、Brantley, et al.の米国特許第3,567,450号明細書及び同第3,658,520号明細書に開示されている。
1,1−ビス(4−ジ−p−トリルアミノフェニル)シクロヘキサン、
1,1−ビス(4−ジ−p−トリルアミノフェニル)−4−フェニルシクロヘキサン、 1,5−ビス[N−(1−ナフチル)−N−フェニルアミノ]ナフタレン、
2,6−ビス(ジ−p−トリルアミノ)ナフタレン、
2,6−ビス[ジ−(1−ナフチル)アミノ]ナフタレン、
2,6−ビス[N−(1−ナフチル)−N−(2−ナフチル)アミノ]ナフタレン、
2,6−ビス[N,N−ジ(2−ナフチル)アミン]フルオレン、
4−(ジ−p−トリルアミノ)−4’−[4−(ジ−p−トリルアミノ)−スチリル]スチルベン、
4,4’−ビス(ジフェニルアミノ)クアドリフェニル、
4,4’’−ビス[N−(1−アントリル)−N−フェニルアミノ]−p−テルフェニル、
4,4’−ビス[N−(1−コロネニル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(1−ナフチル)−N−フェニルアミノ]ビフェニル(NPB)、
4,4’−ビス[N−(1−ナフチル)−N−(2−ナフチル)アミノ]ビフェニル(TNB)、
4,4’’−ビス[N−(1−ナフチル)−N−フェニルアミノ]−p−テルフェニル、
4,4’−ビス[N−(2−ナフタセニル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(2−ナフチル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(2−ペリレニル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(2−フェナントリル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(2−ピレニル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(3−アセナフテニル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(3−メチルフェニル)−N−フェニルアミノ]ビフェニル(TPD)、
4,4’−ビス[N−(8−フルオランテニル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス[N−(9−アントリル)−N−フェニルアミノ]ビフェニル、
4,4’−ビス{N−フェニル−N−[4−(1−ナフチル)−フェニル]アミノ}ビフェニル、
4,4’−ビス[N−フェニル−N−(2−ピレニル)アミノ]ビフェニル、
4,4’,4’’−トリス[(3−メチルフェニル)フェニルアミノ]トリフェニルアミン(m−TDATA)、
ビス(4−ジメチルアミノ−2−メチルフェニル)−フェニルメタン、
N−フェニルカルバゾール、
N,N’−ビス[4−([1,1’−ビフェニル]−4−イルフェニルアミノ)フェニル]−N,N’−ジ−1−ナフタレニル−[1,1’−ビフェニル]−4,4’−ジアミン、
N,N’−ビス[4−(ジ−1−ナフタレニルアミノ)フェニル]−N,N’−ジ−1−ナフタレニル−[1,1’−ビフェニル]−4,4’−ジアミン、
N,N’−ビス[4−[(3−メチルフェニル)フェニルアミノ]フェニル]−N,N’−ジフェニル−[1,1’−ビフェニル]−4,4’−ジアミン、
N,N−ビス[4−(ジフェニルアミノ)フェニル]−N’,N’−ジフェニル−[1,1’−ビフェニル]−4,4’−ジアミン、
N,N’−ジ−1−ナフタレニル−N,N’−ビス[4−(1−ナフタレニルフェニルアミノ)フェニル]−[1,1’−ビフェニル]−4,4’−ジアミン、
N,N’−ジ−1−ナフタレニル−N,N’−ビス[4−(2−ナフタレニルフェニルアミノ)フェニル]−[1,1’−ビフェニル]−4,4’−ジアミン、
N,N,N−トリ(p−トリル)アミン、
N,N,N’,N’−テトラ−p−トリル−4,4’−ジアミノビフェニル、
N,N,N’,N’−テトラフェニル−4,4’−ジアミノビフェニル、
N,N,N’,N’−テトラ−1−ナフチル−4,4’−ジアミノビフェニル、
N,N,N’,N’−テトラ−2−ナフチル−4,4’−ジアミノビフェニル、及び
N,N,N’,N’−テトラ(2−ナフチル)−4,4’’−ジアミノ−p−テルフェニル。
任意の励起子ブロック層又は電子ブロック層(図1には示さない)がHTLとLELとの間に存在し得る。かかるブロック層の幾つかの好適な例が、米国特許出願公開第20060134460号明細書に記載されている。
米国特許第4,769,292号及び米国特許第5,935,721号明細書により詳しく説明されているように、図1に示す有機EL素子の発光層(LEL)134(複数可)は、発光、蛍光又はリン光材料を含み、この領域で電子−正孔対が再結合する結果としてエレクトロルミネッセンスが発生する。発光層は単一の材料で構成されていてもよいが、より一般的には、エレクトロルミネッセンスゲスト化合物(一般にドーパントと称される)をドープした非エレクトロルミネッセンス化合物(一般にホストと称される)、又は発光が主にエレクトロルミネッセンス化合物に由来する化合物からなり、任意の色であり得る。エレクトロルミネッセンス化合物は、0.01%〜50%で非エレクトロルミネッセンス成分材料にコーティングしてもよいが、典型的には0.01%〜30%、より典型的には0.01%〜15%で非エレクトロルミネッセンス成分にコーティングしてもよい。LELの厚さは任意の好適な厚さであり、0.1mm〜100mmの範囲内であり得る。
リン光LELに好適なホストは、ホストからリン光ドーパント(複数可)への三重項励起子の移動は効率的に起こり得るが、リン光ドーパント(複数可)からホストへの三重項励起子の移動は効率的には起こり得ないように選択しなくてはならない。したがって、ホストの三重項エネルギーが、リン光ドーパントの三重項エネルギーより高いことが非常に望ましい。一般的に言えば、大きな三重項エネルギーは光学バンドギャップが大きいことを示唆する。しかしながら、ホストのバンドギャップは、正孔の蛍光青色LELへの注入に対する許容し難い障壁、及びOLEDの駆動電圧の許容し難い上昇の原因となるほど大きくないように選択しなくてはならない。リン光LELのホストは、それが層中のリン光ドーパントの三重項エネルギーより高い三重項エネルギーを有する限り、HTL132に使用される上述の正孔輸送材料のいずれかを含み得る。リン光LELに使用されるホストは、HTL132に使用される正孔輸送材料と同一であっても、又は異なっていてもよい。場合によっては、リン光LELのホストは好適には、それがリン光ドーパントの三重項エネルギーより高い三重項エネルギーを有する限り、電子輸送材料(後述する)も含み得る。
1,1−ビス(4−(N,N−ジ−p−トリルアミノ)フェニル)シクロヘキサン(TAPC)、
1,1−ビス(4−(N,N−ジ−p−トリルアミノ)フェニル)シクロペンタン、
4,4’−(9H−フルオレン−9−イリデン)ビス[N,N−ビス(4−メチルフェニル)−ベンゼンアミン、
1,1−ビス(4−(N,N−ジ−p−トリルアミノ)フェニル)−4−フェニルシクロヘキサン、
1,1−ビス(4−(N,N−ジ−p−トリルアミノ)フェニル)−4−メチルシクロヘキサン、
1,1−ビス(4−(N,N−ジ−p−トリルアミノ)フェニル)−3−フェニルプロパン、
ビス[4−(N,N−ジエチルアミノ)−2−メチルフェニル](4−メチルフェニル(methylpenyl))メタン、
ビス[4−(N,N−ジエチルアミノ)−2−メチルフェニル](4−メチルフェニル)エタン、
4−(4−ジエチルアミノフェニル)トリフェニルメタン、
4,4’−ビス(4−ジエチルアミノフェニル)ジフェニルメタン。
4−(9H−カルバゾール−9−イル)−N,N−ビス[4−(9H−カルバゾール−9−イル)フェニル]−ベンゼンアミン(TCTA)、
4−(3−フェニル−9H−カルバゾール−9−イル)−N,N−ビス[4−(3−フェニル−9H−カルバゾール−9−イル)フェニル]−ベンゼンアミン、
9,9’−[5’−[4−(9H−カルバゾール−9−イル)フェニル][1,1’:3’,1’’−テルフェニル]−4,4’’−ジイル]ビス−9H−カルバゾール、
9,9’−(2,2’−ジメチル[1,1’−ビフェニル]−4,4’−ジイル)ビス−9H−カルバゾール(CDBP);
9,9’−[1,1’−ビフェニル]−4,4’−ジイルビス−9H−カルバゾール(CBP)、
9,9’−(1,3−フェニレン)ビス−9H−カルバゾール(mCP)、
9,9’−(1,4−フェニレン)ビス−9H−カルバゾール、
9,9’,9’’−(1,3,5−ベンゼントリイル)トリス−9H−カルバゾール、
9,9’−(1,4−フェニレン)ビス[N,N,N’,N’−テトラフェニル−9H−カルバゾール−3,6−ジアミン、
9−[4−(9H−カルバゾール−9−イル)フェニル]−N,N−ジフェニル−9H−カルバゾール−3−アミン、
9,9’−(1,4−フェニレン)ビス[N,N−ジフェニル−9H−カルバゾール−3−アミン、
9−[4−(9H−カルバゾール−9−イル)フェニル]−N,N,N’,N’−テトラフェニル−9H−カルバゾール−3,6−ジアミン。
「蛍光」という用語は一般に、任意の発光材料を説明するために使用されるが、本件においては、該用語は一重項励起状態から発光する材料を指す。蛍光材料はリン光材料と同一の層、隣接する層、隣接する画素において、又は任意の組み合わせで使用され得る。本発明のリン光材料の性能に悪影響を与える材料を選択しないよう注意しなければならない。リン光材料と同一の層又は隣接する層における材料の濃度及び三重項エネルギーを、望ましくないリン光の消失を防ぐよう適切に設定すべきことが当業者には理解される。
O−1:アルミニウムトリスオキシン[別名、トリス(8−キノリノラト)アルミニウム(III)]
O−2:マグネシウムビスオキシン[別名、ビス(8−キノリノラト)マグネシウム(II)]
O−3:ビス[ベンゾ{f}−8−キノリノラト]亜鉛(II)
O−4:ビス(2−メチル−8−キノリノラト)アルミニウム(III)−μ−オキソ−ビス(2−メチル−8−キノリノラト)アルミニウム(III)
O−5:インジウムトリスオキシン[別名、トリス(8−キノリノラト)インジウム] O−6:アルミニウムトリス(5−メチルオキシン)[別名、トリス(5−メチル−8−キノリノラト)アルミニウム(III)]
O−7:リチウムオキシン[別名、(8−キノリノラト)リチウム(I)]
O−8:ガリウムオキシン[別名、トリス(8−キノリノラト)ガリウム(III)] O−9:ジルコニウムオキシン[別名、テトラ(8−キノリノラト)ジルコニウム(IV)]
O−10:ビス(2−メチル−8−キノリナト)−4−フェニルフェノラトアルミニウム(III)。
スペーサ層が存在する場合、スペーサ層はLELと直接接触させて配置される。スペーサ層は、アノード若しくはカソードのいずれかの上に配置してもよく、又はさらにはLELの両側に配置してもよい。スペーサ層は典型的にはいかなる発光ドーパントをも含有しない。1つ又は複数の材料を使用してもよく、材料は上記で規定されるような正孔輸送材料、又は下記に規定されるような電子輸送材料のいずれかであり得る。リン光LELの隣に配置した場合、スペーサ層中の材料は、LEL中のリン光ドーパントの三重項エネルギーより高い三重項エネルギーを有しなくてはならない。最も望ましくは、スペーサ層中の材料は隣接するLELにおいてホストとして使用されるものと同一である。したがって、記載されるいずれのホスト材料もスペーサ層に使用する上でも好適である。スペーサ層は薄くなくてはならず、少なくとも0.1nm、好ましくは1.0nm〜20nmの範囲内である。
リン光エミッタを含有するLELが存在する場合、励起子及び再結合現象をLELに局限するのを助けるために、正孔ブロック層135を電子輸送層136と発光層134との間に配置するのが望ましい。この場合、共通ホストから正孔ブロック層への正孔の移動に対するエネルギー障壁がなくてはならず、一方で電子が正孔ブロック層から共通ホスト材料及びリン光エミッタを含む発光層へと容易に受け渡される必要がある。さらに、正孔ブロック材料の三重項エネルギーがリン光材料の三重項エネルギーより大きいことが望ましい。好適な正孔ブロック材料は、国際公開第00/70655号パンフレット、国際公開第01/41512号パンフレット、及び国際公開第01/93642号パンフレットに記載されている。有用な正孔ブロック材料の2つの例は、バトクプロイン(BCP)及びビス(2−メチル−8−キノリノラト)(4−フェニルフェノラト)アルミニウム(III)(BAlq)である。米国特許出願公開第20030068528号明細書に記載されるように、BAlq以外の金属錯体も正孔及び励起子を遮断することが知られている。正孔ブロック層を使用する場合、その厚さは2nm〜100nm、好適には5nm〜10nmであり得る。
電子輸送層136は、混合クラスター化合物のみから構成されていても、又はクラスター化合物と他の適切な材料との混合物であってもよい。混合クラスター化合物とさらなる材料との体積比%は1%〜99%のいずれであってもよく、より好適には10%〜90%、最も望ましくは30%〜70%である。使用されるクラスター化合物又は任意のさらなる材料は、LEL又はスペーサ層においてホストとして使用されるものと同一であっても又は異なっていてもよい。ETL136は任意で副層に分かれていてもよい。
2,4,6−トリス(ジフェニルアミノ)−1,3,5−トリアジン、
2,4,6−トリカルバゾロ−1,3,5−トリアジン、
2,4,6−トリス(N−フェニル−2−ナフチルアミノ)−1,3,5−トリアジン、
2,4,6−トリス(N−フェニル−1−ナフチルアミノ)−1,3,5−トリアジン、
4,4’,6,6’−テトラフェニル−2,2’−ビ−1,3,5−トリアジン、
2,4,6−トリス([1,1’:3’,1’’−テルフェニル]−5’−イル)−1,3,5−トリアジン。
本発明の幾つかの実施形態において、クラスター化合物はEIL138中に配置される。他の好適な材料をEILに使用してもよい。例えば、EILは、ホストとして少なくとも1つの電子輸送材料、及び少なくとも1つのn型ドーパントを含有するn型ドープ層であってもよい。ドーパントは、電荷移動によってホストを還元することが可能である。「n型ドープ層」という用語は、この層がドープ後に半導体特性を有し、この層を流れる電流が実質的に電子により搬送されることを意味する。
アノードのみを通して発光を見る場合には、カソード140は、ほぼ任意の導電性材料を含む。望ましい材料は、下にある有機層との効果的な接触を確実にする有効な膜形成特性を有し、低電圧で電子の注入を促進し、有効な安定性を有する。有用なカソード材料は、仕事関数が小さな金属又は合金(4.0eV未満)を含有することが多い。好ましいカソード材料の1つは、米国特許第4,885,221号明細書に記載されるようなMg:Ag合金を含む。別の好適な種類のカソード材料としては、有機層(例えば有機EIL又はETL)に接触する薄い無機EILを含み、より厚い導電性金属層で覆われる二重層が挙げられる。ここで、無機EILは仕事関数が小さな金属又は金属塩を含んでいることが好ましく、そのような場合には、より厚い被覆層が小さな仕事関数を有する必要はない。かかるカソードの1つは、米国特許第5,677,572号明細書に記載されているように、LiFの薄層と、それに続くより厚いAl層を含む。他の有用なカソード材料の組としては、米国特許第5,059,861号明細書、同第5,059,862号明細書、及び同第6,140,763号明細書に開示されているものが挙げられるが、これらに限定されない。
OLED100は、典型的には支持基板110上に設けられるが、ここでアノード120又はカソード140のいずれかが基板と接触していてもよい。基板と接触する電極は便宜上、底面電極と称される。従来、底面電極はアノード120であるが、本発明はその構成に限定されない。基板は、意図される発光の方向に応じて光透過性であっても、又は不透明であってもよい。基板を通してEL発光を見るには光透過性が望ましい。このような場合には、透明なガラス又はプラスチックが一般に使用される。基板は複数の材料層を備える複雑な構造であってもよい。これは典型的には、OLED層の下側にTFTが設けられるアクティブマトリックス基板の場合に当てはまる。基板は、少なくとも発光画素化領域において、概ね透明な材料(ガラス又はポリマー等)から構成されることがさらに必要とされる。EL発光を上部電極を通して見る用途においては、底面支持体の光透過性は重要ではなく、したがって基板は光透過性であっても、光吸収性であっても、又は光反射性であってもよい。この場合に使用される基板としては、ガラス、プラスチック、半導体材料(ケイ素、セラミックス等)、及び回路基板材料が挙げられるが、これらに限定されない。この場合もやはり、基板は、アクティブマトリクスTFT設計において見られるような複数の材料層を備える複雑な構造であってもよい。これらのデバイス構成においては、光透明性の上部電極を設けることが必要とされる。
上記の有機材料は、好適には昇華によって堆積させるが、膜の形成を改善するために任意で結合剤を用いて溶媒から堆積させることもできる。材料がポリマーである場合には、溶媒堆積が通常は好ましい。昇華によって堆積させる材料は、例えば米国特許第6,237,529号明細書に記載されるように、タンタル材料で構成されることの多い昇華「ボート」(sublimator "boat")から蒸発させるか、又は最初にドナーシートにコーティングし、次いで基板のより近くで昇華させることができる。材料の混合物を含む層では、別個の昇華ボートを用いるか、又は材料を予め混合し、単一のボート若しくはドナーシートからコーティングすることができる。パターニング堆積は、シャドーマスク、一体化シャドーマスク(米国特許第5,294,870号明細書)、ドナーシートからの空間的に限定された染料熱転写(米国特許第5,851,709号明細書及び米国特許第6,066,357号明細書)、インクジェット法(米国特許第6,066,357号明細書)を利用して実現することができる。
大抵のOLEDデバイスは、水分及び/又は酸素に敏感であるため、一般に不活性雰囲気(例えば窒素又はアルゴン)中で、乾燥剤(例えばアルミナ、ボーキサイト、硫酸カルシウム、クレイ、シリカゲル、ゼオライト、アルカリ金属酸化物、アルカリ土類金属酸化物、金属硫酸塩、又は金属ハロゲン化物及び金属過塩素酸塩)と共に密封される。封止及び乾燥のための方法としては、米国特許第6,226,890号明細書に記載される方法が挙げられるが、これに限定されない。
フルカラーディスプレイに対しては、LELの画素化が必要とされ得る。このLELの画素化堆積は、シャドーマスク、一体化シャドーマスク(米国特許第5,294,870号明細書)、ドナーシートからの空間的に限定された染料熱転写(米国特許第5,688,551号明細書、同第5,851,709号明細書、及び同第6,066,357号明細書)、並びにインクジェット法(米国特許第6,066,357号明細書)を用いて行なわれる。
Inv−1の調製に必要とされる出発物質である、リチウム2−(1,10−フェナントロリン−2−イル)−フェノレート(5)の合成をスキーム1に概略的に説明する。
2−クロロ−1,10−フェナントロリンを、B. E. Halcrow, Wm. O. Kermack; Journal of the Chemical Society (1946), 155-7の手順に従って、1,10−フェナントロリンから調製し、十分な収率で単離した。
2−クロロ−1,10−フェナントロリン(5.9g、27.5mmol)、2−メトキシフェニルボロン酸(2)(5g、33mmol)、テトラキス(トリフェニルホスフィン)パラジウム(0)(1g、0.825mmol)、2M Na2CO3(33mL、66mmol)、及びエタノール(8mL)を、トルエン(70mL)中に懸濁し、よく攪拌しながら24時間100℃に加熱した。この期間が終了した時点で、反応物を冷却し、酢酸エチル(200mL)で希釈して、水層を流出させた。有機層を水(3×100mL)及び断続的にブラインで洗浄し、形成されるエマルションを溶解した(break up)。有機層をセライトパッドを通して濾過し、MgSO4で乾燥させ、濾過し、濃縮して油を得た。この油をCH2Cl2(20mL)中に溶解させ、ジエチルエーテル(150mL)を添加した。よく攪拌しながら、濃HClの20%エタノール溶液(20mL)を添加した。黄色の2−(2−メトキシフェニル)−1,10−フェナントロリンヒドロクロリド・クロリドを濾過して、エーテルで洗浄し、風乾した。収量:9.7g。
濃HCl(17.6mL)及びピリジン(16mL)を室温で混合した。得られた溶液を、窒素を溶液表面上に通しながら砂浴上で加熱し、蒸留物をディーン・スタークトラップに回収した。反応器の内部温度を1時間かけて215℃〜220℃まで上昇させた。溶液を140℃まで冷却した後、2−(2−メトキシフェニル)−1,10−フェナントロリンヒドロクロリド・クロリド(6g、18.59mmol)を添加した。よく攪拌しながら、得られた溶液の温度を再度215℃〜220℃まで上昇させ、この温度で3時間保持した。次いで、溶液を100℃に冷却し、慎重に水(10mL)で処理した後、最終的に過剰の水(70mL)中に注ぎ入れて、ゴム状固体を沈殿させた。よく攪拌しながら、溶液のpHを固体Na2CO3を用いて6〜7に調整した。この橙色の固体を濾過し、水でよく洗浄して、乾燥させた。2−(2−ヒドロキシフェニル)−1,10−フェナントロリンの収量は4.6gであった。
2−(2−ヒドロキシフェニル)−1,10−フェナントロリン(4)(20g、73.45mmol)をテトラヒドロフラン中に溶解させて、よく攪拌しながらリチウムt−ブトキシド(5.65g、88.14mmol)で処理した。沈殿した生成物を反応混合物中、室温で1時間攪拌し、反応を完了させた。リチウム2−(1,10−フェナントロリン−2−イル)−フェノレートを濾過し、ジエチルエーテルでよく洗浄して、風乾させた。収量:21g。
リチウムキノレート(5)(1.5g、9.93mmol)及びリチウム2−(1,10−フェナントロリン−2−イル)−フェノレート(6)(1.4g、4.96mmol)を乳鉢及び乳棒で粉砕し、均質混合物とした。次いで、この材料混合物を290℃/10-3mmHgで昇華させて、1.5gのInv−1を得た。
リチウムペンタフルオロフェノレート(1g、1.32mmol)及びリチウム2−(1,10−フェナントロリン−2−イル)−フェノレート(6)(0.37g、0.66mmol)を乳鉢及び乳棒で粉砕し、均質混合物とした。次いで、この材料混合物を235℃/10-3mmHgで昇華させて、0.2gのInv−5を得た。
一連のELデバイス(3.1〜3.4)を以下の方法で組み立てた:
1. 85nmのインジウム−スズ酸化物(ITO)の層でコーティングしたガラス基板をアノードとして、順に、市販の界面活性剤中で超音波処理し、脱イオン水でリンスし、約1分間酸素プラズマに曝露した。
2. 米国特許第6,208,075号明細書に記載されるようなCHF3のプラズマ支援堆積によって、ITO上に1nmのフッ化炭素(CFx)正孔注入層(HIL)を堆積させた。
3. 次いで、正孔輸送材料4,4’−ビス[N−(1−ナフチル)−N−フェニルアミノ]ビフェニル(NPB)の層を、75nmの厚さに堆積させた。
4. ホスト材料P−1及び1.5体積%のFD−54に相当する20nmの発光層(LEL)を次に堆積させた。
5. Li6Q6及びP−1の混合物(1:1)の35nmの電子輸送層(ETL)を、LEL上に真空蒸着した。
6. 表1に示すようなLi6Q6及びInv−1の電子注入層(EIL)を、ETL上に真空蒸着した。
7. 最後に、100nmのアルミニウムの層をEIL上に堆積させて、カソードを形成した。
一連のELデバイス(4.1〜4.4)を、工程5のETL混合物においてLi6Q6の代わりにInv−1を使用した以外は、実施例3と同様の方法で組み立てた。結果を表2に報告する。
一連のELデバイス(5.1〜5.4)を、工程5のETLに、実施例5.1〜実施例5.3においてはInv−1を使用し、実施例5.4〜実施例5.6においてはLi6Q6を比較目的で使用した以外は、実施例3と同様の方法で組み立てた。工程6のEILにおいてはLiF(5nm)を使用した。結果を表3に報告する。
一連のELデバイス(6.1〜6.9)を下記に詳述する方法で組み立てた。実施例6.1〜実施例6.3はEILにLi6Q6を組み込んだ比較用デバイスであり、一方で6.4〜6.6はInv−1をEILとした本発明の実施例の組であり、6.7〜6.9はInv−2をEILとした本発明の実施例の別の組である。比較のために、各々の組は同じレベルのEILを含有する。結果を表4に報告する。
1. 米国特許第6,208,075号明細書に記載されるようなCHF3のプラズマ支援堆積によって、ITO上に1nmのフッ化炭素(CFx)正孔注入層(HIL1)を堆積させた。
2. 次いで、ジピラジノ[2,3−f:2’,3’−h]キノキサリンヘキサカルボニトリルの正孔注入層(HTL2)を10nmの厚さに堆積させた。
3. 次いで、正孔輸送材料4,4’−ビス[N−(1−ナフチル)−N−フェニルアミノ]ビフェニル(NPB)の層を、85nmの厚さに堆積させた。
4. P−1中1.5%のFD−54の20nmの発光層(LEL)を次に堆積させた。
5. Li6Q6及びP−1の混合物(1:1)の35nmの電子輸送層(ETL)を、LEL上に真空蒸着した。
6. 表4に示すような電子注入材料(EIL)の層を、ETL上に真空蒸着した。
7. 最後に、100nmのアルミニウムの層を堆積させて、カソード層を形成した。
100 OLED
110 基板
120 アノード
130 正孔注入層(HIL)
132 正孔輸送層(HTL)
134 発光層(LEL)
135 正孔ブロック層(HBL)
136 電子輸送層(ETL)
138 電子注入層(EIL)
140 カソード
150 電圧/電流源
160 電気コネクタ
Claims (23)
- カソードと、アノードとを備え、且つそれらの間に、第1のサブユニット及び第2のサブユニットを含む、中性の電荷を有する混合クラスター化合物を含有する層を有するOLEDデバイスであって、前記第1のサブユニットが、アニオン性ヒドロキシ基を持つ窒素含有複素環配位子のアルカリ金属塩を含み、且つ前記第2のサブユニットが、該第1のサブユニットとは異なる有機アルカリ金属塩を含み、両方のサブユニットのアルカリ金属カチオンが同じであるOLEDデバイス。
- 前記カソードと、前記アノードとの間に配置される発光層をさらに備え、且つ前記クラスター化合物を含有する層が、該発光層と、該カソードとの間に配置される請求項1に記載のOLEDデバイス。
- 前記アルカリ金属カチオンがリチウムである請求項1に記載のOLEDデバイス。
- 前記第2のサブユニットの前記有機アルカリ金属塩が、
(i)前記第1のサブユニットとは異なる、アニオン性ヒドロキシ基を持つ窒素含有複素環配位子のアルカリ金属塩、又は
(ii)フェノール若しくはナフトールのアルカリ金属塩のいずれかである請求項1に記載のOLEDデバイス。 - 第1のサブユニット及び第2のサブユニットを含む、中性の電荷を有する混合クラスター化合物であって、前記第1のサブユニットが、アニオン性ヒドロキシ基を持つ窒素含有複素環配位子のアルカリ金属塩を含み、且つ前記第2のサブユニットが、該第1のサブユニットとは異なる有機アルカリ金属塩を含み、両方のサブユニットのアルカリ金属カチオンが同じである混合クラスター化合物。
- 前記アルカリ金属カチオンがリチウムである請求項11に記載のクラスター化合物。
- 前記第2のサブユニットの前記有機アルカリ金属塩が、アニオン性ヒドロキシ基を持つ窒素含有複素環配位子のアルカリ金属塩である請求項11に記載のクラスター化合物。
- 前記第2のサブユニットが、フェノール又はナフトールのアルカリ金属塩である請求項11に記載のクラスター化合物。
- 請求項11に記載の混合クラスター化合物を調製する方法であって、前記個々のサブユニットに対応する化合物を、少なくとも100℃の沸点を有する非反応性有機溶媒中で一緒に加熱する混合クラスター化合物の調製方法。
- 請求項11に記載の混合クラスター化合物を調製する方法であって、前記個々のサブユニットに対応する化合物を固体状態で一緒に加熱する混合クラスター化合物の調製方法。
- 前記個々のサブユニットに対応する化合物を固体状態で一緒に加熱し、且つ前記混合クラスター化合物を昇華により単離する請求項22に記載の方法。
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JP7489486B2 (ja) | 2021-06-30 | 2024-05-23 | 寧徳時代新能源科技股▲分▼有限公司 | 有機-無機ハイブリッド型錯体及びそれを含むコーティング組成物、セパレータ、二次電池、電池モジュール、電池パックと電力消費装置 |
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TW200934856A (en) | 2009-08-16 |
US20090142618A1 (en) | 2009-06-04 |
KR20100106443A (ko) | 2010-10-01 |
CN101878554A (zh) | 2010-11-03 |
TWI431096B (zh) | 2014-03-21 |
CN101878554B (zh) | 2012-07-25 |
WO2009073088A1 (en) | 2009-06-11 |
JP5841334B2 (ja) | 2016-01-13 |
US8900722B2 (en) | 2014-12-02 |
KR101491677B1 (ko) | 2015-02-09 |
EP2232612B1 (en) | 2017-02-08 |
EP2232612A1 (en) | 2010-09-29 |
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