JP2011223034A5 - - Google Patents

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Publication number
JP2011223034A5
JP2011223034A5 JP2011161217A JP2011161217A JP2011223034A5 JP 2011223034 A5 JP2011223034 A5 JP 2011223034A5 JP 2011161217 A JP2011161217 A JP 2011161217A JP 2011161217 A JP2011161217 A JP 2011161217A JP 2011223034 A5 JP2011223034 A5 JP 2011223034A5
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JP
Japan
Prior art keywords
exposure apparatus
air outlet
substrate
liquid
path space
Prior art date
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Application number
JP2011161217A
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English (en)
Japanese (ja)
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JP2011223034A (ja
JP5232901B2 (ja
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Priority to JP2011161217A priority Critical patent/JP5232901B2/ja
Priority claimed from JP2011161217A external-priority patent/JP5232901B2/ja
Publication of JP2011223034A publication Critical patent/JP2011223034A/ja
Publication of JP2011223034A5 publication Critical patent/JP2011223034A5/ja
Application granted granted Critical
Publication of JP5232901B2 publication Critical patent/JP5232901B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2011161217A 2011-07-22 2011-07-22 露光装置及びデバイス製造方法 Expired - Fee Related JP5232901B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011161217A JP5232901B2 (ja) 2011-07-22 2011-07-22 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011161217A JP5232901B2 (ja) 2011-07-22 2011-07-22 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005180600A Division JP4884708B2 (ja) 2005-06-21 2005-06-21 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011223034A JP2011223034A (ja) 2011-11-04
JP2011223034A5 true JP2011223034A5 (cg-RX-API-DMAC7.html) 2012-11-08
JP5232901B2 JP5232901B2 (ja) 2013-07-10

Family

ID=45039509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011161217A Expired - Fee Related JP5232901B2 (ja) 2011-07-22 2011-07-22 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP5232901B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
CN109427550B (zh) * 2017-08-31 2021-04-16 沈阳芯源微电子设备股份有限公司 一种增粘单元hmds吹扫结构

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3747566B2 (ja) * 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
TWI232357B (en) * 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method

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