JP2011242522A5 - - Google Patents
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- JP2011242522A5 JP2011242522A5 JP2010113240A JP2010113240A JP2011242522A5 JP 2011242522 A5 JP2011242522 A5 JP 2011242522A5 JP 2010113240 A JP2010113240 A JP 2010113240A JP 2010113240 A JP2010113240 A JP 2010113240A JP 2011242522 A5 JP2011242522 A5 JP 2011242522A5
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- JP
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- Prior art keywords
- stress
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- 239000000463 material Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 10
- 238000010030 laminating Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 96
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- 239000010931 gold Substances 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010113240A JP2011242522A (ja) | 2010-05-17 | 2010-05-17 | マイクロミラー装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010113240A JP2011242522A (ja) | 2010-05-17 | 2010-05-17 | マイクロミラー装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011242522A JP2011242522A (ja) | 2011-12-01 |
| JP2011242522A5 true JP2011242522A5 (enExample) | 2013-03-28 |
Family
ID=45409252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010113240A Pending JP2011242522A (ja) | 2010-05-17 | 2010-05-17 | マイクロミラー装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2011242522A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014184513A (ja) * | 2013-03-22 | 2014-10-02 | Toshiba Corp | 電気部品およびその製造方法 |
| JP6236987B2 (ja) * | 2013-08-23 | 2017-11-29 | ミツミ電機株式会社 | 光走査装置及び光走査ユニット |
| JP2021149007A (ja) | 2020-03-19 | 2021-09-27 | 株式会社リコー | 光反射素子、光偏向装置、画像投影装置、光書込装置、物体認識装置、移動体、及び、ヘッドマウントディスプレイ |
| WO2022270475A1 (ja) * | 2021-06-25 | 2022-12-29 | Ａｇｃ株式会社 | ミラー及びその製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08254612A (ja) * | 1995-03-15 | 1996-10-01 | Canon Inc | 多層膜光学部品およびその製造方法 |
| JP2000284275A (ja) * | 1999-03-31 | 2000-10-13 | Hitachi Ltd | 反射型液晶表示装置 |
| JP4033286B2 (ja) * | 2001-03-19 | 2008-01-16 | 日本板硝子株式会社 | 高屈折率誘電体膜とその製造方法 |
| JP5394663B2 (ja) * | 2008-06-20 | 2014-01-22 | キヤノン電子株式会社 | 光走査用マイクロミラーデバイス、光走査装置、画像形成装置、表示装置および入力装置 |
-
2010
- 2010-05-17 JP JP2010113240A patent/JP2011242522A/ja active Pending
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