JP2011237798A - 印刷フォームを製造する方法 - Google Patents
印刷フォームを製造する方法 Download PDFInfo
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- JP2011237798A JP2011237798A JP2011103609A JP2011103609A JP2011237798A JP 2011237798 A JP2011237798 A JP 2011237798A JP 2011103609 A JP2011103609 A JP 2011103609A JP 2011103609 A JP2011103609 A JP 2011103609A JP 2011237798 A JP2011237798 A JP 2011237798A
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- Prior art keywords
- photopolymerizable layer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
【解決手段】本発明は、支持材および支持材に隣接する光重合性材料の層を有する感光性要素から印刷フォームを製造する方法である。
【選択図】図1
Description
感光性要素または前駆体は、光重合性組成物の少なくとも1層を含む。「感光」という用語には、少なくとも1つの感光層が、化学線に応答して、1つまたは複数の反応、特に、光化学反応を開始することのできる任意の系が包含される。ある実施形態において、感光性要素は、光重合性層の支持材を含む。ある実施形態において、光重合性層は、バインダー、少なくとも1つのモノマーおよび光開始剤を含むエラストマー層である。ある実施形態において、感光性要素は、支持材の反対にある光重合性層に隣接する化学線不透過材料としても機能し得る赤外線感受性の層を含む。
14 光重合性層
16 支持材
20 マスク
22 画像領域
22a 不透明領域
22b 透明領域
24 非画像領域
24a 不透明領域
30 背面マスク
32 カットアウト領域
34 無傷領域
36 化学線
38 化学線
42 硬化部分
44 未露光部分
48 フロア
50 レリーフ領域
54 未露光領域
55 切断器具
58 周縁部
60 キャリア
Claims (13)
- a)感光性要素に隣接して支持材と反対の光重合性層の側面上に配置される、画像領域と非画像領域とを含むフロントマスクを提供し、
b)化学線不透過要素から、無傷領域と、カットアウト領域とを有する背面マスクを形成し、
c)工程a)の要素の前記支持材に隣接して前記背面マスクを配置し、前記無傷領域を前記非画像領域と位置合わせし、
d)工程c)の要素を、前記フロントマスクを通して化学線に露光して、前記画像領域に対応する前記光重合性層の硬化部分を形成し、
e)工程c)の要素を、前記背面マスクを通して化学線に露光して、前記硬化部分に隣接する硬化フロアを形成し、ならびに前記非画像領域に対応する前記光重合性層の未露光部分を提供し、
f)露光工程d)およびe)後に得られる要素を処理して、前記フロアを備えた前記硬化部分のレリーフ領域を形成し、ここで前記光重合性層が少なくともある程度、前記支持材の前記未露光領域に残り、
g)前記光重合性層の前記未露光領域を、前記支持材からおよび前記レリーフ領域から除去し、前記レリーフ領域が前記支持材上に残って、印刷フォームを形成することを含む、支持材上に光重合性層を含む感光性要素から印刷フォームを製造する方法。 - 工程d)および工程e)を同時に、または任意の順で続けて行う請求項1に記載の方法。
- 工程f)の後、前記フロアはある厚さを有し、前記支持材の前記未露光領域に残る前記光重合性層は、前記フロアの厚さと同じ、または実質的に同じ厚さを有する請求項1に記載の方法。
- 工程f)の後、前記フロアはある厚さを有し、前記支持材の前記未露光領域に残る前記光重合性層は、前記フロアの厚さより薄い厚さを有する請求項1に記載の方法。
- 前記支持材の前記未露光領域に残る前記光重合性層の厚さは、前記フロアの厚さより約1〜約20ミル薄い請求項4に記載の方法。
- 工程f)の後、前記フロアはある厚さを有し、前記支持材の前記未露光領域に残る前記光重合性層は、約50ミル〜前記フロアの厚さと略同じ厚さを有する請求項1に記載の方法。
- 工程f)の後、前記フロアはある厚さを有し、前記支持材の前記未露光領域に残る前記光重合性層は、約40ミル〜前記フロアの厚さと略同じ厚さを有する請求項1に記載の方法。
- 工程f)の前、前記要素の前記光重合性層は、約90〜280ミルの厚さを有する請求項1に記載の方法。
- 前記除去工程g)が、
g1)前記レリーフ領域の周囲に沿った前記光重合性層を通した第1の切断を含む、工程f)の要素を切断することと、
g2)前記光重合性層の前記未露光領域を、前記レリーフ領域および前記支持材から分離することと
を含む請求項1に記載の方法。 - 工程g)が、前記未露光領域における前記光重合性層と支持材を通した第2の切断をさらに含み、第2の切断により前記レリーフ領域の少なくとも1つの側面の端から伸びる前記支持材の周縁部が形成される請求項9に記載の方法。
- 工程g)の後、前記支持材の周縁部が、前記レリーフ領域の前記周囲の少なくとも1つの側面の端を超えて伸びる請求項1に記載の方法。
- 前記マスクを提供する工程a)が、前記支持材と反対の前記光重合性層の側面上に配置された化学線不透過層の、前記感光性要素上の一体化マスクを形成することを含む請求項1に記載の方法。
- 少なくとも1つの位置合わせマークを、前記非画像領域に作成し、
少なくとも1つの位置合わせマークを、前記背面マスクの前記無傷領域に作成することをさらに含み、
前記無傷領域の、前記非画像領域との位置合わせは、前記非画像領域の前記少なくとも1つの位置合わせマークを、前記無傷領域の前記少なくとも1つの位置合わせマークと位置合わせすることにより実施される請求項1に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/774,195 | 2010-05-05 | ||
US12/774,195 US8198013B2 (en) | 2010-05-05 | 2010-05-05 | Method for preparing a printing form |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011237798A true JP2011237798A (ja) | 2011-11-24 |
JP2011237798A5 JP2011237798A5 (ja) | 2014-06-19 |
JP5835936B2 JP5835936B2 (ja) | 2015-12-24 |
Family
ID=44675910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011103609A Expired - Fee Related JP5835936B2 (ja) | 2010-05-05 | 2011-05-06 | 印刷フォームを製造する方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8198013B2 (ja) |
EP (1) | EP2385427A3 (ja) |
JP (1) | JP5835936B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017512146A (ja) * | 2014-02-20 | 2017-05-18 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 複合型印刷フォーム原版および処理用の印刷フォーム原版を作製する方法 |
JP7219999B1 (ja) | 2022-08-30 | 2023-02-09 | 日本電子精機株式会社 | フレキソ版とその製造方法とヒートカット装置 |
Families Citing this family (6)
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US9477152B2 (en) * | 2012-09-27 | 2016-10-25 | E I Du Pont De Nemours And Company | Printing form precursor having indicia and a method for preparing a printing form from the precursor |
US9164390B2 (en) * | 2013-11-06 | 2015-10-20 | VIM Technologies, Inc. | Method of preparing flexographic printing members |
GB2520058B (en) * | 2013-11-08 | 2016-08-10 | Graphic Ip Ltd | A method of casting concrete producing a product with a metal finish |
EP2950146A1 (de) * | 2014-05-28 | 2015-12-02 | AKK GmbH | Verfahren und Vorrichtung zur Herstellung einer Flexodruckform |
US10668711B2 (en) * | 2015-06-02 | 2020-06-02 | E I Du Pont De Nemours And Company | Printing form precursor, a process for making the precursor, and a method for preparing a printing form from the precursor |
CN111273522A (zh) * | 2020-04-11 | 2020-06-12 | 苏州源卓光电科技有限公司 | 一种基板的曝光方法及加工方法 |
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JP2017512146A (ja) * | 2014-02-20 | 2017-05-18 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 複合型印刷フォーム原版および処理用の印刷フォーム原版を作製する方法 |
JP7219999B1 (ja) | 2022-08-30 | 2023-02-09 | 日本電子精機株式会社 | フレキソ版とその製造方法とヒートカット装置 |
JP2024033330A (ja) * | 2022-08-30 | 2024-03-13 | 日本電子精機株式会社 | フレキソ版とその製造方法とヒートカット装置 |
Also Published As
Publication number | Publication date |
---|---|
JP5835936B2 (ja) | 2015-12-24 |
EP2385427A2 (en) | 2011-11-09 |
US8198013B2 (en) | 2012-06-12 |
EP2385427A3 (en) | 2014-09-17 |
US20110275017A1 (en) | 2011-11-10 |
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