JP2011503348A5 - - Google Patents

Download PDF

Info

Publication number
JP2011503348A5
JP2011503348A5 JP2010531216A JP2010531216A JP2011503348A5 JP 2011503348 A5 JP2011503348 A5 JP 2011503348A5 JP 2010531216 A JP2010531216 A JP 2010531216A JP 2010531216 A JP2010531216 A JP 2010531216A JP 2011503348 A5 JP2011503348 A5 JP 2011503348A5
Authority
JP
Japan
Prior art keywords
layer
catalyst
patterned
metal
fraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2010531216A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011503348A (ja
Filing date
Publication date
Priority claimed from US11/877,637 external-priority patent/US7666568B2/en
Application filed filed Critical
Publication of JP2011503348A publication Critical patent/JP2011503348A/ja
Publication of JP2011503348A5 publication Critical patent/JP2011503348A5/ja
Abandoned legal-status Critical Current

Links

JP2010531216A 2007-10-23 2008-10-23 組成物および高い伝導性を有するパターニングされた金属層の提供方法 Abandoned JP2011503348A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/877,637 US7666568B2 (en) 2007-10-23 2007-10-23 Composition and method for providing a patterned metal layer having high conductivity
PCT/US2008/080851 WO2009055515A1 (en) 2007-10-23 2008-10-23 Composition and method for providing a patterned metal layer having high conductivity

Publications (2)

Publication Number Publication Date
JP2011503348A JP2011503348A (ja) 2011-01-27
JP2011503348A5 true JP2011503348A5 (https=) 2011-12-08

Family

ID=40219442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010531216A Abandoned JP2011503348A (ja) 2007-10-23 2008-10-23 組成物および高い伝導性を有するパターニングされた金属層の提供方法

Country Status (7)

Country Link
US (1) US7666568B2 (https=)
EP (1) EP2200838B1 (https=)
JP (1) JP2011503348A (https=)
KR (1) KR20100087018A (https=)
CN (1) CN101835624B (https=)
AT (1) ATE529266T1 (https=)
WO (1) WO2009055515A1 (https=)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2401669B1 (en) * 2009-02-26 2016-04-06 3M Innovative Properties Company Touch screen sensor and patterned substrate having overlaid micropatterns with low visibility
US20110279398A1 (en) * 2010-05-12 2011-11-17 Harald Philipp Touch screen electrode enhancements
GB201009847D0 (en) * 2010-06-11 2010-07-21 Dzp Technologies Ltd Deposition method, apparatus, printed object and uses
CN102465259A (zh) * 2010-11-11 2012-05-23 鸿富锦精密工业（深圳）有限公司 塑料表面电磁屏蔽处理方法及其制品
US10526198B2 (en) * 2011-03-04 2020-01-07 Texas Instruments Incorporated Infrared sensor design using an epoxy film as an infrared absorption layer
JP6028727B2 (ja) * 2011-05-18 2016-11-16 戸田工業株式会社 銅粉末、銅ペースト、導電性塗膜の製造方法及び導電性塗膜
KR20130007042A (ko) * 2011-06-28 2013-01-18 삼성디스플레이 주식회사 열전사용 도너 필름, 이의 제조 방법 및 이를 이용한 유기 발광 소자의 제조 방법
WO2013054475A1 (ja) * 2011-10-14 2013-04-18 キヤノン株式会社 電子写真用部材、プロセスカートリッジおよび電子写真装置
CN103184440B (zh) * 2011-12-27 2015-12-02 比亚迪股份有限公司 一种表面选择性金属化的制品及其制备方法
US9204535B2 (en) * 2012-04-18 2015-12-01 Lg Chem, Ltd. Conductive structure and method for manufacturing same
KR101983691B1 (ko) * 2012-08-17 2019-05-30 삼성디스플레이 주식회사 차광 부재 및 이를 포함하는 표시 장치
JP5694265B2 (ja) * 2012-10-02 2015-04-01 学校法人関東学院 無電解めっき方法及び無電解めっき膜
KR101468690B1 (ko) * 2012-11-19 2014-12-04 엔젯 주식회사 고점도 전도성 나노 잉크 조성물로 이루어진 전극선을 포함하는 투명전극 및 이를 이용한 터치센서, 투명히터 및 전자파 차폐제
TW201445006A (zh) * 2013-05-23 2014-12-01 Byd Co Ltd 聚合物製品表面選擇性金屬化方法及其製備的聚合物製品
JP6275482B2 (ja) * 2013-06-03 2018-02-07 株式会社レグルス プラスチック製成形品への回路パターンの形成方法及びこれに用いる塗工液
US9448666B2 (en) 2013-06-08 2016-09-20 Microsoft Technology Licensing, Llc Dark film lamination for a touch sensor
WO2014209575A1 (en) 2013-06-24 2014-12-31 University Of Houston System Metallic nanomesh
RU2554608C2 (ru) * 2013-07-01 2015-06-27 Общество с ограниченной ответственностью "Солар" Способ получения просветляющего покрытия
KR101617534B1 (ko) * 2013-08-01 2016-05-02 주식회사 엘지화학 3차원 구조의 금속 패턴 제조 방법
JP6079505B2 (ja) 2013-08-26 2017-02-15 三菱マテリアル株式会社 接合体及びパワーモジュール用基板
EP3041045B1 (en) * 2013-08-26 2019-09-18 Mitsubishi Materials Corporation Bonded body and power module substrate
KR20150057032A (ko) * 2013-11-18 2015-05-28 삼성전기주식회사 터치 패널 및 그의 제조 방법
JP2015164030A (ja) 2014-01-31 2015-09-10 住友金属鉱山株式会社 導電性基板、積層導電性基板、導電性基板の製造方法、及び積層導電性基板の製造方法
JP5829746B1 (ja) * 2014-04-04 2015-12-09 キヤノン・コンポーネンツ株式会社 導電膜及びその製造方法並びにめっき皮膜付樹脂製品及びその製造方法
CN103935078B (zh) * 2014-04-04 2016-08-24 刘从余 一种复合片材及其制备方法和设备
JP6275861B2 (ja) * 2014-09-29 2018-02-07 富士フイルム株式会社 積層体、導電性積層体およびその製造方法、タッチパネルセンサー、タッチパネル、転写フィルム
CN104294244B (zh) * 2014-10-24 2017-05-31 中国科学院上海光学精密机械研究所 激光辅助化学混合镀实现二维表面金属结构的方法
TWI584708B (zh) * 2014-11-28 2017-05-21 財團法人工業技術研究院 導線結構及其製造方法
US20190053381A1 (en) * 2014-11-28 2019-02-14 Industrial Technology Research Institute Structure of conductive lines and method of manufacturing the same
KR102412896B1 (ko) 2014-12-18 2022-06-24 삼성전자 주식회사 단말의 설비 제어를 지원하는 방법 및 장치
CN107210097A (zh) * 2014-12-26 2017-09-26 日本科技先进有限公司 在透明基板上具有图案化的导电性高分子层的层叠基板的制造方法以及金属网基板的制造方法
WO2016127362A1 (zh) * 2015-02-12 2016-08-18 四川大学华西医院 一种磁共振用鼠标及其制作方法和信号传输装置
JP5843992B1 (ja) * 2015-05-01 2016-01-13 株式会社イオックス 無電解めっき用転写フィルム用触媒組成物及び無電解めっき用転写フィルム
KR20170012679A (ko) 2015-07-22 2017-02-03 희성전자 주식회사 터치 센서의 제조 방법 및 이 방법으로 제조되는 터치 센서
US9915002B2 (en) * 2015-09-21 2018-03-13 Ethan Pfeiffer System and method for producing a nano metal mesh using a brittle film template for lithography
TW202224211A (zh) * 2016-03-31 2022-06-16 美商伊雷克托科學工業股份有限公司 用於導電電鍍的雷射種晶之方法
CN109492504B (zh) * 2017-09-12 2023-07-04 江西欧迈斯微电子有限公司 超声波生物识别装置及其制备方法和电子设备
TWI646672B (zh) 2017-12-01 2019-01-01 財團法人工業技術研究院 紅外線感測元件及其製造方法
US10519595B2 (en) 2017-12-29 2019-12-31 Industrial Technology Research Institute Composite textile
EP3804140A2 (de) * 2018-06-07 2021-04-14 Continental Automotive GmbH Schwarz gefärbter gegenstand mit einer elektromagnetischen- oder elektrischen feld funktion
US11426818B2 (en) 2018-08-10 2022-08-30 The Research Foundation for the State University Additive manufacturing processes and additively manufactured products
CN117845201B (zh) * 2024-01-03 2025-03-14 江苏未来像素科技有限公司 一种复合铜箔及其制备方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4743091A (en) * 1986-10-30 1988-05-10 Daniel Gelbart Two dimensional laser diode array
EP0308518B1 (en) 1987-04-06 1995-07-05 Sigmax Ltd. Ink receiving flexible sheet for printing a pattern on an object by firing and label comprising said sheet
US5256506A (en) * 1990-10-04 1993-10-26 Graphics Technology International Inc. Ablation-transfer imaging/recording
SE9200564L (sv) * 1992-02-26 1993-03-15 Perstorp Ab Dendritisk makromolekyl av polyestertyp, foerfarande foer framstaellning daerav samt anvaendning daerav
SE503342C2 (sv) * 1994-10-24 1996-05-28 Perstorp Ab Hyperförgrenad makromolekyl av polyestertyp samt förfarande för dess framställning
US5994489A (en) * 1994-10-24 1999-11-30 The Dow Chemical Company Adhesion promoter and self-priming arylcyclobutene resin compositions
JP3585598B2 (ja) 1995-08-25 2004-11-04 大日本印刷株式会社 熱転写シート
US6207268B1 (en) * 1996-11-12 2001-03-27 Dai Nippon Printing Co., Ltd. Transfer sheet, and pattern-forming method
US6765082B2 (en) * 1998-12-22 2004-07-20 Bayer Aktiengesellschaft Method for producing highly-branched glycidol-based polyols
SE514207C2 (sv) * 1999-03-23 2001-01-22 Perstorp Ab Hyperförgrenad dendritisk polyeter och förfarande för framställning därav
CN1414903A (zh) * 1999-12-28 2003-04-30 株式会社日本触媒 多层材料
US6228555B1 (en) * 1999-12-28 2001-05-08 3M Innovative Properties Company Thermal mass transfer donor element
US6645681B2 (en) * 2000-12-15 2003-11-11 E. I. Du Pont De Nemours And Company Color filter
JP2002185184A (ja) 2000-12-18 2002-06-28 Dainippon Printing Co Ltd 電磁波シールド材及びその製造方法
JP4668438B2 (ja) * 2001-03-08 2011-04-13 住友ゴム工業株式会社 電磁波シールド板及びその製造方法
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
AU2002329387B2 (en) * 2001-09-08 2007-06-07 Albireo Ab Benzothiazepine and benzothiadiazepine derivatives with ileal bile acid transport (IBAT) inhibitory activity for the treatment hyperlipidaemia
US6767980B2 (en) * 2002-04-19 2004-07-27 Nippon Shokubai Co., Ltd. Reactive diluent and curable resin composition
US7153617B2 (en) 2002-05-17 2006-12-26 E. I. Du Pont De Nemours And Company Low molecular weight acrylic copolymer latexes for donor elements in the thermal printing of color filters
JP4606161B2 (ja) * 2002-05-21 2011-01-05 アムジエン・インコーポレーテツド 置換複素環式化合物および使用方法
EP1553212B1 (en) 2002-07-12 2017-08-23 Fujimori Kogyo Co., Ltd. Electromagnetic wave shield material and process for producing the same
KR100667067B1 (ko) * 2004-09-08 2007-01-10 삼성에스디아이 주식회사 레이저 전사용 도너 기판 및 그 기판을 사용하여 제조되는유기 전계 발광 소자
US7270887B2 (en) * 2004-10-13 2007-09-18 Shin-Etsu Chemical Co., Ltd. Antireflective coating, coating composition, and antireflective coated article
US20080014532A1 (en) * 2006-07-14 2008-01-17 3M Innovative Properties Company Laminate body, and method for manufacturing thin substrate using the laminate body
US7927454B2 (en) * 2007-07-17 2011-04-19 Samsung Mobile Display Co., Ltd. Method of patterning a substrate

Similar Documents

Publication Publication Date Title
JP2011503348A5 (https=)
Wang et al. Multifunctional integrated transparent film for efficient electromagnetic protection
Jang et al. A review on intense pulsed light sintering technologies for conductive electrodes in printed electronics
Kanzaki et al. Fabrication of conductive copper films on flexible polymer substrates by low-temperature sintering of composite Cu ink in air
JP7260923B2 (ja) 電気工学的薄膜積層体の製造方法
Jiu et al. Metallic nanowires and their application
US8715536B2 (en) Conductive material formed using light or thermal energy, method for forming the same and nano-scale composition
CN104241406B (zh) 用于硅太阳能电池的核‑壳型镍粒子金属化层
KR101350507B1 (ko) 금속 나노입자를 포함하는 전기전도성 잉크 및 이의 광 소결 방법
US9331216B2 (en) Core-shell nickel alloy composite particle metallization layers for silicon solar cells
JP2013521180A5 (https=)
JPH05502556A (ja) 電気接触部及びその製造方法
CN105472791A (zh) 一种稀土掺杂半导体红外辐射厚膜电子浆料及其制备方法
JP2009108407A (ja) 屈曲棒状金属粒子及びその製造方法、並びに屈曲棒状金属粒子含有組成物、及び導電性材料
CN109148616A (zh) 硅异质结太阳电池及其制备方法
Nishimura et al. Fabrication of Flexible and Transparent Conductive Nanosheets by the UV‐Irradiation of Gold Nanoparticle Monolayers
Sun et al. Mechanism of silver/glass interaction in the metallization of crystalline silicon solar cells
JP2010531044A5 (https=)
CN103915130B (zh) 用于太阳能电池电极的组合物和使用其制作的电极
TWI660516B (zh) 機械性變形的金屬粒子
Liu et al. Enhanced electrical conductivity of PEDOT-encapsulated silver nanowire film pretreated with surfactants
CN102187414A (zh) 埋入式电容器及其制造方法
JP6979130B2 (ja) 太陽電池および前記太陽電池の製造方法
CN102615878A (zh) 一种中高温太阳能选择性吸收涂层及其制备方法
Lee et al. Conductive copper paste for crystalline silicon solar cells